INDUSTRIAL MICROSCOPES

LASER SCANNING MICROSCOPE 

SEMICONDUCTOR INSPECTION MICROSCOPES 

WAFER LOADER 

METALLURGICAL MICROSCOPES 

STEREO MICROSCOPES 

MEASURING MICROSCOPES 

DIGITAL CAMERAS 

IMAGE ANALYSIS SOFTWARE 

PHOTOMICROGRAPHY SYSTEMS 

INDUSTRIAL 

MICROSCOPES

Technology is quickly progressing in fields such as those related to semiconductors, FPDs and electronic 

equipment. As the demands of industry become more specialized and diversified, the capabilities of 

research and inspection equipment must keep pace. 

Olympus microscopes and their accessories are developed to meet the ever-changing needs of research 

and inspection applications. Our accomplishments in microscope development date back more than eighty 

years. Olympus has accumulated a broad range of advanced optical and precision technologies and we are 

renowned for our innovative, forward looking approach to microscopy. An outstanding example of 

Olympus ingenuity is the superior UIS infinity-corrected optical system. Olympus has also won acclaim for 

its system versatility and broad range of advanced accessories. Our microscopes are evolving with 

enhanced performance and operational ease. Olympus continues to answer the demands of industry and 

pave the way for future advances with increasingly sophisticated research and inspection equipment. 

MX61L 

MX61

NEW 

NEW 

NEW 


TM 

OLS300 -------------------------------------------------------------- 3 

OLS3000 CONFOCAL LASER SCANNING MICROSCOPE 

SEMICONDUCTOR INSPECTION MICROSCOPES 

MX80 ---------------------------------------------------------------- 4 

200/300mm AUTOMATED SEMICONDUCTOR INSPECTION MICROSCOPE 

MX61/MX61L ------------------------------------------------------ 5 

SEMICONDUCTOR INSPECTION MICROSCOPE 

300mm SEMICONDUCTOR/FPD INSPECTION MICROSCOPE 

MX40 ---------------------------------------------------------------- 7 

INDUSTRIAL INSPECTION MICROSCOPE 

WAFER LOADER 

AL110/MX61 ------------------------------------------------------- 8 

WAFER LOADER/SEMICONCUDTOR INSPECTION MICROSCOPE 


BX61 ----------------------------------------------------------------- 9 

SYSTEM MICROSCOPE 

BX51/BX51M ------------------------------------------------------- 10 

SYSTEM MICROSCOPES 

BX51/BX51M-IR --------------------------------------------------- 10 

SYSTEM IR MICROSCOPES 

BX41M -------------------------------------------------------------- 11 


BX41M-ESD -------------------------------------------------------- 11 


BXFM-S ------------------------------------------------------------- 12 

SYSTEM INDUSTRIAL MICROSCOPE 

BXFM ---------------------------------------------------------------- 12 


U-CFU --------------------------------------------------------------- 13 

DISK SCAN MICROSCOPE SYSTEM 

GX71 ----------------------------------------------------------------- 14 

TOP-OF-THE LINE INVERTED METALLURGICAL SYSTEM MICROSCOPE 

GX51 ----------------------------------------------------------------- 15 

INVERTED METALLURGICAL SYSTEM MICROSCOPE 

GX41 ----------------------------------------------------------------- 15 

COMPACT INVERTED METALLURGICAL MICROSCOPE 

BX-P ----------------------------------------------------------------- 16 

POLARIZING MICROSCOPES 

CX31-P -------------------------------------------------------------- 16 

POLARIZING MICROSCOPE 

UNIVERSAL 

INFINITY SYSTEM 

CONTENTS 

*Some products shown in this catalog may not be available in your area. 

Please consult your Olympus dealer. 

UIS infinity-corrected optical system 

The advanced Olympus UIS optical system maximizes the advantages of infinity correction. 

Light travels through the body tube as parallel rays as it passes through the objective. These are focused by the tube lens to 

form a completely aberration-free intermediate image. Attachments can be added between the objective and the built-in tube 

lens in the observation tube without any magnification factor alterations to total magnification. Additional correction lenses are 

not required. 

The UIS optical system delivers optimum image quality with any configuration. 

2 

NEW 


SZX12/SZX9 ------------------------------------------------------- 17 

RESEARCH STEREOMICROSCOPE SYSTEM 

SZX7 ---------------------------------------------------------------- 18 

STEREOMICROSCOPE 

SZ61/SZ51 --------------------------------------------------------- 19 


SD/SF series ------------------------------------------------------- 20 



STM6 ---------------------------------------------------------------- 21 

MEASURING MICROSCOPE 

STM6-LM ----------------------------------------------------------- 22 



DP70 ----------------------------------------------------------------- 23 

DIGITAL CAMERA 

DP12 ----------------------------------------------------------------- 23 

MICROSCOPE DIGITAL CAMERA 


analySIS ® FiVE series --------------------------------------------- 24 

ruler/imager/docu/auto/pro 

PHOTOMICROGRAPHY SYSTEMS 

PM30/PM20/PM10SP -------------------------------------------- 25 

AUTOMATIC PHOTOMICROGRAPHIC SYSTEM 

OBJECTIVES/EYEPIECES 

UIS OBJECTIVES ------------------------------------------------- 26 

UIS EYEPIECES --------------------------------------------------- 27 

OC-M ---------------------------------------------------------------- 27 

MICROMETER RETICLES (ø20.4mm) 

OPTICAL TERMINOLOGY ------------------------- 28

NEW 


OLS3000 CONFOCAL LASER SCANNING MICROSCOPE 

Ideally suited for the ultra-fine surface observation and measurements required for 

micro fabrication devices like MEMS (Micro Electro Mechanical System), for new materials 

development, and for today's thinner devices, with more compact surface mounting 

requirements. 

OLS3000 Specifications 

Laser scan Universal 

Observation method Laser Laser, brightfield, darkfield, DIC 

Objective 5X, 10X, 20X, 50X, 100X 

Optical zoom 1X-6X 

Total magnification 120X-14400X 

Field of view 2560X2560-21X21µm 

Microscope stand Illumination Laser 408nm LD laser 

Class 2 

Brightfield — 12V100W Halogen lamp 

Z revolving nosepiece Stroke 10mm 

Resolution 0.01µm 

Z stage Vertical movement 70mm 

Maximum height of specimen 100mm 

Stage Manual stage 100X100mm 

Motorized stage 150X100mm 

Frame memory Intensity 1024X1024X12bit 

Height 1024X1024X16bit 

AF Laser reflection type 

Dimensions 464(W) X 559(D) X 614.5(H)mm 

Weight 56.9kg 57.5kg 

3 

TM 

UNIVERSAL 

INFINITY SYSTEM

MX80 Specifications 


MX80 

200/300mm AUTOMATED SEMICONDUCTOR INSPECTION MICROSCOPE 

The MX 80's advanced automation enables it to fulfill various inspection requirements and 

connection to external automated systems. Employing Olympus' renowned UIS optics, 

the MX80 provides the highest image quality in the industry. 

Objective UIS objectives (Objective adapter combined for brightfield objective) 

Eyepiece UIS eyepieces (F.N. 26.5) 

Microscope stand Compatible stand for 200/300mm wafer inspection • An RS232C communication external interface, microscope stand power switch 

Motorized focusing unit 

• Vertical stroke 25 mm; Z-direction resolution: 50nm (with 50x or higher magnification objective ) 

• Focusing speed interlocked with objective; focusing adjustment for each objective; high limit; stage lowering (return) 

Reflected light Illumination Motorized selection of observation modes (4-cube turret selection for BF, DF, DIC, POL and FL) 

illumination (integrated) • AS 6-stage turret interlocked with objective /Automatic FS opening in DF (fixed size of FS), motorized analyzer mounting/dismounting (for DIC 

system combined with auto focus) • Light source: 12V100W halogen (The intensity adjustment can be preset by objective in use), 100W Hg, 75W Xe 

• Filter pocket (ø25 mm, Up to 3 filters can be accommodated. Manual switching)/ • Built-in DND ( manual switching ) 

AF Laser active method, wavelength λ=780 nm, CDRH Class 1 compatible 

(integrated) • Magnification 5x - 250x • Offset function • Applicable sample reflectance 3% - 100% ( Other value for 250x objective ) 

system • Repeatability ±0.2µm (= 150X objective ) • Focus tracking range 10,000µm - 15µm (2,000µm for 20X objective) 

Transmitted illumination (option) • Condenser : N.A. 0.6/W.D. 30mm (t=9mm mask thickness can be observed) • Field diaphragm, Condenser height adjustable 

The separate light source (LG-PS2* 12V100W halogen lamp) and a fiber guide (LG-SF*) are required 

Observation tube Super widefield erect image tilting trinocular tube (MX-SWETTR or U-SWETTR-2) • F.N. 26.5 • MX-SWETTR: optical path changeover 

(100:0/0:100), tilting angle 0 to 42 degrees • U-SWETTR-2: optical path changeover (100:0/20:80), tilting angle 2 to 35 degrees 

Super widefield erect image tilting trinocular tube for motorized stage use (MX-SWETTR300) • Optical path changeover (100:0/20:80), 

tilting angle 0 to 45 degrees • Integrated 1/2.5x variable magnification function • F.N. 26.5 • Optical axis — eye point approx. 500 mm (horizontal) 

Revolving nosepiece 6-position motorized BF/DF revolving nosepiece (integrated center motor) 

6-position motorized BF/DF/DIC revolving nosepiece (integrated center motor and DIC Prisms) 

• Motorized DIC prism switching (observation mode, interlocked with objective) 

• Built-in prism: 2 types for UM objective and LM objective (for ultra high magnification) • Motorized DIC retardation changing 

Stage MX-SIC8R XY Stroke : (X) 210mm X (Y) 210mm/AL110-VS8 (for 200mm/150mm wafer handler the model AL110) 

MX-SIC1412R2 XY Stroke : (X) 355.6mm X (Y) 304.8mm 

Accommodates various kinds of motorized stages from other suppliers (Assist spring is needed for a stage of 10 kg or over) 

Main operation unit 2-jog 11-button main hand switches • 7-segment LED display 

Focusing handle unit 1 focus knob 5 button focus handle unit (auxiliary operation unit) 

Power supply 12V 100W light source, power box for motorized control (U-PS-3) 

Power consumption 100 - 240V ±10%; g 4.8 A; 50/60 Hz 

Dimensions Approx. 509(W) X 854(D) X 562(H)mm (MX-SIC8R configuration) 

Weight Microscope stand including AF illumination tube: 53 kg 

Approximately 73 kg when combined with standard modules (6-hole motorized DIC revolving nosepiece, U-SWETTR, MX-SIC8R) 

*Note: The model or type might differ by area. 

