INDUSTRIAL MICROSCOPES

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PHOTOMICROGRAPHY SYSTEM PM30/PM20/PM10SP AUTOMATIC PHOTOMICROGRAPHIC SYSTEM PM30: Fully automatic fluorescence photomicrography — only by Olympus. PM20: Sophisticated features, superior photomicrography — with room to spare. PM10SP: Semi-automatic photomicrographic with an economical and compact system. PM20 PM series Specifications PM30 Item PM30 PM20 PM10SP Photometric mode Super FL Auto mode FL Auto mode ✓ ✓ — ✓ — — Auto mode ✓ ✓ ✓ Manual mode ✓ ✓ ✓ Time mode ✓ ✓ ✓ Light distribution Measuring Exposure Viewer: 50%/Meter 50% Camera: 100% Viewer: 16%/Meter: 20%/Camera: 64% Meter: 20%/Camera: 80%* Viewer: 50%/Meter: 50% Camera 100% Color temperature measuring Viewer: 80%/Color temperature (option): 20% — Measuring elements 350,000 pixel 2-dimensional CCD High sensitivity SPD with auxiliary filter 1%/30% divisional concentric SPD (effective pixel 330,000) (silicon photo diode) (self-developed) Measuring area Spot Average 0.1%, 1% 30% 1% Automatic exposure adjustment range 1/125s.—64 minutes 1/125s.—21.2 minutes (35mm camera, ISO100) (reciprocity failure adjustment: Nil [0]) (reciprocity failure adjustment: standard [4] ISO setting range 3—25600(at exposure compensation 1.00), 1/3 increment, Automatic ISO setting via DX code (manual setting also possible) Exposure adjustment range 0.25—4.00(±2EV) Exposure time reciprocity failure adjustment 8steps [0—7] 3 steps [2,4,6] Manual exposure time setting 1/100s— 40minutes (52 steps), time mode setting Exposure condition memory, call ✓ ✓ — Bright frame viewer ✘ ✘ — Storage of photo settings 4+100 (with the use of memory card) 4 11 (previous, power off) Memory card ✘ — — Data print ✘ (control included) ✘ (data print control box power supply included) ✘ RS-232C ✓ — — Print out ✘ — — Display Graphical LCD LCD LED display for exposure warning and (with adjustable back light function) (with adjustable back light function) working condition Switch, jog dial input switch input Acceptable camera 35mm (automatic winding), large-format camera (4"X5")/Polaroid (3 1/4"X4 1/4") Others AE-LOCK, multi exposure, reset function for frame count numbers (large-format camera), with terminal for release from outside Power consumption 150VA 50VA 15VA(AC adapter) ✓: standard ✘: optional *Selectable with manual operational lever 25 PM10SP
OBJECTIVES/EYEPIECES UIS OBJECTIVES UNIVERSAL INFINITY SYSTEM UIS Optical characteristics of objectives for industrial and metallurgical applications. UMPLFL (-BD) Plan Semi-Apochromat Series The universal Plan Semi-Apochromat objectives completely eliminate coma aberration, which is perfect for a wide range of microscopic methods including brightfield (darkfield), fluorescence, Nomarski DIC and simple polarized light observations. UMPLFL-BDP Plan Semi-Apochromat POL Series The Plan Fluorite Semi-Apochromat POL design ensures thorough compensation for coma aberration. Distortion is also minimized, which makes these objectives the best choice for Nomarski DIC and real polarized light microscopy. LMPLAPO (-BD) Plan Apochromat Series Exhibiting outstanding resolving power at super high magnifications. Ideal for observation of high-density IC wafers and other samples with minute details at long working distance. LMPLFL (-BD) Plan Semi-Apochromat Series These Plan Semi-Apochromat objectives feature a long working distance which makes it easy to change