Onderzoeksprojecten (1000 - 1500 van 8189)
Onderzoeksprojecten (1000 - 1500 van 8189)
Onderzoeksprojecten (1000 - 1500 van 8189)
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Membranen voor waterfiltratie<br />
K.U.Leuven<br />
Abstract: Geen Nederlandstalig Abstract<br />
Organisaties:<br />
• Centr. vr Oppervlaktechemie & Katalyse<br />
Onderzoekers:<br />
• Ivo Vankelecom<br />
• Stefaan Reyniers<br />
Insight in selective oxidation chemistry<br />
K.U.Leuven<br />
Abstract: Geen Nederlandstalig Abstract<br />
Organisaties:<br />
• Centr. vr Oppervlaktechemie & Katalyse<br />
Onderzoekers:<br />
• Bert Sels<br />
• Julie Vancauwenbergh<br />
Immobilized metathesis catalysis<br />
K.U.Leuven<br />
Abstract: Geen Nederlandstalig Abstract<br />
Organisaties:<br />
• Centr. vr Oppervlaktechemie & Katalyse<br />
Onderzoekers:<br />
• Bert Sels<br />
• Annelies Dewaele<br />
Magnetic and electric properties of multiferroic thin-film manganites<br />
K.U.Leuven<br />
Abstract: The PhD project aims at investigating the coupling between electric and magnetic order parameters in multiferroic complex oxide thin<br />
films. These materials exhibit simultaneously ferroelectric and magnetic ordering. The two ferroic order parameters are strongly entangled by a<br />
magneto-electric coupling, allowing the reversal of the ferroelectric polarization by applying a magnetic field or the control of the magnetic order<br />
parameter by an electric field. This unique property makes multiferroic materials very good candidates for designing tunable multifunctional<br />
spintronic devices. The coexistence of ferroelectricity and magnetic order wasfound in rare earth manganites RMnO3.<br />
The PhD research project can be divided into three parts.<br />
The first part involves development and realization of the preparation of the thin film manganite (YMnO3, YbMnO3, SmMnO3, HoMnO3, TbMnO3<br />
and GdMnO3) samples.<br />
The second part involves detailed structural, magnetic and electric characterization of the th<br />
Organisaties:<br />
• Afdeling Vaste-stoffysica en Magnetisme<br />
Onderzoekers:<br />
• Christian Van Haesendonck<br />
Lattice site location of impurities in semiconductors<br />
K.U.Leuven<br />
Abstract: This Ph.D. will focus on precise lattice site location of impurities insemiconductors using emission channelling experiments on ISOLDE-<br />
CERN...<br />
Organisaties:<br />
• Afdeling Kern- en Stralingsfysica<br />
Onderzoekers:<br />
• Kristiaan Temst<br />
Visualization and localisation of defects by nonlinear elastic wave spectroscopy techniques<br />
K.U.Leuven<br />
Abstract: The doctoral research will aim at developing experimental and numericaltechniques for nonlinear ultrasonic non-destructive testing and<br />
evaluation (NDT&E). As part of the research and dissertation, several nonlinearelastic wave spectroscopy (NEWS) techniques will be developed<br />
and further refined. NEWS focuses on methodologies to increase the detection sensitivity of material microdamage through an amplitude dependent<br />
analysis of key material parameters. The information acquired using the NEWS methods will be further exploited to visualize zones of deterioration.<br />
Innovative implementations of experimental NEWS based techniques will be considered to enhance the reliability and accuracy of microdamage<br />
detection by implementing selective-focusing techniques based on time-reversal andtomographic approaches and to improve the detection of<br />
multiple damagedregions by signal processing techniques.<br />
The wave equation in a nonlinear #or damaged- elastic medium, will be studied both from a nu<br />
Organisaties:<br />
• Natuurkunde @ Kulak<br />
Onderzoekers:<br />
• Koen Van Den Abeele<br />
• Jan Hettler<br />
Investigating the effect of W on the solid phase reaction of nickel silicides<br />
K.U.Leuven<br />
Abstract: Silicides, i.e. compounds between a metal and silicon, formed through the reaction of a metal film with a Si substrate, are often used as<br />
electrical contact layers in semiconductor devices. As device dimensions are drastically decreasing, the requirements for these silicide thin films