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Metrology Tools as Basis for Photo Mask Repair and Mask ...

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PROVE ®<br />

Schematic optical layout<br />

Autofocus system<br />

CCD camera<br />

Flexible<br />

illumination<br />

<strong>for</strong> transmission or<br />

reflection<br />

Imaging optics<br />

=193nm, NA=0.60<br />

pellicle compatible<br />

Image processing<br />

Auxiliary optics<br />

<strong>for</strong> coarse alignment<br />

Reticle<br />

(face-up)<br />

Stage<br />

actively controlled in 6 dof<br />

ultra precise stage metrology system<br />

Carl Zeiss SMS GmbH, Klaus Edinger<br />

03/27/2013 6

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