Preliminary Program - The Society of Vacuum Coaters

› WebTech Roll to Roll Coatings for High-EndApplications› Coatings for Cleantech Energy Conversion,Storage and Related Processes› Tribological and Decorative Coating› Emerging Technologies› High Power Impulse Magnetron Sputtering› Optical CoatingPreliminaryTechnicalProgram55th 2012 SVC Annual Technical ConferenceApril 28–May 3, 2012 | Santa Clara Convention Center, Santa Clara, California USAExplore the Science and TechnologyDriving Future InnovationTechnical Program: April 30–May 3Featuring Symposia topics that are integral parts of our traditional Technical Program:“Lab to Fab” Vacuum CoatingManufacturing ProcessesNew Materials and Processes forPhotovoltaics ManufacturingTraditional sessions examine proven technologies applied to unique processes and applications:› Vacuum Processes and Coatings forBiomedical Applications› Large Area Coating› Plasma Processing› Heuréka! Post-Deadline Recent Developments› Business Topics Session› Technical Poster PresentationsTutorial Courses: April 28–May 3This year’s lineup includes new Hot Topic Tutorials designed to complement the Technical Programcontent and Exhibit. See page 16 for the 2012 Tutorial Roster ››Technology Exhibit: May 1–2Technology and business intersect in Santa Clara! This 2-day event, dedicated to vacuum coatingtechnology, offers the ideal location to meet new customers and connect with existing clients. See page 28 ››Technical Program Two-day Exhibit Tutorial Courses Networking

2012 Technical ProgramUniversity of Technology, Eindhoven, TheNetherlands11:50 a.m. PV-7 New Approaches of Controllingof Electrical and Optical Properties of DCSputtered Al Doped ZnO Thin Film for TransparentConducting OxideW. Yang and J. Joo, Kunsan National University,Kunsan, South KoreaTribological and Decorative CoatingModerators: Jolanta Klemberg-Sapieha, ÉcolePolytechnique de Montréal, Canada and KlausBewilogua, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, GermanyInvited speaker9:10 a.m. T-1 In Situ Tribometry: SheddingLight on the Tribology of Hard CoatingsR.R. Chromik and H.W. Strauss, Department ofMining and Materials Engineering, McGill University,Montréal, Canada; and S. Hassani andJ.E. Klemberg-Sapieha, École Polytechnique deMontréal, Montréal, Canada9:50 a.m. T-2 Properties of TiN Films Preparedby Oblique Angle DepositionJ.I. Jeong, J.H. Yang, J.H. Jung, H.S. Park, andM.A. Song, Hybrid Materials Research Department,Research Institute of Industrial Scienceand Technology, Pohang, Korea10:10 a.m. – 10:30 a.m. – Break10:30 a.m. T-3 Deposition of Thick a-C:H:SiCoatings for Tribological ApplicationsC. Forsich, University of Applied Sciences, Wels,Austria; D. Heim, Upper University of AppliedSciences, Wels, Austria; and T. Mueller and A.Gebeshuber, Rübig GmbH & Co KG Anlagentechnik,Wels, Austria10:50 a.m. T-4 Silicon Aluminum OxynitrideThin Films Deposited by Plasma EnhancedChemical Vapour DepositionSponsored Student PresentationO. Taggart and P. Masher, Department of EngineeringPhysics, McMaster University, Hamilton,Canada; L. Martinu, Department of EngineeringPhysics, École Polytechnique de Montréal, Montréal,Canada; J. Wojcik, Department of EngineeringPhysics, McMaster University, Hamilton,Canada; J.E. Klemberg-Sapieha, Department ofEngineering Physics, École Polytechnique deMontréal, Montréal, Canada11:10 a.m. T-5 High Performance PVD Coatingsfor Today’s and Tomorrow’s Engine PlatformsR. Jacobs, Hauzer Techno Coating BV, Venlo, TheNetherlands; T. Liskiewicz and L. Austin, Schoolof Mechanical Engineering, University of Leeds,Leeds, United Kingdom; D. Doerwald and R.Tietema, Hauzer Techno Coating BV, Venlo, TheNetherlands; A. Neville, School of MechanicalEngineering, University of Leeds, Leeds, UnitedKingdom; and T. Krug, Hauzer Techno CoatingBV, Venlo, The Netherlands11:30 a.m. T-6 Nanostructured PVD Coating forHigh Demanded ApplicationsJ.A. Araujo, Metallurgical and Materials EngineeringDepartment, University of São Paulo,São Paulo, Brazil; G.M. Araujo, MAHLE-TechnologyCenter Brazil, São Paulo, Brazil; and A.Tschiptschin, Department of Metallurgical andMaterials Engineering, São Paulo University, SãoPaulo, Brazil11:50 a.m. T-7 Modified Diamond-Like CarbonMultilayer Coatings on Metallic SubstratesProduced by Pulsed-DC Hollow Cathode PECVDSponsored Student PresentationR. Birney and F. Placido, Thin Film Centre, Universityof the West of Scotland, Paisley, UnitedKingdomPlasma ProcessingModerators: James Bradley, University ofLiverpool, United Kingdom and Jorg Patscheider,EMPA, Switzerland9:10 a.m. P-1 Effects of Cumulative SurfaceTreatment on Vacuum-Deposited CoatingAdhesionR. Wolf, Enercon Industries Corporation,Menomonee Falls, WI; C.A. Bishop, C.A. BishopConsulting Ltd, Near Loughborogh, UnitedKingdom; and I. Fletcher, Intertek MSG, Redcar,United Kingdom9:30 a.m. P-2 Influence of Deposition Parametersin PACVD-SiO 2Preparation on ResultingFilm PropertiesR. Bandorf, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, Braunschweig,Germany; I. Stasewitsch, Insitut für Oberflächentechnik,TU-Braunschweig, Braunschweig,Germany; H. Gerdes, Fraunhofer Institute forSurface Engineering and Thin Films IST, Braunschweig,Germany; and G. Bräuer, FraunhoferInstitute for Surface Engineering and Thin FilmsIST, Braunschweig, Germany and Insitut fürOberflächentechnik, TU-Braunschweig, Braunschweig,Germany9:50 a.m. P-3 Plasma-Based Chemical Modificationof Epitaxial GrapheneS.C. Hernández, M. Baraket, and E.H. Lock,Plasma Physics Division, U.S. Naval ResearchLaboratory, Washington, DC; V.D. Wheeler, L.O.Nyakiti, F.J. Bezares, R.L. Myers-Ward, C.R. EddyJr., D.K. Gaskill, and J.D. Caldwell, ElectronicsScience and Technology Division, U.S. NavalResearch Laboratory, Washington, DC; and S.G.Walton, Plasma Physics Division, U.S. NavalResearch Laboratory, Washington, DC10:10 a.m. – 10:30 a.m. – Break10:30 a.m. P-4 Magnetron Assisted PECVD Processfor Deposition of a-Si:H and µc-Si:H from aSilane-Hydrogen-Argon Gas MixtureP. Pötschick, H. Bartzsch, A. Delan, and P. Frach,Fraunhofer Institute for Electron Beam andPlasma Technology FEP, Dresden, GermanyTechnology Forum BreakfastTopics and FacilitatorsMonday, April 307:00 a.m. – 8:15 a.m.Coatings for Thin FilmPhotovoltaics – Wolfgang Diehl andVolker Sittinger, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, GermanyHigh-Power Impulse Magnetron Sputtering(HIPIMS) – Arutiun P. Ehiasarian, SheffieldHallam University, United Kingdom andRalf Bandorf, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, GermanyTransparent Conductive Oxides (TCO)for Thin Film Photovoltaics, Displays,Transparent Electronics and More – ClarkBright, 3M CompanyOptical Coating Design – H. Angus Macleod,Thin Film Center Inc.Tribological Coatings – Allan Matthews,University of Sheffield, United Kingdom andBill Sproul, Reactive Sputtering, Inc.10:50 a.m. P-5 Alternative Methods for Depositionof Superhydrophobic FluorocarbonCoatingsH. Biederman, O. Kylian, M. Petr, M. Drabik,A. Serov, O. Polonskyi, P. Solar, A. Artemenko,A. Choukourov, J. Kousal, D. Arzhakov, and D.Slavinska, Charles University in Prague, Prague,Czech Republic11:10 a.m. P-6 Nanorough Surfaces PreparedUsing Gas Aggregation Cluster SourcesSponsored Student PresentationP. Solar, O. Polonskyi, M. Petr, O. Kylian, A.Artemenko, A. Choukourov, D. Arzhakov, D.Slavinska, and H. Biederman, Charles Universityin Prague, Prague, Czech Republic11:30 a.m. P-7 High Quality Low TemperaturePlasma Deposition of Aluminum Oxide Thin FilmsSponsored Student PresentationA. Jagia, Department of Applied Physics, EindhovenUniversity of Technology, Eindhoven, TheNetherlands; M.C.M van de Sanden, Departmentof Applied Physics, Eindhoven University ofTechnology, Eindhoven, The Netherlands andOM Institute for Plasma Physics, Nieuwegein,The Netherlands; J. Michels, TNO Holst Centre,Eindhoven, The Netherlands; and M. Creatore,Department of Applied Physics, EindhovenUniversity of Technology, Eindhoven, The Netherlands11:50 a.m. P-8 Examples of Plasma Treatmentof Organic SubstancesP. Kríz, Department of Applied Physics andTechnology, University of South Bohemia,Ceské Budejovice, Czech Republic; P. Spatenka,Department of Applied Physics and Technology,505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org5

2012 Technical ProgramUniversity of South Bohemia, Ceské Budejovice,Czech Republic and Department of MaterialScience, Technical Univerzity of Liberec, Liberec,Czech Republic; J. Cerman, Department ofMaterial Science, Technical Univerzity of Liberec,Liberec, Czech Republic; M. Dienstbier, ResearchMonday Afternoon, April 30The Donald M. Mattox TutorialProgram12:50 p.m. – 1:35 p.m.See this page for detailsKeynote Presentation1:50 p.m. – 2:30 p.m.Some Implications of “Nanotech” OnTransitioning From Lab to MarketPresented by Robert Praino, ChasmTechnologies, Canton, MASee abstract and biographical sketch on page 7.Symposium on “Lab to Fab” VacuumCoating Manufacturing ProcessesModerator: Carl Lampert, Star Science2:30 p.m. L2F-1 High Throughput AtomicLayer Deposition of Al 2O 3for Ultrabarrier Encapsulationof Large Area ElectronicsJ.C.S. Kools, Encapsulix SAS, Simiane, France2:50 p.m. L2F-2 Electrical, Optical Propertiesof Indium-Tin-Oxide Films Deposited on PolyethyleneTerephthalate Substrate for CapacitiveTouch Panels6Donald M. Mattox Tutorial ProgramSociety of Vacuum Coaters » 2012 TechCon Preliminary ProgramInstitute of Brewing and Malting, Prague, CzechRepublic; B. Gavril, Technical University “Gh.Asachi”, Iasi, Romania; and B. Será, Instituteof Nanobiology and Structural Biology GCRC,Academy of Sciences of the Czech Republic,Ceské Budejovice, Czech RepublicMonday Afternoon, April 3012:50 p.m.– 1:35 p.m.Emerging Trends in Solid State LightingPresented by Julian Carey, Intematix, Freemont, CAThis talk will focus on the emerging trends in the solid state lighting industryand the growing demand for efficient high quality lighting solutions. Also discussedwill be how innovative phosphor and remote phosphor materials areimproving LED lighting designs as more manufacturers begin to develop LEDlighting solutions to replace incandescent bulbs and fixtures used in generallighting applications. This presentation will include a discussion on lightingsystem efficacy comparisons between a white LED system and a remotephosphor system using a blue LED to improve light quality. Additionally, thisdiscussion will highlight how these latest innovations in LED lighting technology have risen to thechallenge to make light bulbs, fixtures, TVs and displays brighter and more efficient.Julian Carey is marketing director at Intematix, a leading innovator of patented phosphors and phosphor componentsfor high-quality LED lighting. Prior to joining Intematix, Julian directed product management and corporatebranding for Prysm, a maker of Laser Phosphor Displays. In the lighting area, Julian was VP of Marketing at LUXIMwhere he launched plasma lighting products for OEMs in consumer TV, commercial display and general lightingapplications. Previously, he served as product marketing manager at Philips Lumileds Lighting where he led thecommercialization of their LED product family into diverse markets including cell phone camera flash, printing andimaging, signage and general lighting. Prior to Philips, Julian held product design and process engineering rolesdeveloping the first family of power LEDs and systems at the Optoelectronics Division of Hewlett-Packard. He holds aBS degree in mechanical engineering from Stanford University and an MBA from MIT Sloan.D.-H. Kim, Toray Advanced Materials Korea Inc.,Seoul, South Korea; J.-Y. Park, Toray AdvancedMaterials Korea Inc., Gumi, South Korea; and H.-S. Jeon and Y.-S. Kim, Toray Advanced MaterialsKorea Inc., Seoul, South Korea3:10 p.m. L2F-3 Compact Vacuum Web CoatingSystem for R&DH. Tamagaki and T. Segawa, Kobe Steel, Ltd.,Takasago, Japan3:30 p.m. – 3:50 p.m. - BreakInvited speakerContributed by the Emerging Technologies TAC3:50 p.m. L2F-4 Depositing Copper onFlexible Polymers with the Help of a Nano-CoatingA.N. Beavers, Jr., SRI International, Menlo Park, CA4:30 p.m. L2F-5 Innovative Automated WebInspection Systems - Vision Beyond DefectDetection in Vacuum Coating ManufacturingProcessesJ. Koenig, Schenk Vision, Woodbury, MNInvited speakerContributed by the Optical Coating TAC4:50 p.m. L2F-6 Recent Advances in MultilayerPolymeric Interference ReflectorsM.F. Weber, 3M Company, St. Paul, MNLarge Area CoatingModerator: Michael Andreasen, Vacuum EdgeInvited speaker2:30 p.m. L-1 Advanced Transparent Contactsfor Photovoltaic and Other ApplicationsT.M. Barnes, J. Burst, J.L. Blackburn, and T.Gessert, National Renewable Energy Laboratory,Golden, CO3:10 p.m. L-2 Recent Developments ofTiO 2:Nb Sputtered with High Deposition Ratesfrom a Rotatable Magnetron SystemM. Junghähnel and F. Fietzke, Fraunhofer Institutefor Electron Beam and Plasma TechnologyFEP, Dresden, Germany; and M. Vinnichenkoand S. Cornelius, Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany3:30 p.m. – 3:50 p.m. - Break3:50 p.m. L-3 ITO 97/3 Coatings as TransparentContact for Heterojunction C-Si Solar CellsP. Lippens and M. Büchel, UMICORE Thin FilmsProducts, Balzers, Principality of Liechtenstein;and C. Szepesi and J. Fargo, UMICORE Thin FilmProducts USA, Providence, RI4:10 p.m. L-4 Structural and ElectricalProperties of Highly Transparent ConductiveGa-Doped ZnO Films by Magnetron SputteringK. Nagamoto, T. Hara, and T. Kondo, ResearchCenter, LINTEC Corporation, Saitama, Japan;and K. Ishi, Utsunomiya University, Tochigi,Japan4:30 p.m. L-5 Large Area PECVD CoatingsCombined In-Line with SputteringW. Seaman and J. Madocks, General Plasma,Tucson, Arizona4:50 p.m. L-6 In-Line Hot-Wire ChemicalVapor Deposition of Silicon-Based CoatingsL. Schaefer, T. Harig, M. Hoefer, and A. Laukart,Fraunhofer Institute for Surface Engineeringand Thin Films IST, Braunschweig, Germany; D.Borchert and S. Keipert-Colberg, FraunhoferInstitute for Solar Energy Systems ISE, Gelsenkirchen,Germany; and J. Trube, Leybold Optics,Alzenau, Germany5:10 p.m. L-7 Plasma-Activated Electron BeamPhysical Vapor Deposition - Novel Technologiesand ToolsG. Mattausch, B. Scheffel, C. Metzner, and F.-H.Roegner, Fraunhofer Insitute for Electron Beamand Plasma Technology FEP, Dresden, GermanyHigh Power Impulse MagnetronSputtering - HIPIMSModerator: Ralf Bandorf, Fraunhofer Institutefor Surface Engineering and Thin Films IST,GermanyInvited speaker2:30 p.m. HP-1 Hard Coatings for AdvancedCutting Tool Applications Produced byHiPIMS-Technology