samples without touching the coarse focus. MPL (-BD) Plan Achromat Series Designed for brightfield (or brightfield/darkfield) observation, these Plan Achromat objectives ensure superb field flatness up to F.N. 22. SLMPLAPO no-cover Plan Apochromat Series Designed for brightfield observation. Offers an ultra long working distance that is much in demand, especially in the magnetic head market. LCPLAPO Plan Apochromat Series For LCD inspection. Changing the correction collar makes it possible to accommodate LCD glass substrates with thicknesses of 1.1mm, 0.7mm, and 0mm. 26 Lens Optical Magnifi- N.A. W.D. Cover glass Resolution* 2 character cation (mm) thickness (mm) (µm) 5X 0.15 20.0 — 2.24 10X 0.30 10.1 — 1.12 UMPLFL 20X 40X 0.46 0.75 3.1 0.63 0 0 0.73 0.45 50X 0.80 0.66 0 0.42 100X 0.95 0.31 0 0.35 5X2 0.15 12.0 — 2.24 10X2 0.30 6.5 — 1.12 UMPLFL-BD 20X2 0.46 3.0 0 0.73 50X 0.80 0.66 0 0.42 100X 0.90 0.31 0 0.37 5X 0.15 12.0 — 2.24 10X 0.25 6.5 — 1.34 UMPLFL-BDP 20X 0.40 3.0 0 0.84 50X 0.75 0.66 0 0.45 100X 0.90 0.31 0 0.37 LMPLAPO 150X 0.9 1.0 0 0.37 250X 0.9 0.80 0 0.37 LMPLAPO-BD 150X2 250X 0.9 0.9 1.0 0.80 0 0 0.37 0.37 5X 0.13 22.5 — 2.58 10X 0.25 21.0 — 1.34 LMPLFL 20X 0.40 12.0 0 0.84 50X 0.50 10.6 0 0.67 100X 0.80 3.4 0 0.42 5X 0.13 15.0 — 2.58 10X 0.25 10.0 — 1.34 LMPLFL-BD 20X 0.40 12.0 0 0.84 50X 0.50 10.6 0 0.67 100X 0.80 3.3 0 0.42 1.25X* 4 0.04 3.6 0 8.39 MPLAPO 2.5X* 4 0.08 10.70 0 4.19 20X 0.60 0.90 0 0.56 50X 0.95 0.30 0 0.35 100X 0.95 0.35 0 0.35 100XOil 1.40 0.1 0 0.24 MPLAPO-BD 100X 0.9 0.31 0 0.37 MPLFL-BD 50X2 100X2 0.8 0.9 1.0 1.0 — — 0.42 0.37 5X 0.10 19.6 — 3.36 MPL* 10X 0.25 10.6 — 1.34 3 20X 0.40 1.3 0 0.84 50X 0.75 0.38 0 0.45 100X 0.90 0.21 0 0.37 5X 0.10 12.0 — 3.36 MPL-BD* 10X 0.25 7.0 — 1.34 1* 3 20X 0.40 1.3 0 0.84 50X 0.75 0.38 0 0.45 100X 0.90 0.21 0 0.37 SLMPL 20X 0.35 21.0 0 0.58 50X 0.45 15.0 0 0.75 UNIVERSAL INFINITY SYSTEM LCPLAPO 20X 50X 0.40 0.60 8.8 3.1 0.95/ 0/0.7/1.1 0/0.7/1.1 0.84 0.56 LCPLFL-LCD 100X 0.80 1.1/ 1.143 0.6-1.2 0.42 5XIR 0.10 20.0 — — 10XIR 0.25 18.5 — — LMPL-IR 20XIR 0.40 8.1 — — 50XIR 0.55 6.0 — — 100XIR 0.80 3.4 — — MPL-IR 100XIR 0.95 0.3 — — * 1 When MPL-BD objectives are used in combination with the U-ULH lamp housing (mercury/xenon socket) for darkfield observation, illumination near the perimeter of the field of view may be slightly insufficient depending on the specimen. * 2 Resolving power calculated with the aperture diaphragm fully opened. * 3 Up to F.N. 22. * 4 Polarizer and analyzer are recommended to use. *“BD” indicates brightfield/darkfield capability.
Page 1 and 2: LASER SCANNING MICROSCOPE SEMICONDU
Page 3 and 4: NEW NEW NEW LASER SCANNING MICROSCO
Page 5 and 6: MX80 Specifications SEMICONDUCTOR I
Page 7 and 8: High efficiency Minimizing wafer in
Page 9 and 10: WAFER LOADER The easy-to-use functi
Page 11 and 12: METALLURGICAL MICROSCOPES BX51/BX51
Page 13 and 14: METALLURGICAL MICROSCOPES BXFM-S SY
Page 15 and 16: GX71 Specifications METALLURGICAL M
Page 17 and 18: METALLURGICAL MICROSCOPES BX-P POLA
Page 19 and 20: SZX7 Specifications STEREO MICROSCO
Page 21 and 22: STEREO MICROSCOPES Compact, lightwe
Page 23 and 24: MEASURING MICROSCOPES STM6-LM MEASU
Page 25: NEW IMAGE ANALYSIS SOFTWARE analySI
Page 29 and 30: 1. Field Number (F.N.) and Practica
Page 31 and 32: 7. Resolving Power The resolving po
Page 33: •OLYMPUS CORPORATION obtains the

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