4 

UNIVERSAL 

INFINITY SYSTEM

NEW 


MX61/ MX61L 

SEMICONDUCTOR/FPD INSPECTION MICROSCOPE 

The highest efficiency for all our customers — that's the commitment underlying the launch of 

the MX61/MX61L. 

MX61 accepts up to 200mm samples while MX61L accommodates up to 300mm samples. 

MX61/MX61L Specifications 

MX61 

reflected light configuration 

Model MX61 MX61L 

Optics UIS optics (infinity-corrected system) 

Microscope stand Reflected light illumination (F.N. 26.5) 12V, 100W halogen lamp (pre-centering type) 

Brightfield/darkfield mirror plus 1 cube (option), exchange method 

Built-in motorized aperture diaphragm (Pre-setting for each objective, automatically open for darkfield observation) 

Transmitted light illumination* (F.N. 26.5) *When transmitted illumination unit MX-TILLA or MX-TILLB is combined. 

Illumination by light source LG-PS2 and light guide LG-SF (12V,100W halogen lamp) or their equivalent. 

•MX-TILLA: condenser (N.A.0.5), with aperture stop 

•MX-TILLB: condenser (N.A.0.6), with aperture stop and field stop 

Observation methods qReflected light brightfield wReflected light darkfield eReflected light Nomarski DIC rReflected light simple polarizing 

tReflected light fluorescence yReflected light IR uTransmitted light brightfield iTransmitted light simple polarizing 

*Separate (optional) cubes are required for e, r and t. 

*u and i require combination with a transmitted illumination unit. 

Observation tube Super widefield erect image tilting trinocular tube (F.N.26.5): Super widefield erect image tilting trinocular tube (F.N.26.5): 

MX-SWETTR MX-SWETTR or U-SWETTR 

Others: Super widefield trinocular tube/Widefield binocular tube (MX-SWETTR is equipped for MX61L as standard.) 

Revolving nosepiece Motorized sextuple revolving nosepiece with slider slot for DIC: U-D6REMC 

Motorized quintuple BD revolving nosepiece with slider slot for DIC: U-D5BDREMC 

Motorized centerable quintuple revolving nosepiece with slider slot for DIC: U-P5REMC 

Forward rotation by objective exchange button on the front panel of microscope, or directly by hand switch U-HSTR2 (user designation) 

Stage MX-SIC8R 8" X 8" stage MX-SIC1412R2 14" X 12" stage 

Stroke: 210 X 210mm Stroke: 356 X 305mm 

(Transmitted light illumination area: 189x189mm) (Transmitted light illumination area: 356x284mm) 

MX-SIC6A 6" X 6" stage combination with MX-TILLB 

Stroke: 158 X 158mm (Reflected light use only) 

Roller guide slide mechanism, belt drive system (no rack), grip clutch function (belt drive disengagement system) 

Power consumption Built-in reflected light source body 100-120/220-240V~1.9/0.9A 50/60Hz, 

Transmitted light source (LG-PS2) 100-120/220-240V~3.0/1.8A 50/60Hz 

Dimensions/weight Dimensions: approx. 509(W) X 843(D) X 507(H)mm Dimensions: approx. 710(W) x 843(D) x 507(H)mm 

Weight: approx. 40kg (microscope stand only approx. 27kg) Weight: approx. 51kg (microscope stand only approx. 31kg) 

5 

MX61L 

transmitted light configuration

High 

efficiency 

Minimizing wafer inspection time 

Auto focus system MX-AF 

This auto focus unit for the MX61/61L is compatible with all reflected light 

observation methods, including darkfield and Nomarski DIC. Fast and 

precise, it responds 

instantly to changes in the 

observation position to 

provide accurate focusing 

in real time. 

More than 20% improvement in contrast at high magnifications 

Confocal system U-CFU 

This unit integrates confocal optics into the tilting trinocular tube and is 

compatible with the 0.18µm rule inspection. High-precision devices with 

multiple layers can be 

inspected with high 

resolving power and high 

contrast. 

Controlling/obtaining information about microscope 

magnifications and aperture diaphragm 

RS232C 

An RS232C interface is equipped on the MX61/61L as standard, enabling 

various motorized parts of the microscope to be controlled via a PC. 

The observation conditions for several 

microscopes can be set in the same way: 

this makes it possible to establish such 

conditions on a uniform basis among 

several PCs; to replicate particular 

environmental conditions of use. 


Fast start-up: Olympus MX microscopes benefit every customer right from the start — meeting their needs in full, without wasting time or money. 

Easy operation: Speedy detection of any flaw ensures faster, more productive throughput. 

Failure analysis: High resolving power and high image sensitivity support faster, more accurate analysis. 

Future expandability: A complete range of accessories, available when and if you need them — no other exclusive optical microscope required. 

Suitable for judgement of resist residue 

Fluorescent modules 

For fluorescence observation, a mirror unit can be added in the slider. 

U, B and G excitation mirror units are available; they are used for 

inspecting resist residue or 

organic LEDs. 

Suitable for observing silicon wafers, the inside of compound 

wafers, and the bonding section of wafer bump 

Near Infrared (IR) modules 

Compatible accessories include objectives which compensate for 

aberrations from the visible to near IR wavelength light and various other 

options, allowing 

comprehensive inspection of 

the bump wafer. 

6 

UNIVERSAL 


Indispensable for observing FPD or MEMS* sensors 

Transmitted illumination modules MX-TILLA/MX-TILLB 

There are two types of illumination modules: one for general purpose use 

and the other with high N.A. (Numerical Aperture). These transmitted 

illumination modules are 

provided to enable 

MX-TILLB MX-TILLA 

inspections for photomask 

and FPD. A polarizer is also 

equipped, allowing simple 

polarizing observations using 

transmitted light. 

*Micro-Electro-Mechanical System

MX40 Specifications 


MX40 

INDUSTRIAL INSPECTION MICROSCOPE 

A reflected-light inspection microscope optimized for the inspection requirements of a 

variety of electronics components including magnetic heads and semiconductors. 

Objectives UIS objectives 

Eyepieces UIS eyepieces (10X, 12.5X, 15X) 

Microscope stand Frame 6" arm-integrated frame dedicate for reflected light Built-in transformer for reflected light 

Focus Coaxial coarse and fine focus controls, stage travel range: 32mm (2mm up and 30mm down from the focal plane) 

Fine focus stroke per rotation: 0.1mm, minimum focus adjustment graduation: 1µm, sensitivity: 1µm or less 

Incident illumination Brightfield/DIC* 12V, 100W halogen bulb light source. Integrated lamp housing. Built-in aperture diaphragm (with centering mechanism) 

Brightfield/darkfield/DIC* 12V, 100W halogen bulb light source (xenon and mercury lamp housing mountable). Brightfield/darkfield switchable via slider 

Field diaphragm, aperture diaphragm (with centering mechanism), and built-in pinhole slider 

Fluorescence 100W mercury and 75 xenon light source (halogen lamp housing mountable) Observation method changeover via a turret holding four 

filter cubes. Field diaphragm, aperture diaphragm (with centering mechanism) and built-in shutter mechanism 

Observation tube Invert Widefield binocular tube, widefield trinocular tube (F.N. 22), super widefield trinocular tube (F.N. 26.5) 

Erect Widefield trinocular tube (F.N. 22), super widefield trinocular tube, super widefield tilting trinocular tube (F.N. 26.5) 

Revolving nosepiece Brightfield Quintuple/sextuple/DIC sextuple/motorized DIC sextuple 

Brightfield/darkfield Quintuple/DIC quintuple/motorized DIC quintuple. 

Stage 6" X 6" Stroke: 158 x 158mm Reflected light: roller guide slide mechanism, belt drive system (no racks), stage handle with a built-in clutch 

4" X 4" Stroke: 100 x 105mm Reflected light: roller guide slide mechanism, rack & pinion drive system, built-in Y-direction lock mechanism 

Power consumption 150VA 

Weight 

*High resolution type DIC slider available 

Approx. 25kg (standard set) 

7 

UNIVERSAL 

INFINITY SYSTEM

WAFER LOADER 

The easy-to-use functions and compact design of the AL110 and MX61/MX61L 

combination maximize efficiency of wafer inspection. 

AL110 Specifications 

AL110/MX61 

WAFER LOADER/SEMICONDUCTOR INSPECTION MICROSCOPE 

AL110+MX61 configuration 

200mm versions 200/150mm compatible versions 100/125/150mm compatible versions 

Item L LM LB MB LMB L LM LB MB LMB L LM LMB 

Wafer diameters* 1 200mm orientation flat type, 200mm notch type _ _ 

150mm orientation flat type _ 

100mm, 125mm and 150mm orientation flat type _ 

Cassette Fluoroware, H-ber type _ 

Number of cassette One _ 

Inspection modes Sequential and sampling _ 

Transfer modes Micro inspection _ _ _ _ _ _ _ _ _ _ _ 

Top macro inspection _ _ _ _ _ _ _ _ 

Back macro inspection _ _ _ _ _ _ _ 

2nd back surface macro inspection _ _ _ _ _ _ _ 

Orientation flat/notch 

alignment 

One every 90°, O.F./notch alignment also 

available before unloading wafers into cassette 

_ 

No-contact centering _ 

Wafer transfer Robot arms with vacuum pickup _ 

Adaptable microscope* 2 MX61/MX61L _ 

Model 

Dimensions (mm) 580 (W) x580 (D) x297 (H) 490 (W) x520 (D) x297 (H) 

Weight (kg) 30 32 31 31 33 30 32 31 31 33 26 28 30 

Utilities Power source: AC100 to 120V 0.90A or AC220 to 240V 0.55A 50/60Hz, Vacuum pressure: -67kPa to -80kPa 

* 1 Applicable for SEMI and JEIDA 6- and 8-inch wafers. * 2 Besides the MX61/MX61L, other equivalent microscopes are available. Please consult your Olympus dealer for the options. 