2012 Technical ProgramO. Lemmer, C. Schiffers, S. Bolz, and W. Kölker,CemeCon AG, Würselen, Germany; and G.Greczynski and L. Hultman, Department ofPhysics, Linköping University, Linköping,Finland3:10 p.m. HP-2 Effect of the Degree of HIPIMSUtilisation on the Properties of TiN FilmsP.Eh. Hovsepian, A.A. Sugumaran, Y. Purandare,and A.P. Ehiasarian, Sheffield Hallam University,Sheffield, United Kingdom3:30 p.m. – 3:50 p.m. - Break3:50 p.m. HP-3 Reactive HIPIMS Sputter Depositionof Alumina from Industrial Size RotatablesH. Gerdes, R. Bandorf, and G. Bräuer, FraunhoferInstitute for Surface Engineering and Thin FilmsIST, Braunschweig, Germany4:10 p.m. HP-4 Pulse Magnetron Sputteringwith High Power Density - Process and FilmPropertiesP. Frach, C. Gottfried, F. Fietzke, H. Klostermann,H. Bartzsch, and D. Glöß, Fraunhofer Institutefor Electron Beam and Plasma Technology FEP,Dresden, Germany4:30 p.m. HP-5 Modeling of High PowerImpulse Magnetron Sputtering of CopperSponsored Student PresentationT. Kozák, Department of Physics, University ofWest Bohemia, Plzen, Czech Republic4:50 p.m. HP-6 Azimuthal Ion Spin in HiPIMSDischargesJ.W. Bradley, P. Poolcharuansin, and B. Liebig,Department of Electrical Engineering andElectronics, University of Liverpool, Liverpool,United Kingdom5:10 p.m. HP-7 Inductively Coupled ImpulseSputtering (ICIS): A Novel Technique for IonisedPVDA.P. Ehiasarian and D.A.L. Loch, HIPIMS TechnologyCentre, Sheffield Hallam University, Sheffield,United KingdomEmerging TechnologiesModerators: Chris Stoessel, Southwall Technologiesand Clark Bright, 3M Company2:30 p.m. E-1 Transfer Print of Single LayerGraphene to PolymersE.H. Lock and S.C. Hernández, Plasma PhysicsDivision, U.S. Naval Research Laboratory,Washington, DC; M. Laskoski, S. Mulvaney, V.D.Wheeler, and W.K. Lee, Chemistry Division, U.S.Naval Research Laboratory, Washington, DC; T.Anderson, F.J. Bezares, F.J. Kulb, J.D. Caldwell,and K.D. Hobart, Electronics Division, U.S. NavalResearch Laboratory, Washington, DC; P.E. Sheehan,Chemistry Division, U.S. Naval ResearchLaboratory, Washington, DC; B.N. Feygelson,L.O. Nyakiti, R.L. Myers-Ward, C.R. Eddy Jr., andD.K. Gaskill, Electronics Division, U.S. Naval ResearchLaboratory, Washington, DC; S.G. Walton,Plasma Physics Division, U.S. Naval ResearchLaboratory, Washington, DCKeynote SpeakerSymposium on “Lab to Fab” Vacuum Coating Manufacturing ProcessesMonday Afternoon, April 30 at 1:50 p.m. – 2:30 p.m.Some Implications of “Nanotech” On Transitioning From Lab to MarketPresented by Robert F. Praino, Jr., Co-Founder Chasm Technologies, Inc.,Canton, MAFrequent reference is made to the “valley of death” and “bridging the gap” forboth new companies and existing ones. In the case of the new company, i.e.a startup less than five years old, there are unique barriers that must be overcome.It turns out that size matters relative to materials processing, evaluation,and understanding, and the “age of nanotechnology” has unanticipated effects.The ability to rapidly develop and deliver a product to paying customersis a dominant driver for a young organization. For a new technology platform, a new material, or“disruptive” device, the tension can be exacerbated between technology validation/acceptance andthe need to break into existing supply chains or market arenas. This talk will explore some of theencounters experienced by startups within the nanotech space. Although a traditional “stage-gate”development framework can be effective as a means to manage the development process, certainmodifications and adjustments can facilitate greater success. Early integration of strategy and tacticscan help to make the journey easier.Mr. Praino has 35 years of experience developing and manufacturing products utilizing film coating processes. Hiscareer path prior to Chasm includes assignments at Stone & Webster Engineering, Polaroid Corporation, Presstek, VitexSystems, and Precision Lithograining. Bob has a BS and MS in Chemical Engineering from Worcester PolytechnicInstitute and MBA from Boston University. He co-founded Chasm in March 2005 to apply his experience in coatedfilm products and associated science and engineering to develop commercially viable pathways to product applicationsbeginning with a wide range of “nano-materials” and “nano-technologies”. The applications for these technicalareas have included flat panel displays, fuel cells, photovoltaics, film substrate development, optical film development,carbon nanotube applications, life sciences, and nano-imprint lithography. In addition to the process work inthese areas, Chasm has designed and managed capital equipment projects totaling over $10 million for roll-to-rollcoating lines and nano-material manufacturing facilities.2:50 p.m. E-2 Large Area PECVD Process UsingDual Rotatable MagnetronsM. Fahland, J. Neidhardt, R. Thielsch, A. Wahl,R. Kleinhempel, R. Bluethner, and T. Preussner,Fraunhofer Institute for Electron Beam andPlasma Technology FEP, Dresden, Germany3:10 p.m. E-3 “Save Art” Treatment: New Improvementsin Removable-Protective Coatingsfor Metallic Archaeological FindsC. Misiano, P. Matarazzo and M. Pezzilli, RomanaFilm Sottili, Anzio Italy; E. Bemporad and L.Mazzola, University of Roma 3, Rome, Italy; andE. Angelini and S. Grassini, Politecnico di Torino,Torino, Italy3:30 p.m. – 3:50 p.m. - BreakInvited speaker3:50 p.m. E-4 Advances in Roll to Roll AtomicLayer DepositionE.R. Dickey, Lotus Applied Technology,Hillsboro, OR4:30 p.m. E-5 Water Vapor Transmission Ratesfor Ultrabarriers on Polymers Grown UsingAtomic Layer DepositionJ.A. Bertrand and S.M. George, Departments ofChemistry and Chemical Engineering, Universityof Colorado, Boulder, CO4:50 p.m. E-6 New Design and Operation ofPhoton Energy Source for the Low TemperatureAtomic Layer Deposition Process; Deposition ofTiO 2on Polymer SubstratesT.O. Kääriäinen, M.-L. Kääriäinen and D.C.Cameron, ASTRaL, Lappeenranta University ofTechnology, Mikkeli, Finland5:10 p.m. E-7 Flexible Phosphorescent OLEDLighting Devices Encapsulated with a NovelThin Film BarrierP. Mandlik, J. Silvernail, K. Rajan, P. Levermore,H. Pang, E. Krall, R. Ma, and J.J. Brown, UniversalDisplay Corporation, Ewing, NJMonday Evening, April 30Heuréka! Post Deadline RecentDevelopments Session6:00 p.m.Moderators: Hana Baránková and LadislavBárdos, Uppsala University, SwedenSVC will continue to accept abstracts for theHeuréka! Session through March 2, 2012Designing and Building a R&D Vacuum CoatingTool from Standard Catalog ComponentsJ. Moore, MDC Vacuum Products, LLC.,Hayward, CAA Self Cleaning Continuous Process FilmThickness Monitor for OLED, CIGS and OrganicCompound Vacuum DepositionsS. Grimshaw, Colnatec, Gilbert, AZ505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org7

2012 Technical Program9:50 a.m. P-10 Discharge Behavior andDeposition of DLC Film in High Power PulsedMagnetron Discharge ConfigurationX. Tian, Z. Wu, G. Gui, C. Gong, and S. Yang,State Key Laboratory of Advanced Welding andJoining, Harbin Institute of Technology, Harbin,China; and P.K. Chu, Department of Physics andMaterials Science, City University of Hong Kong,Hong Kong, China10:10 a.m. – 10:30 a.m. – BreakPlasma Processing10:30 a.m. P-11 2-D Spatial Maps of NegativeIon Densities and Temperatures in Oxygen/ArgonMagnetron PlasmasSponsored Student PresentationS.C. Scribbins and J.W. Bradley, Department ofElectrical Engineering and Electronics, Universityof Liverpool, Liverpool, United Kingdom10:50 a.m. P-12 Complex Characterization ofGliding Arc Discharge for Advance OxidationProcessesP. Spatenka, Department of Applied Physicsand Technology, University of South Bohemia,Ceské Budejovice, Czech Republic, Departmentof Material Science, Technical University of Liberec,Liberec, Czech Republic and SurfaceTreatInc., Turnov, Czech Republic; P. Kríz, Departmentof Applied Physics and Technology, Universityof South Bohemia, Ceské Budejovice, CzechRepublic; J. Cerman, Department of MaterialScience, Technical University of Liberec, Liberec,Czech Republic and SurfaceTreat Inc., Turnov,Czech Republic; J. Sláma, Czech TechnicalUniversity in Prague, Praha, Czech Republic;P. Barto, Department of Applied Physics andTechnology, University of South Bohemia,Ceské Budejovice, Czech Republic; and J. Píchal,Czech Technical University in Prague, Praha,Czech RepublicInvited speaker11:10 a.m. P-13 The Multiple Resonance Probe:A Novel Device for Industry Compatible PlasmaDiagnosticsR.P. Brinkmann, Theoretical Electrical Engineering,Ruhr University Bochum, Bochum,Germany11:50 a.m. P-14 Frequency Probe Measurementsof Electron Density, Plasma Potential,and Electron Energy Distribution in ProcessingPlasmasD.R. Boris, S.G. Walton, and R.F. Fernsler, PlasmaPhysics Division, U.S. Naval Research Laboratory,Washington, DCTribological and DecorativeCoatingModerators: Papken Hovsepian, Sheffield HallamUniversity, United Kingdom and ChristophLeyens, Technische Universität Dresden, Germany8:30 a.m. T-8 Engineering the DLC Coating/Lubricant Interface: Optimization for EffectiveSeventh Annual 5K Fun Run and WalkTo Benefit the SVC Foundation Scholarship ProgramJoin friends and colleagues on this out and back coursethat follows the paved trail near the Hyatt Regency SantaClara, Tuesday morning, May 1, 2012 at 6:00 a.m.The registration fee of $25 includes a T-shirt (the fee isnot tax-deductible). All proceeds benefit the SVC Foundation,which awards scholarships to students working inthe field of vacuum coating technology.Sponsorship opportunities are also available for this fundraisingevent. Contact Wolfgang Decker at w.decker@vastfilm.comFriction and Wear ReductionA. Neville, A. Morina, L. Austin, and T. Liskiewicz,School of Mechanical Engineering, University ofLeeds, United Kingdom; and R. Tietema, HauzerTechno Coating BV, Venlo, The Netherlands8:50 a.m. T-9 How Contaminants Affect theQuality of PVD Coatings and their Affect onProcess ParametersZ. Wang and M. Akkaoui, Tanury Industries,Lincoln, RIInvited speaker9:10 a.m. T-10 Nanostructured Carbon andTiN Based Coatings Deposited by FilteredVacuum-Arc Apparatus in NSC KIPT, UkraineI.I. Aksenov, V.A. Belous, and V.E. Strel’nitskij,National Science Center, Kharkov Institute ofPhysics and Technology, Kharkov, Ukraine9:50 a.m. T-11 Multicomponent Depositionby a Magnetron with a Non-EquipotentialCathodeV.V. Zhurin, Colorado Advanced TechnologyLLC, Fort Collins, CO; and P.A. Tsygankov andN.G. Elistratov, Bauman State Technical University,Moscow, Russian Federation10:10 a.m. – 10:30 a.m. – Break10:30 a.m. T-12 Pulsed Laser Ablation of ReparableErosion-Resistant Coatings for AerospaceSponsored Student PresentationA. Ragusich, J.E. Klemberg-Sapieha, and L.Martinu, École Polytechnique de Montréal,Montréal, Canada10:50 a.m. T-13 Tuning Colors In ProtectiveMetal Nitride Coatings by the Control ofAbsorption/Interference EffectsM. Panjan, Jozef Stefan Institute, Ljubljana,Slovenia and École Polytechnique de Montréal,Montréal, Canada; M. Cekada and P. Panjan,Jozef Stefan Institute, Ljubljana, Slovenia; M.Klanjsek Gunde, National Institute of Chemistry,Ljubljana, Slovenia; and R. Vernhes andL. Martinu, École Polytechnique de Montréal,Montréal, Canada11:10 a.m. T-14 Tribological Behaviour of HeatTreated Tungsten Doped Diamond-Like CarbonCoating at High TemperaturesSponsored Student PresentationA. Abou Gharam, Mechanical Automotive andMaterials Department, University of Windsor,Windsor, Canada; M.J. Lukitsch, Materials andProcesses Laboratory, General Motors R&DCenter, Warren, MI; and A.T. Alpas, MechanicalAutomotive and Materials Department, Universityof Windsor, Windsor, Canada11:30 a.m. T-15 Corrosion Behavior of DuplexPVD Coatings in Comparison to Duplex CoatingsBased on Electroplated Base Coatings andPVD Top CoatingsM.V. Ravichandran, Ionbond USA, Greenborough,NC; F. Derangere, Ionbond France,Paris, France; and T. Hurkmans, Ionbond USA,Madison Heights, MI11:50 a.m. T-16 Optimisation of CoatingMechanical Properties by Simulation Based onExperimental DataB. Zhou, N. Randall, and D. Griffin, CSM Instruments,Needham, MAEmerging TechnologiesModerators: Chris Stoessel, SouthwallTechnologies and Clark Bright, 3M CompanyInvited speaker8:30 a.m. E-8 Metalcones: Hybrid Organic-Inorganic Films Fabricated Using Atomic andMolecular Layer Deposition TechniquesS.M. George, B. Lee, B. Yoon, A.I. Abdulagatov,and R.A. Hall, Departments of Chemistry andChemical Engineering, University of Colorado,Boulder, CO9:10 a.m. E-9 Functional NanoparticleCoatingsA.H. Kean, S. Saranu, V. Broadley, G. Vatougiaand L. Allers, Mantis Deposition Ltd., Thame,United Kingdom9:30 a.m. E-10 Vacuum Deposition of ConjugatedPolymers for Organic PhotovoltaicsSponsored Student PresentationP. Kovacik, H.E. Assender and A.A.R. Watt,Department of Materials, University of Oxford,Oxford, United Kingdom505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org9

