CLEO/QELS 2008
CLEO/QELS 2008
CLEO/QELS 2008
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Tuesday, May 6, <strong>2008</strong><br />
Wednesday, May 7, <strong>2008</strong><br />
Thursday, May 8, <strong>2008</strong><br />
Friday, May 9, <strong>2008</strong><br />
Postdeadline Paper Abstracts<br />
Agenda of Sessions and Key to Authors and Presiders<br />
Agenda of Sessions<br />
Key to Authors and Presiders<br />
Postdeadline Paper Key to Authors and Presiders<br />
<strong>2008</strong> <strong>CLEO</strong>/<strong>QELS</strong> Committees<br />
<strong>CLEO</strong> Technical Program Committee<br />
<strong>2008</strong> <strong>CLEO</strong> General Co-Chairs<br />
Markus Pollnau, Univ. of Twente, Netherlands<br />
John Zayhowski, MIT Lincoln Lab, USA<br />
<strong>2008</strong> <strong>CLEO</strong> Program Co-Chairs Claire<br />
Gmachl, Princeton Univ., USA Konstantin<br />
Vodopyanov, Stanford Univ., USA<br />
<strong>CLEO</strong> 1: Laser Processing and Optical Instrumentation<br />
Donald Harter, IMRA America Inc., USA, Chair<br />
Eric Mazur, Harvard Engineering & Applied Science, USA<br />
Marc Nantel, Photonics Res. Ontario, Canada<br />
Andreas Ostendorf, Laser Zentrum Hannover, Germany<br />
Martin Richardson, Univ. of Central Florida, USA<br />
Chris Schaffer, Cornell Univ., USA<br />
Koji Sugioka, RIKEN, Japan<br />
Yunlong Sun, Electro-Scientific Industries, USA<br />
Andreas Tünnermann, Friedrich Schiller Univ., Germany