SON(rcHEMICAI, SYNIIIISIS AIID CIIARACTERIZATION OF PR.ECT ...

Fige 63:
showirs SEM imagc of aor 6 depGncd (a) dd d€st€d (b) l5l
XRD profiles of copFr filn 152
X-ny dill@tioo p.n o of C! film deposired or eda glss 153
XRD p.itce of ZnO filn on cfuic srbsdlr6
XRD paft.m of thin 6lrn ofzno
)(RD pan@ ofdop.d/udop.d ZnO rlin filn
xRD patt*n of lilm deposir.d win tz(@)r(n1o)lcl s !
e'@ ndaial a) at 200 qC. b) ar 500 t
Optical rtuoitnnce ofzno liln on tused sitica qudrz
Ab6orydos @flici.nt ( d1 ) !s ploron 66s, Gv) @. or
Iw-vBibl. s!@irM of Zrq lhin 6lD delosii.d oD @mic lS9
Absoryiion c@nici.D1( dr ) !s ptoroo odgy (hv) cw. of t59
Tdp.ratur€ q R$ist'!@ n*ll@€nr. of th. nnc oxide 160
filo un&r d oxyao aftolph@ (A), veuu (.) &d air (.)
Semnivily ofzno rhin filrn ar vdioB r.DFarw 164
S6itiviiy Esposc s ietion of €$6ot @ocftllion for 164
thiD ZnO filn d op.Rcd at 60 t
SeNnivity 6pone 6 a tunciion of elh&ol concc.lratio! for l6t
llin 6lt! of hO $ opai.d !r 60 oC
El.ctrical rcspoBc of dopp.d /udoppcd sosr at
S.Nrcspo@tin of filn in oxyg@ ovibm.nl
s1&r e!o@ rim. of lilD in etud ss
t54
154
156
t57
151
t5E
166