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TEM, Altered layer on etch (2)<br />
Long etching time and no desmutting<br />
BULK<br />
Atom %<br />
C O Mg Al Si<br />
75 12 0 0 13<br />
A2<br />
A1<br />
Aluminium<br />
Gunnar Pettersson, Sintef<br />
Adhesive<br />
XD4600<br />
5 µm<br />
92 6 0 1 1<br />
42 15 17 18 8<br />
Altered layer<br />
1. Adhesive and oxides<br />
mixed as a micro<br />
composite<br />
2. Polymer rich layer,<br />
with less thixotropy<br />
agent<br />
Cohesive fatigue failure<br />
Date: 2004-01-13 • Page: 35 • Hydro Aluminium
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