estudio y caracterización de un plasma de microondas a presión ...
estudio y caracterización de un plasma de microondas a presión ...
estudio y caracterización de un plasma de microondas a presión ...
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2.3. Results<br />
2.3.1. Destruction of trichloroethylene<br />
Capítulo 2<br />
The trichloroethylene <strong>de</strong>struction process was studied in a helium <strong>plasma</strong> <strong>un</strong><strong>de</strong>r<br />
variable conditions as regards applied microwave power, gas flow-rate, inner diameter of<br />
the coupler tip and C2HCl3 concentration.<br />
2.3.1.1. Influence of the applied microwave power<br />
The principal mechanism for the <strong>de</strong>composition of residual molecules in non-<br />
equilibrium <strong>plasma</strong>s is via electron collisions. The efficiency of which increases when<br />
the amo<strong>un</strong>t of energy released to free electrons in the <strong>plasma</strong> increases. As a result, the<br />
electronic <strong>de</strong>nsity and temperature of the <strong>plasma</strong> have a direct impact on the efficiency<br />
with which contaminants can be <strong>de</strong>stroyed since the microwave energy supplied to the<br />
torch via the wavegui<strong>de</strong> is used to reach optimum efficiency [19, 20]; therefore,<br />
increasing the applied power increases the electron <strong>de</strong>nsity and temperature of the<br />
<strong>plasma</strong>, and the efficiency with which the compo<strong>un</strong>ds introduced in the main gas flow<br />
are <strong>de</strong>stroyed.<br />
C 2 HCl 3 concentration (ppb)<br />
60<br />
55<br />
50<br />
45<br />
40<br />
35<br />
30<br />
25<br />
20<br />
15<br />
10<br />
5<br />
0<br />
Total flow rate: 1.0 L/min<br />
C 2 HCl 3 : 1000 ppm<br />
Helium<br />
300 400 500 600 700 800 900 1000 1100 1200 1300 1400 1500<br />
Microwave Power (W)<br />
Figure 2.2: Variation of the C 2HCl 3 concentration in the helium <strong>plasma</strong> as a f<strong>un</strong>ction of the<br />
applied microwave power.<br />
53