2012 Technical Program9:50 a.m. E-11 Synthesis of Solar-ActivatedMaterials for the Controlled Release of VolatileCompoundsC.J. Tavares, L.F. Oliveira, and J.F. Marques, Centreof Physics, University of Minho, Guimaraes,Portugal; and P. Parpot, Centre of Chemistry,University of Minho, Braga, Portugal10:10 a.m. – 10:30 a.m. – BreakLarge Area CoatingModerator: Johannes Strümpfel, VON AR-DENNE, Germany10:30 a.m. L-8 Hardware and Technology forModern Glass CoatingC. Koeckert, VON ARDENNE AnlagentechnikGmbH, Dresden, Germany10:50 a.m. L-9 Solid State Laser Inspection ofLarge Area CoatingsT. Potts, Dark Field Technologies, Inc.,Orange, CT11:10 a.m L-10 Characterization of OrganicLight Emitting Diode Devices by SpectroscopicEllipsometryK. Uppireddi and L. Yan, Horiba Scientific,Edison, NJ11:30 a.m. L-11 Advances in Power Supplies forHigh Arc Rate ApplicationsD.J. Christie, S. Kovacevic, F.G. Tomasel, and H.Walde, Advanced Energy Industries, Inc., FortCollins, CO11:50 a.m. L-12 Next Generation of Mid-Frequency Power Supplies for Plasma ApplicationsP. Wiedemuth, R. Merte, and U. Richter,HÜTTINGER Elektronik GmbH, Freiburg,GermanyTuesday Afternoon, May 1SVC Exhibit Opens!12:00 p.m. – 6:00 p.m.Don’t Miss the Only Exhibit Dedicated toVacuum Coating TechnologiesSVC Exhibit Cash Lunch and“Beerposium” –it’s 5 o’clock somewhere12:00 p.m. – 1:30 p.m.“Meet the Experts” Corner1:15 p.m. – 2:15 p.m.Tim Gessert, National Renewable EnergyLaboratoryTopic: Polycrystalline Thin-Film PhotovoltaicsExecutive Forum: Road Mappingof Future Thin Film Products12:30 p.m. – 1:30 p.m.Forum Moderators: Carl Lampert, Star Scienceand Paula Mints, NavigantCo-Organizers: Michael Andreasen, VacuumEdge, and Ric Shimshock, MLD Technologies LLCForum Speakers:Michael Lebby, General Manager and ChiefTechnology Officer, Translucent Inc.,Palo Alto, CA“Driving ‘On-Silicon’ Solutions in LED Lighting,Power Electronics, and Solar CPV Cells UsingGaN-on-Si and Ge-on-Si Large Format SiliconWafers”Bettina Weiss, Executive Director, PV Group,SEMI, San Jose, CA“What a Difference a Year Makes – The Global PVIndustry in a Changing Global Environment”Plasma ProcessingModerator: David Boris, U.S. Naval ResearchLaboratoryInvited speaker1:30 p.m. P-15 Plasma Processing SystemDesign Using Plasma and ElectromagneticModelingS. Rauf, J. Kenney, A. Agarwal, K. Bera, A.Balakrishna, and K. Collins, Applied Materials,Inc., Sunnyvale, CA2:10 p.m. P-16 3D Numerical Study of DifferentMagnet Systems to Reduce Cross CornerEffect in Rectangular Magnetron SputteringK. Lacis, Sidrabe Inc., Riga, Latvia; M. Sarma,University of Latvia, Riga, Latvia; and M. Mishels-Piesins and V. Kozlovs, Sidrabe Inc., Riga, Latvia2:30 p.m. P-17 Plasma Generation by InductiveCoupling with a Resonant Planar AntennaP. Guittienne, Helyssen, Belmont-sur-Lausanne,Switzerland; P. Fayet, TetraPack, Romont,Switzerland; and S. Lecoultre, A. Holling, and C.Hollenstein, École Polytechnique Federale deLausanne (EPFL), Lausanne, Switzerland2:50 p.m. P-18 Hydrogenated Diamond-LikeCarbon Deposition by Using an Anode LayerType Linear Ion SourceJ.-K. Kim and S. Lee, Korea Institute of MaterialsScience, Changwon, Korea; K.-H. Nam and T.-Y.Kim, POSCO Technology Research Laboratory,Gwangyang-si, Korea; and D.-G. Kim, Korea Instituteof Materials Science, Changwon, Korea3:10 p.m. P-19 Self Contained Plasma Sourcefor Remote and Projected Plasma GenerationD. Carter, D. Hoffman, R. Grilley, and K. Peterson,Advanced Energy Industries Inc., Fort Collins, CO3:30 p.m. P-20 In Vacuum Plasma CleaningSources of Non-Electrically Conductive SubstratesD. Monaghan, R. Brown, V. Bellido-Gonzalez,and M. Audronis, Gencoa Ltd, Liverpool, UnitedKingdom; and S. Williams, Gencoa USA, SanFrancisco, CAPoster Presentations3:30 p.m. – 6:00 p.m. in the Exhibit HallSVC will continue to accept abstracts for thePoster Session through March 2, 2012 forpublication in the Final ProgramPoster-1 Nano-Structured Amphiphilic PlasmaPolymers for Tuning the Adhesion of CellsI. Gordeev, D. Arzhakov, P. Solar, A. Serov,A. Artemenko, and O. Polonskyi, Faculty ofMathematics and Physics, Charles Universityin Prague, Prague, Czech Republic; J. Ponti,Institute for Health and Consumer Protection,European Commission, Joint Research Centre,Ispra, Italy; J. Kousal, O. Kylian, A. Choukourov,D. Slavinska and H. Biederman, Faculty ofMathematics and Physics, Charles University inPrague, Prague, Czech RepublicPoster-4 Cylindrical Magnetrons Sputter Depositionof Ti-Si-C-N Nanocomposite Coatings onInner Surface of CylindersR. Wei and E. Langa, Southwest Research Institute,San Antonio, TXPoster-5 Choosing the Right Flow Meter forYour ApplicationN. Glover, Brooks Instrument, LLC, Snellville, GAPoster-6 Reduction of Particle Contaminationby Handling and Plasma Pretreatment forDefect Sensitive CoatingsR. Bandorf and G. Bräuer, Fraunhofer Institutefor Surface Engineering and Thin Films IST,Braunschweig, GermanyPoster-7 Deposition of Piezoresistive Films forStrain Gauge Application Using an IndustrialHigh-Rate In-Line Sputtering SystemR. Bandorf, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, Braunschweig,Germany; M. Petersen, Institut für Oberflächentechnik,Technische Universität Braunschweig,Braunschweig, Germany; and U. Heckmann,and G. Bräuer, Fraunhofer Institute for SurfaceEngineering and Thin Films IST, Braunschweig,GermanyPoster-8 Accurate Reflectance and TransmittanceMeasurements for Optical CoatingsR.R. Willey, Willey Optical, Consultants, Charlevoix,MIPoster-9 Hall-Current Ion Sources Basic ParametersImprovement and ExpansionV.V. Zhurin, Colorado Advanced TechnologyLLC, Fort Collins, CO; and M.Choi, VAC-TEC Co.,Kyonggi-Do, KoreaPoster-10 Plasma Assisted Reactive MagnetronSputtering of Demanding Interference Filters10Society of Vacuum Coaters » 2012 TechCon Preliminary Program

2012 Technical Programand T. Krug, Hauzer Techno Coating BV, Venlo,Netherlands9:30 a.m. T-19 Tribological Behavior of MetalAlloyed DLC Coatings in Dry and LubricatedConditionsM. Evaristo, SEG-CEMUC - Department ofMechanical Engineering, University of Coimbra,Coimbra, Portugal; T. Polcar, National Centrefor Advanced Tribology (nCATS), University ofSouthampton, Southampton, United Kingdom;and A. Cavaleiro, SEG-CEMUC - Department ofMechanical Engineering, University of Coimbra,Coimbra, Portugal9:50 a.m. T-20 Effect of the Substrate Bias onthe Mechanical Properties of Boron Carbide(BC) Deposited Using the Medium FrequencyMagnetron Sputtering TechniqueW. Tillmann and F. Hoffmann, Institute of MaterialsEngineering, Technische Universität Dortmund,Dortmund, Germany; and G. Bejarano,Institute of Materials Engineering, TechnischeUniversität Dortmund, Dortmund, Germany andDepartment of Materials Engineering, Universidadde Antioquia, Medellín, Colombia10:10 a.m. – 10:30 a.m. – BreakSVC Exhibit Opens!10:00 a.m. – 5:00 p.m.Symposium on New Materials and Processesfor Photovoltaics ManufacturingModerators: Bettina Weiss, SEMI and CarlLampert, Star Science10:30 a.m. PV-11 Deposition of Nb-DopedTiO 2Films on Large Area by Co-Sputtering withPrecise Process ControlWednesday at a GlanceMorningTAC Breakfast Meetings7:00 a.m. – 8:15 a.m.Technical Sessions• Tribological and Decorative Coating• Symposium on New Materials and Processes forPhotovoltaics Manufacturing• Joint Session: WebTech Roll to Roll Coatings forHigh Tech Applications/Large Area Coating• Optical Coating• Coatings for Cleantech Energy Conversion,Storage and Related Processes• Vacuum Processes and Coatings for BiomedicalApplicationsEducation ProgramFull Day Tutorials 8:30 a.m. – 4:30 p.m.• Troubleshooting for Thin Film DepositionProcesses• Practical Aspects of Vacuum Technology:F. Fietzke and M. Junghähnel, Fraunhofer Institutefor Electron Beam and Plasma TechnologyFEP, Dresden, Germany10:50 a.m. PV-12 A Study of MoO 2Doped SnO 2Transparent and Conductive Thin FilmsS. Sun and P. Kumar, H.C. Starck, Inc., Newton, MA11:10 a.m. PV-13 High Vacuum Selenium Evaporationfor Industrial Production of CIGS Solar CellsD. Gross, S. Stille, and G. Grabosch, Leybold OpticsGmbH, Alzenau, Germany; T. Huault and J.-L.Guyaux, Riber S.A., Paris, FranceInvited speakerContributed by the Coatings for Cleantech EnergyConversion, Storage and Related Processes TAC11:30 a.m. PV-14 An Overview of the Market forPV TechnologiesP. Mints, Navigant, Palo Alto, CAJoint Session: WebTech Roll to RollCoatings for High Tech Applications/Large Area CoatingOperation and Maintenance of ProductionVacuum Systems• Ion Beam Processing Technology• Practice of Reactive SputteringExhibit• Exhibit Opens at 10:00 a.m.AfternoonTechnical Sessions• Donald M. Mattox Tutorial 12:30 p.m. – 1:10 p.m.• Optical CoatingSpecial Events• “Meet the Experts” Corner 1:15 p.m. – 2:15 p.m.• “Meet the Experts” Corner 2:15 p.m. –3:15 p.m.Exhibit• Exhibit 10:00 a.m. – 5:00 p.m.• Beer Blast 3:30 p.m. – 5:00 p.m.Moderators: Michael Andreasen, Vacuum Edgeand John Fahlteich, Fraunhofer Institute for ElectronBeam and Plasma Technology FEP, Germany8:30 a.m. W-1 Roll-to-Roll Manufacturing ofNext Generation Display DevicesN.A. Morrison, T. Stolley, U. Hermanns, U. Kroemer,T. Deppisch, H.G. Lotz and A. Reus, AppliedMaterials GmbH & Co. KG, Alzenau, Germany; andD.K. Yim, Applied Materials, Santa Clara, CA8:50 a.m. W-2 Control and Quantification ofTexture in Tantalum Sputtering TargetsP. Hogan, C. Michaluk, and D. Bozkaya, H.C.Starck, Inc., Newton, MA9:10 a.m. W-3 Functional and Decorative Coatingsonto Metal Strips Deposited by Plasma-ActivatedHigh-Rate Electron Beam Physical VapourDeposition (EBPVD)C. Metzner, B. Scheffel, H. Morgner, and F. Händel,Fraunhofer Institute for Electron Beam andPlasma Technology FEP, Dresden, GermanyInvited speaker9:30 a.m. W-4 Printing Low-Cost OrganicSolar CellsV. Shrotriya, Solarmer Energy Inc., El Monte, CA10:10 a.m. – 10:30 a.m. – Break10:30 a.m. W-5 Novel Coatings for Steel Stripvia Sputtering TechniquesJ. Davies, Materials Research Department,Swansea University, Baglan, United Kingdom;and S. Louch, Materials Research Department,Swansea University, Baglan, United Kingdom;and J. Sullivan and C. Weirman, Tata Steel ColorsLtd., Baglan, United Kingdom10:50 a.m. W-6 ITO Films on Ultra-Slim FlexibleGlass SubstratesL. Tian, S. Garner, D. Enicks, P. Sachenik, L. Simpson,H. Russell, B. Cheney, J. Zhang, J. Lin, C. Kuo,and A.H. Chaturvedi, Corning Inc., Corning, NY11:10 a.m. W-7 The Role of Plasma Gas Compositionin Optimized Roll-to-Roll Atomic LayerDeposition of Ultra Barrier FilmsW. Barrow and E. Dickey, Lotus Applied Technology,Hillsboro, OR11:30 a.m. W-8 Recent Developments in Rollto-RollALD TechnologyT. Alasaarela and M. Söderlund, Beneq Oy,Vantaa, Finland11:50 a.m. W-9 Interface Investigation of StructuresConsisting of Conductive Metallic ThinFilms Deposited on High Density Polyethyleneand Styrene Butadiene Copolymer SubstratesReinforced with Vapor Grown Carbon Nanofibersfor Electromagnetic Interference ShieldingEffectiveness ImprovementH. Garcia, R. Suarez, D. Mihut, and K. Lozano,Department of Mechanical Engineering, TheUniversity of Texas Pan American, Edinburg, TXOptical CoatingModerators: George Dobrowolski, NationalResearch Council of Canada (retired) and RobertSargent, JDSU8:30 a.m. O-1 Thin LayersA. Macleod and C. Clark, Thin Film Center Inc.,Tuscon, AZ8:50 a.m. O-2 Analysis of Optical MonitoringStrategies for Narrow Bandpass Filters bySoftware SimulationR.R. Willey, Willey Optical, Consultants, Charlevoix,MI; and S. Hicks and M. Biagi, IntellemetricsGlobal Ltd., Paisley, United Kingdom9:10 a.m. O-3 Constrained Optimization as aTool for Choosing Manufacturable DesignsA. Tikhonravov and M. Trubetskov, ResearchComputing Center, Moscow State University;12Society of Vacuum Coaters » 2012 TechCon Preliminary Program

