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Flare distance

Flare distance

Flare distance

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Summary• Early results of 2 unique flare evaluation methods are shown.– Donut patterns: huge spillover area at < 2 μm outer radiusfor Resist A and B. (No data yet for Resist C.)– LS pattern: resists with long diffusion lengths show higher ηvalues. η strongly depends on resist material.MagnitudeResist Along DLResist Bshort DLResist Clong DLη 18.4 % 6.45 % 14.6%PSF Same trend No dataDistance LS edge Few μm ~16 μm 23 μm• These results will be utilized for our next device demo.2008 International Symposium on Extreme Ultraviolet Lithography 14

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