directory of the spanish nanotechnology community - Fundación ...

(Japan); Matrox (Canada); KUKA, Staubli, ABB and Fanuc; Renishaw; ZEISS and FARO, among others
Main capacities in nanotechnology/nanoscience
DATAPIXEL has its own R&D laboratory, dedicated to optical developments and experiments in the
following fields: optical chain development, artificial vision and digital image processing, 3D data
processing algorithms and metrology. This laboratory is equipped with vision systems, image
processing SW and HW and some mathematical SW modules. The company has developed the
following capacities in the area of nanotechnology:
Fiber-based confocal and interferometry based 3D point nano-sensing.
Triangulation-based 3D micro sensing.
Vision-based inline 3D diffractive micro-structure and micro-tool inspection.
Inline large-area diffractive optics micro-structure illumination sensing.
3D optical nano-sensing control.
Closed-loop in-process adaptive control.
Algorithmic for automated multi orientation, multi nano-probe 3D point cloud information
stitching and 3D point cloud nano-feature extraction and uncertainty estimation.
Main related relevant activities/projects
DATAPIXEL has participated in the following R&D projects:
1. SCALAB (EC MNT 2010-2012): This project aims at development of scalable solutions for 3D microassembly
automation of complex products in photonics with highest demands on accuracy. The solution
supports the development and optimization of automated manipulation, assembly and inspection
processes during prototype production as well as the easy transfer and scaling up for series production.
2. NanoCMM (FP6-NMP 2006-2011): The main objective was to develop a universal Coordinate
Measurement Machine that could be able to measure most of 3D geometries at micro and nano scale,
including inside holes, steeps and behind obstacles. Nano-CMM instrumentation achieved control of 3D
features in micro-part production with accuracies from 20-200 nm in large measurement volumes.
3. FLEXPAET (FP6-NMP 2008-2011): The main goal was to develop a manufacturing process to
replicate micro-structures in large area substrates, aiming at enhancing the use of LED as main source of
light, energy saving and high efficient lighting products. Flexible Patterning featuring Adaptive Embossing
Technology developed a new method to mass replicate micro-structured surfaces (below 100 microns) in
large thermoplastic substrates based on inline adaptive quality control.
4. NANOSOST (MCI 2008-2010): Development of metrology equipment for the characterization of nanoparticles
in nano-manufacturing processes for health and safety considerations.
Other information
Innovalia Metrology (www.innovalia-metrology.com/en) is a strategic alliance between UNIMETRIK,
TRIMEK and DATAPIXEL – three companies that have joined forces to offer our customers with best-inclass
metrology solutions that integrate traditional metrology with the latest technological developments
from laboratories to production lines. Our systems and solutions are designed to provide our customers
with a guarantee of measurement accuracy for parts and components that are vital to the manufacturing
process, and to enable the achievement of higher levels of productivity and efficiency in production
processes.
Directory of the Spanish Nanotechnology Community Page 16 of 148