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section 1 - World Intellectual Property Organization

section 1 - World Intellectual Property Organization

44/2002 21800 PCT

44/2002 21800 PCT Gazette - Section I - Gazette du PCT 31 Oct/oct 2002 SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 C23C 4/12, 24/04, B61F 15/00, F16C 33/14 (11) WO 02/086182 (13) A1 (21) PCT/EP02/02837 (22) 14 Mar/mar 2002 (14.03.2002) (25) de (26) de (30) 101 19 309.2 19 Apr/avr 2001 DE (19.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) METHOD FOR PREVENTING PRESS FIT DAMAGES TO WHEELSETS, PAR- TICULARLY TO WHEELSETS OF RAIL VEHICLES PROCEDE DESTINE A EVITER DES DEGATS D’AJUSTEMENT FORCE SUR DES ESSIEUX MONTES, NOTAM- MENT SUR DES ESSIEUX MONTES DE VEHICULES SUR RAILS (71) DEUTSCHE BAHN AG [DE/DE]; Postdamer Platz 2, 10782 Berlin (DE). (for all designated States except / pour tous les États désignés sauf US) (72, 75) KUTTNER, Thomas [DE/DE]; Waldstrasse 86, 13156 Berlin (DE). STAUDER, Norbert [DE/DE]; Friedhofstrasse 22, 74354 Besigheim (DE). (74) DEUTSCHE BAHN AG; Zinken-Sommer, Rainer, Patentabteilung TZ 02, Völckerstr. 5, 80939 München (DE). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 C23C 14/00, C25B 11/00, 13/00, 9/00, C22C 21/00, B23K 20/00, 28/00 (11) WO 02/086183 (21) PCT/US02/11686 (13) A1 (22) 12 Apr/avr 2002 (12.04.2002) (25) en (26) en (30) 60/285,658 19 Apr/avr 2001 (19.04.2001) US (43) 31 Oct/oct 2002 (31.10.2002) (54) DIFFUSION BONDED ASSEMBLIES AND FABRICATION METHODS ENSEMBLES SOUDES PAR DIFFU- SION ET PROCEDES DE FABRICA- TION (71) HONEYW ELL INTERNATIONAL INC. [US/US]; Law Department AB2, P.O. Box 2245, 101 Columbia Road, Morristown, NJ 07962 (US). (for all designated States except / pour tous les États désignés sauf US) (72, 75) MISNER, Josh, W. [US/US]; 222 N. Whipple, Spokane, WA 99206 (US). (74) LAKE, James, E. et al. / etc.; Wells St. John P.S., 601 West First Ave., # 1300, Spokane, WA 99201 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Published / Publiée : (c) Declaration / Déclaration : (u) for / pour US only / seulement (51) 7 C23C 14/34, C22C 1/02, B21J 5/02, 5/08, G11B 5/851, 5/65 (11) WO 02/086184 (21) PCT/JP02/01341 (13) A1 (22) 18 Feb/fév 2002 (18.02.2002) (25) ja (26) ja (30) 2001-116323 16 Apr/avr 2001 (16.04.2001) JP (30) 2001-167040 1 Jun/juin 2001 (01.06.2001) JP (43) 31 Oct/oct 2002 (31.10.2002) (54) MANGANESE ALLOY SPUTTERING TARGET AND METHOD FOR PRO- DUCING THE SAME CIBLE DE PULVERISATION D’AL- LIAGE DE MANGANESE ET PRO- CEDE DE PRODUCTION ASSOCIE (71) NIKKO MATERIALS COMPANY, LIM- ITED [JP/JP]; 10-1, Toranomon 2-chome, Minato-ku, Tokyo 105-8407 (JP). (for all designated States except / pour tous les États désignés sauf US) (72, 75) NAKAMURA, Yuichiro [JP/JP]; c/o Isohara Factory of, Nikko Materials Company, Limited, 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi, Ibaraki 319-1535 (JP). (74) OGOSHI, Isamu; TecLaw Patent & Law Office, Nishi-shimbashi Sato Bldg. 7F, 4-1, Nishi-Shimbashi 3-chome, Minato-ku, Tokyo 105-0003 (JP). (81) CN KR US. (84)EP(ATBECHCYDEDKESFIFRGBGR IE IT LU MC NL PT SE TR). Published / Publiée : (b) (51) 7 C23C 14/35, 16/00, C23F 1/02 (11) WO 02/086185 (13) A1 (21) PCT/US02/11473 (22) 10 Apr/avr 2002 (10.04.2002) (25) en (26) en (30) 60/285,360 20 Apr/avr 2001 US (20.04.2001) (30) 60/285,361 20 Apr/avr 2001 US (20.04.2001) (30) 60/285,364 20 Apr/avr 2001 US (20.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) PENNING DISCHARGE PLASMA SOURCE SOURCE DE PLASMA DE DECHARGE DE PENNING (71) APPLIED PROCESS TECHNOLOGIES [US/US]; 546_East 25th Street, Tucson, AZ 85713 (US). (for all designated States except / pour tous les États désignés sauf US) (72, 75) MADOCKS, John, E. [US/US]; 110 East Yvon Drive, Tucson, AZ 85704 (US). (74) HETZ, Joseph, F.; Brinks Hofer Gilson & Lione, P.O. Box 10087, Chicago, IL 60610 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RUTJTM);EP(ATBECHCYDEDKES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 C23C 14/35, G01N 33/00 (11) WO 02/086186 (21) PCT/US02/04819 (13) A1 (22) 20 Feb/fév 2002 (20.02.2002) (25) en (26) en (30) 60/286,182 24 Apr/avr 2001 (24.04.2001) US (30) 60/296,354 6 Jun/juin 2001 (06.06.2001) US (30) 60/300,019 21 Jun/juin 2001 (21.06.2001) US (30) 60/328,847 11 Oct/oct 2001 (11.10.2001) US (43) 31 Oct/oct 2002 (31.10.2002) (54) TARGET AND METHOD OF OPTIMIZ- ING TARGET PROFILE CIBLE ET PROCEDE D’OPTIMISA- TION D’UN PROFIL DE CIBLE (71) TOSOH SMD, INC. [US/US]; 3600 Gantz Road, Grove City, OH 43123 (US). (only for / seulement pour US) (72, 75) IVANOV, Eugene, Y. [US/US]; 3198 Windsor Place, Grove City, OH 43123 (US). SMATHERS, David, B. [US/US]; 3298 Kirkham Road, Columbus, OH 43221 (US). WICKERSHAM, Charles, E., Jr. [US/US]; 571 Arden Road, Columbus, OH 43221 (US). ZHU, Lin [US/US]; 3262 Heritage Glen Dr., Grove City, OH 43123 (US). (74) PEACOCK, Bruce, E. et al. / etc.; Biebel & French, 35 East First Street, Dayton, OH 45402 (US).

