Rotary and Planar Sputtering Targets

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Rotary and Planar Sputtering Targets

2Rotary TargetsPutting the “I” in CIGCIGCu/GaHigh ThroughputCylindrical, rotatable sputtering targets increasematerial utilization and system throughputwhile reducing the total cost of ownership.The cylindrical, rotatable shape offers greaterthan 70% material utilization with less systemdowntime and high system throughput.The targets are made by Indium Corporation’s verticallyintegrated proprietary process utilizing aerospace powdermetallurgy technology. The production process outputresults in a consistently homogeneous alloy, with lowcontaminate levels and consistent density throughout thetarget.Copper-Indium-GalliumCIG alloy targets have very low levels of impurities, whichenable the manufacture of high efficiency solar cells. Thisis because we can control the impurity levels before andduring our manufacturing process.Targets can be used in reactive or non-reactive modes.Using fully alloyed targets with various Cu/III and Ga/III ratios enable grading of the deposited CIG chemicalcomposition. This replicates the process used formanufacturing high-efficiency solar cells.Shows homogeneitythroughout the targetTypical Dimensions:Length: 304.8 – 1651mm (12 - 65 inches)Diameter: 76.2 – 152.4mm (3 - 6 inches)Thickness: 3.175 – 12.7mm (0.125 – 0.5 inches)Copper-GalliumThe targets can be produced in chemistry ranges from50% to 80% Cu atomic weight, with Ga making up thebalance of the alloy. They are produced as a monolithicmaterial, bonded onto the backing tube during IndiumCorporation’s unique hybrid consolidation process.www.indium.com

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