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section 1 - World Intellectual Property Organization

section 1 - World Intellectual Property Organization

44/2002 21884 PCT

44/2002 21884 PCT Gazette - Section I - Gazette du PCT 31 Oct/oct 2002 (72, 75) LI, Kenneth, K. [US/US]; 217 Laurel Avenue, Arcadia, CA 91006 (US). (74) REPPER, George, R. et al. / etc.; Rothwell, Figg, Ernst & Manbeck, P.C., 1425 K Street, N.W., Suite 800, Washington, DC 20005 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 G03B 21/60 (11) WO 02/086618 (13) A1 (21) PCT/US02/03747 (22) 7 Feb/fév 2002 (07.02.2002) (25) en (26) en (30) 09/841,021 24 Apr/avr 2001 US (24.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) INTEGRATED FRONT PROJECTION SYSTEM WITH DRY ERASE SCREEN SYSTEME DE PROJECTION FRON- TALE INTEGRE AVEC ECRAN S’EF- FAÇANT A SEC (71) 3M INNOVATIVE PROPERTIES COM- PANY [US/US]; 3M Center, Post Office Box 33427, Saint Paul, MN 55133-3427 (US). (72) VANDERWERF, Dennis, F.; Post Office Box 33427, Saint Paul, MN 55133-3427 (US). DELUCA, Patricia, H.; Post Office Box 33427, Saint Paul, MN 55133-3427 (US). RODRIGUEZ, Ernesto, M., Jr.; Post Office Box 33427, Saint Paul, MN 55133-3427 (US). (74) FLORCZAK, Yen, Tong et al. / etc.; Officeof Intellectual Property Counsel, Post Office Box 33427, Saint Paul, MN 55133-3427 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). (51) 7 G03B 42/04, A61B 6/14 (11) WO 02/086619 (13) A1 (21) PCT/EP02/04430 (22) 23 Apr/avr 2002 (23.04.2002) (25) de (26) de (30) 101 20 202.4 24 Apr/avr 2001 (24.04.2001) DE (43) 31 Oct/oct 2002 (31.10.2002) (54) TOMOGRAPHIC DEVICE FOR DEN- TAL TOMOSYNTHESIS TOMOGRAPHE POUR TOMOSYN- THESE DENTAIRE (71) CDI - CENTRUM FÜR DENTALE INNO- VATIONEN GMBH [DE/DE]; Fabrikstrasse 37, 64625 Bensheim (DE). (for all designated States except / pour tous les États désignés sauf US) (72, 75) FRANETZKI, Manfred [DE/DE]; Nussallee 9, 64625 Bensheim (DE). (74) ZINNGREBE, Horst; Saalbaustrasse 11, 64283 Darmstadt (DE). (81) JP US. (84)EP(ATBECHCYDEDKESFIFRGBGR IE IT LU MC NL PT SE TR). Published / Publiée : (c) (51) 7 G03F 1/00 (11) WO 02/086620 (13) A2 (21) PCT/US02/12540 (22) 19 Apr/avr 2002 (19.04.2002) (25) en (26) en (30) 60/284,780 19 Apr/avr 2001 US (19.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) ION-BEAM DEPOSITION PROCESS FOR MANUFACTURING ATTENU- ATED PHASE SHIFT PHOTOMASK BLANKS PROCESSUS DE DEPOT PAR FAIS- CEAU D’ION DESTINE A LA FABRI- CATION DE PLAQUES POUR PHOTO- MASQUES A DECALAGE DE PHASE ATTENUE (71) E.I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street, Wilmington, DE 19898 (US). (for all designated States except / pour tous les États désignés sauf US) (71, 72) CARCIA, Peter, Francis [US/US]; 3413 Sweetbriar Road, Wilmington, DE 19810 (US). (74) SIEGELL, Barbara, C.; E.I. Du Pont De Nemours and Company, Legal Patent Records Center, 4417 Lancaster Pike, Wilmington, DE 19805 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Declarations / Déclarations : (r) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (s) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (t) for all designations / pour toutes les désignations (51) 7 G03F 1/00 (11) WO 02/086621 (13) A2 (21) PCT/US02/12543 (22) 19 Apr/avr 2002 (19.04.2002) (25) en (26) en (30) 60/284,779 19 Apr/avr 2001 US (19.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) ION-BEAM DEPOSITION PROCESS FOR MANUFACTURING MULTILAY- ERED ATTENUATED PHASE SHIFT PHOTOMASK BLANKS PROCEDE DE DEPOT PAR FAISCEAU D’IONS POUR LA PRODUCTION D’EBAUCHES DE MASQUES DE PHO- TOGRAVURE MULTICOUCHES ATTE- NUES A DEPHASAGE (71) E.I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street, Wilmington, DE 19898 (US). (for all designated States except / pour tous les États désignés sauf US) (72, 75) CARCIA, Peter, Francis [US/US]; 3413 Sweetbriar Road, Wilmington, DE 19810 (US). DIEU, Laurent [FR/US]; 7011 West Parmer Lane #1026, Austin, TX 78729 (US). (74) SIEGELL, Barbara, C.; E.I. Du Pont de Nemours and Company, Legal Patent Records Center, 4417 Lancaster Pike, Wilmington, DE 19805 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RUTJTM);EP(ATBECHCYDEDKES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Declarations / Déclarations : (r) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX

44/2002 31 Oct/oct 2002 PCT Gazette - Section I - Gazette du PCT 21885 MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (s) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (t) for all designations / pour toutes les désignations (51) 7 G03F 1/08, C03C 17/34 (11) WO 02/086622 (13) A2 (21) PCT/US02/12542 (22) 19 Apr/avr 2002 (19.04.2002) (25) en (26) en (30) 60/284,831 19 Apr/avr 2001 (19.04.2001) US (43) 31 Oct/oct 2002 (31.10.2002) (54) ION-BEAM DEPOSITION PROCESS FOR MANUFACTURING BINARY PHOTOMASK BLANKS PROCEDE DE DEPOSITION PAR FAIS- CEAUX IONIQUES EN VUE DE LA FA- BRICATION DE PLAQUES SUPPORTS PHOTOMASQUES BINAIRES (71) E.I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street, Wilmington, DE 19898 (US). (for all designated States except / pour tous les États désignés sauf US) (71, 72) CARCIA, Peter, Francis [US/US]; 3413 Sweetbriar Road, Wilmington, DE 19810 (US). DIEU, Laurent [FR/US]; 7011 West Parmer Lane, #1026, Austin, TX 78729 (US). (74) SIEGELL, Barbara, C.; E.I. Du Pont De Nemours And Company, Legal Patent Records Center, 4417 Lancaster Pike, Wilmington, DE 19805 (US). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Declarations / Déclarations : (r) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (s) for the following designations / pour les désignations suivantes : AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG UZ VN YU ZA ZMZWAP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW) EA (AM AZ BY KG KZ MD RU TJ TM) EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR) OA (BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG) (t) for all designations / pour toutes les désignations (51) 7 G03F 7/00, 7/075 (11) WO 02/086623 (13) A1 (21) PCT/GB02/01816 (22) 19 Apr/avr 2002 (19.04.2002) (25) en (26) en (30) 0109809.4 20 Apr/avr 2001 (20.04.2001) GB (43) 31 Oct/oct 2002 (31.10.2002) (54) OPTICAL RECORDING MATERIALS MATERIAUX D’ENREGISTREMENT OPTIQUE (71) DURAND TECHNOLOGY LIMITED [GB/GB]; Winchester House, 19 Bedford Row, London WC1R 4EB (GB). (for all designated States except / pour tous les États désignés sauf US) (72, 75) CLABBURN, Robin, James, Thomas [GB/GB]; Buckthorn House, Sevenhampton, Wiltshire SN6 7QA (GB). IQBAL, Rifat [GB/GB]; 37 Gloucester Road, Kidsgrove, Stoke of Trent, Staffordshire ST7 1EH (GB). (74) HOW DEN, Christopher, Andrew; Forrester Ketley & Co., Forrester House, 52 Bounds Green Road, London N11 2EY (GB). