Equipment S PECIA L S Y S TE M S - Leybold Optics GmbH

SPECIAL SYSTEMS
Lab Family
Equipment

Customer Benefit
The H750 is an advanced horizontal sputter inline system
in sputter-up configuration. It not only uses the state of
the art stainless steel design but it is made for high
throughput, low contamination levels of the substrates,
quick service, extended uptime, and user friendly opera-
tion. The H750 is based on a modular concept and can be
configured to match customer’s requirements.
In the H750 substrates are placed on substrate carriers.
These are manufactured according to customer’s sub-
strates and can be exchanged during operation of the
machine. For reliable operation of the H750 a PLC is
used. Process recipes can be easily modified, stored and
recalled. The H750 can be operated from the clean room
as well as from the machine room.
used. Process recipes can be easily modified, stored and
recalled. The H750 can be operated from the clean room
as well as from the machine room.

Applications
The H750 offers a quality coating area of up to 550 mm x
600 mm at standard substrate carriers.
Processes include substrate pre-treatment by means of a
linear ion source and all different magnetron sputter pro-
cesses available from Leybold Optics Dresden. These are
DC sputter processes using magnetrons with high target
utilization, MF sputter processes with dual magnetrons
or even RF sputtering of insulating target materials.

LAB 500
LAB 600
LAB 600 H
LAB 700
Inside dimension of the chamber
(W x H x D in mm):
LAB 500: 500 x 650 x 520
LAB 600: 600 x 750 x 620
LAB 600 H: 600 x 1100 x 620
SPECIAL SYSTEMS
LAB 700 H
LAB 900
LAB 1100
LAB 1820
LAB 700: 700 x 750 x 720
LAB 700 H: 700 x 950 x 720
LAB 900: 950 x 950 x 920
LAB 1100: 1100 x 1100 x 1050
LAB 1820: ø: 1820 / H: 1400

GENERAL FEATURES:
• high-grade steel vacuum chamber mounted on welded
frame rack with height adjustable feet
• two set of chamber liners (evaporation shields)
• water cooled chamber walls
• viewports with mirror observation system or shutter
• Pirani and Bayard-Alpert Ionivac
• pumping system according to the requirements
• PLC based control system with PC visualisation
ELECTRICAL CABINETS:
• 2x or 3x 19” Rittal cabinet
• main power distribution
• PLC based control system with PC visualisation
• Emergency Off
Option:
• customized electrical cabinets
SPECIAL SYSTEMS

SPECIAL SYSTEMS
Vacuum

SPECIAL SYSTEMS
Vacuum

MINI PLC
PLC WITH TOUCH SCREEN
3 user level
• Service
• Supervisor
• User
Automatic control of:
• vacuum pumps
• process devices
• optional equipment:
Modem
Data logging
on CF-card
Recipe handling
• 20 recipes can
be stored
• fixed structure of
header and up
to 50 layers
per recipe
SPECIAL SYSTEMS
Monochrome touch
panel with
320 x 240 pixels
Compact PLC OMRON
SYSMAC CPM2A with
directly connected
in- and outputs
Signals directly
wired to PLC (no
field bus system)
Standard touch screen
version 16 colours
touch panel with
640 x 480 pixels
Modular PLC OMRON
SYSMAC CS1H with
Profibus DP
RS232 and RS485
interfaces
Signals distributed
via Profibus DP
Other possible field
busses with OMRON
PLC: CANopen,
DeviceNet, ASi,
ModBus, Interbus
Loop2

LAB PLUS CONTROLER
ADDITIONAL FEATURES COMPARED
TO PLC WITH TOUCH SCREEN VERSION:
• Better graphics resolution
• Windows look and feel
• 5 user levels
• configurable data logging
• Free recipe editing (drag and drop)
• Recipes stored in Access database on PC
• Up to 800 steps per recipe can be stored on PLC
• Modem and Ethernet
SPECIAL SYSTEMS
19”-Rack Panel-PC in
cabinet front or
cabinet mounted
Industrial-PC
with separate mobile
control desk for clean
room installation with
15” or 18” TFT-Touch
screen
Modular PLC with
Profibus DP communi-
cation processor
OMRON SYSMAC CS1H
or SIEMENS SIMATIC
• process devices like OMS 3000 can be used PC version example screen shot
S7
RS232 and RS485
interfaces, TCP/IP on
Industrial Ethernet
Other possible field
busses with SIMATIC
PLC: ASi, Interbus