2012 Technical ProgramDonald M. Mattox Tutorial ProgramWednesday Afternoon, May 212:30 p.m. – 1:10 p.m.Vacuum-Arc Surface Modification and Coating Deposition Methods in KIPT,Ukraine (Historical Review)Presented by Vladimir Strel’nitskij, National Science Center, Kharkov Instituteof Physics and Technology, Kharkov, UkraineThis short historical sketch presents the invention of new technology inprotective wear-resistant coatings deposition and surface modification bya vacuum-arc method at the Kharkov Institute of Physics and Technology(KIPT), and the development of the work in this direction in the former USSRand in CIS. The experience of the KIPT experts is used by other institutions ofUkraine, Russia and other countries in the creation of new specialized installationsfor vacuum-arc coating deposition and surface modification. Long-termresearches and developments in KIPT are carried out in the following directions:- Methods of formation and control of the metal plasma streams generated by the cathode spots ofan arc in vacuum and low-pressure gas medium- Processes in interelectrode plasma, methods of discharge ignition and stabilization in technologicalplasma sources; physics and technology of formation of plasma streams with preselected parameters- The mechanisms underlying processes of formation of the functional coatings from metals,their compounds of type of nitrides, oxides, carbides and their combinations- Research of synthesis of micro- and nanostructured composite and multilayer coatings- Extensive experimental and theoretical research on physics and technology of vacuum-arcsynthesis of thin and ultrathin films of diamond-like carbon, with an attainment of commercialuse of the diamond-like coatings deposition methods created- Vacuum-arc processes for the surface protection of uranium and other materials of nuclear powerfrom atmospheric and hydride corrosion- Methods of duplex surface ion-plasma treatment of materials (nitriding + deposition, plasmaimmersion ion implantation + deposition)Vladimir Evgeniyevich Strel’nitskij is a noted scientist in the field of physics and technology of diamond like carbon(DLC) films synthesis. He graduated from Kharkov State University (Ukraine) in 1970. After military service in the SovietArmy (1970-1972) he worked in the National Science Centre “Kharkov Institute of Physics and Technology” (NSCKIPT) since 1972 until now. He received the Candidate (PhD) and Doctor Science degrees in physics and mathematicsfrom Kharkov State University in 1980 and 2003, respectively. At present Dr. Strel’nitskij acts as the head of the SuperhardCarbon Films Laboratory. He is the author of a series of pioneer works on vacuum arc synthesis of diamond-likecarbon films. He is coauthor of the new theoretical model of growth of superhard nanocomposite materials includingDLC. The new setups equipped with filtered vacuum-arc plasma sources for deposition of DLC and compositenanostructured TiN based films were developed and applied in industry under his direction. He is the Laureate of theUSSR State Prize for service in physics and technology for 1987. Dr. Strel’nitskij is author and coauthor more than 200science published works and patents.T. Copp, K. Lewis, B. Shogrin, K. Smith, and J.Sokol, Ball Aerospace and Technologies Corp.,Boulder, CO; J. Hadaway, University of Alabama,Huntsville, AL; H. Glatzel, P. Johnson, and A. Lee,L-3 Communications IOS Tinsley, Richmond, CA;D. Patriarca and I. Stevenson, Quantum CoatingIncorporated, Moorestown, NJ; J. Cluney andT. Parsonage, Materion Brush Beryllium andComposites, Elmore, OH; J. Calvert and B. Rodgers,AXSYS Technologies, Cullman, AL; A. McKayand S. Texter, Northrop Grumman AerospaceSystems, Redondo Beach, CA; L. Cohen, SAO,Cambridge, MA; and L. Feinberg, NASA GoddardSpace Flight Center, Greenbelt, MDInvited speaker2:10 p.m. O-12 Gold Coatings for the ReflectiveOptics on James Webb Space Telescope(JWST)C. Childers, D. Patriarca, G. Sadkin, and I. Stevenson,Quantum Coating, Inc, Moorestown, NJInvited speaker2:50 p.m. O-13 Optimization of the ManufacturingStrategies of High Quality Coatings intoa 2-Meter Optics Magnetron Sputtering DepositionMachineM. Lequime, Institut FRESNEL, Marseille, FranceSVC Exhibit Beer Blast!3:30 p.m. – 5:00 p.m.Thursday Morning, May 3Coatings for Cleantech EnergyConversion, Storage and RelatedProcessesModerators: Ric Shimshock, MLD TechnologiesLLC and Carl Lampert, Star Science8:30 a.m. CT-5 Superfenestration CombiningElectrochromic and Thermochromic FunctionalitiesC.G. Granqvist, The Angstrom Laboratory, UppsalaUniversity, Uppsala, Sweden8:50 a.m. CT-6 Exploring a Novel Filtered ArcSource for Ultra-High Rate Deposition of HighQuality ZnO:Al Transparent Conducting FilmsJ.L. Slack, S.H.N. Lim, R.J. Mendelsberg, and A.Anders, Lawrence Berkeley National Laboratory,Berkeley, CAInvited speaker9:10 a.m. CT-7 Metal Oxide Films with FunctionalProperties; From TCO and Thermochromicsto Hydrophobic CoatingsI.P. Parkin, D.S. Bhachu, N. Noor, and C. Crick,Department of Chemistry, University CollegeLondon, London, United Kingdom9:50 a.m. CT-8 The Effect of Film Thicknesson the Electrochromic Performance of NickelOxideM. Neeves and F. Placido, Thin Film Centre, Universityof the West of Scotland, Paisley, UnitedKingdom10:10 a.m. – 10:30 a.m. – BreakSymposium on New Materials and Processesfor Photovoltaics ManufacturingModerator: David Sanchez, Materion10:30 a.m. PV-15 Multilayer Barrier Coatingsfor Organic PhotovoltaicsA.M. Coclite, F. DeLuca, and K.K. Gleason, Departmentof Chemical Engineering, MassachusettsInstitute of Technology, Cambridge, MA10:50 a.m. PV-16 Permeation Rate Measurementsof Ultra-Barriers Using Cavity Ring-DownSpectroscopyD.S. Shackleford and A. Mahfoud-Familia, Saint-Gobain Innovative Materials, Northborough,MA11:10 a.m. PV-17 Study of Mechanical andWater Vapor Barrier Performances for FlexibleOrganic Solar Cells Protecting CoatingF. De Luca, A.M. Coclite, and K.K. Gleason, MassachusettsInstitute of Technology, Cambridge,MA; and H. Benmansour, TOTAL SA Organic &Hybrid Photovoltaic, R&D Division, Courbevoie,France14Society of Vacuum Coaters » 2012 TechCon Preliminary Program

2012 Technical ProgramWebTech Roll to Roll Coatings forHigh-End ApplicationsModerators: Alberto Argoitia, JDSU FlexProducts Group and Chris Stoessel, SouthwallTechnologiesInvited speaker8:30 a.m. W-10 Market Opportunities for R2RThin Film CoatingL. Gasman, NanoMarkets, LLC, Glen Allen, VA9:10 a.m. W-11 The Characteristics of FlexibleIndium Tin Oxide (ITO) Electrodes Grown onPolyethylene Terephthalate(PET) SubstratesUsing Multi-Cathode Roll-to-Roll SputteringSystem for Use in Flexible Display and CapacitiveType Touch PanelJ. Cho, I.S. Kim, and M.H. Lee, LG Hausys Institute,Gyunggi-do, South Korea9:30 a.m. W-12 Transparent Conductive Filmswith Low Resistivity and High Optical Propertyon Plastic Substrates for Projected CapacitiveTouch SensorsG. Nakamura, N. Tatami, H. Murakami, M.Kohmoto, T. Oya, and S. Yokoyama, toyobo co.,LTD., Shiga, Japan9:50 a.m. W-13 Deposition of Full DielectricSolar Control Stack on Polymer Films Using aCombined PVD/PECVD ApproachM. Fahland, T. Vogt, J. Fahlteich, and N. Schiller,Fraunhofer Institute for Electron Beam andPlasma Technology FEP, Germany10:10 a.m. – 10:30 a.m. – Break10:30 a.m. W-14 New Solar Control Coatingsfor Automotive Application to Achieve LowTotal Solar Transmittance TTS < 40%R. Kleinhempel, A. Wahl, R. Thielsch, and P.Buettrich, Southwall Europe GmbH, Grossroehrsdorf,Germany10:50 a.m. W-15 Thin-Film Barriers for FlexibleOLEDsF. van Assche and S. Unnikrishnan, Holst Centre/ TNO, Eindhoven, The Netherlands; P. van deWeijer and P. Bouten, Philips Research Laboratories,Eindhoven, The Netherlands; and T.van Mol, Holst Centre / TNO, Eindhoven, TheNetherlands11:10 a.m. W-16 Roll-to-Roll Technology onPilot Scale for Transparent Ultra-High MultilayerBarriersJ. Fahlteich, Fraunhofer Institute for ElectronBeam and Plasma Technology FEP, Dresden,Germany; S. Amberg-Schwab and U. Weber,Fraunhofer Institute for Silicate Research ISC,Wuerzberg, Germany; K. Noller, O. Miesbauer,and E. Kücükpinar, Fraunhofer Institute for ProcessEngineering and Packaging IVV, Freising,Germany; and N. Schiller, Fraunhofer Institutefor Electron Beam and Plasma Technology FEP,Dresden, Germany11:30 a.m. W-17 Functional Coatings Based onVapor Deposition of Triazine Based CompoundsS. Jahromi, Knowfort Technologies BV, Geleen,The Netherlands11:50 a.m. W-18 Clear Hard Coat Films viaHybrid Multi-Layer (HML) Vacuum DepositionJ. DiBattista, Darly Custom Technology, Inc.,Windsor, CTOptical CoatingModerators: Angus Macleod, Thin Film CenterInc. and Ulrike Schulz, Fraunhofer Institute forApplied Optics and Precision Engineering IOF,Germany8:30 a.m. O-14 Porous Si 3N 4Optical Filters forGas Sensing ApplicationR. Vernhes, J.E. Klemberg-Sapieha, and L.Martinu, École Polytechnique de Montréal,Montréal, Canada8:50 a.m. O-15 Manufacturing of High-PrecisionOptical Coatings Using a Novel SputteringSystemD. Rademacher and M. Vergöhl, FraunhoferInstitute for Surface Engineering and Thin FilmsIST, Braunschweig, Germany9:10 a.m. O-16 New Generation of End-HallIon Sources with Improved CharacteristicsV.V. Zhurin, Colorado Advanced TechnologyLLC, Fort Collins, CO; and E.V. Klyuev and A.I.Sidorov, Ion Sources and Technologies, LLC,Troitsk, Russia9:30 a.m. O-17 High Ion Current DensityPlasma Source for Ion Assisted Deposition OverExtended AreasD.R. Gibson and E.M. Waddell, Thin Film SolutionsLtd, Glasgow, United Kingdom; and F.Placido, Thin Film Centre, University of theWest of Scotland, United Kingdom and ScottishUniversities Physics Alliance (SUPA)9:50 a.m. O-18 Advanced Deposition Technologyfor Astronomical and Space ApplicationsM.L. Fulton, Surface Optics Corp., San Diego, CA10:10 a.m. – 10:30 a.m. – BreakModerators: Georg Ockenfuss, JDSU and JamesHilfiker, J.A. Woollam Co., Inc10:30 a.m. O-19 Spectroscopic EllipsometryBeyond Thin FilmsThursday at a GlanceMorningTechnical Sessions• Coatings for Cleantech Energy Conversion,Storage and Related Processes• Symposium on New Materials and Processesfor Photovoltaics Manufacturing• WebTech Roll to Roll Coatings for High TechApplications• Optical CoatingJ.A. Zapien, R. He, Y. Foo, C.-H. To, and K.T.Cheung, Center Of Super-Diamond andAdvanced Films (COSDAF) and Department ofPhysics and Materials Science, City University ofHong Kong, Hong Kong SAR, People’s Republicof China10:50 a.m. O-20 Optical Oroperties of Cu Oxidesand N-Doped Cu OxidesS. Song and F. Placido, Thin Film Centre, Universityof the West of Scotland, Paisley, UnitedKingdom11:10 a.m. O-21 Electrochromic InterferenceFilters Based on WO 3and Composite SiO 2/WO 3FilmsB. Baloukas and L. Martinu, Department ofEngineering Physics, École Polytechnique deMontréal, Montréal, Canada11:30 a.m. O-22 Design and Development ofBroad Band Anti-Reflection Coatings on Siliconand GaAs Substrates for Solar Cell ApplicationsK. Narasimha Rao and V. Tamilselvan, Departmentof Instrumentation and Applied Physics,Indian Institute of Science, Bengaluru, India;and N. Raghu and M. Sudhakar, Solar Panel Division,ISRO Satellite Centre, Bangalore, India11:50 a.m. O-23 Indium-Tin Oxide Thin Films:The Effect of Doping Ration ThicknessX.-F. Zhang, G.-L. Zhang, Y.-H. Wang, Z.-Q. Huo,Y.-L. Wang, J.-H. Wu, and Y. Yan, Beijing Instituteof Aeronautical Materials (BIAM), Beijing, ChinaThursday Afternoon1:40 p.m. – 6:00 p.m.The Gilroy Wine TourVisiting two popular vineyards in theSouthern Santa Clara ValleyOrganized by South Bay Tours and EventsDeparts from the Hyatt Regency SantaClara Hotel at 1:45 p.m.For details and to register:http://www.southbaywinetours.com/svc_gilroy_tour.htmlEducation Program• Diamond Like Carbon Coatings –from Basics to Industrial Realization (AM)• Atmospheric Plasma Technologies (AM)• C-Introduction to Atomic Layer Deposition(ALD) (AM)AfternoonSpecial Events• Gilroy Wine Tour 1:40 p.m. – 6:00 p.m.505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org15