MS200 motorized stage 

Combining MS200 motorized stage enables complete surface inspections of a 200mm wafer, with specific inspection points 

quickly detected and examined according to preset programs. 

8 

UNIVERSAL 

INFINITY SYSTEM

BX61 Specifications 


The motorized BX61 microscope is provided with auto focus and automatic reflect/ 

transmitted light mode select. Either of two types of motorized incident illuminator are 

mountable for the BX61: BX-RLAA with automatic BF/DF observation mode select, or 

BX-RFAA with automatic 6-position observation cube select . 

BX61+BX-RFAA 

Optical system UIS optical system 

BX61 



Specifications Eyepieces UIS eyepieces 

Microscope Illumination Reflected/transmitted: External 12V100W light source , light preset switch, LED voltage indicator, reflected/transmitted changeover switch 

stand Focus Motorized focusing, stroke 25mm, minimum graduation 0.01µm 

Maximum specimen height 25mm (without spacer) 

Reflected light illuminator BX-RLAA: Motorized BF/DF changeover, motorized AS 

BX-RFAA: Motorized 6 position turret, built-in motorized shutter, with FS, AS 

Transmitted light 100W halogen, Abbe/long working distance condensers, built-in transmitted light filters (LBD,ND25, ND6) (BX51) 

Observation tube Widefield (F.N. 22) Inverted: binocular, trinocular, tilting binocular 

Erect: trinocular, tilting binocular 

Super widefield (F.N. 26.5) Inverted: trinocular 

Erect: trinocular, tilting trinocular 

Revolving 

nosepiece 

For BF 

For BF/DF 

Motorized sextuple, centering quintuple 

Motorized quintuple 

Stage Coaxial left (right) handle stage: 76(X)X52(Y)mm, with torque adjustment 

large-size coaxial left (right) handle stage: 110(X)X105(Y)mm, with lock mechanism in Y axis 

9 

BX61+BX-RLAA 

UNIVERSAL 

INFINITY SYSTEM


BX51/BX51M 

SYSTEM MICROSCOPES 

The BX51 microscope model offers reflected and transmitted light illumination, the BX51M 

model offers reflected light illumination only. 

Both accept the reflected light brightfield/darkfield illuminator BX-RLA2 or the universal 

illuminator, BX-URA2, which includes fluorescence capability. 

BX51M+BX-RLA2 

BX51+BX-URA2 

BX51/BX51M-IR 

SYSTEM IR MICROSCOPES 

With the same microscope stand and reflected light illuminator, it is possible to conduct 

near infrared light observations of semiconductor interiors and the back surface of a chip 

package as well as CSP bump inspections. 

10 

BX51/BX51M Specifications 

BX51/BX51M-IR Unit 

100W halogen lamp housing for IR U-LH100IR 

Trinocular tube for IR U-TR30IR 

Single port tube lens with lens for IR U-TLUIR 

Transmitted polarizer for IR U-POTIR 

Rotatable analyzer slider for IR U-AN360IR 

Reflected polarizer slider for IR U-POIR 

Band path filter (1100nm) for IR U-BP1100IR 

Band path filter (1200nm) for IR U-BP1200IR 

Objectives for IR LMPL5XIR, LMPL10XIR, LMPL20XIR, 

LMPL50XIR, LMPL100XIR, MPL100XIR 

* For other specifications, please refer to BX51/BX51M. 

UNIVERSAL 




Eyepieces UIS eyepieces 

Microscope Illumination Reflected/transmitted: built-in 12V100W light source, light preset switch, 

stand LED voltage indicator, reflected/transmitted changeover switch (BX51) 

Reflected: built-in 12V100W light source, light preset switch, 

LED voltage indicator (BX51M) 

Focus Stroke: 25mm, fine stroke per rotation: 100µm 

minimum graduation: 1µm, with upper limit stopper, 

torque adjustment for coarse handle 

Maximum specimen height 25mm (without spacer: BX51), 65mm (without spacer: BX51M) 

Reflected light BF etc. BX-RLA2: 100W halogen (high intensity burner, fiber illuminator 

illuminator mountable), BF/DF/DIC/KPO, with FS, AS (with centering 

mechanism, BF/DF interlocking ND filter) 

Reflected fluorescence BX-URA2: 100 Hg lamp, 75W Xe lamp, 50W metal halide lamp, 

6 position mirror unit turret (standard: WB, WG, WU+BF etc), 

with FS, AS (with centering mechanism), with shutter mechanism 

Transmitted light 100W halogen, Abbe/long working distance condensers, 

built-in transmitted light filters (LBD,ND25, ND6) (BX51) 


Erect: trinocular, tilting binocular 



Revolving nosepiece For BF Sextuple, centering sextuple, septuple (motorized septuple: optional) 

For BF/DF Quintuple, centering quintuple, sextuple (motorized quintuple optional) 

Stage Coaxial left (right) handle stage: 76(X) X 52(Y)mm, with torque adjustment, 

large-size coaxial left (right) handle stage: 110(X) X 105(Y)mm, 

with lock mechanism in Y axis 

UNIVERSAL 

INFINITY SYSTEM


BX41M 


As well as excellent cost-efficiency, the BX41M offers a compact design based on 

advanced ergonomics and incorporating Olympus' original Y-shaped frame, and simple, 

straightforward operation. 

BX41M-ESD 


Provided to protect electronic devices from potentially harmful static electricity, and to 

broaden the inspection field of this advanced, high-performance microscope. 

11 

BX41M Specifications 

BX41M-ESD Specifications 

UNIVERSAL 





Microscope Illumination Reflected light, 6V30W power supply, 

stand light preset switch 

Focus Vertical stage movement: 25mm, 

fine focus movement: 100µm 

minimum graduation: 1µm, 

upper limit stop, 

torque adjustment for coarse adjustment 

knobs 


Reflected light illuminator BX-KMA: 30W halogen, BF/DIC/KPO 


Erect: trinocular,tilting trinocular 



Revolving For BF Sextuple, centerable sextuple, septuple 

nosepiece (optional: motorized sextuple) 

Stage Coaxial stage with left or right hand low drive 

control, with torque adjustment, 

Movement: X=76mm, Y=52mm 

Large-sized coaxial stage with left or right 

hand low drive control, 

with Y direction locking mechanism 


UNIVERSAL 





Microscope Illuminator Reflected light (with ESD performance), 

stand 6V30W power supply, light preset switch 

Focus Vertical stage movement: 25mm, 

fine focus movement: 100µm 

minimum graduation: 1µm, 

upper limit stop, 

torque adjustment for coarse adjustment 

knobs 


Reflected light illuminator BX-KMA-ESD: 30W halogen, BF/DIC/KPO 





Revolving For BF Sextuple revolving nosepiece with slider slot 

nosepiece for DIC with ESD performance 

Stage Coaxial stage with left or right hand low drive 

control, with torque adjustment, 


Large-sized coaxial stage with left or right 

hand low drive control, 

with Y direction locking mechanism 

Movement:X=110mm, Y=52mm


BXFM-S 


Accommodates the reflected light brightfield/darkfield and fluorescence illuminators. 

BXFM 


Compact focusing unit suitable for building into existing equipment. 

12 

BXFM Specifications 

Optical system UIS optical system (infinity-corrected) 

Objective UIS objectives 

Eyepiece UIS eyepiece 

Microscope stand Focus: 30mm, rotation of fine focus knob: 200µm, minimum 

adjustment gradation: 2µm, with torque adjustment for coarse knob 

Illuminator BX-RLA2 100W halogen, etc., BF/DF/DIC/KPO 

BX-URA2 100W Hg, etc., fluorescence illuminator 

Observation tube UIS observation tubes 

Revolving nosepiece UIS revolving nosepieces 

220 180 

587 

249 

40 3.5 

45 

187.5 

165 

130 

87.5 

83 

UNIVERSAL 


BXFM-S Specifications 




Microscope stand Stroke 30mm, rotation of fine focus knob: 200µm, minimum 

adjustment gradation: 2µm, with torque adjustment for coarse knob 

Illuminator BX-KMAS 100W halogen, fiber illumination, BF/DIC/KPO 

Observation tube UIS observation tubes 

Revolving nosepiece UIS revolving nosepieces 

124 

ø32 

106 187 

230.5 

252.5 

20 

40 

45 

* 

92.5 

** 

88 

208 

221 

290 

*123—153(stroke: 30)(146) 

**279.5—309.5(stroke: 30)(302.5) 

UNIVERSAL 


11 

17-47(stroke) 

ø32


U-CFU 

DISK SCAN MICROSCOPE SYSTEM 

New, cost-efficient disk scan confocal tube provides confocal images with high contrast 

and high resolution. 

MX61 configuration 

BX51RF configuration 

13 

U-CFU Specifications 

Type Infinity-corrected optical intermediate attachment tube 

Applicable objectives 5X-150X 

Field Number 22 (Real field number 11mm) 

Intermediate magnification 2X 

Optical path exchange CF confocal/direct optical paths 

CF mode exchange CF 1: Priority on contrast (recommended objectives 10X-100X) 

CF 2: Priority on brightness (recommended objectives 100X, 150X) 

Confocal illumination 100W mercury lamp 

Power supply AC adapter U-ACAD4515 (100-120V/220-240Vg0.4A/0.2A) 

Dimensions & weight W288 X D330 X H130mm, Approx. 5.4kg

GX71 Specifications 

METALLURGICAL MICROSCOPE 

GX71 

TOP-OF-THE LINE INVERTED METALLURGICAL SYSTEM MICROSCOPE 

Ideal for every observation method from brightfield to fluorescence. 

