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Photosensitive polymers with cinnamate units in the side position of ...

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2390 R. Mahy et al. / European Polymer Journal 42 (2006) 2389–2397<br />

O<br />

HO C<br />

H<br />

H 3C<br />

H 2C<br />

CN<br />

CO 2Et<br />

photosensitive <strong>polymers</strong> are regarded as negativetype<br />

photoresists [6,7].<br />

The substitution <strong>of</strong> <strong>the</strong> double bond <strong>of</strong> <strong>c<strong>in</strong>namate</strong><br />

group can affect its photosensitivity. It was<br />

reported that <strong>the</strong> <strong>with</strong>draw<strong>in</strong>g groups such as cyano<br />

group at <strong>the</strong> a-<strong>position</strong> <strong>of</strong> carbonyl function<br />

enhances <strong>the</strong> photoreactivity <strong>of</strong> <strong>c<strong>in</strong>namate</strong> unit [8].<br />

Brosse et al. [9] and Remmas et al. [10,11] have<br />

prepared and tested for photosensitivity different<br />

polystyrenic <strong>polymers</strong> <strong>with</strong> pendant <strong>c<strong>in</strong>namate</strong><br />

groups substituted on a-<strong>position</strong> by carboxylate<br />

and cyano groups.<br />

This article deals <strong>with</strong> <strong>the</strong> syn<strong>the</strong>sis <strong>of</strong> new monomer<br />

[Ethyl a-cyano-4-(methacryloxy)<strong>c<strong>in</strong>namate</strong>],<br />

its polymerization and copolymerization <strong>with</strong><br />

C<br />

O<br />

CH 2<br />

+<br />

O<br />

piperid<strong>in</strong>e<br />

(pyrid<strong>in</strong>e)<br />

CN<br />

CH C<br />

CO2Et methyl methacrylate (Schemes 1 and 2). Monomer<br />

reactivity ratios and <strong>the</strong> ability to crossl<strong>in</strong>k <strong>of</strong> <strong>the</strong><br />

obta<strong>in</strong>ed <strong>polymers</strong> under UV irradiation were also<br />

<strong>in</strong>vestigated.<br />

2. Experimental<br />

2.1. Materials<br />

CN<br />

HO CH C<br />

CO2Et 1 2 3 (80 %)<br />

4 (75 %)<br />

1) Et 3 N / CH 2 Cl 2<br />

2) H 2 C=C(CH 3 )-COCl<br />

Scheme 1. Syn<strong>the</strong>sis <strong>of</strong> ethyl a-cyano-4-hydroxy<strong>c<strong>in</strong>namate</strong> 3 and ethyl a-cyano-4-(methacryloxy)<strong>c<strong>in</strong>namate</strong> 4.<br />

H 2C<br />

C<br />

EtO 2 C<br />

CH 3<br />

4<br />

C<br />

O<br />

CH<br />

C<br />

O<br />

CN<br />

+<br />

MMA<br />

AIBN/ CHCl 3<br />

65ºC<br />

CH 2<br />

EtO 2 C<br />

C<br />

C<br />

O<br />

HC<br />

CH 3<br />

C<br />

CN<br />

p<br />

CH 2<br />

5 :Homopolymer (q=0)<br />

6 : Copolymer<br />

Scheme 2. Syn<strong>the</strong>sis <strong>of</strong> photosensitive homo- and co-<strong>polymers</strong> com<strong>in</strong>g from 4.<br />

O<br />

C<br />

q<br />

CO2CH3 Solvents were distilled before use accord<strong>in</strong>g to<br />

<strong>the</strong> procedures described <strong>in</strong> Perr<strong>in</strong> book [12] p-<br />

Hydrobenzaldehyde and AIBN were recrystallized<br />

<strong>in</strong> methanol. Methyl methacrylate was purified as<br />

follows: after wash<strong>in</strong>g twice <strong>with</strong> an aqueous solution<br />

<strong>of</strong> NaHCO3 (5%), and <strong>the</strong>n twice <strong>with</strong> water,<br />

CH 3

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