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conducters by Impact of EMP and UWB Pulses

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a)<br />

Figure 17. Destruction <strong>of</strong> Onchipwires<br />

V.3 Bondwire Destructions<br />

Bondwire destructions always occured at higher pulse amplitudes<br />

than onchipwire destructions due to the fact, that<br />

onchipwires normaly has much lower cross sections than<br />

bondwires. The destructions occured <strong>by</strong> melting <strong>of</strong> the<br />

material similar to onchipwire destructions. Figure 18<br />

shows two destructed bondwires <strong>and</strong> pads.<br />

a) b)<br />

Figure 18. Destructions <strong>of</strong> Bondwires<br />

The energy to destruct bond- or onchipwires can be calculated<br />

via the equation [5]<br />

( melt sur ) T T c l A Q − ⋅ ⋅ ⋅ ⋅ = ρ<br />

with A = cross section, l = length <strong>of</strong> wire, ρ = density <strong>of</strong><br />

material, c = specific heat capacity, Tmelt = melting temperature<br />

<strong>and</strong> Tsur = surrounding area temperature. Equation<br />

1 shows that the melting energy strictly depends on the<br />

cross section, if the same material is used for bond- <strong>and</strong><br />

onchipwires under the constraint heat transfer into the surrounding<br />

area is neglectable (valid due to short pulse impact).<br />

Drawing an energy balance results in equation 2<br />

which allows to make a rough estimate <strong>of</strong> the current<br />

which was responsible for the bondwire destruction.<br />

b)<br />

(1)<br />

I =<br />

With κ = electrical conductivity, d = diameter <strong>of</strong> the<br />

bondwires <strong>and</strong> the assumption that the duration <strong>of</strong> the current<br />

is approximately equivalent to the pulse length, a current<br />

<strong>of</strong> I ≈ 400 A can be calculated via equation 2 if<br />

bondwires made <strong>of</strong> aluminium were implemented.<br />

VI. SUMMARY<br />

The investigation <strong>of</strong> the susceptibility <strong>of</strong> logic devices built<br />

in ten different semiconductor technologies (NANDs <strong>and</strong><br />

Inverter) to <strong>EMP</strong> <strong>and</strong> <strong>UWB</strong> pulses has shown, that CMOS<br />

devices first gets reversible breakdowns <strong>and</strong> at much<br />

higher field amplitudes non reversible destructions occur.<br />

The destruction thresholds <strong>of</strong> TTL <strong>and</strong> CMOS devices are<br />

similar but TTL devices always gets non reversible destructions.<br />

The breakdown- (BT) <strong>and</strong> destructionthresholds<br />

(DT) decreases much <strong>by</strong> extending the ribbon<br />

cable length or usage <strong>of</strong> pulses with faster rise times.<br />

The destruction effects can be separated into componentonchipwire-<br />

<strong>and</strong> bondwire-destructions. First, at lower<br />

field amplitudes, component destructions ,mostly as a result<br />

<strong>of</strong> flashover effects, occur. If the amplitude increases<br />

also onchipwire destructions appear. Further increase <strong>of</strong><br />

the amplitude is leading to additional bondwire destructions<br />

<strong>and</strong> multiple component- <strong>and</strong> onchipwiredestructions.<br />

This investigation is part <strong>of</strong> the study “Susceptibility <strong>of</strong><br />

Electronics to <strong>EMP</strong> <strong>and</strong> <strong>UWB</strong>, Phase II”, commissioned<br />

<strong>by</strong> the Armed Forces Scientific Institute for Protection<br />

Technologies - ABC-Protection (Munster, Germany).<br />

REFERENCES<br />

2 4<br />

ρ ⋅κ<br />

⋅c<br />

⋅π<br />

⋅d<br />

⋅(<br />

T<br />

16⋅<br />

∆t<br />

melt<br />

−T<br />

[1] D.Nitsch, J.Schlüter, H.J.Kitschke, “Generierung<br />

und Vorteile von Ultrawideb<strong>and</strong>-Impulsen”,<br />

EMV99, Mannheim, Germany<br />

[2] C.Braun, “Aufbau eines breitb<strong>and</strong>igen Wellenleiters<br />

für N<strong>EMP</strong> Modell Simulationen”, INT Bericht<br />

Okt. 84<br />

[3] D.Nitsch, M.Camp, "<strong>UWB</strong> <strong>and</strong> <strong>EMP</strong> Susceptibility<br />

<strong>of</strong> Modern Microprocessorboards", EMC<br />

Europe, Brugge, Sept. 2000<br />

[4] M.Camp, H.Garbe, D.Nitsch, "<strong>UWB</strong> <strong>and</strong> <strong>EMP</strong><br />

Susceptibility <strong>of</strong> Modern Electronics", IEEE<br />

EMC, Montreal, August 13-17, 2001, ISBN: 0-<br />

7803-6569-0, pp. 1015-1020<br />

[5] M.Camp, “Empfindlichkeit von Elektronik gegen<br />

<strong>EMP</strong> und <strong>UWB</strong> - Phase II”, WIS Bericht,<br />

Okt. 01, AN:005.H-0 A064, AG:UT 243-C<br />

sur<br />

)<br />

(2)

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