Zoom function for easy image trimming. 

Erect images — observation and recording of the specimen "as is". 



Eyepiece UIS eyepiece (F.N. 26.5) 

Microscope stand Intermediate magnification Zoom incorporated (1X-2X) 

Imprinting of scale All ports 

Power source Power source for illuminator (12V100W halogen) incorporated 

Photo frame Incorporated (IN/OUT) 

Output port Side port: video system 

Illuminator Observation method Brightfield, darkfield, simple polarized light, DIC, Fluorescence 

Illuminator diaphragm FS/AS manually controlled, with centering adjustment 

Light source 100W halogen (standard), 100W Hg, 75W Xe, 50W metal halide (optional) 

Observation tube Super widefield U-SWBI30, U-SWTR-2 

Revolving nosepiece Manual operation Sextuple for BF/DIC, quintuple for BF/DF, quintuple for BF/DF/DIC 

Motorized operation Sextuple for BF/DIC, quintuple for BF/DF/DIC 

Stage Flexible right handle stage, exclusively for GX series microscope (teardrop, circular stage insert plate) 

Image recording equipment Digital camera Olympus DP series, etc. 

Video camera Mountable, using video adapters 

Photomicrographic system 35mm/large-format camera (simultaneously mountable), 1% spot/average measuring area (switchable), 

auto/manual exposure, exposure time adjustment, automatic ISO setting, AE lock, multiplex exposure, etc. 

14 

UNIVERSAL 

INFINITY SYSTEM

NEW 


GX51 

INVERTED METALLURGICAL SYSTEM MICROSCOPE 

Single lever switchover for brightfield/darkfield observation. 

Expandable functionality. 

Improved operating convenience. 




Eyepiece UIS eyepiece (F.N. 22) 

Microscope Imprinting of scale All ports 

stand Power source Power source for illuminator (12V100W halogen) 

incorporated 

Output port Side port (optional): video system 

Illuminator Observation method Brightfield, darkfield, simple polarized light, DIC 

Illuminator diaphragm FS/AS manually controlled, with centering adjustment 

Light source 100W halogen (standard), 100W Hg, 75W Xe, 

50W metal halide (optional) 

Observation tube Widefield U-BI90-1-2, GX-BI90, U-TR30H-2 

Revolving Manual operation Sextuple for BF/DIC, quintuple for BF/DF, 

nosepiece quintuple for BF/DF/DIC 

Motorized operation Sextuple for BF/DIC, quintuple for BF/DF/DIC 

Stage Flexible right handle stage, exclusively for GX series 

microscope (teardrop, circular stage insert plate) 

Image Digital camera Olympus DP series, etc. 

recording 

equipment 

Video camera 

Photomicrographic 

Mountable, using video adapters 

35mm/large-format camera (simultaneously 

system mountable), 1% spot/average measuring area 

(switchable), auto/manual exposure, exposure time 

adjustment, automatic ISO setting, AE lock, multiplex 

exposure, etc. 

GX41 

COMPACT INVERTED METALLURGICAL MICROSCOPE 

New advances in both imaging and functionality: featuring the brighter, clearer visibility of 

UIS optics, and the convenience of observation with instant image recording. 

15 


UNIVERSAL 


UNIVERSAL 



Observation method Brightfield, Reflected light simple polarizing 

Focus Vertical revolving nosepiece movement (fixed stage), 

coarse and fine handles (with torque adjustment), 

roller guide movement. 

Stroke per coarse handle rotation: 36.8mm, 

Stroke per fine handle rotation: 0.2mm 

Illumination Illuminator Built-in aperture diaphragm (Lever operation type) 

Various ø25mm filters can be inserted 

Light source 6V30WHAL-L: long-life halogen lamp 

6V30WHAL: High intensity halogen lamp 

Observation Eyepieces: Attached to U-CTBI (tilting tube) 

tube microscope stand Inclination angle: 30°—60°, 

(F.N. 18) adjustable interpupillary distance range: 48 — 75mm 

Eyepieces: WHB10X3, U-CBI30-2-2 (binocular tube), U-CTR30-2-2 (trinocular tube) 

WHB10X3-H (F.N. 20) Inclination angle: 30°, interpupillary distance: 48 — 75mm 

Eyepieces: WHN10X U-BI30-2-2 (binocular tube), U-TR30-2-2 (trinocular tube) 

series (F.N. 22) Inclination angle: 30°, interpupillary distance: 50 — 76mm 

U-TBI-3 (tilting binocular tube) 

Inclination angle: 5° — 35°, interpupillary distance: 50 — 76mm 

Revolving nosepiece Quadruple revolving nosepiece 

Stage Plane stage Size: 160(W) X 250(D)mm, stage insert plate type (no accessories) 

Mechanical stage Stroke: 120mm(X) X 78(Y)mm 

Coaxial handle: attachable to right/left side of plane stage 

Use special stage plate CK40M-CP to observe 

samples up to ø50mm. 

Intermediate attachments U-CA, GX-SPU, U-ECA, U-DA, U-DO3


BX-P 

POLARIZING MICROSCOPES 

Employing UIS optics to achieve unsurpassed performance in polarized light observation, 

this series delivers optimum compensation for optical aberrations to achieve images of 

unprecedented sharpness. Six compensators are available to allow observations and 

measurement at various retardation levels. 

BX41-P 

conoscopic/ 

orthoscopic version 

BX51-P 

orthoscopic version 

CX31-P 

POLARIZING MICROSCOPE 

Simple to use, the CX31-P offers a variety of functions to answer a range of applications 

from mineralogical training and educational use to chemical research in the laboratory. 

16 

BX-P series Specifications 

Item Conoscopic and orthoscopic Orthoscopic observation 

observation (U-CPA) (U-OPA) 

Polarized light 

intermediate 

attachment 

(U-CPA or 

U-OPA) 

F.N. 

Bertrand lens 

Bertrand field stop 

Engage or disengage 

Bertrand lens 

22 

Focusable 

ø3.4mm diameter (fixed) 

22 

— 

— 

changeover 

between orthoscopic 

and conoscopic 

observation 

Position of slider [ in 

Position of slider _ out 

— 

Analyzer slot Rotatable analyzer with slot (U-AN360P-2) 

Analyzer (U-AN360P-2) 360° dial-rotatable, rotatable minimum angle 0.1° 

Centerable revolving nosepiece Quadruple, centerable attachable components: 1/4 wavelength 

(U-P4RE) retardation plate (U-TAD), Tint plate (U-TP530) and various 

compensators can be attached using plate adapter (U-TAD) 

Stage (U-SRG2) Polarizing rotatable stage with 3-point centering function.360° 

rotatable, lockable in any position, 360° graduated in 1° 

increments [Slide holder (U-SCB2) and mechanical stage 

(U-FMP) can be attached 

Condenser (U-POC-2) Achromat strain-free condenser (U-POC-2), 360° rotatable 

polarizer with swing-out achromatic top lens, Click stop at 

position "0°" is adjustable. N.A. 0.9 (top-lens in) N.A. 0.18 

(top-lens out) Aperture iris diaphragm: adjustable from 2mm to 

21mm diameters 

* For other specifications, please refer to BX51/BX41. 

CX31-P Specifications 

Optics UIS optical system (infinity-corrected) 

Objective ACHN-P series, UPFL-P series 

Eyepiece WHN10X, WHN10X-H, CROSS WHN10X 

WHB10X3, WHB10X2-H 

UNIVERSAL 


UNIVERSAL 


Microscope Illuminator 6V30W halogen lamp 

stand Stage Polarizing rotatable stage with centering function 

360° rotatable, lockable in any position 

360° graduated in 1° increments 

(minimum retardation resolution 6', using vernier scale) 

Condenser Strain-free polarizing condenser 

N.A. 0.9 (with oil immersion: 1.25), 

Aperture iris diaphragm incorporated 

Polarizer 360° rotatable, detachable 

Focusing Rack & pinion, Full stroke range: 25mm, 

Minimum graduation in fine movement: 2.5µm 

Upper limit stop mechanism in coarse movement 

Tension adjustment on coarse focus adjustment knob 

Conoscopic Bertrand lens Incorporated, detachable, focusable 

Intermediate 

tube 

Changeover between 

orthoscopic/conoscopic 

Engage or disengage of Bertrand lens 

Position: [ IN 

(U-PA) observation Position: _ OUT 

Analyzer Incorporated, detachable, 

180° rotatable, lockable in any position 

2° increments, minimum retardation resolution 6', 

using vernier scale 

Slot for Tint plate (U-TP530), 1/4 wavelength 

compensators retardation plate (U-TP137) and 

various compensators attachable


SZX12/SZX9 

RESEARCH STEREOMICROSCOPE SYSTEM 

The SZX Series is today's first choice in research stereo microscopy. 

Represents a new class of research stereo microscope with superb optical performance. 

The system modularity allows users to create the application dedicated configurations they 

need. 