TechCon Tutorial ScheduleYou do not have to register for the TechCon or be a member of SVC to attend tutorials.Anyone can take advantage of the practical problem-solving tutorials developed by the SVC. Taught by some of the most respected professionalsin the vacuum coating industry, these tutorials cover every aspect of vacuum coating and complement the technical conferencesessions and Exhibit. Twenty-six tutorials will be offered, including six new tutorials. Discounted fees are available for full time students.Saturday, April 28V-204 Vacuum Systems, Materials and Operation (O’Hanlon)C-103 An Introduction to Physical Vapor Deposition (PVD) Processes (Shah)C-311 Thin Film Growth and Microstructure Evolution (Greene)C-332 NEW! Zinc Oxide-Based and Other TCO Alternatives to ITO: Materials,Deposition, Properties and Applications (Bright)Sunday, April 29C-203 Sputter Deposition (Greene) - Day 1 of 2-Day TutorialC-301 Optical Coating Design (Willey)C-335 (AM) NEW! Understandng Solar Cells (Martin)C-330 (PM) Introduction to Thin Film Photovoltaic Technologies (Sittinger & Schlatmann)C-323 High Power Impulse Magnetron Sputtering (Ehiasarian & Anders)Monday, April 30C-211 Sputter Deposition onto Flexible Substrates (McClure)C-322 Characterization of Thin Films (Christensen)C-302 Practical Aspects of Optical Coatings (Morton)C-203 Sputter Deposition (Greene) - Day 2 of 2-Day TutorialTuesday, May 1C-210 (PM) Introduction to Plasma Processing Technology (Baránková & Bárdos) .C-318 (AM) Nanostructures: Strategies for Self-Organized Growth (Greene)C-208 Sputter Deposition in Manufacturing (Glocker)C-333 (AM) NEW! Practice and Applications of High Power Impulse Magnetron Sputtering(HIPIMS) (Bandorf & Ehiasarian)M-102 (AM) NEW! Introduction to Ellipsometry (Hilfiker)C-328 (PM) Properties and Applications of Tribological Coatings (Matthews)C-326 (PM) Manufacture of Precision Evaporative Coatings (Oliver)Wednesday, May 2C-212 Troubleshooting for Thin Film Deposition Processes (Ash)V-207 Practical Aspects of Vacuum Technology: Operation and Maintenanceof Production Vacuum Systems (Langley)C-331 NEW! Industrial Ion Sources (Zhurin)C-317 Practice of Reactve Sputtering (Sproul)Thursday, May 3C-320 (AM) Diamond Like Carbon Coatings – from Basics to Industrial Realization(Schuelke, van de Kolk, & Bewilogua )C-324 (AM) Atmospheric Plasma Technologies (Baránková & Bárdos)C-316 (AM) NEW! Introduction to Atomic Layer Deposition (ALD) Processes, Chemistriesand Applications (Willis)Here’s what a few previousstudents have said aboutSVC’s Tutorials“Fantastic session. The instructorwas very engaging and heexplained the topics very well. Hetook great care to answer clearlyand thoroughly. I took four classesthis week and this was by farthe most informative and helpful.”– A. Larnece C-208“Excellent tutorial. Good balanceof technical and practical information.”– C. Dixon C-208“The instructor made the coursematerial easy to understand andrelated it to practical applicationsby giving real world examples.”– E. Urbanski C-212“The instructor made thecourse both educational andentertaining.”– A. Morrish C-322“I thoroughly enjoyed the classand look forward to putting theknowledge into practice.”– J. Nall C-328“Very good teacher with loadsof knowledge in both theoreticaland practical issues.”– H. Frederiksen C-326Tutorial Classification SystemThe tutorial codes provide the prospective attendee with some guidance as to whether the emphasis in the tutorial is primarily on vacuum technology(V code), or vacuum deposition coating processes and technology (C code), or other miscellaneous topics (M code). The tutorial number indicates thelevel of tutorial specialization—the lower numbers refer to basic or introductory tutorials, and the higher numbers refer to tutorials that offer a morespecialized treatment of a specific topic. Tutorials are full day (8:30 a.m. to 4:30 p.m.) unless noted as AM or PM for half-day courses.For details on all tutorials in the SVC portfolio, including the description, topical outline, tutorial syllabus and biographical sketches of theinstructors, explore the Education button at www.svc.org. Register on-line or contact the SVC at 505/856-7188 or by E-mail to svcinfo@svc.org.

Saturday, April 282012 Tutorial CoursesV-204 Vacuum Systems, Materials and OperationSaturday, April 288:30 a.m.—4:30 p.m.Tutorial fee: $670 (includes text book) Student fee: $190This tutorial course is intended for those who wish to learn how diffusionand cryo pump systems operate, how to choose materials for vacuumuse, and how to pump water vapor properly during the rough pumpingcycle. At the end of this tutorial, a participant should be able to explain theoperation of diffusion, and cryo pumped systems; understand how materialsare chosen for use in vacuum, and how to rough pump water vaporwithout producing condensation.Topical Outline:• Introduction• Rotary mechanical pumps• Diffusion pumps and systems• Cryogenic pumps and systems• Materials suitable for vacuum use• Methods for rough pumping water vapor.Attendees in this tutorial receive the text, A User’s Guide to VacuumTechnology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).Instructor: John F. O’Hanlon, Professor Emeritus of Electrical and ComputerEngineering, University of ArizonaJohn F. O’Hanlon is Professor Emeritus of Electrical and Computer Engineering, the Universityof Arizona. He retired from IBM Research Division in 1987, where he was involvedin thin-film deposition, vacuum processing, and display technology. He retired from UAin 2002, where he directed the NSF Ind./Univ. Center for Microcontamination Control. Hisresearch focused on particles in plasmas, cleanrooms, and ultrapure water contamination.He is the author of A User’s Guide to Vacuum Technology, 3rd edition. (John Wiley &Sons, 2003).Also available through the SVC On Location Education ProgramC-103 An Introduction to Physical Vapor Deposition(PVD) ProcessesSaturday, April 288:30a.m.—4:30 p.m.Tutorial fee: $670 (includes text book) Student fee: $190Physical vapor deposition (PVD) processes are atomistic depositionprocesses in which material vaporized from a source is transported in theform of a vapor through a vacuum or low-pressure gaseous environmentto the substrate, where it condenses and film growth takes place. PVDprocesses can be used to deposit films of compound materials by thereaction of depositing material with the ambient gas environment or witha codeposited material. This tutorial will discuss and compare the fourbasic PVD techniques: vacuum evaporation, sputter deposition, arc vapordeposition, and ion plating. Vacuum evaporation uses thermal vaporizationas a source of depositing atoms; sputter deposition uses physicalsputtering as the vaporizing source; arc vapor deposition uses a highcurrent,low-voltage arc for vaporization; and ion plating uses concurrentor periodic energetic particle bombardment to modify the film growth.The parameters used for each technique will be discussed along with theiradvantages, disadvantages, and applications. This is an entry-level tutorialto acquaint the students with various PVD processes used for “surfaceengineering.”Topical Outline:• Introduction: deposition environments (vacuum and plasma), film formation,film structures, reactive deposition, factors affecting film properties• Vacuum evaporation and vaporization, evaporation and sublimation, depositionchambers, vaporization sources (resistive and e-beam), evaporationmaterials, fixture design, process parameters, monitoring and control, advantagesand disadvantages, applications• Sputter deposition and physical sputtering, plasmas (dc, rf, magnetron, andpulsed dc), sputtering target configurations, reactive sputter deposition, sputteringmaterials, process parameters, monitoring and control, advantages anddisadvantages, applications• Arc vapor deposition and vacuum and plasma arcs, properties of arcs,generation and “steering” of arcs, arc sources, reactive arc deposition, processparameters, monitoring and control, advantages and disadvantages, applications• Ion plating and bombardment effects, bombardment configurations, reactiveion plating, ion plating vaporization sources and evaporation, sputtering andarc process parameters, monitoring and control, advantages and disadvantages,applications• PVD deposition systems and configurations (batch, load-lock, and in-line),pumping optionsThe tutorial fee includes the text, Handbook of Physical Vapor Deposition(PVD) Processing, 2nd edition, Donald M. Mattox (Elsevier Publishing,2010).Instructor: S. Ismat Shah, University of DelawareS. Ismat Shah graduated from the University of Illinois at Urbana-Champaign in 1986from the Department of Materials Science and Engineering. He worked for the DuPontCompany as senior Staff Scientist for 12 years before joining the University of Delawarein 1999, where he has a joint appointment in the Department of Materials Science andEngineering and the Department of Physics and Astronomy. He has been involved in thefield of thin films and nanostructured materials for 22 years. He has over 174 publicationsin the field and six patents awarded. He is the Chair of the SVC Education Committee. Heteaches the first on-line course offered by the SVC, in collaboration with the University ofDelaware, on Vapor Deposition Processes.Also available through the SVC On Location Education ProgramC-311 Thin Film Growth and Microstructure EvolutionSaturday, April 288:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, technicians, and others involvedwith the vapor deposition of thin films by sputtering, evaporation, MBE,CVD, GS-MBE, etc., and who need to obtain a better understanding of theeffects of operating parameters on the properties of metal, semiconductor,and dielectric films and alloys. The tutorial is concentrated on thedevelopment of a detailed atomic-scale understanding of the primaryexperimental variables and surface reaction paths controlling nucleation/growth kinetics and microstructural evolution during vapor-phase depositionof thin films. The goal is to develop an appreciation of the advantagesand disadvantages of competing growth techniques and to learn howto design better and more efficient film growth processes to achieverequired properties.Thin-film technology is pervasive in many advanced fields of moderntechnology including microelectronics, optics, magnetics, hard and corrosion-resistantcoatings, micromechanics, etc. Progress in each of theseareas depends upon the ability to selectively and controllably depositthin films (thickness ranging from tens of Ångstroms to micrometers) withspecified physical properties. This, in turn, requires control—often at theatomic level—of film microstructure and microchemistry.Essential fundamental aspects, as well as the technology of thin-filmnucleation and growth from the vapor phase (evaporation, MBE, sputtering,and CVD) are discussed in detail and highlighted with “real” examples.The tutorial begins with an introduction on substrate surfaces: structure,reconstruction, and adsorption/desorption kinetics. Nucleation processesare treated in detail using insights obtained from both in situ (RHEED,LEED, STM, AES, EELS, etc.) and post-deposition (TEM and AFM) analyses.The primary modes of nucleation include two-dimensional (step flow,layer-by-layer, and two-dimensional multilayer), three-dimensional, andStranski-Krastanov. The fundamental limits of epitaxy will be discussed.Experimental results and simulations will be used to illustrate processescontrolling three-dimensional nucleation kinetics, island coalescence,clustering, secondary nucleation, column formation, preferred orientation,and microstructure evolution. The effects of low-energy ion-irradiationduring deposition, as used in sputtering and plasma-CVD, will bediscussed with examples. The course concludes with discussion of the505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org17

2012 Tutorial Coursesorigins, mechanisms, and control strategies, of intrinsic and extrinsicstresses in thin films.Topical Outline:• The role of the substrate in mediating growth kinetics• The nucleation process• Film growth modes• Epitaxy• The development and control of film stress (strain engineering)• Nucleation and growth of strain-mediated self-organized structures• Polycrystalline film growth, texture, and microstructure evolution• Structure-zone models of film microstructure• The role of low-energy ion/surface interactions during film growth• The relationship between film growth parameters and film propertiesInstructor: Joe Greene, D. B. Willett Professor of Materials Science andPhysics, University of IllinoisJoe Greene is the D.B. Willett Professor of Materials Science and Physics, the Tage ErlanderProfessor of Materials Physics at Linkoping University, a Chaired Professor at the NationalTaiwan University of Science and Techology, and Past Director of the Frederick SeitzMaterials Research Laboratory at the University of Illinois. The focus of his research hasbeen the development of an atomic-level understanding of adatom/surface interactionsduring vapor-phase film growth in order to controllably manipulate microchemistry,microstructure, and physical properties. His work has involved film growth by all formsof sputter deposition (MBE, CVD, MOCVD, and ALE). He was President of the AmericanVacuum Society in 1989, a consultant for several research and development laboratories,and a visiting professor at several universities. Recent awards include receipt of the AristotleAward from SRC (1998), the Adler Award from the American Physical Society (1998),Fellow of the American Vacuum Society (1993) and the American Physical Society (1998),and the Turnbull Prize from the Materials Research Society (1999). He was elected to theUS National Academy of Engineering in 2003. He is the Editor-in-Chief of Thin Solid Films.Also available through the SVC On Location Education ProgramSaturday, April 28C-332 Zinc Oxide-Based and Other TCO Alternatives toITO: Materials, Deposition, Properties and ApplicationsNew!Saturday, April 288:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95Indium tin oxide, ITO, is the most common of Transparent ConductiveOxides (TCO). However, there are concerns about ITO cost, availability andin some cases, performance. This tutorial covers zinc oxide-based alternativeswith various dopants including, aluminum (AZO) and gallium (GZO),as well as other TCO alternatives to ITO. The tutorial is intended for scientists,engineers, technicians and others, interested in understanding thematerials, deposition, properties and applications of TCO. The effects ofdopant material choice and concentration on TCO properties are explored.TCO deposition by common methods, e.g., evaporation and CVD/pyrolysis,are described, although magnetron sputter deposition is emphasized.The influence of the deposition method on the TCO properties is shownincluding reported performance with Pulsed Laser Deposition (PLD).Engineering of TCO film properties by controlling deposition processparameters is explained. TCO properties with high temperature processes,e.g., on glass substrates, and low temperature processes, e.g., on plasticsubstrates, are compared. The instability of ZnO-based and other TCO inhigh temperature and high humidity environments is discussed, progressreported and future directions suggested. Designing and engineering TCOproperties for specific applications is explained and examples presented.(This full-day tutorial is much more in-depth than the previously offeredone-half day course (C-321) which surveyed alternative TCO types andachieved performance).Topical Outline:• Conductivity in transparent metal oxides• Performance expectations; Theory and ITO baseline• ZnO-based materials and dopants• Performance of TCO grown by major deposition methods• Control of TCO Film Properties• Other TCO Hosts and dopants• Advanced doping Techniques• Environmental Performance of ZnO-based and other TCO• Designing and Engineering TCO properties for Applications• Applications Examples of TCOInstructor: Clark Bright, Senior Staff Scientist & Group Technical Leader, 3MCorporationClark Bright is a Senior Staff Scientist and Group Technical Leader with 3M Corporation.He is directing the development and scale-up of processes for vacuum deposition ofmultilayer organic and inorganic thin film products. He previously was Vice Presidentat Presstek, Inc., and its Delta V Technology subsidiary, where he directed the R&D oftransparent conductive oxides, barrier coatings, polymer multilayer (PML) technology,and custom vacuum coating equipment. While at Southwall Technologies, as Directorof Product Development he led the development of a web coating process for sputter depositinga durable, conductive (ITO), multilayer antireflection coating on plastic film usedon CRT computer monitors. He has published and presented numerous papers on opticalcoatings and holds 11 patents in the field.18Society of Vacuum Coaters » 2012 TechCon Preliminary Program

