2 Si 4 O 10 (OH) 2
2 Si 4 O 10 (OH) 2
2 Si 4 O 10 (OH) 2
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Srovnání<br />
bodů<br />
Ceramic Compound<br />
tání<br />
a % iontovosti vazeb keramických materiálů<br />
Melting Point °<br />
(Bod tání<br />
o C)<br />
% Covalent character<br />
% kovalentního char.<br />
% Ionic character<br />
% iontového char.<br />
Magnesium Oxide 2798° 27% 73%<br />
Aluminum Oxide 2050° 37% 63%<br />
<strong>Si</strong>licon Dioxide 1715° 49% 51%<br />
<strong>Si</strong>licon Nitride 1900° 70% 30%<br />
<strong>Si</strong>licon Carbide 2500° 89% 11%
![Zdroj : [2] - ateam.zcu.cz](https://img.yumpu.com/36610235/1/190x143/zdroj-2-ateamzcucz.jpg?quality=85)
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