Download self-assembled monolayers lecture
Download self-assembled monolayers lecture
Download self-assembled monolayers lecture
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
In Si(100), the anisotropic etch characteristic of a KOH was exploited for the<br />
fabrication of 35 nm wide and 30 nm deep grooves. The grating pattern was<br />
written in Octadecylthrichlorosilane (OTS) adsorbed onto hydroxilized Si(100).