SZX12/SZX9 Specifications 

Zoom 

microscope bodies 

*Total magnification 

(Objective 1X, 

eyepiece 10X) 

Focusing assembly 

Observation heads 

Stands 

Objectives 

W.D.: Working Distance 

PF: Parfocal objectives 

*Auxiliary long pillar and 

drop prevention collar 

(SZX-R) are necessary 

Eyepiece 

*Possible to insert 

micrometer 

(ø24mm, 1.5mm thick) 

SZX12 

17 

SZX9 

SZX-ZB12 SZX-ZB9 

Zoom variable magnification system with parallel optical axis, Zoom drive system: Horizontal handle Click-stop for various zoom positions incorporated 

Zoom ratio: 12.86(0.7X-9X) Zoom ratio: 9.0 (0.63X-5.7X) 

Total magnification indication*: 7/10/12.5/16/20/25/32/40/50/63/90 Total magnification indication*: 6.3/8/10/12.5/16/20/25/32/40/50/57 

Objective mounting: Screw mount 

Built-in aperture iris diaphragm Aperture diaphragm unit (SZX-AS) is available 

SZX-FOF: Fine focusing unit 

Focus: Rack and pinion with roller guide(with torque adjustment ring for coarse focusing), built-in counter balance, coarse and fine coaxial handle, 

coarse handle stroke: 80mm (stroke per rotation: 36.8mm), fine handle stroke: 80mm (stroke per rotation: 1.5mm) 

SZX-FO: Focusing unit 

Focus: Rack and pinion with roller guide(with torque adjustment ring for coarse focusing), counter balance optional, coarse handle, 

coarse handle stroke: 80mm, coarse handle stroke per rotation: 21.2mm 

SZX-TR30: 30 degree trinocular head 

Tilting angle: 30°, Light path selection: 2 steps (100% binocular tube, 20% binocular tube and 80% photo), 

Interpupillary distance adjustment: 50 - 76mm, with eyepiece fixing knob, eyepiece: WHS series 

SZX-BI30:30 degree binocular head; Tilting angle: 30°, Interpupillary distance adjustment: 50 - 76mm, with eyepiece fixing knob, eyepiece: WHS series 

SZX-TBI:Tilting binocular head; Tilting angle: 5° - 45°, Interpupillary distance adjustment: 50 - 76mm, with eyepiece fixing knob, eyepiece: WHS series 

SZX-ST:Stand; Pillar height: 270mm, base dimension: 300(W)X260(D)X30(H)mm, stage clips are mountable, with stage adapter fixing screw holes 

SZX-STL:Large stand; Pillar height: 400mm, base dimension: 400(W)X350(D)X28(H)mm, stage clips are mountable, drop prevention collar (SZX-R) is necessary 

Model N.A. Working Distance Model N.A. Working Distance 

DFPLFL0.3X 0.036 130mm* DFPL0.5X4 0.05 171mm* 

DFPLFL0.45X 0.05 198mm* DFPL0.75X4 0.075 116mm 

DFPLFL0.5XPF 0.055 70mm DFPLAPO1X-4 0.10 81mm 

DFPLAPO1XPF 0.110 74mm SZX-ACH1X 0.10 90mm 

DFPLAPO1.2XPF 0.13 60mm SZX-ACH1.25X 0.125 68mm 

DFPLFL1.6XPF 0.176 34mm DFPL1.5X4 0.15 45.5mm 

SZX-AL20X 0.275 10/7mm DFPL2X4 0.20 33.5mm 

WHS10X-H *(F.N. 22) CROSS-WHS10X (F.N. 22, with cross lines) 

WHS15X-H *(F.N. 16) CROSS-WHS15X (F.N. 16, with cross lines) 

WHS20X-H *(F.N. 12.5) 

WHS30X-H *(F.N. 7) 

CROSS-WHS20X (F.N. 12.5, with cross lines)

SZX7 Specifications 


SZX7 


Galilean optical system using parallel light paths for outstanding performance and easy 

expandability. 

Zoom microscope body Zoom drive: Horizontal knob system 

SZX-ZB7 Click stop for each zoom magnification: ON-OFF switching possible 

Lead-free materials used Zoom ratio values: 7:1 (0.8x to 5.6) 

Zoom magnification indication: 0.8, 1, 1.25, 1.6, 2, 2.5, 3.2, 4, 5, 5.6 

Objective mounting: Screw mounting into thread 

Aperture iris diaphragm control: The AS unit (SZX-AS) is mountable 

Observation tube SZX-BI45 SZX-TBI SZX-TR30 

SZX-BI45 Binocular tube Tilting binocular tube Trinocular tube 

SZX-TBI View inclination angle 45° View tilting angle 5° to 45° View inclination angle 30° 

SZX-TR30 Lead-free materials used Light path selection:2 steps 

(Binocular 100%, 

Video & photo 80%/Binocular 20%) 

Stand 

Interpupillary distance adjustable range: 50 to 76 mm Eyepiece clamping knob provided 

SZ2-ST SZ2-ILST 

SZ2-ST Standard stand LED reflected/transmitted illumination stand 

SZ2-ILST Frame installation Mounting diameter 76mm 

Focusing adjustment Knob rotation tension adjustment Focusing stroke 120mm 

Stage plate SZ2-SPBW (Black & white) 

SP-C (Glass clear transparent) 

The dedicated glass plate in 100mm dia. included 

Light source Fiber optic illumination system Transmitted illumination: LED 

SZ2-LGB mountable (option) Reflected illumination: LED 

Transmitted light illumination Average LED life span: 6000 hrs. 

attachment (SZ2-ILA) mountable (option) Input rating: 100-120V/200-240Vg0.15/0.1A, 50/60Hz 

Objective lens Model N.A. Working Distance 

All objectives: lead-free materials DFPL0.5X4* 0.05 171mm 

DFPL0.75X4 0.075 116mm 

* The SZ2-ET auxiliary sleeve is required 

when the SZ2-ST/SZ2-ILST is used. 

DFPLAPO1X-4 0.10 81mm 

SZX-ACH1X 0.10 90mm 

SZX-ACH1.25X 0.125 68mm 

DFPL1.5X4 0.15 45.5mm 

DFPL2X4 0.20 33.5mm 

Eyepieces All eyepieces: lead-free materials "ComfortView" WHSZ series 

18


SZ61: Top-of-the-line optical performance, with zoom ratio of 6.7:1. 

Model variations: SZ61TR with trinocular tube, SZ61-60 with 60° observation tube inclination. 

SZ51: Versatile, cost-efficient, ideal in all line inspection applications. 

Model variation: SZ51-60 with 60° observation tube inclination. 

SZ61/SZ51 Specifications 

SZ61/SZ51 

SZ61/SZ51 


19 

SZ61TR SZ61-60/SZ51-60 

Microscope body SZ61 SZ61-60 SZ61TR SZ51 SZ51-60 

SZ61 Magnification 0.67X to 4.5X 0.8X to 4X 

SZ61-60 Zoom ratio 6.7: 1 5: 1 

SZ61TR Working distance 110mm 

SZ51 Tube inclination angle 45° 60° 45° 45° 60° 

SZ51-60 Interpupillary Left/right interlocked 

distance adjustment Adjustment range: 52 to 76 mm (using the WHSZ10X eyepieces) 

Video camera adaptability — — C-mount (0.5x built in) — — 

Zoom adjustment knob Left/right single-shaft horizontal knob 

Optical components 

Interpupillary distance high/low magnification stopper incorporated 

Lead-free materials used 

Auxiliary objective Mounting by screwing into the thread at the bottom of frame (M48 thread X 0.75) 

Eyepiece "ComfortView" WHSZ series 

Lead-free materials used 

Stand SZ2-ST SZ2-ILST 

SZ2-ST Standard stand LED reflected/transmitted illumination stand 

SZ2-ILST Frame installation Mounting diameter: 76mm 

Focusing adjustment Focusing stroke: 120mm 

Stage plate SZ2-SPBW (Black & white for anti-ESD) The dedicated glass plate in 

SP-C (Clear glass plate) 100mm dia. included 

Light source Fiber optic illumination system SZ2-LGB mountable (option) Transmitted illumination: LED 

Transmitted light illumination attachment Reflected illumination: LED 

(SZ2-ILA) mountable (option) Average LED life span: 6000 hrs. 

Input rating: 100-120V/200-240V g0.15/0.1A, 50/60Hz


Compact, lightweight, cost-effective stereo microscopes which demonstrate superb 

performance and easy operation. 

SD/SF series Specifications 

Models 

SD3060 

SD3045 

SD/SF series 


SF1060 

20 

SF1045 

SF2060 

SD series SF series 

SF2045 

SD3045ILK SD3045 SD3060 SF2045ILK SF2045 SF2060 SF1045ILK SF1045 SF1060 

Microscope Optical system Greenough 

body Convergent angle 12° 

Magnification 1X, 3X (switchable) 2X 1X 

Working distance (W.D.) 110mm 

Observation tube inclination 45° 60° 45° 60° 45° 60° 

Interpupillary distance adjustment 

Right and left tubes interlocked distance adjustment, Adjustment range: 52–75mm (45° inclined tube), 

51–75mm (60° inclined tube), with GSWH10X 

Diopter adjustment Provided on left tube only, Adjustment range: ±5 diopter 

Magnification change horizontal knobs Right and left uniaxial — 

Auxiliary objectives 0.3X, 0.4X, 0.5X, 0.75X, 1.5X, 2X (Screw into the microscope body’s bottom) 

Eyepiece GSWH10X [Field number (F.N.): 22; ø24mm eyepiece micrometer mountable]

STM6 Specifications 


STM6 


Compact and highly functional design, with many possible combinations of bodies and 

stages. 

