量子電腦 - 中研院物理研究所

光 學 平 版 印 刷 術
複 雜 圖 案
Complicated
pattern
繞 射
Optical Lithography
Reduced-sized pattern
縮 小 圖 案
• The resolution of the reduced
image cannot be better than λ/2
due to the diffraction effect..
• No effective lenses working at very
short wavelength in x-ray region
• Using N-photon entangled state
to achieve a spatial resolution
equivalent of using a light with
wavelength λ/N.
2
sin β
Diffraction ∝ ,
2
β
β = ( πa
/ λ)sin θ.
Diffraction limit:
minimum width at
β= π.