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RU TJ TM); EP (AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG). Published / Publiée : (c) (51) 7 G03F 7/11, H01L 21/027, C09D 201/02, 5/00, 179/04, H01L 21/302 (11) WO 02/086624 (21) PCT/JP02/03576 (13) A1 (22) 10 Apr/avr 2002 (10.04.2002) (25) ja (26) ja (30) 2001-111230 10 Apr/avr 2001 (10.04.2001) JP (43) 31 Oct/oct 2002 (31.10.2002) (54) COMPOSITION FOR FORMING AN- TIREFLECTION FILM FOR LITHOG- RAPHY COMPOSITION SERVANT A FORMER UN FILM ANTIREFLET POUR PRO- CEDE LITHOGRAPHIQUE (71) NISSAN CHEMICAL INDUSTRIES, LTD. [JP/JP]; 7-1, Kandanishiki-cho 3-chome, (JP). Chiyoda-ku, Tokyo 101-0054 (for all designated States except / pour tous les États désignés sauf US) (72, 75) KISHIOKA, Takahiro [JP/JP]; c/o Nissan Chemical Industries, Ltd. Toyama Research and Development Center, 635, Sasakura, Fuchu-machi, Nei-gun, Toyama 939-2753 (JP). ARASE, Shinya [JP/JP]; c/o Nissan Chemical Industries, Ltd. Electronic Materials Research Laboratories, 722-1, Tsuboi-cho, Funabashi-shi, Chiba 274-8507 (JP). MIZUSAWA, Ken-ichi [JP/JP]; c/o Nissan Chemical Industries, Ltd. Toyama Research and Development Center, 635, Sasakura, Fuchu-machi, Nei-gun, Toyama 939-2753 (JP). (74) HANABUSA, Tsuneo et al. / etc.; c/o Hanabusa Patent Office, 5th Floor, Shin-Ochanomizu Urban Trinity Bldg., 2, Kandasurugadai 3-chome, Chiyoda-ku, Tokyo 101-0062 (JP). (81) CN JP KR US. (84)EP(ATBECHCYDEDKESFIFRGBGR IE IT LU MC NL PT SE TR). (51) 7 G03F 7/40, B29C 71/02 (11) WO 02/086625 (13) A1 (21) PCT/AU02/00497 (22) 19 Apr/avr 2002 (19.04.2002) (25) en (26) en (30) PR4516 20 Apr/avr 2001 AU (20.04.2001) (43) 31 Oct/oct 2002 (31.10.2002) (54) METHOD AND APPARATUS FOR THE HARDENING OF PHOTOPOLYMER PLATES PROCEDE ET APPAREIL POUR LE DURCISSEMENT DE PLAQUES PHO- TOPOLYMERES (71) FAWCETT, Alan, John [AU/AU]; Lot 137, Cairns Road, Glenorie, NSW 2157 (AU). (for all designated States except / pour tous les États désignés sauf US) (72, 75) WRIGHT, Glen, Lawrence [AU/AU]; 3 Calabash Road, Arcadia, NSW 2159 (AU). (74) SPRUSON & FERGUSON; G.P. Box 3898, Sydney, NSW 2001 (AU). (81) AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW. (84)AP(GHGMKELSMWMZSDSLSZTZ UG ZM ZW); EA (AM AZ BY KG KZ MD RUTJTM);EP(ATBECHCYDEDKES FI FR GB GR IE IT LU MC NL PT SE TR); OA(BFBJCFCGCICMGAGNGQGW ML MR NE SN TD TG).

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