Item Manual 2-axis Manual 3-axis Motorized 3-axis 

Objectives (UIS) For metallurgical microscope MM6-OB series 

For measuring microscope UMPlanFL series, LMPlanFL series, UMPlanFL-BD series, LMPlanFL-BD series 

Eyepiece (UIS) MM6-OCC10x (with cross line, F.N. 22), MM6-OC10x (F.N. 22) 

Microscope Focus Vertical movement range 155mm 

stand Maximum accepted sample height 155mm * 1 , 100mm * 2 

Z-axis measurement range — 155mm * 1 , 100mm * 2 

Coarse focusing speed — — 4.8mm/sec 

Fine focusing speed (variable) 

— — 

800µm/400µm/200µm/50µm 

(full rotation of knob) 4 steps 

Illumination Cold light fiber guided illumination 12V100W halogen (for both reflected and transmitted light) 

Observation tube Erect image monocular tube, erect image trinocular tube, 

erect image trinocular tube for ES (100:0/0:100/10:90) 

Stage Stroke MM6C-CS50 = X-axis: 50mm, Y-axis: 50mm/MM6C-CS100R = X-axis: 100mm, Y-axis: 50mm 

MM6C-CS100 = X-axis: 100mm, Y-axis: 100mm/MM6C-CS150 = X-axis: 150mm, Y-axis: 100mm 

Measuring accuracy 50mm stroke: (3+L/50)µm 

100mm stroke: (3+2L/100)µm 

150mm stroke: (3+3L/150 )µm [L: measuring length (mm)] 

Counter display Minimum readout 0.5µm 0.1µm/0.5µm (selectable) 0.1µm 

Power consumption 100-120/220-240Vg0.7/0.4A 100 -120/220-240Vg1.6/0.8A 

50/60Hz 50/60Hz 

Dimensions * 3 465(W) X 437(D) X 596(H)mm 465(W) X 437(D) X 592 (H)mm 465(W) X 437(D) X 696(H)mm 

Weight * 4 * 

Approx. 94kg Approx. 95kg Approx. 97kg 

1 : With objectives for metallurgical microscope 

* 2 : With objectives for measuring microscope 

* 3 : STM6 microscope stand + MM6C-CS100 stage combination 

* 4 : STM6 microscope stand + MM6C-CS100 stage + integrated unit combination 

21


STM6-LM 


Motorized focusing as standard, for fast, high-precision measurement of large samples. 

Counter display: minimum readout 0.1µm or 0.5µm selectable. 

STM6-LM Specifications 

Objectives (UIS) For metallurgical microscope MM6-OB series 

For measuring microscope UMPlanFL series, LMPlanFL series, UMPlanFL-BD series, LMPlanFL-BD series 

Eyepiece (UIS) MM6-OCC10X (with cross line, F.N. 22), MM6-OC10X (F.N. 22) 

Microscope Focus Vertical movement range 205mm 

stand Maximum accepted sample height 205mm * 1 , 150mm * 2 

Z-axis measurement range 205mm * 1 , 150mm * 2 

Coarse focusing speed 4.8mm/sec 

Fine focusing speed (variable) 800µm/400µm/200µm/50µm (full rotation of knob) 4 steps 

Illumination Cold light fiber guided illumination 12V100W halogen (for both reflected and transmitted light) 

Observation tube Erect image monocular tube, erect image trinocular tube, erect image trinocular tube for ES (100:0/0:100/10:90) 

Stage Stroke MM6-CS250=X-axis: 250mm, Y-axis: 150mm 

Measuring accuracy X-axis: (3+5L/250) µm, Y-axis: (3+5L/150)µm [L: measuring length (mm)] 

Counter display Minimum readout 0.1µm/0.5µm (selectable ) 

Power consumption 100 -120/220-240Vg0.9/0.4A 50/60Hz 

Dimensions * 3 480(W) X 579 (D) X 843(H)mm 

Weight * 4 Approx. 170kg 

* 1 : With objectives for metallurgical microscope 

* 2 : With objectives for measuring microscope 

* 3 : STM6-LM microscope stand + MM6-CS250 stage combination, 

* 4 : STM6-LM microscope stand + MM6-CS250 stage + integrated unit combination 

22


DP70 

DIGITAL CAMERA 

Rapid high-resolution image acquisition — 12.5million pixels in only 3 seconds. 

High sensitivity, low noise design captures even confocal and fluorescence images. 

DP70+BX61M+U-AFA1M 

DP12 

MICROSCOPE DIGITAL CAMERA 

Compact, easy-to-use design and excellent image clarity. 

High-resolution 3.34 million pixel imaging. 

Large LCD monitor for on-screen image selection. 

DP12+BX51M 

23 

Camera Type Single chip color CCD camera, Piezo shifted 

Cooling system Peltier device (Ta-10°C)* 1 

Imaging Size 2/3 inch 

sensor Effective pixels 1.45million pixels (total pixels: 1.5 million pixels) 

Scanning method Progressive scanning 

Color filter RGB Bayer primary color filter 

Microscope camera mount Standard C mount 

Effective image resolutions 4080 X 3072, 2040 X 1536, 1360 X 1024, 680 X 512 

Sensitivity Equivalent to ISO 200/400/800/1600 

Bit depth 12 bits each for R, G, B 

Metering modes 30%, 1% spot, 0.1% spot (measuring area can be moved in image freely) 

Exposure Exposure modes Auto, manual, SFL automatic 

control AE lock Available 

Exposure adjustment Range : ± 2.0EV, step : 1/3EV 

Exposure time 1/44,000s-60s 

Image Mode Integral/Average 

integration Number 64 frames maximum 

Binning options OFF (1X1), 2 X 2 and 4 X 4 only preview image 

White balance Mode Auto, manual, one-push 

Image format BMP, TIFF (48 bit images saved in TIFF format only), JPEG, PICT, AVI 

Image orientation Flip/mirror/180° 

Interface PC interface PCI bus interface 

Image transfer rate Approximately 3 s* 2 (at maximum resolution 4080 X 3072) 

Frame rate 15 frames/s* 2 DP70 Specifications 

maximum (at image size 680 X 512) 

OS Microsoft Windows XP, 2000, NT4.0 

Camera system Camera head, PCI interface board (full size), interface cable, standard software 

Dimensions Camera head 112(ø) X 75(H)mm (excluding protuberance), approximately 1,200g 

& PCI interface board 352(W) X 126(D) X 29(H)mm (excluding protuberance), approximately 250g 

weight Interface cable Approximately 2.5m 

*1 Depends on environmental conditions 

*2 Image transfer time and preview image display time depend on PC's condition 

DP12 Specifications 

Image sensor 1/1.8 inch interlace scan CCD with 3.34 Mpixel (effective 3.24 Mpixel) 

Image Metering system: 1% spot, 30% average 

recording Exposure control: Automatic, manual, AE lock 

Exposure time: Automatic 1/4,000 sec - 1/2 sec, 

Manual 1/4,000 sec - 8 sec 

White balance (3 modes): Full auto, one touch, manual 

Recording media: 3.3V SmartMedia (SSFDC) 

*The SmartMedia card is not included 

Resolution: SHQ (TIFF) 2048x1536 (Approximately 9.4MB) 

SHQ (JPEG) 2048x1536 (Approximately. 2.3MB) 

HQ (JPEG) 1600x1200 (Approximately 790KB) 

SQ1 (JPEG) 1024x668 (Approximately 580KB) 

SQ2 (JPEG) 640x480 (Approximately 230KB) 

Image display 3.5 inch 200.000 pixel TFT colour LCD 

Live image display: max. 30 frames/sec 

image magnifications 1X, 2X (Electronic zoom) 

Reproductive image display: 30 frames/sec 

Image magnifications 1/16X, 1/9X, 1/4X, 

1X, 2X, 4X 

I/O DC input 

Data Output: USB 

Video output: Composite (NTSC/PAL) 

SSFDC slot 

Exposure adjustment: 2EV (1/3 increments)

NEW 


analySIS ® FiVE series 

ruler/imager/docu/auto/pro 

Digital Power Analyzing — analySIS FiVE software provides sophisticated solutions for all 

applications involving materials analysis, industry and quality assurance, ensuring efficient 

and successful results. 

analySIS ® FIVE series Specifications 

Function/type ruler imager docu auto pro 

Camera control/microscope control* ✓ ✓ ✓ ✓ ✓ 

Measurement ✓ ✓ ✓ ✓ ✓ 

Stitching images — ✘ ✓ ✓ ✓ 

Extended focus — ✘ ✓ ✓ ✓ 

3D image — ✓ ✓ ✓ ✓ 

Particle analysis — ✘ ✘ ✓ ✓ 

Database — ✓ ✓ ✓ ✓ 

Report generator — ✓ ✓ ✓ ✓ 

Fourier Transformation — ✘ ✘ ✘ ✓ 

Pattern measurement — ✘ ✘ ✘ ✓ 

* For acceptable cameras and microscopes, please consult your Olympus dealer. 

✓: standard ✘: Can be extended using special expansion software "add-ins". For details, please consult your Olympus dealer. 

Hardware requirements 

OS Windows98/ME/NT4.0 SP6/2000 SP3/XP SP1 

Memory 256MB or higher (512MB and more recommended) 

CPU Pentium III 500MHz or higher (Pentium 4 1.8GHz or higher recommended) 

Hard disk 200MB or higher 

Display 1024 X 768 resolution or higher, 1280 X 1024 resolution, 16.77 million color recommended 

Browser Internet Explorer 3.02 or later (version 6.0 or higher recommended) 

Others CD-ROM drive or DVD-ROM drive 

24 

Sample combination of an industrial microscope and 

microscope digital camera 

Note: The different models might be available in some areas.

PHOTOMICROGRAPHY SYSTEM 

PM30/PM20/PM10SP 

AUTOMATIC PHOTOMICROGRAPHIC SYSTEM 

PM30: Fully automatic fluorescence photomicrography — only by Olympus. 

PM20: Sophisticated features, superior photomicrography — with room to spare. 

PM10SP: Semi-automatic photomicrographic with an economical and compact system. 

