IntroducTon to Nanotechnology - Academia Sinica

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IntroducTon to Nanotechnology - Academia Sinica

Introduc)on to Nanotechnology

Kuei-­‐Hsien Chen: IAMS, Academia Sinica & CCMS, NTU

Ph.D. 1989 Harvard University

Hossein hosseinkhani: GSMST, NTUST

Ph.D. Kyoto University

Chunwei Chen: MSE, NTU

Ph.D. Cambridge University

Li-­‐Chyong Chen: CCMS, NTU

Ph.D. 1989 Harvard University


Introduc)on to Nanotechnology

9/20 Introduc


Introduc)on to Nanotechnology

11/22 Midterm (Prof. Hossein)

11/29 Physical-­‐based Experimental Approaches to Nanotechnology-­‐2 (Prof. Hossein)

12/6 Silicon Nanoeletronic and Beyond (Prof. Hossein)

12/13 Nanomedicine-­‐1 (Prof. Hossein)

12/20 Nanomedicine-­‐2 (Prof. Hossein)

12/27 Nano Materials for Photovoltaic (Prof. LC Chen)

1/3 Nano Materials for Thermoelectric (Prof. LC Chen)

1/10 Looking into the Future (Prof. LC Chen)

1/17 Conclusion and Final Exam (Prof. KH Chen)


Moore’s Law


Introduc)on to Nanotechnology


Introduc)on to Nanotechnology


Introduc)on to Nanotechnology


Introduc)on to Nanotechnology


Introduc)on to Nanotechnology


Introduc)on to Nanotechnology


Modern Alchemy (I)

Thermal CVD

Plasma-­‐assisted MBE

MOCVD


Core Process Techniques at CCMS-AML

CVD

PVD

•Microwave plasma

• Electron-­‐cyclotron-­‐resonance plasma

• Thermal-­‐ and MO-­‐CVD

• Induc)vely Coupled Plasma

Gas phase reac*on, Gas-­‐solid interac*on

Forma*on kine*cs

• Magnetron spuQering

• Ion beam spuQering

• Atom-­‐ and Ion-­‐beam assisted PVD

• Molecular beam epitaxy

Hydrogen vs. H-­‐free growth environments

Film forma*on via physical route (varying K.E.) vs. chemical

route (reac*ve spuBering)

Highly energized vapor deposition/etching processes

under situations far away from equilibrium


Gas Phase Syntheses

• Evapora)on-­‐Condensa)on (Earliest methods)

• SpuQering

• Laser Abla)on

• Arc Discharge

• Aerosol Process

• Spray Pyrolysis

• Plasma Spray

atomic process in the nuclea)on of

three-­‐dimensional clusters of

deposited film atoms on a substrate

(J. S. Horowitz and J. A. Sprague, Chap. 8, Pulsed Laser Deposi


Schema


Nuclea


Selec


SEM


SEM


AFM


STM


STM


TEM


TEM (EELS)


Composi)on Analysis

1. EL

2. EDS

3. AES ()

4. NMR

5. ICP MASS (

6. MALDI Matrix-­‐assisted laser

desorp)on/ioniza)on


NMR, MRI


MALDI Matrix-­‐assisted laser

desorp)on/ioniza)on)


Structure Analysis

1. XRD (X)

2. TEM ()

3. FTIR (

4. Raman


XRD (X)


FTIR ()(


Raman )

Normalized intensity (a.u.)

D

G

H2/CH4=3

H2/CH4=5

H2/CH4=10

H2/CH4=20

H2/CH4=40

2D

1400 1600 1800 2400 2600 2800

Raman shift (cm -1 )


Electronic proper)es

1. Op)cal Absorp)on ()

2. Photoluminescence ()

3. STS ()

4. XPS ( X

5. (SRRC)


Photoluminescence (PL & CL)


XPS ( X)


Other Thermal and Magne


TGA & DSC

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