Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...

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Definitions of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) Structures and materials made by ALD Properties needed for CVD and ALD precursors: Volatility, Stability, Reactivity How to design those properties into precursors: metal amidinates High-k insulators: La 2 O 3 , LaAlO 3 Harvard University Outline
Chemical Vapor Deposition (CVD) One or more gases or vapors react to form a solid product precursor vapors substrate Solid product can be a film particle nanowire nanotube Harvard University Heater film byproduct vapors Reaction started by heat mixing 2 vapors plasma
Page 1: Atomic Layer Deposition (ALD): An E
Page 5 and 6: ML 2 H 2O Typical ALD Reaction for
Page 7 and 8: Lining and Filling Holes by ALD Har
Page 9 and 10: Coatings on the Outside of Particle
Page 11 and 12: ALD ruthenium on aluminum oxide dia
Page 13 and 14: Alumina Nanotubes on Carbon Nanotub
Page 15 and 16: Elements included in ALD Materials
Page 17 and 18: Pure Elements Made by ALD Green = A
Page 19 and 20: Harvard University Sulfides Made by
Page 21 and 22: Harvard University Fluorides Made b
Page 23 and 24: Definitions of Chemical Vapor Depos
Page 25 and 26: Criteria for CVD Precursors •Reac
Page 27 and 28: Definitions of Chemical Vapor Depos
Page 29 and 30: Increasing ligand bulk Structures o
Page 31 and 32: Increasing ligand bulk Structures o
Page 33 and 34: Zr(amd) 4 and Hf(amd) 4 Harvard Uni
Page 35 and 36: Harvard University Thermogravimetri
Page 37 and 38: Precursors: H 2 O and Harvard Unive
Page 39 and 40: Precursors: Me 3 Al, H 2 O and Harv
Page 41 and 42: 2 nm TEMs of ALD LaAlO 3 and GdScO
Page 43 and 44: Leakage (A/cm 2 ) 10 2 10 0 10 -2 1
Page 45: Harvard University Acknowledgements

Atomic Layer Deposition (ALD): An Enabler for Nanoscience and ...

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