PM20 

PM series Specifications 

PM30 

Item PM30 PM20 PM10SP 

Photometric 

mode 

Super FL Auto mode 

FL Auto mode 

✓ 

✓ 

— 

✓ 

— 

— 

Auto mode ✓ ✓ ✓ 

Manual mode ✓ ✓ ✓ 

Time mode ✓ ✓ ✓ 

Light 

distribution 

Measuring 

Exposure 

Viewer: 50%/Meter 50% 

Camera: 100% 

Viewer: 16%/Meter: 20%/Camera: 64% 

Meter: 20%/Camera: 80%* 

Viewer: 50%/Meter: 50% 

Camera 100% 

Color temperature measuring Viewer: 80%/Color temperature (option): 20% — 

Measuring elements 350,000 pixel 2-dimensional CCD High sensitivity SPD with auxiliary filter 1%/30% divisional concentric SPD 

(effective pixel 330,000) (silicon photo diode) (self-developed) 

Measuring 

area 

Spot 

Average 

0.1%, 1% 

30% 

1% 

Automatic exposure adjustment range 1/125s.—64 minutes 1/125s.—21.2 minutes 

(35mm camera, ISO100) (reciprocity failure adjustment: Nil [0]) (reciprocity failure adjustment: standard [4] 

ISO setting range 3—25600(at exposure compensation 1.00), 1/3 increment, Automatic ISO setting via DX code (manual setting also possible) 

Exposure adjustment range 0.25—4.00(±2EV) 

Exposure time reciprocity failure adjustment 8steps [0—7] 3 steps [2,4,6] 

Manual exposure time setting 1/100s— 40minutes (52 steps), time mode setting 

Exposure condition memory, call ✓ ✓ — 

Bright frame viewer ✘ ✘ — 

Storage of photo settings 4+100 (with the use of memory card) 4 11 (previous, power off) 

Memory card ✘ — — 

Data print ✘ (control included) ✘ (data print control box power supply included) ✘ 

RS-232C ✓ — — 

Print out ✘ — — 

Display Graphical LCD LCD LED display for exposure warning and 

(with adjustable back light function) (with adjustable back light function) working condition 

Switch, jog dial input switch input 

Acceptable camera 35mm (automatic winding), large-format camera (4"X5")/Polaroid (3 1/4"X4 1/4") 

Others AE-LOCK, multi exposure, reset function for frame count numbers (large-format camera), with terminal for release from outside 

Power consumption 150VA 50VA 15VA(AC adapter) 

✓: standard ✘: optional *Selectable with manual operational lever 

25 

PM10SP


UIS OBJECTIVES 

UNIVERSAL INFINITY SYSTEM 

UIS Optical characteristics of objectives for industrial and metallurgical applications. 

UMPLFL (-BD) Plan Semi-Apochromat Series 

The universal Plan Semi-Apochromat objectives completely eliminate coma aberration, which 

is perfect for a wide range of microscopic methods including brightfield (darkfield), fluorescence, 

Nomarski DIC and simple polarized light observations. 

UMPLFL-BDP 

Plan Semi-Apochromat POL Series 

The Plan Fluorite Semi-Apochromat POL 

design ensures thorough compensation for 

coma aberration. Distortion is also minimized, 

which makes these objectives the 

best choice for Nomarski DIC and real 

polarized light microscopy. 

LMPLAPO (-BD) 

Plan Apochromat Series 

Exhibiting outstanding resolving power at 

super high magnifications. Ideal for observation 

of high-density IC wafers and other 

samples with minute details at long working 

distance. 

LMPLFL (-BD) Plan Semi-Apochromat Series 

These Plan Semi-Apochromat objectives feature a long working distance which makes it easy 

to change samples without touching the coarse focus. 

MPL (-BD) Plan Achromat Series 

Designed for brightfield (or brightfield/darkfield) observation, these Plan Achromat objectives 

ensure superb field flatness up to F.N. 22. 

SLMPLAPO no-cover Plan Apochromat 

Series 

Designed for brightfield observation. Offers 

an ultra long working distance that is much 

in demand, especially in the magnetic head 

market. 

LCPLAPO Plan Apochromat Series 

For LCD inspection. Changing the correction 

collar makes it possible to accommodate 

LCD glass substrates with thicknesses 

of 1.1mm, 0.7mm, and 0mm. 

26 

Lens 

Optical 

Magnifi- 

N.A. 

W.D. 

Cover 

glass 

Resolution* 

2 

character 

cation (mm) thickness 

(mm) 

(µm) 

5X 0.15 20.0 — 2.24 

10X 0.30 10.1 — 1.12 

UMPLFL 

20X 

40X 

0.46 

0.75 

3.1 

0.63 

0 

0 

0.73 

0.45 

50X 0.80 0.66 0 0.42 

100X 0.95 0.31 0 0.35 

5X2 0.15 12.0 — 2.24 

10X2 0.30 6.5 — 1.12 

UMPLFL-BD 20X2 0.46 3.0 0 0.73 

50X 0.80 0.66 0 0.42 

100X 0.90 0.31 0 0.37 

5X 0.15 12.0 — 2.24 

10X 0.25 6.5 — 1.34 

UMPLFL-BDP 20X 0.40 3.0 0 0.84 

50X 0.75 0.66 0 0.45 

100X 0.90 0.31 0 0.37 

LMPLAPO 

150X 0.9 1.0 0 0.37 

250X 0.9 0.80 0 0.37 

LMPLAPO-BD 

150X2 

250X 

0.9 

0.9 

1.0 

0.80 

0 

0 

0.37 

0.37 

5X 0.13 22.5 — 2.58 

10X 0.25 21.0 — 1.34 

LMPLFL 20X 0.40 12.0 0 0.84 

50X 0.50 10.6 0 0.67 

100X 0.80 3.4 0 0.42 

5X 0.13 15.0 — 2.58 

10X 0.25 10.0 — 1.34 

LMPLFL-BD 20X 0.40 12.0 0 0.84 

50X 0.50 10.6 0 0.67 

100X 0.80 3.3 0 0.42 

1.25X* 4 0.04 3.6 0 8.39 

MPLAPO 

2.5X* 4 0.08 10.70 0 4.19 

20X 0.60 0.90 0 0.56 

50X 0.95 0.30 0 0.35 

100X 0.95 0.35 0 0.35 

100XOil 1.40 0.1 0 0.24 

MPLAPO-BD 100X 0.9 0.31 0 0.37 

MPLFL-BD 

50X2 

100X2 

0.8 

0.9 

1.0 

1.0 

— 

— 

0.42 

0.37 

5X 0.10 19.6 — 3.36 

MPL* 

10X 0.25 10.6 — 1.34 

3 20X 0.40 1.3 0 0.84 

50X 0.75 0.38 0 0.45 

100X 0.90 0.21 0 0.37 

5X 0.10 12.0 — 3.36 

MPL-BD* 

10X 0.25 7.0 — 1.34 

1* 3 20X 0.40 1.3 0 0.84 

50X 0.75 0.38 0 0.45 

100X 0.90 0.21 0 0.37 

SLMPL 

20X 0.35 21.0 0 0.58 

50X 0.45 15.0 0 0.75 

UNIVERSAL 


LCPLAPO 

20X 

50X 

0.40 

0.60 

8.8 

3.1 

0.95/ 

0/0.7/1.1 

0/0.7/1.1 

0.84 

0.56 

LCPLFL-LCD 100X 0.80 1.1/ 

1.143 

0.6-1.2 0.42 

5XIR 0.10 20.0 — — 

10XIR 0.25 18.5 — — 

LMPL-IR 20XIR 0.40 8.1 — — 

50XIR 0.55 6.0 — — 

100XIR 0.80 3.4 — — 

MPL-IR 100XIR 0.95 0.3 — — 

* 1 When MPL-BD objectives are used in combination 

with the U-ULH lamp housing (mercury/xenon socket) 

for darkfield observation, illumination near the perimeter 

of the field of view may be slightly insufficient depending 

on the specimen. 

* 2 Resolving power calculated with the aperture 

diaphragm fully opened. 

* 3 Up to F.N. 22. 

* 4 Polarizer and analyzer are recommended to use. 

*“BD” indicates brightfield/darkfield capability.


UIS EYEPIECES 

UNIVERSAL INFINITY SYSTEM 

OC-M 

MICROMETER RETICLES (Ø20.4mm) 

27 

Diopter Micrometer 

Product F.N. 

Remarks 

(1/m) (mm) 

WHN10X 22 — 24 — 

WHN10X-H 22 -8 - +2 24 with helicoid 

CROSS WHN10X 22 -8 - +2 — with cross, helicoid 

WH15X 14 — 24 — 

SWH10X-H 26.5 -8 - +2 — with helicoid 

MICRO SWH10X 26.5 -8 - +2 — with micrometer, helicoid 

CROSS-SWH10X 26.5 -8 - +2 — with cross, helicoid 

When the OC-M is inserted into the WH10X eyepiece filed iris diaphragm, the length of 

the specimen within the field of view can be measured. 

Various types are available to choose from depending on the specimen. 

0 10 20 30 40 50 60 70 80 90 100 

10/100 H5/5 

0 10 20 30 40 50 60 70 80 90 100 

Cross 10/100 H7/7 

H10/100 

OC-M Specifications 

10/100 10mm in 100 divisions 

Cross 10/100 10mm in 100 divisions on crosslines 

H5/5 5mm in 5 divisions in grid pattern 



UNIVERSAL 


UNIVERSAL 

INFINITY SYSTEM

1. Field Number (F.N.) and Practical Field of View 

The field number (F.N.) is referred to as the diaphragm size of 

eyepiece in mm unit which defines the image area of specimen. 

The diaphragm diameter actually seen through eyepiece 

is known as the practical field of view (D) which is determined 

by the formula: 

D = 

Eyepiece F.N. (mm) 

Objective magnification 

2. Working Distance (W.D.) 

The distance between the front edge of the objective and the 

specimen surface (with the surface of the cover glass in case 

of the cover glass objective) when the specimen is focused. 

3. Parfocal Distance 

It is the distance between the objective mounting plane and 

the specimen. 

In UIS objectives, the parfocal distance is designed at 45mm. 

Working distance and parfocal distance 

Working Distance(W.D.) 

OPTICAL TERMINOLOGY 

Objective 

mounting position 

Parfocal distance 

Focus plane 

28 

4. Relationship between the objective's focal length 

and magnifications 

The following formula indicates the relationship between an 

objective's focal length and magnifications. 

m(ob)= 

Focal length of tube lens 

f 

m(ob): Objective magnification, 

f: Objective's focal length 

In the UIS optical systems, the focal length of the tube lens is 

180mm. 

