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Onderzoeksprojecten (1000 - 1500 van 8189)

Onderzoeksprojecten (1000 - 1500 van 8189)

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Membranen voor waterfiltratie<br />

K.U.Leuven<br />

Abstract: Geen Nederlandstalig Abstract<br />

Organisaties:<br />

• Centr. vr Oppervlaktechemie & Katalyse<br />

Onderzoekers:<br />

• Ivo Vankelecom<br />

• Stefaan Reyniers<br />

Insight in selective oxidation chemistry<br />

K.U.Leuven<br />

Abstract: Geen Nederlandstalig Abstract<br />

Organisaties:<br />

• Centr. vr Oppervlaktechemie & Katalyse<br />

Onderzoekers:<br />

• Bert Sels<br />

• Julie Vancauwenbergh<br />

Immobilized metathesis catalysis<br />

K.U.Leuven<br />

Abstract: Geen Nederlandstalig Abstract<br />

Organisaties:<br />

• Centr. vr Oppervlaktechemie & Katalyse<br />

Onderzoekers:<br />

• Bert Sels<br />

• Annelies Dewaele<br />

Magnetic and electric properties of multiferroic thin-film manganites<br />

K.U.Leuven<br />

Abstract: The PhD project aims at investigating the coupling between electric and magnetic order parameters in multiferroic complex oxide thin<br />

films. These materials exhibit simultaneously ferroelectric and magnetic ordering. The two ferroic order parameters are strongly entangled by a<br />

magneto-electric coupling, allowing the reversal of the ferroelectric polarization by applying a magnetic field or the control of the magnetic order<br />

parameter by an electric field. This unique property makes multiferroic materials very good candidates for designing tunable multifunctional<br />

spintronic devices. The coexistence of ferroelectricity and magnetic order wasfound in rare earth manganites RMnO3.<br />

The PhD research project can be divided into three parts.<br />

The first part involves development and realization of the preparation of the thin film manganite (YMnO3, YbMnO3, SmMnO3, HoMnO3, TbMnO3<br />

and GdMnO3) samples.<br />

The second part involves detailed structural, magnetic and electric characterization of the th<br />

Organisaties:<br />

• Afdeling Vaste-stoffysica en Magnetisme<br />

Onderzoekers:<br />

• Christian Van Haesendonck<br />

Lattice site location of impurities in semiconductors<br />

K.U.Leuven<br />

Abstract: This Ph.D. will focus on precise lattice site location of impurities insemiconductors using emission channelling experiments on ISOLDE-<br />

CERN...<br />

Organisaties:<br />

• Afdeling Kern- en Stralingsfysica<br />

Onderzoekers:<br />

• Kristiaan Temst<br />

Visualization and localisation of defects by nonlinear elastic wave spectroscopy techniques<br />

K.U.Leuven<br />

Abstract: The doctoral research will aim at developing experimental and numericaltechniques for nonlinear ultrasonic non-destructive testing and<br />

evaluation (NDT&E). As part of the research and dissertation, several nonlinearelastic wave spectroscopy (NEWS) techniques will be developed<br />

and further refined. NEWS focuses on methodologies to increase the detection sensitivity of material microdamage through an amplitude dependent<br />

analysis of key material parameters. The information acquired using the NEWS methods will be further exploited to visualize zones of deterioration.<br />

Innovative implementations of experimental NEWS based techniques will be considered to enhance the reliability and accuracy of microdamage<br />

detection by implementing selective-focusing techniques based on time-reversal andtomographic approaches and to improve the detection of<br />

multiple damagedregions by signal processing techniques.<br />

The wave equation in a nonlinear #or damaged- elastic medium, will be studied both from a nu<br />

Organisaties:<br />

• Natuurkunde @ Kulak<br />

Onderzoekers:<br />

• Koen Van Den Abeele<br />

• Jan Hettler<br />

Investigating the effect of W on the solid phase reaction of nickel silicides<br />

K.U.Leuven<br />

Abstract: Silicides, i.e. compounds between a metal and silicon, formed through the reaction of a metal film with a Si substrate, are often used as<br />

electrical contact layers in semiconductor devices. As device dimensions are drastically decreasing, the requirements for these silicide thin films

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