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ATTIVITA' SCIENTIFICA DEL PROF - Dipartimento di Fisica

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'On the influence of the deposition con<strong>di</strong>tions on the carrier lifetime in hydrogenated and<br />

chlorinated silicon films.'<br />

Journ. Non-Cryst. Solids, 77-78, 675 (1985)<br />

H.Kiess, V.Augelli, R.Murri<br />

'Carrier lifetime from transient photoconductivity measurements on microcrystalline silicon<br />

films.'<br />

Thin Solid Films, 141, 193 (1986)<br />

V.Augelli, G.Dilecce, R.Murri, L.Schiavulli<br />

'Field effects measurements in hydrogenated and chlorinated amorphous silicon films.'<br />

Journ. Non-Cryst. Solids, 77-78, 303 (1985)<br />

V.Augelli, M.Leo, R.A.Leo, G.Soliani<br />

'Analytical determination of the density of state <strong>di</strong>stribution in amorphous semiconductors.'<br />

Phys. Rev. B, 33, 7392 (1986)<br />

V.Augelli, R.Murri, L.Schiavulli<br />

'The density of states in the mobility gap of amorphous silicon films computed by a new<br />

analytical method.'<br />

Il Nuovo Cimento, 10D, 237 (1988)<br />

V.Augelli, T.Ligonzo, R.Murri, L.Schiavulli<br />

'Photoconductivity in doped microcrystalline Si:H,Cl films.'<br />

Journ. Appl. Phys., 59, 2863 (1986)<br />

V.Augelli, V.Berar<strong>di</strong>, R.Murri, L.Schiavulli<br />

'Evaluation of density of states <strong>di</strong>stribution in amorphous silicon films by photoconductivity<br />

measurements.'<br />

Journ. Non-Cryst. Solids, 90, 123 (1987)<br />

V.Augelli, V.Berar<strong>di</strong>, R.Murri, L.Schiavulli, M.Leo, R.A.Leo, G.Soliani<br />

'Analytical determination of the density of gap states <strong>di</strong>stribution in amorphous<br />

semiconductors: experimental results.'<br />

Phys. Rev. B, 35, 614 (1987)<br />

V.Augelli, V.Berar<strong>di</strong>, R.Murri, L.Schiavulli<br />

'Photoconductivity measurements as a tool for the evaluation of the density of states in<br />

amorphous silicon.'<br />

Physica Scripta, 38, 188 (1988)<br />

V.Augelli, R.Murri and L.Schiavulli<br />

'The density of states in the mobility gap of halogenated amorphous silicon'<br />

Il Nuovo Cimento, 11D, 827 (1989).<br />

T.Ligonzo, R.Murri, V.Augelli, L.Schiavulli<br />

'Density of states in a-Si:H,Cl determined by Space-Charge-Limited Currents.'<br />

Thin Solid Films, 158, 217 (1988)<br />

V.Augelli, T.Ligonzo, R.Murri, L.Schiavulli<br />

'Photovoltaic characterization of a-Si:H,Cl films.'<br />

Thin Solid Films, 170, 163 (1989)<br />

V.Augelli, R.Murri, M.Nowak<br />

'Interference photoconductivity and photoelectromagnetic effect in amorphous silicon.'<br />

Phys. Rev. B, 39, 8336 (1989)<br />

V. Augelli and M. Nowak,<br />

'Distribution of ra<strong>di</strong>ation intensity in a thin semiconductor film on a thick substrate.'

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