44/2002 31 Oct/oct 2002 PCT Gazette - Section I - Gazette du PCT 21801 (81) JP KR US. (84) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR). (51) 7 C23C 14/50, 14/54, 14/56, 16/458, 16/46, H01L 39/24 (11) WO 02/086187 (13) A1 (21) PCT/EP02/04243 (22) 17 Apr/avr 2002 (17.04.2002) (25) en (26) en (30) 01201428.8 20 Apr/avr 2001 EP (20.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) APPARATUS FOR THE DEPOSITION OF METAL OR METAL OXIDE COAT- INGS APPAREIL UTILE POUR DEPOSER DES COUCHES DE METAL OU D’OXYDE METALLIQUE (71) N.V. BEKAERT S.A. [BE/BE]; Bekaertstraat 2, B-8550 Zwevegem (BE). (for all designated States except / pour tous les États désignés sauf US) (72, 75) DENUL, Jurgen [BE/BE]; Krekelstraat 119, B-9800 Deinze (BE). DE GRYSE, Roger [BE/BE]; Dorp 47, B-9860 Oosterzele (BE). SEGERS, Anneke [BE/BE]; Eekhout 62, B-9000 Gent (BE). LIEVENS, Hugo [BE/BE]; Nederzwijnaarde 45, B-9052 Gent (BE). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 C23C 14/56, 16/54, H01L 39/24, C23C 14/54 (11) WO 02/086188 (13) A1 (21) PCT/EP02/04241 (22) 17 Apr/avr 2002 (17.04.2002) (25) en (26) en (30) 01201427.0 20 Apr/avr 2001 EP (20.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) APPARATUS AND METHOD FOR THE DEPOSITION OF METAL OR METAL OXIDE COATINGS ON AN ELON- GATED SUBSTRATE APPAREIL ET PROCEDE POUR DEPO- SER UN REVETEMENT METALLIQUE OU D’OXYDE METALLIQUE SUR UN SUBSTRAT ALLONGE (71) N.V. BEKAERT S.A. [BE/BE]; Bekaertstraat 2, B-8550 Zwevegem (BE). (for all designated States except / pour tous les États désignés sauf US) (72, 75) DENUL, Jurgen [BE/BE]; Krekelstraat 119, B-9800 Deinze (BE). DE GRYSE, Roger [BE/BE]; Dorp 47, B-9860 Oosterzele (BE). SEGERS, Anneke [BE/BE]; Eekhout 62, B-9000 Gent (BE). LIEVENS, Hugo [BE/BE]; Nederzwijnaarde 45, B-9052 Gent (BE). (74) HEYDE, Katrien; N.V. Bekaert S.A., D.I.E. - 4011, Bekaertstraat 2, B-8550 Zwevegem (BE). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Published / Publiée : (c) (51) 7 C23C 16/18, C07C 49/92, C07F 1/08 (11) WO 02/086189 (13) A1 (21) PCT/JP01/03257 (22) 16 Apr/avr 2001 (16.04.2001) (25) en (26) en (43) 31 Oct/oct 2002 (31.10.2002) (54) SUBSTITUTED CYCLOALKENE NEW COPPER PRECURSORS FOR CHEMI- CAL VAPOR DEPOSITION OF COPPER METAL THIN FILMS NOUVEAUX PRECURSEURS DU CUIVRE A SUBSTITUTION CY- CLOALCENE POUR DEPOT CHI- MIQUE EN PHASE VAPEUR DE COUCHES MINCES DE CUIVRE (71) SHARP KABUSHIKI KAISHA [JP/JP]; 22-22, Nagaikecho, Abeno-ku, Osaka-shi, Osaka 545-8522 (JP). (72) ZHUANG, Wei-Wei; 18806 SE 18th Street, Vancouver, WA 98683 (US). NGUYEN, Tue; 671 Lonsdale Avenue, Fremont, CA 94539 (US). CHARNESKI, Lawrence, J.; 8115 NE 227th Avenue, Vancouver, WA 98682 (US). EVANS, David, R.; 7574 SW 179th, Beaverton, OR 97007 (US). HSU, Sheng, Teng; 2216 NW Trout Court, Camas, WA 98607 (US). (74) YAMAM OTO, Shusak u; Fifteenth Floor, Crystal Tower, 2-27, Shiromi 1-chome, Chuo-ku, Osaka-shi, Osaka 540-6015 (JP). (81) JP KR. (84)EP(ATBECHCYDEDKESFIFRGBGR IE IT LU MC NL PT SE TR). (51) 7 C23C 16/40, 16/06 (11) WO 02/086190 (21) PCT/ES02/00193 (13) A1 (22) 18 Apr/avr 2002 (18.04.2002) (25) es (26) es (30) P 200100911 19 Apr/avr 2001 (19.04.2001) ES (43) 31 Oct/oct 2002 (31.10.2002) (54) METHOD FOR PREPARING THIN POROUS OXIDES LAYERS OF INORGANIC PROCEDE DE PREPARATION DE FINES COUCHES POREUSES D’OXYDES INORGANIQUES (71) CONSEJO SUPERIOR DE INVESTI- GACIONES CIENTÍFICAS [ES/ES]; C/Serrano, 117, E-28006 Madrid (ES). UNIVERSIDAD DE SEVILLA [ES/ES]; C/Valparaiso, 5 - 3º, E-41013 Sevilla (ES). (for all designated States except / pour tous les États désignés sauf US) (72, 75) BARRANCO QUERO, Angel [ES/ES]; Insto. Ciencia de Materiales de Sevilla, Consejo Superior de Investigaciones Científicas, C/Americo Vespucio, Isla de Cartuja, E-41092 Sevilla (ES). YUBERO VALEN- CIA, Francisco [ES/ES]; Ctro. Nacional de Aceleradores, Consejo Superior de Investigaciones Científicas, C/Tomás Alba Edisón, Isla de Cartuja, E-41092 Sevilla (ES). ESPINOS MANZORRO, Juan Pedro [ES/ES]; Ctro. Nacional de Aceleradores, Consejo Superior de Investigaciones Científicas, C/Tomás Alba Edisón, Isla de Cartuja, E-41092 Sevilla (ES). RODRÍGUEZ GONZALEZ-ELIPE, Agustín [ES/ES]; Insto. Ciencia de Materiales de Sevilla, Consejo Superior de Investigaciones Científicas, C/Americo Vespucio, Isla de Cartuja, E-41092 Sevilla (ES). COTRINO BAUTISTA, José [ES/ES]; Universidad de Sevilla, C/Valparaiso, 5 - 3º, E-41013 Sevilla (ES). (74) REPRESA SÁNCHEZ, Domingo; Oficina de Transferencia de Tecnología, Consejo Superior de Investigaciones Científicas, C/Serrano, 113 - 2 planta, E-28006 Madrid (ES). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RUTJTM);EP(ATBECHCYDEDKES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 C23C 16/44, C23G 5/032, C11D 11/00, H01L 21/306 (11) WO 02/086191 (21) PCT/US02/04087 (13) A1 (22) 12 Feb/fév 2002 (12.02.2002) (25) en (26) en (30) 09/841,340 24 Apr/avr 2001 (24.04.2001) US (43) 31 Oct/oct 2002 (31.10.2002) (54) USE OF FLUORINATED KETONES AS WET CLEANING AGENTS FOR VA- POR REACTORS UTILISATION DE CETONES FLUO- REES EN TANT QU’AGENTS DE NETTOYAGE HUMIDES POUR REAC- TEURS A VAPEUR (71) 3M INNOVATIVE PROPERTIES COM- PANY [US/US]; 3M Center, Post Office Box 33427, Saint Paul, MN 55133-3427 (US). (72) KESARI, Susrut; Post Office Box 33427, Saint Paul, MN 55133-3427 (US).

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