THERMAL EVAPORATION
Thermal evaporator „big“
• high current feedthroughs up to 1000 A
• special boat holder
• high current transformer 1100 A / 12 V
• special thyristor unit
Thermal evaporator „small“
• Evaporation assembly
• High current generator AS 053
(400 A with 5 V or 200 A with 10 V)
High volume evaporator
• ceramic heater with shielding
• high volume
Evaporator „small“
SPECIAL SYSTEMS
AS 053
• Multi boat evaporator
Evaporator „big“

ELECTRON BEAM EVAPORATION
Electron-beam evaporator HPE 6
• max. power: 6 kW
• deflection: 270°
• 3 types: coaxial, standard, long
• single, 4-6-7 cup
Electron-beam evaporator
ESV 14/4, ESV 14/D, ESV 14/Q
• crucible: four-hearth rotary crucible
(ESV 14/4) • 4 x 25 cm 3
single hearth rotary crucible (ESV 14/D) • 1 x 100 cm 3
exchangeable crucible plates (ESV 14/Q)
• beam power at 10 kV: 10 kW
• operating pressure: < 5 x 10 -4 mbar
• cooling water requirement: > 12 l/min; 4-7 bar
Electron-beam evaporator EV M-6 and EV M-8
• max. power: 6 kW (EV M-6) or 10 kW (EV-M8)
• acceleration voltage: 4 - 10 kV
• operating pressure: 1 x 10 -8 to 5 x 10 -4 mbar
• cooling water requirement:
6 l/min (1.6 gpm); > 3 bar (45 psi)
• mounting flange: 32 mm through hole
e-gun controller unit EGC 38
• with radio controlled remote unit
• Windows based setup and simulation software
power supply
• switched filament power supply
• HV-generator power supply with 5 kW or 10 kW
EGC 38
power
supply
SPECIAL SYSTEMS
ESV 14/Q
contact
cooled
ESV 14/Q
directly
cooled
EVM-6
directly
cooled
EVM-6
contact
cooled
EVM-8
directly
cooled
1 x D 40 mm
10 mm deep
1 x D 70 mm
32 mm deep
1 x 65 cm 3
max 4 kW
1 x 65 cm 3
max 3 kW
1 x 160 cm 3
max 10 kW
-
-
-
-
1 x 93 cm 3
max 6 kW
-
-
1 x 240 cm 3
max 10 kW
HPE 6
EVM-6
ESV 14/Q
EVM-8
4 x D 38 mm
19 mm deep
4 x D 38 mm
15 mm deep
4 x 8 cm 3
max 5 kW
4 x 8 cm 3
max 4 kW
4 x 30 cm 3
max 8 kW
14 x D 14 mm
10 mm deep
-
-
6 x 4 cm 3
max 4 kW
6 x 4 cm 3
max 3 kW
6 x 20 cm 3
max 8 kW
-
-
12 x 1,1 cm 3
max 2 kW
12 x 4 cm 3
max 3 kW

MAGNETRON SPUTTERING
Penning cathode PK 100 - 250
• wall mounted
• magnetic array at athmosphere
• water cooling integrated in backing plate
Internally mounted cathode IMM 100 - 200
• adjustable distance to substrate
• high yield magnetic array
• magnetic array not in contact
with cooling water
ION AND PLASMA SOURCES
End Hall ion sources
• pressure range > 3·10 -4 mbar
• beam current up to 1000 mA
• ion energy from 40 to 120 eV
• filament or hollow cathode nutralizer
ECWR plasma sources
• pressure range > 1·10 -4 mbar
• plasma densities up to 1013/cm 3
• ion current density up to 3 mA/cm 2
• independent control of the ion energy
from 20 to 600 eV
RF ion source
• RF power: 75 to 300 W at 13.56 MHz
• beam current: up to 50 mA
• ion energy: from 100 to 2000 eV
Penning cathode
Mark I
Copra
SPECIAL SYSTEMS
IMM 100
Mark II
Copra
RF/I 40