5. Total Magnification 

5.1 Observation through eyepiece (binocular observation) 

M(bino)=m(ob)×m(oc) 

M(bino): Total magnification for binocular observation 

m(ob): Objective magnification 

m(oc): Eyepiece magnification 

5.2 Photomicrography 

● 35mm film camera 

M(35mm)=m(ob)×m(pe) 

M(35mm): Total magnification on the 35mm film plane 


m(pe): Photo eyepiece magnification 

* The magnification after the picture is printed varies with print 

size. 

● Large-format camera 

M(large-format)=m(ob)×m(pe)×3 (camera tube magnification) 

M(large-format): Total magnification on the large-format film plane 


m(pe): Photo eyepiece magnification 

Example 

What is total magnification for large-format camera when 

objective 20× and PE4× are used ? 

m(ob)=20×, m(pe)=4× 

M(large-format)=m(ob)×m(pe)×3=20×4×3=240×

5.3 Video monitor observation 

● Total magnification for video monitor 

M(video monitor)=m(ob)×m(video adapter)×Monitor magnification* 

M(video monitor): Total magnification on the video monitor 


m(video adapter): Projected magnification for video adapter including 

photo eyepiece 

(please refer to Figure 1) 

* Please refer to Figure 3 for "Monitor magnification" 

Figure 1 Video adapter and projection magnifications 

Video adapter (Projection lens) Projection magnifications 

U-TVZ 0.5×-1.25× 

U-TV1×-2 1× 

U-TV0.5× 0.5× 

U-TV0.25×C 0.25× 

PE2.5× 0.75× 

PE3.3× U-PMTVC 

1× 

PE4× (0.3×) 

1.2× 

PE5× 1.5× 

Figure 2 Imaging device size 

Camera format Diagonal Horizontal Vertical 

1/3" 6.0mm 4.8mm 3.6mm 

1/2" 8.0mm 6.4mm 4.8mm 

2/3" 11.0mm 8.8mm 6.6mm 

The above table is for standard image device sizes. 

Please check your device size for precise calculation. 

Figure 3 Imaging device size and monitor magnifications 

Camera format 

9" 

Monitor size (diagonal) 

12" 14" 20" 27" 

1/3" 38.1× 50.8× 59.2× 84.6× 114.1× 

1/2" 28.6× 38.1× 44.5× 63.5× 85.7× 

2/3" 20.8× 27.7× 32.3× 46.2× 62.3× 

Inch↔mm conversion table 

1 inch = 25.4mm = 25.4 ×1000 µm 

1 mm = 0.03937 inch 

● Practical field of view for video monitor observation 


Practical field of view for 

= Image device size * 

video monitor observation m(ob)×m(video adapter) 

m(video adapter): Projected magnification for video adapter including 

photo eyepiece (please refer to Figure 1 for 

projected magnifications) 

* Please refer to Figure 2 for image device size 


29 

Example 

What is total magnifications for video monitor when objective 

50×, video adapter U-TV0.5×, 2/3" video camera and 20" 

video monitor are used ? 

•Total magnification on the video monitor: 

m(ob)=50×, m(video adapter) is 0.5× from Figure 1 and monitor 

magnification is 46.2× from Figure 3. 

M(monitor observation)=m(ob)×m(video adapter)×monitor magnification 

=50×0.5×46.2=1155× 

•Practical filed of view for video observation(horizontal side): 

m(ob)=50×, m(video adapter) is 0.5× from Figure 1 and horizontal 

side of 2/3" imaging device is 8.8mm from Figure 2 

Practical field of view Image device size 

= 

for video observation m(ob) × m(video adapter) 

= 8.8 (mm) =352µm 

50 × 0.5 

6. Numerical Aperture (N.A.) 

The numerical aperture is a key factor to the performance of 

objective (resolving power, focal depth and brightness). 

The N.A. is determined by the following formula: 

N.A.= n × sinθ 

n=Refraction rate of the medium between specimen and 

objectives. (Air: n=1, oil: n=1.515) 

θ: Angle which is made by the optical axis and refraction of the 

light farthest from the center of the lens. 

The visual field brightness (B) of the microscope is determined 

by the following formula in relation to the objective magnification 

(M). The larger the N.A. and the lower the objective magnification, 

brightness will increase in the factor of the second power. 

B ∝ N.A.2 

M 2 

Numerical aperture 

n=1 

(air) 

Objective 

θ 

Sample 

surface

7. Resolving Power 

The resolving power of an objective is measured by its ability to 

differentiate two lines or points in an object. The greater the 

resolving power, the smaller the minimum distance between 

two lines or points that can still be distinguished. The larger the 

N.A., the higher the resolving power. 

● Resolving power formula 

The following formula is generally used for determing resolution. 

ε = 0.61 × λ (Reyleigh formula) 

N.A. 

λ: Wavelength or radiation in use 

(λ=0.55µm is used for visible light) 

N.A.: Objective N.A. 

Example 

UMPLFL100×(N.A.=0.95), λ=0.55µm 

ε = 0.61 × λ = 0.3355 = 0.3355 = 0.35µm 

N.A. N.A. 0.95 

8. Focal Depth 

The focal depth refers to the depth of the specimen layer 

which is in sharp focus at the same time. As human eyes are 

individually different in the ability of their focus adjustment, each 

perception of the focal depth varies.At present, the Berek formula 

that gives a focal depth value that often coincides with 

that obtained through experiments is generally used. 

● Visual observation (Berek formula) 

± d= ω× 250,000 λ 

+ 

N.A. × M 2(N.A.) 2 

ω: Resolving power of eyes 0.0014 

(when optical angle is 0.5 degrees) 

M: Total magnification 

(objective magnification × eyepiece magnification) 

350 0.275 

± d= + (λ=0.55µm) 

N.A. × M N.A. 2 

Example 

With UMPLFL100×(N.A.=0.95), WH10×: 

± d= 

350 + 0.275 = 0.37 + 0.3 = 0.67µm 

0.95 × 1,000 0.9 


30 

● Photomicrography 

The focal depth formula is calculated as follows. 

± d= 

λ 

2×(N.A.) 2 

● Video camera 

In the case of a video camera, the focal depth will vary according 

to number of pixels of CCD, optical magnification, and N.A. 

The above-mentioned formula is used as a rough guide only. 

9. Observation Methods 

9.1 Reflected Brightfield 

It is to observe the light reflected directly from specimen. The 

light from the illumination lamp is vertically guided through 

objectives and incident on the specimen. The light reflected 

from the specimen is observed through the objective. 

9.2 Reflected Darkfield 

It is to observe the scattered or diffracted light forming from the 

specimen. The light from the lamp travels in ring-form illumination 

optics equipped in circumference separately from objective 

and is focused on the specimen. 

★ Suitable for detection of minute scratches or flaws on 

specimen and examining mirror surface specimens 

including wafer. 

9.3 Reflected DIC (Differential Interference Contrast) 

It is a microscopic observation technique where the height difference 

of specimen that may not be visible with brightfield 

become a relief-like or three dimensional image with improved 

contrast. Illumination light becomes two rays of diffracted light 

by DIC prism. They bring about slightly difference in light path 

on height difference of the specimen. The difference becomes 

contrast utilizing DIC prism and analyzer. 

At the sensitive tint range, coloration is enhanced. 

★ Suitable for examining specimens with very minute 

height differences including metallurgical structure, minerals, 

magnetic heads, surface of hard disk and polished 

surface of wafer.

9.4 Polarized Light 

It is a microscopic observation technique with polarized light 

generated by a set of two filters (analyzer and polarizer). The 

polarization axes are perpendicular to each other for extinct. 

Some specimens located between the two filters give 

characteristic contrast or coloration according to each birefringence 

property and orientation (i.e. A polished specimen of 

zinc structure). Polarizer is located in the light path before the 

vertical illumination, while analyzer is inserted in the observation 

path before eyepiece. 

★ Suitable for metallurgical structures (i.e. growth pattern 

of the graphite on nodular casting iron), minerals and liquid 

crystal (LCD) and semiconductor materials. 

9.5 Reflected Fluorescence 

This technique is used for specimens emitting fluorescence. 

★ Suitable for inspection of contamination on wafer, photoresist 

residues and detection of crack with the usage 

of fluorescence method. 

9.6 IR (Infrared ray) 

IR observation is the preferred method of inspecting the inside 

of electronic devices using materials which transmit IR, like silicon 

or film. It is especially suitable for inspecting semiconductor 

substrates, and is widely used in contemporary CSP (chip 

scale package) research and development programs. IR 

objectives are also used with the near-infrared ray Raman 

spectroscope and laser repair purposes using a (1,064nm) 

YAG laser. 

10. Koehler illumination 

Light from the primary light source is collected by the collector 

lens and forms an image at the AS (aperture stop) position. 

This image acts as a secondary light source, reproducing the 

image at the objective's exit pupil position and casting telecentric 

(parallel light) illumination on the specimen surface. This is 

generally known as "Koehler illumination" and has two main 

features. One is its brightness and uniformity; the other is that 

it allows both AS and FS (field stop) settings to be changed 

independently. 

The effect of FS 

FS settings adjust the field of view at the extreme periphery 

and prevent extraneous reflected light from altering the forming 

light. This effectively eliminates flares from the whole image. 


31 

The effect of AS 

AS is effective when adjusting the illumination N.A. or changing 

the image contrast. Generally, the best contrast is obtained by 

diapharagming the objective pupil diameter to about 80%. 

However, when using objectives of over 100x magnification, 

better contrast images are obtained by diapharagming the 

objective pupil diameter to less than 50%.

•OLYMPUS CORPORATION obtains the ISO9001/ISO140001. 

Specifications are subject to change without any obligation on the part of the manufacturer. 

Printed in Japan M1550E-0305B

INDUSTRIAL MICROSCOPES

You also want an ePaper? Increase the reach of your titles

Delete template?

Save as template?