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As and Epitaxial-Growth MnSi Thin Films - OPUS Würzburg

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16 2. Diluted Ferromagnetic Semiconductor (Ga, Mn)<strong>As</strong><br />

A way of visualizing these anisotropy terms was developed in [Papp 07a]. Sample resistance<br />

polar plots (RPP) for different collections of anisotropies are shown in Figure 2.2.<br />

In these plots, the innermost region (low-field) part is the most important for calculating<br />

the anisotropy strengths. This lower field region would form of a square with corners<br />

along the easy axis for a pure bixial anisotropy <strong>and</strong> the domain wall nucleation energy is<br />

calculated from the length of the half diagonal ǫ/M.(Figure 2.2.a) Figure 2.2.b shows the<br />

the model now including uniaxial terms, where the additional effects elongate the square<br />

into a rectangle. The strength of the uniaxial anisotropy constant in the [¯110] direction<br />

K¯110 (U h ) relative to the biaxial anisotropy constant K cryst can be obtained from the<br />

angle δ (Figure 2.2.c).<br />

With a uniaxial anisotropy term parallel to one of the biaxial easy axes (i.e. K [010]<br />

u , U e ),<br />

an asymmetry arises in the switching energy between the two biaxial easy axes. (e.g. the<br />

energy required to switch towards the easier of the two biaxial easy axis is less than to<br />

switch towards the second biaxial) [Goul 08] The ratio of K cryst : K 110 : K 010 is usually<br />

of the order of 100 : 10 : 1. [Papp 07b] This ratio can easily be modified via changing<br />

parameters such as hole concentration or temperature. [Sawi 04, Papp 07b]<br />

2.2 Ultra-thin (Ga,Mn)<strong>As</strong> films<br />

Because of increasing surface <strong>and</strong> finite-size effects, the behavior of ultra-thin films of<br />

many materials differ significantly from the bulk. [Rush 07] observed a marked difference<br />

of the AMR response between 5 <strong>and</strong> 25 nm (Ga,Mn)<strong>As</strong> layers showing an increased<br />

crystalline contribution to the magnetic response, particularly a large uniaxial component<br />

Fig. 2.3: Anisotropic magnetoresistance measurement for a device with Corbino geometry from<br />

a 5 nm (Ga,Mn)<strong>As</strong> film with 5% nominal Mn concentration. The applied field is maintained at<br />

saturation value <strong>and</strong> rotated along different angles. [Rush 07] used a phenomenological model<br />

to fit the magnetic response <strong>and</strong> found unaxial crystalline terms dominating the measured magnetoresistance,<br />

confirmed by this measurement. Reprinted from [Rush 07].

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