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Electron beam: GEMINI-Process (Delphax)<br />
Carrier<br />
RF line<br />
Insulator<br />
Finger electrode<br />
Distance foil<br />
Screen-Electrode<br />
- 675V<br />
- 650V<br />
PC-layer<br />
0 V<br />
„Finger on“<br />
„Finger off“<br />
• Electrography (former Ionography),<br />
developed by Delphax<br />
• Generation of charges (electrons) by RF<br />
stimulation (Microplasma)<br />
• Resolution currently limited to 600 dpi<br />
• Minimum thermal stress because of<br />
Flash fusing<br />
52<br />
© Hübler 2000<br />
Institute for Print and Media Technology of Chemnitz Technical University, Germany
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