UV Measurement & Process Control

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Process or Cure Window for TemperatureSensitive SubstratesStop! Over temperature limit?Caution 20% Over temperature Buffer RangeNormal Operating WindowCaution 20% Undercure Buffer RangeStop!Undercure Limit
Sample Job LogDateLine Speed DwellTimeFPMUV System: North Line Lamp: 2OtherSignatureInd.Actual.PowerWPIHourMeterIrradiance(W/cm 2 )EnergyDensity(J/cm 2 )2/1725224007800.8591.45Equipment variables• Indicated vs. actual process speedFor each UV lamp system• Hour meter• Power settings (WPI, Amps)• Irradiance (W/cm 2 )• Radiant Energy Density(J/cm 2 )• Lamp matched to chemistry• Focus/Reflector conditionOther things to consider• Date/job number• Operator signature• Mesh count• Formulation type• Pass/fail on specific QC tests-cross hatch,rub, registration• Maintenance log of system• Maintenance due date• Radiometer type/bandwidths
Page 3 and 4: Are we speaking the same (UV) langu
Page 5 and 6: Why do we measure?• Repeatability
Page 7 and 8: Who is measuring UV and what is the
Page 9 and 10: Where the UV goes-relative penetrat
Page 11 and 12: Electrical Power• Amp MeterWhat s
Page 13 and 14: What should we monitor?• Before:
Page 15 and 16: Impact of System ChangesWhat should
Page 17 and 18: What should we monitor? UV Spectral
Page 19 and 20: With 600 hours of run time would yo
Page 21 and 22: What should we monitor?Do you have
Page 23 and 24: Radiant Energy Density as a Functio
Page 25 and 26: How do we measure?Absolute Instrume
Page 27 and 28: UV Bandwidths60504030CBAV201000 100
Page 29 and 30: UV Measurement and Process Control
Page 31: Process or Cure WindowNormal Operat
Page 35 and 36: UV Formulation SpecificationsOrigin
Page 37 and 38: Why Calibrate?• Balance the amoun
Page 39 and 40: Instrument Optics: Spatial Response
Page 41 and 42: Instrument ElectronicsThreshold•
Page 43 and 44: Instrument with Low Sampling Rate &
Page 45 and 46: What ‘dialect’ of UV Watts are

UV Measurement & Process Control

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