Sunday, April 29C-203 Sputter Deposition (two-day tutorial)Sunday and Monday, April 29 and 308:30 a.m.—4:30 p.m.Tutorial fee: $895 Student fee: $190This tutorial covers fundamental mechanisms associated with generationof glow discharges, sputtering, and energetics of target and substrate processes.Operation and system design will be discussed for dc, rf, magnetron(both magnetically balanced and unbalanced), pulsed dc, and ion beamsputtering. The advantages and disadvantages of these different modesof operation will be examined from the point of view of controlling filmproperties. Emphasis is placed on developing a sufficient understanding ofsputter deposition to provide direction in designing new processes. Presentand future trends in sputter deposition also will be addressed.Topical Outline:• Processes controlling film growth and properties• The role of energetic particles in controllably modifying these processes• Target sputtering effects• Nature and energy of sputtered atoms• Diode, triode, magnetron, and ion beam systems• dc, HIPIMS, pulsed dc, mid-frequency ac, and rf power for targets and substrates• Reactive sputtering of conducting and dielectric layers• Alloy sputteringInstructor: Joe Greene, D. B. Willett Professor of Materials Science and Physics,University of IllinoisFor Joe Greene’s profile, see C-311 (Saturday)Also available through the SVC On Location Education ProgramC-301 Optical Coating DesignSunday, April 298:30 a.m.—4:30 p.m.Tutorial fee: $620 (includes text book) Student fee: $145This tutorial covers optical coating design principles and techniques fromboth classical approaches and other different viewpoints. Methods for thedesign to produce desired coating results are described.Topical Outline:• Fundamentals of thin film optics from various points of view• The use of graphical methods for understanding and designing opticalcoatings• A Fourier viewpoint of optical coatingsThe tutorial fee includes textbook: Practical Design of Optical Thin Films,Third Edition, Ronald R. Willey, 2011 (published by Willey Optical Consultants).Instructor: Ronald R. Willey, Consultant, Willey OpticalRonald R. Willey graduated from the MIT in optical instrumentation, has an M.S. from FIT,and over 35 years of experience in optical system and coating development and production.He is very experienced in practical thin films design, process development, and the applicationof industrial Design Of Experiments methodology. He is the inventor of a robustplasma/ion source for optical coating applications. He worked in optical instrument developmentand production at Perkin-Elmer and Block Associates. He developed automaticlens design programs at United Aircraft Research Laboratories. He formed Willey Corporationin 1964 and served a wide variety of clients with consulting, development, prototypes,and production. In 1981 he joined Martin Marietta Aerospace and was Director of theOptical Component Center where he was responsible for optical fabrication, coating, andassembly. He joined Opto Mechanik in 1985 where he was responsible for the developmentof all new technologies, new instruments, and production engineering. He was a Staff Scientistat Hughes Danbury Optical Systems. He holds four patents and has published manypapers and a book on optical coating, optical design, and economics of optical tolerances.He is a fellow of the Optical Society of America and SPIE and a past Director of the Societyof Vacuum Coaters. He now is a consultant in the above-listed technical areas.Also available through the SVC On Location Education Program2012 Tutorial CoursesC-335 Understanding Solar Cells (half-day) New!Sunday, April 298:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70In addition to traditional semiconductors, photovoltaics technology nowencompasses thin films, organic materials, low dimensional materials,nanotubes and biomaterials. This course provides an introduction to thebasic principles of solar cell operation and photovoltaic devices (homojunction,heterojunction, p-n, and p-i-n structures) based on photoconductivityand photoactivation. Photocatalytic materials and selectedphotovoltaic technologies and systems will also be addressed. Principlesof photoconductivity and solar cell operation will be presented using basicsolid state physics and graphic examples. Specific examples addressed aresemiconductor solar cells, Gratzel (dye sensitized) cells, organic cells andmultijunction cells. This course will address current PV cell structures andpower systems and the factors that are preventing them from achievingtheoretical efficiencies.Topical Outline:• Energy from the sun and heat sources• Semiconductor lattice structure• Electrical conductivity basics• Why semiconductors?• Semiconductor band structure• Photoconductivity mechanisms• Solar cell parameters• Materials• Bulk semiconductor cells• Dye sensitized solar cells• Photocatalytic materials• Organic solar cells• Advanced materials and designs• Future directionsInstructor: Peter Martin, Columbia Basin Thin Film Solutions LLCPeter Martin worked at Pacific Northwest Laboratory (PNNL) for over 29 years where hecurrently holds an Emeritus Laboratory Fellow appointment At PNNL he developed thinfilm coatings for energy, biomedical, space and defense applications. He is currentlyPresident of Columbia Basin Thin Film Solutions LLC and recent Past President of SVC. Hehas written over 400 technical publications, three R&D 100 Awards, two Federal LaboratoryConsortium awards, and voted Battelle 2005 Inventor of the Year. He has over thirtyUS patents, and teaches short courses on Smart Materials and Energy Materials andApplications.C-330 Introduction to Thin Film PhotovoltaicTechnologies (half-day)Sunday, April 291:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70This course focuses on PV thin film technologies like Cu(In,Ga)(Se,S)2, CdTean the amorphous and microcrystalline silicon solar cells which are nowadaysmainly introduced. Starting point is a market overview followed bythe basic designs of these solar cell types and their efficiency potentials.Especially the different manufacturing technologies are introduced focusingthe different production and process steps of each solar cell type.Topical Outline:• Market situation• Cell design of thin film solar cells• Research activities• Production and process technologies for thin film solar cellsAttendees will benefit from registering for C-335 “UnderstandingSolar Cells,” on Sunday morning to learn about thefundamentals of solar cells –followed by registering for C-330“Introduction to Thin Fiilm Photovoltaic Technologies,” onSunday afternoon.505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org19

202012 Tutorial CoursesInstructor: Volker Sittinger, Senior Scientist, Fraunhofer Institute – GermanyInstructor: Rutger Schlatmann, Director, PVcomB - Berlin, GermanyVolker Sittinger is a senior scientist at Fraunhofer Institute for Surface Engineering andThin Films (IST) in the Large Area Coating department. He works on magnetron sputteringfor photovoltaic applications. Formerly he was a scientific assistant at the Institute ofSolar Energy Research GmbH (ISFH). Volker Sittinger received his doctoral degree in opticaland electrical characterisation of electrodeposited CuInSe2 solar cells from the Universityof Oldenburg in 2003 and studied physics at the University of Karlsruhe.Rutger Schlatmann is director of PVcomB, the Competence Center for Thin Film andNanotechnology in Photovoltaics Berlin. He obtained his PhD at the FOM Institute inAmsterdam, From 1999 until 2008 he worked as R&D manager at flexible thin film Si solarcell producer Helianthos, formerly owned by Akzo Nobel and Shell Solar.C-323 High Power Impulse Magnetron Sputtering(HIPIMS)Sunday, April 298:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, technicians, students, and othersinterested in high power impulse magnetron sputtering (HIPIMS). WithHIPIMS we mean a pulsed sputtering process where the power density onthe sputtering target is greatly enhanced (about two orders of magnitude)over the average power density. Hence, the word “impulse” is adopted tosignify a low duty cycle of operation.Some basic understanding or experience with plasmas and materials isdesirable but not required. The tutorial starts with a brief introductionto basic plasma and sheath physics. The operation of dc magnetrons isexplained to provide the foundation for the understanding of the timedependentprocesses in pulsed systems, and especially those of HIPIMSdischarges.High power density leads to significant ionization of the sputtered material,enabling effective surface modification via ion etching and ion assistanceto film growth. The interface to the substrate can be engineered andthe film texture can be influenced using the HIPIMS plasma in combinationwith an appropriate bias.Topical Outline:• HIPIMS - An Introduction• Stationary plasmas, sheaths, discharge• The dc magnetron processes• Ion surface modification: etching and film growth, energetic condensation• Pulsed plasmas and sheaths• High Power Impulse Magnetron Sputtering: the discharge• Plasma characterization and plasma diagnostics• Substrate biasing: etching / growth assist• Interface engineering by using HIPIMS plasmas• Deposition and coatings by HIPIMS• Hardware• ApplicationsInstructor: André Anders, Plasma Applications Group, Lawrence BerkeleyNational LaboratoryInstructor: Arutiun P. Ehiasarian, Sheffield Hallam University - United KingdomAndré Anders is a Senior Scientist and the Leader of the Plasma Applications Group atLawrence Berkeley National Laboratory, Berkeley, California. He studied physics in Poland,Germany, and Russia. He holds an M.S. (1984) and Ph.D. degree (1987) in physics fromHumboldt University, Berlin. He worked at the Academy of Sciences, (East) Berlin, until hemoved to Berkeley, California, in 1992. His research includes coatings by sputtering andcathodic arcs, plasma immersion ion implantation, and plasma and ion source development.He has authored/co-authored three books, over 250 papers in refereed journals, andholds several patents. He serves as Associate Editor for the Journal of Applied Physics, onseveral international advisory committees, and on the Editorial Boards of Applied PhysicsLetters, the Journal of Applied Physics, and Surface and Coatings Technology. He waselected Fellow of APS, IEEE and IoP (UK) and received the Chatterton Award (1994), twoR&D 100 Awards (1997, 2009), and the 2010 Merit Award of the IEEE Nuclear and PlasmaSocieties.Society of Vacuum Coaters » 2012 TechCon Preliminary ProgramSunday, April 29Arutiun P. Ehiasarian joined the Nanotechnology Centre for PVD Research at SheffieldHallam University, UK in 1998 where he obtained his PhD in Plasma Science and SurfaceEngineering. His research within NTCPVD has concentrated on development of plasmaPVD technologies for substrate pretreatment prior to coating deposition to improve adhesion,deposition of coatings with dense microstructure, low-pressure plasma nitriding andhybrid processes of plasma nitriding/coating deposition. He has experience with cathodicvacuum arc discharges, dc and pulsed magnetron discharges, and radio-frequency coilenhanced magnetron sputtering. He utilizes plasma diagnostics such as optical emissionspectroscopy (OES), electrostatic probes, energy-resolved mass spectroscopy and atomicabsorption spectroscopy. Materials characterization includes high-resolution TEM, STEM,STEM-EDS, SEM, and XRD as well as mechanical testing available at NTCPVD. Arutiun isone of the pioneers of high power impulse magnetron sputtering (HIPIMS) technologyand his work in the field has been acknowledged with the R.F. Bunshah Award (2002), theTecVac Prize (2002) and the Hüttinger Industrial Accolade. He is an author of more than50 publications, 10 invited lectures, 3 patents and 1 book chapter in the field of PVD andHIPIMS.Also available through the SVC On Location Education ProgramAttendees will benefit from registering for C-323 “High PowerImplulse Magnetron Sputtering (HIPIMS),” on Sunday to learnabout the fundamentals of HIPIMS – followed by C-333 “Practiceand Applications of High Power Impulse Magnetron Sputtering(HIPIMS),” on Tuesday morning which describes the applicationsof HIPIMS. Registrants can then visit the exhibit to discuss issueswith many different vendors of power supplies for HIPIMS.

