IntroducTon to Nanotechnology - Academia Sinica
IntroducTon to Nanotechnology - Academia Sinica
IntroducTon to Nanotechnology - Academia Sinica
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Introduc)on <strong>to</strong> <strong>Nanotechnology</strong><br />
Kuei-‐Hsien Chen: IAMS, <strong>Academia</strong> <strong>Sinica</strong> & CCMS, NTU <br />
Ph.D. 1989 Harvard University <br />
Hossein hosseinkhani: GSMST, NTUST <br />
Ph.D. Kyo<strong>to</strong> University <br />
Chunwei Chen: MSE, NTU <br />
Ph.D. Cambridge University <br />
Li-‐Chyong Chen: CCMS, NTU <br />
Ph.D. 1989 Harvard University
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong><br />
9/20 Introduc
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong><br />
11/22 Midterm (Prof. Hossein)<br />
11/29 Physical-‐based Experimental Approaches <strong>to</strong> <strong>Nanotechnology</strong>-‐2 (Prof. Hossein)<br />
12/6 Silicon Nanoeletronic and Beyond (Prof. Hossein)<br />
12/13 Nanomedicine-‐1 (Prof. Hossein)<br />
12/20 Nanomedicine-‐2 (Prof. Hossein)<br />
12/27 Nano Materials for Pho<strong>to</strong>voltaic (Prof. LC Chen)<br />
1/3 Nano Materials for Thermoelectric (Prof. LC Chen)<br />
1/10 Looking in<strong>to</strong> the Future (Prof. LC Chen)<br />
1/17 Conclusion and Final Exam (Prof. KH Chen)
Moore’s Law
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Introduc)on <strong>to</strong> <strong>Nanotechnology</strong>
Modern Alchemy (I)<br />
Thermal CVD <br />
Plasma-‐assisted MBE <br />
MOCVD
Core Process Techniques at CCMS-AML<br />
CVD<br />
PVD<br />
•Microwave plasma <br />
• Electron-‐cyclotron-‐resonance plasma <br />
• Thermal-‐ and MO-‐CVD <br />
• Induc)vely Coupled Plasma <br />
Gas phase reac*on, Gas-‐solid interac*on <br />
Forma*on kine*cs <br />
• Magnetron spuQering <br />
• Ion beam spuQering <br />
• A<strong>to</strong>m-‐ and Ion-‐beam assisted PVD <br />
• Molecular beam epitaxy <br />
Hydrogen vs. H-‐free growth environments <br />
Film forma*on via physical route (varying K.E.) vs. chemical <br />
route (reac*ve spuBering) <br />
Highly energized vapor deposition/etching processes<br />
under situations far away from equilibrium
Gas Phase Syntheses <br />
• Evapora)on-‐Condensa)on (Earliest methods) <br />
• SpuQering <br />
• Laser Abla)on <br />
• Arc Discharge <br />
• Aerosol Process <br />
• Spray Pyrolysis <br />
• Plasma Spray <br />
a<strong>to</strong>mic process in the nuclea)on of <br />
three-‐dimensional clusters of <br />
deposited film a<strong>to</strong>ms on a substrate <br />
(J. S. Horowitz and J. A. Sprague, Chap. 8, Pulsed Laser Deposi
Schema
Nuclea
Selec
SEM
SEM
AFM
STM
STM
TEM
TEM (EELS)
Composi)on Analysis<br />
1. EL <br />
2. EDS <br />
3. AES () <br />
4. NMR <br />
5. ICP MASS ( <br />
6. MALDI Matrix-‐assisted laser <br />
desorp)on/ioniza)on
NMR, MRI
MALDI Matrix-‐assisted laser <br />
desorp)on/ioniza)on)
Structure Analysis<br />
1. XRD (X) <br />
2. TEM () <br />
3. FTIR ( <br />
4. Raman
XRD (X)
FTIR ()(
Raman )<br />
Normalized intensity (a.u.)<br />
D<br />
G<br />
H2/CH4=3<br />
H2/CH4=5<br />
H2/CH4=10<br />
H2/CH4=20<br />
H2/CH4=40<br />
2D<br />
1400 1600 1800 2400 2600 2800<br />
Raman shift (cm -1 )
Electronic proper)es<br />
1. Op)cal Absorp)on () <br />
2. Pho<strong>to</strong>luminescence () <br />
3. STS () <br />
4. XPS ( X <br />
5. (SRRC)
Pho<strong>to</strong>luminescence (PL & CL)
XPS ( X)
Other Thermal and Magne
TGA & DSC
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