Thickness measurement
and rate control
QUARTZ MONITORING
Thin film deposition controller IC/5
• control of up to 6 coating sources
• co-deposition with two sources is possible
• 50 coating programs with 250 different layers
• 24 material programs
• simultaneous measurement with up to 8 sensors
• thickness resolution: ca. 1 Å
• rate resolution: down to 0.1 Å /s
Thin film deposition controller XTC/2
• two channels, but not simultaneously used
• 9 coating programs with up to 3 different layers
• 9 material programs
• thickness resolution: ca. 1 Å
• rate resolution: down to 0.1 Å /s
Sensors:
double head shutter assembly standard
OPTICAL MONITORING
Optical monitor OMS 3000
• measuring range: 400 ... 2400 nm
• test glass changer (motor controlled)
with 100 test glasses
OMS 3000
SPECIAL SYSTEMS
IC/5
XTC/2
test glass
changer
test glass changer
substrate holder
chamber
receiver
transmitter

Table
SUBSTRATE HOLDER
• Plane plate (with holder rings)
• Calotte (1 or 4 segments)
SUBSTRATE DRIVE SYSTEMS
ferrofluidic rotary feedthrough
• Massiv shaft with servo motor
• hollow shaft with servo motor or asynchronous motor
substrate drive systems
SPECIAL SYSTEMS
Calotte
Calotte
Calotte
IMM 100
IMM 100

IR-resistor heater
• power: 2,2 kW
Quartz lamp heater
• power: 3 x 500 W
• UHV compatible
Ceramic radiative heater
• contamination free
• low desorption
• power: 5,2 kW
Inconel backside heater
• max. substrate temperature: 300 °C
• power: depends on chamber size
SPECIAL SYSTEMS
IR resistor
lamp heater
ceramic heater
inconel
backside
heater

CHINA
LEYBOLD OPTICS CHINA
#25, Kangsheng Industrial Park
No.11 Kangding Street
Beijing BDA, 100176, China
Phone: +86 10 67803366 - 0
Fax: +86 10 67803366 - 100
FRANCE
LEYBOLD OPTICS FRANCE
7 Avenue du Quebec
91140 Villebon sur Yvette
Z.A. de Courtaboeuf, France
Phone: +33 1 698248 - 12
Fax: +33 1 698248 - 40
GERMANY
LEYBOLD OPTICS DRESDEN
Zur Wetterwarte 50
Haus 303
01109 Dresden, Germany
Tel.: +49 351 86695 - 16
Fax: +49 351 86695 - 42
GREAT BRITAIN /
IRELAND
LEYBOLD OPTICS UK
St. Modwen Road, Stretford
Manchester M32 OZE, Great Britain
Phone: +44 161 86628 - 00
Fax: +44 161 86628 - 01
ITALY / AUSTRIA / SLOWENIA
LEYBOLD OPTICS ITALIA
Via Trasimeno 8
20128 Milano, Italy
Phone: +39 02 263050 - 84
Fax: +39 02 272096 - 95
HEADQUARTERS:
LEYBOLD OPTICS GmbH
Siemensstrasse 88
63755 Alzenau, Germany
Tel.: +49 6023 500 - 0
Fax: +49 6023 500 - 150
E-Mail: info@leyboldoptics.com
www.leyboldoptics.com
JAPAN
LEYBOLD OPTICS JAPAN
Kazama Bldg.
19-5, Nishi Shinbashi 2-chome,
Minato-ku, Tokyo, 105-0003 - Japan
Phone: +81 35 77755 - 51
Fax: +81 35 77755 - 53
KOREA
LEYBOLD OPTICS KOREA
# 1406, HyunDae 41 Tower, 917-9
Mok-1Dong, Yangcheon-Gu
Seoul 158-051, Korea
Phone: +82 2 2168 - 2136
Fax: +82 2 2168 - 2078
SPAIN / PORTUGAL
LEYBOLD OPTICS IBÉRICA
C/Carles Buigas 57-59
08980 Sant Feliu de Llobregat
Barcelona, Spain
Phone: +34 93 666 - 0778
Fax: +34 93 666 - 4612
TAIWAN
LEYBOLD OPTICS TAIWAN
82, Shien-Cheng 11th St., Chu-Bei City
302, Hsinchu County
Taiwan
Phone: +886 35 5831 - 23
Fax: +886 35 5831 - 39
USA / CANADA / SOUTH AMERICA
LEYBOLD OPTICS USA
539 James Jackson Ave.
Cary, NC 27513, USA
Phone: +1 919 65771 - 00
Fax: +1 919 65771 - 01
www.mbwm.de