Monday, April 30C-211 Sputter Deposition onto Flexible SubstratesMonday, April 308:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is intended for engineers, scientists, and others who areinterested in sputter deposition onto polymer substrates in a roll-to-rollformat. This tutorial will emphasize practical aspects of the topics, and thetreatment will be descriptive with little mathematics used. There will betime dedicated to problem solving; bring your questions and problemsand leave with new solutions and/or new directions.Topical Outline:• Markets for sputter-coated web products• Vacuum technology for sputter web coating• Substrate characteristics• Web handling, web winding, and web cooling issues• The sputter coating process• Process and product monitoring methods• Current topics in sputter web coatingAdditionally, the notes provide extensive information and references tosputtering (written at several levels) and a comprehensive bibliographyon sputter web coating.Instructor: Donald J. McClure, Acuity Consulting and TrainingDonald J. McClure founded Acuity Consulting and Training to continue his love affairwith vacuum coating and vacuum web coating in particular. Don retired from 3M’sCorporate Research Laboratory after spending twenty five years working on a broadrange of products and projects that utilized vacuum roll coating and processing. Heserved the Society of Vacuum Coaters in many roles including President and Secretary. Hehas offered his courses on the “Basics of Vacuum Web Coating” and “Sputter Depositiononto Flexible Substrates” for many years. His presentation, “A Wizard’s Guide to Vacuumand Vacuum Coating,” has received rave reviews from attendees. He was the SVC’s 2004Nathaniel Sugerman Award recipient.Also available through the SVC On Location Education ProgramC-322 Characterization of Thin FilmsMonday, April 308:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial examines the broad range of techniques available to characterizethin film materials. We examine the range of properties of interestand how thin film properties may differ from bulk properties. Generic differencesbetween counting and spectroscopic techniques are presented.Available “probes” are identified.The main emphasis of the tutorial is an overview of a wide range of characterizationtechniques. We examine imaging techniques such as Opticalmicroscopy, Scanning electron microscopy (SEM), Transmission electronmicroscopy (TEM), and Scanning probe microscopies (STM, AFM …). Wealso explore techniques, which provide information about structural propertiesincluding X-ray diffraction (XRD), Stylus profilometry, Quartz crystalmonitors (QCM) and density measurements.The tutorial examines techniques, which explore chemical propertiessuch as Auger electron spectroscopy (AES), Energy Dispersive Analysis ofX-rays (EDAX), X-ray Photoelectron Spectroscopy (XPS, ESCA), SecondaryIon Mass Spectrometry (SIMS), and Rutherford Backscattering (RBS). AESis used as a prototype to examine quantitative analysis of spectroscopicdata. Characterization techniques for optical properties such as ellipsometryand optical scattering are also considered. Many of these chemicaland optical techniques can also provide information about structuralproperties.Techniques for determining electrical and magnetic properties are alsodiscussed. These include resistance / four point probe, Hall effect, magneto-opticalKerr effect and ferromagnetic resonance. The emphasis here ison materials characterization as opposed to device characterization.2012 Tutorial CoursesThe tutorial concludes with an examination of techniques used to exploremechanical properties such as stress-curvature measurements, frictiontesting, micro/nano indentation and adhesion tests.Topical Outline:• Overview of wide range of characterization techniques for thin filmsincluding:• Mechanical properties (stress, friction, micro/nano indentation, adhesion…)• Imaging (microscopies: optical, SEM, TEM, AFM …)• Structural properties (XRD, profilometry, QCM …)• Chemical properties (AES, EDAX, XPS, SIMS, …)• Electrical/magnetic properties (resistance, Hall effect, Kerr effect …)Instructor: Tom Christensen, University of Colorado - Colorado SpringsTom Christensen is a Professor in the Department of Physics at the University of Coloradoat Colorado Springs. He received his B.S. in physics from the University of Minnesota in1979 and his M.S. and Ph.D. degrees in Applied Physics from Cornell University. Afterseveral years as a member of the technical staff at Sandia National Laboratories in Albuquerquehe joined the University of Colorado faculty in 1989. He has worked with vacuumtechnology, thin film technology and surface characterization since 1980 and has taughtlocal AVS short courses since 1992.Also available through the SVC On Location Education ProgramC-302 Practical Aspects of Optical CoatingsMonday, April 308:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial covers methods for depositing optical thin film materials andthe parameters to control to achieve desired properties. Various depositionsource types will be presented with strong emphasis on physicalvapor deposition (sputtering and evaporation). Both qualitative and quantitativemethods for characterizing thin films will be presented.Topical Outline:• Methods for depositing thin films and for calculating performance• Measuring optical thin films and calculating optical properties (n and k)• Dispersion models for optical thin films• Comparison of characterization techniques• Effect of deposition parameters on optical properties• Ion-assisted deposition• Thin film material properties for dielectric and metal films• Review of optical properties for other selected materialsInstructor: Dale E. Morton, Denton Vacuum, LLC (retired)Dale E. Morton has retired as the Process R&D Manager of the High Vacuum EquipmentDivision of Denton Vacuum, LLC. He also was Product Manager for the cold cathode ionsource product line. He has 35 years of experience in design and process development foroptical thin film applications with a strong emphasis on the characterization of the opticalproperties of thin film materials. He is a past director of the SVC (1994 to 2000) and is aformer Optical Coating TAC Chair (1993 to 1995) and Program Chair (1997 to 1999) for theSVC Annual Technical Conference.Also available through the SVC On Location Education Program505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org21

222012 Tutorial CoursesC-208 Sputter Deposition in ManufacturingTuesday, May 18:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial emphasizes issues of practical importance to those usingsputtering as a manufacturing process. It is intended for engineers, scientists,and technicians who would like an understanding of the factors thatinfluence product throughput, coating quality, and process robustnessand reliability. The primary focus will be on the use of planar magnetronsof various shapes, but other sources will be covered as well. The relationshipsbetween the sputtering conditions and important film properties—such as microstructure, composition, stress, adhesion and the resultingmechanical, electrical, and optical characteristics—will be discussed. Newdevelopments that are finding their way into practical applications alsowill be highlighted. No prior formal training in sputtering is required toappreciate the tutorial content.Topical Outline:• A Brief introduction to basic vacuum technology• Sputtering plasmas and the nature of the sputtering process• Estimating deposition rates and rate limiting factors• Cathode geometries and associated film thickness profiles• Film composition and compositional uniformity• Film nucleation and growth• Effects of substrate temperature and energetic particle bombardment• Biased sputtering and the use of unbalanced magnetrons• Sources of substrate heating• rf sputtering of dielectrics from insulating targets• The dc, pulsed dc, and ac reactive sputtering of dielectrics• Process control methods for reactive sputtering• Arcing, disappearing anodes, and other process stability issues• Ion beam sputtering• High Power Pulsed Magnetron Sputtering (HPPMS or HIPIMS)Instructor: David Glocker, Isoflux IncorporatedDavid Glocker is President of Isoflux Incorporated, a manufacturer of magnetron equipment,which he founded in 1993. He has more than 20 years’ experience in thin filmresearch, development, and manufacturing and has taken a number of new processesfrom laboratory-scale feasibility studies through successful production. He is an inventoror co-inventor of 25 U.S. patents and an author of more than 25 research papers in theareas of sputter source design, plasmas and plasma characteristics, sources of substrateheating in sputtering, and the control of sputtering processes and sputtered film properties.He also is the co-editor of The Handbook of Thin Film Process Technology, a majorreference work in the field.Also available through the SVC On Location Education ProgramC-318 Nanostructures: Strategies for Self-OrganizedGrowth (The Materials Science of Small Things)(half-day)Tuesday, May 18:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70Learn about the primary classical and quantum effects which controllablyalter the properties of increasingly small nanostructures.Understand the mechanisms controlling self-assembly and self-organizationduring nanostructure growth.Learn how to better design nanostructure growth processes.The study of nanotechnology is pervasive across widespread areas includingmicroelectronics, optics, magnetics, hard and corrosion resistantcoatings, mechanics, etc. Progress in each of these fields depends uponthe ability to selectively and controllably deposit nanoscale structureswith specified physical properties. This, in turn, requires control -- often atthe atomic level -- of nanostructure, nanochemistry, and cluster nanoorganization.Society of Vacuum Coaters » 2012 TechCon Preliminary ProgramTuesday, May 1Deceasing size scales of solid clusters can result in dramatic propertychanges due to both “classical” effects associated with changes in averagebond coordination and, as cluster sizes become of the order of the spatialextent of electron wavefunctions, quantum mechanical effects. The coursewill start with examples including reduced melting points, higher vaporpressures, increased optical bandgaps, decreased magnetic hysteresis,and enhanced mechanical hardness. Essential fundamental aspects, aswell as the technology, of nanostructure formation and growth from thevapor phase will be discussed and highlighted with “real” examples usinginsights obtained from both in-situ and post-deposition analyses.Nanostructure case studies include:• examples of template, size, and coarsening effects: self-assembled Si/Si(001),Cu/Cu(001),TiN/TiN(001), TiN/TiN(111) nano-clusters,• examples of controlled template plus strain effects: self-organized Ge wireson Si(111), Ge wires on Si(187 72 81), Au chains on Si(553), InAs metal wireson GaAs(001), insulated metal wires on Si(111),• quantum dot engineering: formation, shape transformations, and orderingin self-organized SiGe/Si(001); InAs/GaAs(001), CdSe/ZnSe(001), PbSe/PbEuSe(111), Ag/Pt(111), and MnN/Cu(001) quantum dots,• examples of 3D nanostructures:(Ti,Ce)N/SiO 2, TiBx/SiO 2, and d-TaN/g-Ta2N/SiO 2.Topical Outline:The course provides an understanding of:• the classical and quantum effects controlling the dramatic property changesobserved in nanostructures as a function of cluster size and dimension (3D –2D – 1D)• self-assembly and self-organization during film growth• the role of the substrate template and defect structures in mediating growthkinetics• the use of film stress to controllably manipulate nanostructure• other mechanisms (including surface segregation, surfactant effects, lowenergyion bombardment, cluster coarsening, etc) for controlling nanostructures• the design of nanostructures with specified properties.Who Should Attend?Scientists and engineers involved in deposition, characterization, ormanufacturing/marketing of nanostructures and nanostructure depositionequipment.Instructor: Joe Greene, D. B. Willett Professor of Materials Science and Physics,University of IllinoisFor Joe Greene’s profile, see C-311 (Saturday)Also available through the SVC On Location Education ProgramC-333 Practice and Applications of High Power ImpulseMagnetron Sputtering (HIPIMS) (half-day) New!Tuesday, May 18:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70HIPIMS is a highly ionized pulsed sputtering process that produces significantionization of the sputtered materials that, in turn, enables effectivesurface modification by ion etching and energetic deposition. Energeticdeposition allows the formation of coatings with unique or superior propertiescompared to other deposition processes. Presently HIPIMS is undergoingthe transition from academic research to being a major industrialprocess. This half day tutorial is intended for decision makers, engineers,technician and students interested in equipment availability, applicationsand process requirements of HIPIMS.Basic understanding or experience with plasma and materials is desirablebut not required. The tutorial starts with a short introduction in the basicsof HIPIMS technology. An extended treatment of HIPIMS is provided bythe tutorial C-323 “High Power Impulse Magnetron Sputtering. The mainfocus of this tutorial is on commercially available equipment and its specificationsas well as the general processing principles. Finally industrial (orclose to industrial) applications will be presented.

Tuesday, May 12012 Tutorial CoursesTopical Outline:1. Introduction to HIPIMS Technology2. Industrial Equipmenta. HIPIMS pulse generationb. Process control (reactive HIPIMS)c. HIPIMS diagnosticsd. HIPIMS Coating systems3. HIPIMS Applicationsa. HIPIMS etchingb. Trench filling, Through via connectionc. TCOsd. Hard coatings- nitrides- carbidese. Optical coatingsInstructor: Arutiun P. Ehiasarian, Sheffield Hallam University - United KingdomInstructor: Ralf Bandorf, Head of Group Sensoric Functional Coatings,Fraunhofer IST - Braunschweig, GermanyFor Arutiun P. Ehiasarian’s profile, see C-323 (Sunday)Ralf Bandorf received his PhD in Mechanical Engineering in 2002 from Fraunhofer IST/ Carolo-Wilhelmina Technical University Braunschweig, Germany. Ralf continued atFraunhofer IST as a scientist, specifically as Project leader in Group Micro and SensorTechnology with a Focus on PVD and PACVD coatings. Since 2007, he has worked asHead of Group Sensoric Functional Coatings at Fraunhofer IST, with a focus on highlyionized pulse plasma processes (HIPP processes) like HiPIMS and MPP, additionally GasFlow Sputtering, PACVD, reactive deposition, plasma characterization (OES, RFA) sputterstrain gauges, magnetic films, electrical films, and MAX-Coatings. In addition to hiswork at Fraunhofer IST, Ralf is Action Chair of COST Action MP0804: Highly ionized pulseplasma processes (HIPP processes, 2009-2013. He is the Chair of the HIPIMS Sessions atICMCTF and SVC TechCon, and Conference Chairman of the International Conference onFundamentals and Industrial Applications of HIPIMS.M-102 Introduction to Ellipsometry (half-day) New!Tuesday, May 18:30 a.m.—12:00 p.m.Tutorial fee: $395 Student fee: $70Ellipsometry is an important characterization technique for optical coatings.This tutorial will build an understanding of ellipsometry fundamentals.We start with the basic theory behind optical measurements. Aspecial focus will be placed on the merits of spectroscopic, variable angle,and in-situ or in-line ellipsometry. The applications of ellipsometry includemeasurement of single and multi-layer film thickness, complex refractiveindex, birefringence, porosity, conductivity, and composition. A widerange of ellipsometry applications will be surveyed, with emphasis towardoptical coatings.The level of this tutorial is suitable for those new to the field of opticalcharacterization but also contains worthwhile information for current ellipsometryusers. It will help anyone interested in exploring the potentialof ellipsometry measurements.Topical Outline:• Principles of ellipsometry• Optical constants and light-matter interaction• Considerations for:- Spectroscopic ellipsometry- Variable Angle ellipsometry- In situ and in-line ellipsometry• Survey of applications:- What can Ellipsometry measure?- Ex-situ, in situ, and in-line examplesInstructor: James N. Hilfiker, J.A. Woollam Co. Inc.James N. Hilfiker graduated from the Electrical Engineering Department of the Universityof Nebraska in 1995. His graduate research involved in situ ellipsometry and opticalcharacterization of magneto-optic thin films. He joined the J.A. Woollam Company upongraduation and has worked in their applications lab for over 11 years. He has authoredover 30 technical articles involving Ellipsometry, including a couple of Encylopedia chaptersand a recent book chapter on Vacuum Ultraviolet Ellipsometry.C-328 Properties and Applications of TribologicalCoatings (half-day)Tuesday, May 11:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70This tutorial is intended for design engineers, materials scientists, and coatingsdevelopers who have a need to specify and develop coatings for tribologicalapplications (i.e., those in which wear must be reduced or preventedand/or friction minimized). The coatings also may need to have corrosionresistantproperties to operate in arduous conditions. The tutorial beginswith a description of the mechanics of friction and wear and discusses theproblems of selecting coatings for optimal tribological performance. Anoverview of the main processes for producing tribological coatings is given,emphasizing plasma assisted vacuum deposition methods. Tribological testmethods also are overviewed, including tests for adhesion and mechanicalproperties. Coatings developed for enhanced tribological propertiesare described, and information is provided on some applications for thesecoatings.Topical Outline:• Wear mechanisms and theories (adhesion, abrasion, erosion, fatigue, corrosion,etc.)• Tribological and mechanical test methods (e.g., pin on disc, abrasive wheel,scratch adhesion, microhardness, etc.)• Coating processes and selection• Benefits of ceramic coatings by PVD methods• Information on tribological coatings (e.g., metal nitrides, carbides, oxides,superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplexprocesses)• Applications information (e.g., metal cutting and forming, molding, bearings,pumps, auto parts, etc.)Instructor: Allan Matthews, University of Sheffield - United KingdomAllan Matthews is Professor of Surface Engineering, and Head of the Department ofEngineering Materials at the University of Sheffield, UK. He has been working on plasmaassistedPVD processes for about 30 years. He spent his early career in the aerospaceindustry and subsequently carried out research into enhanced plasma-based coating andtreatment processes as well as test and evaluation methods. He holds eight patents in thesefields and has authored or co-authored over 330 publications, including the book, CoatingsTribology (Elsevier, 2009). He is a SVC Board Member and a former Chair of the ExecutiveCommittee of the Advanced Surface Engineering Division of the AVS. He is a former Chairman,Symposium Committee member and Proceedings Editor for the ICMCTF Conference.He a member and past Chair of the British Vacuum Council and a Co-Editor of the Elsevierjournal, Surface and Coatings Technology.Also available through the SVC On Location Education ProgramC-326 Manufacture of Precision Evaporative Coatings(half-day)Tuesday, May 11:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70This tutorial provides detailed information on how to establish and improveevaporative coating processes for precision optical coatings. Designconsiderations for coating chambers, such as source placement, substratefixturing, control of film thickness uniformity, and thickness monitors willbe discussed. Trade-offs in the selection of source materials, means ofcontrolling film structure, and the influence on the performance of thecoated component will be considered. Process details will be approachedwith a focus on practicality; film properties must be measurable and systemdesigns must be practical and cost-effective. These process concepts arereadily implemented in standard evaporation systems, providing significantimprovements in existing coating facilities.Topical Outline:• Chamber components for an evaporation system• Deposition monitoring and control- Optical monitoring- Advanced methods for quartz crystal monitoring505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org23

