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Temperature calibration - Laytec

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Motivation<br />

Heteroepitaxy of III-Nitride semiconductors<br />

Wafer temperature has influence on:<br />

• material quality<br />

• composition of ternary compounds<br />

• evolving film stress<br />

substrate/wafer<br />

susceptor<br />

Bow<br />

Dz ~ ΔT<br />

Stress due to lattice mismatch results in wafer bowing which leads to:<br />

� Change in temperature uniformity across the wafer<br />

� Inhomogeneity of material properties<br />

23 June 2009 <strong>Temperature</strong> <strong>calibration</strong><br />

4

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