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Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

Wüest M. 51 Wykes M. 82 Yamaguchi M. 17 Ybarra G. 129 Yubero F ...

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JUNE 28 WEDNESDAY AFTERNOON<br />

JS1-WeA-P.7 UHV REACTIVE EVAPORATION GROWTH OF TITANIUM NI-<br />

TRIDE THIN FILMS, LOOKING FOR MULTIPACTOR EFFECT SUPPRESSION IN<br />

SPACE APPLICATIONS. Ana Ruiz and Elisa Román. Instituto de Ciencia de Materiales de Madrid.<br />

Consejo Superior de Investigaciones Científicas. Cantoblanco. E-28049-Madrid. Spain Pilar<br />

Lozano*, Mariano García and Luis Galán. Departamento de Física Aplicada. Universidad Autónoma<br />

de Madrid.Cantoblanco. E-28049 Madrid. Spain. Isabel Montero. Instituto de Ciencia de Materiales<br />

de Madrid. Consejo Superior de Investigaciones Científicas. Cantoblanco. E-28049-Madrid. Spain.<br />

David Raboso. ESA/ESTEC. Keplerlaan, 1. 2200 AG Noordwijk. The Netherlands.<br />

A low secondary electron emission yield which remains stable after exposure to ambient, as well as a<br />

good electrical conductivity, have proved to be basic criteria for selecting a reliable coating in RF<br />

components for space applications, in order to reduce the multipactor effect. Although titanium nitride<br />

is among the most appropriate materials, its actual performance is very much dependent on the<br />

deposition conditions. Standard deposition techniques used for TiN thin films or coatings often produce<br />

layers that are far from optimal, specially concerning secondary emission yield and its stability<br />

when exposed to air.<br />

In this work, an ultra-high vacuum reactive evaporation procedure has been tested and optimized for<br />

the growth of TiN thin films, throwing very good results both in composition of the TiN layers and<br />

SEY values and performance. Sublimation of Ti filaments is carried out in a ultra-high vacuum<br />

chamber in which a controlled leak of high purity N 2 is placed close to the substrate surface, thus<br />

maintaining the overall pressure in the high vacuum range and preventing nitridation of the Ti filaments.<br />

Detailed description of the growth procedure, substrate preparation and deposition protocol<br />

will be described with special emphasis on the relevant growth parameters and practical hints and<br />

how to achieve them. We present a study of the samples grown, such as stoichiometry and composition<br />

obtained by means of XPS and AES, and secondary electron emission measurements versus<br />

time in the scale of several months. The results obtained show that the deposition technique throws<br />

the best results towards the multipactor effect suppression.<br />

*present address: Instituto Universitario de Investigación en Nanociencia de Aragón. Universidad de<br />

Zaragoza.<br />

Edificio Interfacultativo II. c/ Pedro Cerbuna,12.E-50009 Zaragoza (Spain)<br />

130

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