2012 Tutorial Courses• Thin-film uniformity concepts and calculations- Source placement- Substrate rotation and fixturing- Analysis and selection of system gearing- Design of uniformity masks to correct film thickness variations• Stress in optical coatings- Theoretical basis for film stress- Measurements of stress in thin films- Process design to minimize stresses in optical coatingsInstructor: Jim Oliver, Vacuum Innovations, LLC and Univ. of Rochester LLEJim Oliver is founder and owner of Vacuum Innovations, LLC and is a research engineer atthe University of Rochester’s Laboratory for Laser Energetics. A graduate of the Universityof Rochester’s Institute of Optics, his work has focused on process design and modeling forprecision evaporated coatings. Thin-film uniformity control is of particular interest, havingdeveloped advanced distribution models and planetary rotation systems. He also teachesoptical coating design at the Institute of Optics as well as at the Institute’s annual thin filmsummer school program.Also available through the SVC On Location Education ProgramC-210 Introduction to Plasma Processing Technology(half day)Tuesday, May 11:00 p.m.—4:30 p.m.Tutorial fee: $395 Student fee: $70The goal of the tutorial is to show the link and provide understandingof relations between coating application, coating (or modified surface)properties, selection criteria on process characteristics, selection criteria onplasma parameters, and method design. It is possible to predict how theprocess parameters will be reflected in the coating and in the opposite direction,requirements on the coating properties can imply how the processshould be designed.Topical Outline:• Plasma-assisted technologies, general attributes• Useful criteria, basic relations and limits for plasma, classification of plasmas• Generation of gas discharge plasma, plasma diagnostics• Generation of vapor species, transport through medium, diffusion, condensationat the surface• Consequences of the deposition process on film propertiesTuesday, May 1• Fundamentals of radical and ion-assisted plasma chemistry• Homogeneous and heterogeneous plasma-assisted reaction in deposition offilms• Examples of novel plasma processes• Limits and new trends• Hybrid plasma processesInstructor: Hana Baránková, Professor, Angstrom Laboratory, UppsalaUniversity – SwedenInstructor: Ladislav Bárdos, Professor, Uppsala University – SwedenHana Baránková is Professor at the Angstrom Laboratory, Uppsala University and Directorof the interdisciplinary program/center on environmental applications of plasma. Shereceived her PhD from the Czech Academy of Science. Her primary interests are innovationin coating technology, development of plasma sources, plasma processing andplasma treatment of surfaces and gases. She has published over 140 scientific papers andconference contributions and holds several industrial patents on plasma systems. She isan inventor of metastable assisted deposition and co-inventor of the Linear Arc Discharge(LAD) source, the Magnets-in-Motion concept in plasma sources and Fused Hollow Cathodeand Hybrid Hollow Electrode Activated Discharge (H-HEAD) cold atmospheric plasmasources. Hana Baránková has been serving 6 years on the SVC Board of Directors, andas TAC Chair of Emerging Technologies over the years. She is Secretary of SVC, organizerof Atmospheric Plasma Technologies session and Heuréka! sessions and member of theEducation, Strategic Planning, International Relations, Scholarship, and Student SponsorshipCommittees. Hana is 2006 Mentor Award recipient for the development of numerousnovel plasma sources. She acts as a consultant and is a co-founder of two companies, BBPlasma HB and BB Plasma Design AB.Ladislav Bárdos is Professor at Uppsala University in Sweden and Research leader of thePlasma group at the Angstrom laboratory. He received his PhD in 1978 from the CzechAcad. Sci. and a Doctor of Science degree from Charles University in Prague in 1995. In1984 he was awarded the Czechoslovak State Prize for outstanding research results inthe plasma deposition of thin films. He has more than 25 years of experience in the fieldof applied plasma physics and thin films. He has published over 200 scientific papers andconference contributions, designed several plasma sources for industry and has 15 Czech,7 Swedish and several international patents. He runs a consulting company in plasmasources and processing technology. His primary interests are microwave plasmas, includingdownstream ECR and surface-wave generation, and particularly the radio frequencygenerated hollow cathodes and hybrid sources at both low and atmospheric pressures.Lad Bardos is Program Chair for 2009 and 2010 SVC TechCons, is currently serving on theSVC Board of Directors and is TAC chair of a special session Heuréka! at the SVC TechConand a member of the SVC Publications and Strategic Planning Committees.Also available through the SVC On Location Education ProgramSVC On Location Education ProgramBring High-Quality, Practical Tutorials in PVDProcessing and Vacuum Technology to a FacilityThat You Select!The SVC On-Location Education Program provides:• Instructors who are recognized professionals in vacuum technologyand PVD processing• Practical information that will assist your staff in the R&D andmanufacturing environment• Convenient scheduling that lets you choose where and when thecourse will be taught• Cost-effective education eliminates time-away-from-work, travelexpenses, and individual tutorial attendee fees.For a current list of tutorial descriptions, visit www.svc.org and explore the“Education” button on the main page. For technical questions regarding thetutorial content, contact the SVC Administrative Office at 505/856-7188 orE-mail svcinfo@svc.org.24Society of Vacuum Coaters » 2012 TechCon Preliminary Program

Wednesday, May 2C-212 Troubleshooting for Thin Film DepositionProcessesWednesday, May 28:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95Vacuum deposited thin films are used for optical coatings, electricallyconductivecoatings, semiconductor wafer fabrication, and a wide varietyof other uses. They may be deposited on glass, plastic, semiconductors,and other materials. Usually, a vacuum deposition process producesdurable, adherant films of good quality. But what do you do when thingsgo wrong? Not all films can be deposited on all substrate materials.Sometimes films peel off or crack. Other times they are cloudy, absorbing,scattering, or have other unacceptable properties.This tutorial will teach you about techniques and tools that can be used toidentify the source of the problems, correct the process, and get back intoproduction. It will also help in learning how to develop new processesand products. The tutorial is designed for process engineers and technicians,quality control personnel, thin film designers, and maintenancestaff.Topical Outline:• Mechanical, electrical, and optical properties of thin films• Process parameters that affect film properties• Gauge and instrument calibration• Properties of substrate surfaces• Measurement of film stress• Detection of contamination• Introduction to surface analysis techniques (Auger, ESCA, SIMS, FTIR)• Substrate preparation and cleaningInstructor: Gary S. Ash, President, Castle Brook CorporationGary S. Ash is President of Castle Brook Corporation, Dartmouth, MA. The companyprovides technical and management consulting services for the vacuum and cryogenicsindustry. He has had more than 35 years of experience in vacuum systems, pumpsand other components, deposition processes ranging from evaporation to sputtering tomolecular beam epitaxy. Engineering experience includes equipment and process design,manufacturing process development, materials and failure analysis, and applicationssupport. In addition, he has had extensive experience in product strategy, development,and manufacturing planning for industrial products and services. He was previouslyemployed by the CTI-Cryogenics division of Helix Technology Corporation, ASTeX, RIBERdivision of Instruments SA, Optical Coating Laboratory Inc., Spectrum Systems division ofBarnes Engineering Co., AAI Corporation, and American Electronic Laboratories. He holdsBS and MS degrees in electrical engineering from Cornell University and a PhD in opticalphysics from Heriot-Watt University, Edinburgh, Scotland.Also available through the SVC On Location Education Program2012 Tutorial CoursesV-207 Practical Aspects of Vacuum Technology:Operation and Maintenance of Production VacuumSystemsWednesday, May 28:30 a.m.—4:30 p.m.Tutorial fee: $570 Student fee: $95This tutorial is designed to teach the basic fundamentals of vacuumtechnology to technicians, equipment operators, line process operators,and maintenance personnel. This tutorial will address how to use andmaintain an existing vacuum effectively, not how to design a system. Theintroduction will consist of a very basic explanation of what a vacuum isand how it is attained and proceeds to an explanation of the three gasflow regimes (i.e., viscous, transition, and molecular flow). This is followedby a description of the types of pumps used in the viscous flow region(e.g., mechanical displacement pumps, venturi/suction pumps, andsorption pumps). Types of high vacuum pumps are next discussed; theseinclude diffusion pumps, turbopumps, and cryopumps. Presented nextis a guide for selecting a pressure gauge which includes a descriptionof various types of gauges and details their useful pressure range andmeasurement precision.The next section deals with the care and maintenance of pumps andvacuum systems, including both compressible “rubber” gasket and metalgasket systems. The unique role that water plays in both pumpdownfrom atmosphere and in outgassing is addressed, and techniques to ameliorateits harmful effects will be presented. The effects of other unique“bad actors” are also discussed. Many useful charts and tables will bepresented and explained.Participants are requested to present any problems or difficulty thatthey may be experiencing with their vacuum systems for discussion. Thismakes for very interesting examples, and the problem might actually besolved.Topical Outline:• Introduction to vacuum• Explanation of the three gas flow regimes• Viscous flow pumps• High vacuum pumps• Guide for selecting a pressure gauge• Care and maintenance of pumps and vacuum systems, including both compressible“rubber” gasket and metal gasket systems• Evaluating system performance: pumpdown rate and leak-up rate• Leak detection and correction• Cleaning and conditioning of vacuum components and system• Operation of vacuum systems: crossover pressure, interlocks, and safety• Applications of vacuum systems for vacuum coating• Pumpdown and outgassing• Descriptions of other vacuum related tutorials presented by SVCInstructor: Robert (Bob) A. Langley, Oak Ridge Scientific ConsultantsRobert (Bob) A. Langley retired from Oak Ridge National Laboratory in 1994 and SandiaNational Laboratories in 1999. He has performed research in the fields of atomic andmolecular physics, solid state physics, material science, vacuum science and technology,upper atmospheric phenomena, fusion power research, and high-energy accelerators,published over 130 scientific papers and is a Fellow of the American Vacuum Society. Heobtained his BS, MS and PhD in physics at Georgia Tech and accepted visiting academicpositions at Princeton University and University of New Castle, Australia. He is associateeditor of Vacuum Technology and Coating magazine, teaches vacuum related coursesfor the American Vacuum Society and the Society of Vacuum Coaters, served on theBoard of Directors of the AVS, and at present consults on vacuum science and technology,and microwave material processing.Also available through the SVC On Location Education Program505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org25

2012 Exhibit & Target MarketingHighlights for Exhibitors and Visitors in Santa ClaraExhibit Hall is 85% FullWe’re selling booths at a rapid pace! SVC welcomed a record number of Exhibit Visitors at the 2009TechCon in Santa Clara, California. Don’t miss this chance to exhibit in the heart of the Silicon Valley -the economic center of American high-tech business, academia, innovation and development.Reserve Your Booth Today Using the On-line Booth Registration SystemVisit www.svc.org and click on the Exhibit portion of the 2012 TechCon banner to preview the realtimeinteractive floorplan and exhibitor list, choose your preferred location and reserve your boothbefore it’s too late.Once you have completed the booth registration and secured your spot, you can then complete yourcompany’s on-line profile on the SVC TechCon Web Site. Create an on-line profile to help Attendeesfind YOU before and during TechCon Exhibit. The SVC Exhibit is accessible on the web and from anysmart device.Potential Attendees are Looking for You!Get started by logging into the Exhibitor Console• Create your 2000 character company description• Create your 500 character paragraph for publication in the TechCon Exhibit Guide• Choose your products and services categories• Add show specials to your profileEnhance your presence on the TechCon website and enhance pre-conference marketing activity withone of the following Add-Ons:• Prominent banner ads: from $595 to $895(Gold sponsors receive a complimentary banner on the TechCon web site as a benefit - $895 value)• Visit Us Now! Company logo and link: $495• Press Releases (3 for $95) highlighting news, products and show specials.Companies participating in the TechCon Sponsorship Program are entitled to upload unlimited pressreleases as part of the sponsor benefits.Go to the Exhibitor Meeting!Want to earn 5 Exhibit Points for your company and a chance to pick your booth first for 2013? Makesure at least one member of your Exhibit Staff attends the Exhibitor Meeting on Wednesday, May 2,2012, from 9:00 – 10:00 a.m. (before the Exhibit opens)! The meeting agenda will be broadcast viathe new Exhibit Focus digital newsletter prior to the Exhibit. The new point system will be described,including details on exciting incentives for early booth reservations.What you get for attending this meeting:• 1st Choice Booth Drawing: One entry per Exhibiting Company• Earn 5 points for having a representative from your company in attendance for the entire meetingThe SVC Exhibit is Accessible on any Smart Device!New! ChirpE mobile application makes it easy for exhibit visitors to access eventinformation on the web, strengthen social communities and continuously share informationabout your company or participation at the TechCon. This valuable accessto attendees offers exhibitors one more way to capture, engage and educate theirtarget audience about their brand, products and special offerings.Networking Events that MergeTechnology and BusinessThe SVC Exhibit in Santa Clara will combine abusiness-friendly environment with opportunitiesto learn, network and conduct businessduring the two-day event.• Free Wireless Internet in the Exhibit Hall• Technical Poster Presentations• Cyber Café in the Exhibit Hall• New! Lunchtime Beerposium to open theExhibit on Tuesday• Exhibit Reception, lunch and specialtybreaks (including sponsored Java Cart CoffeeStation)• Beer Blast Exhibit Grand Finale on Wednesdayafternoon• New! Complimentary transportation toSantana Row on Tuesday eveningHow to Use Your ExhibitorPromotional CodeSVC is charging a $20 registration fee for ExhibitVisitors in Santa Clara. This fee will be waivedfor visitors if they have an Exhibitor PromotionalCode when registering. To help you marketyour presence at the TechCon, we encourageyou to send your Exhibitor Promotional Code(provided by SVC to each exhibitor) to an unlimitednumber of visitors to use to waive the$20 registration fee.To help you with this promotion, SVC willprovide a customized Electronic Postcard toevery exhibitor; or you can create your ownannouncement to send to your customers. Thisserves to promote the SVC, the TechCon andyour participation in the event.Sponsors and Advertisers Benefit from New Point SystemMore Points = Better Booth LocationSVC is providing more ways to earn points for the 2013 Exhibit in Providence, RhodeIsland! Earn points for being a 2012 TechCon Sponsor and SVC Advertiser. Earn 1 point forevery $1,000 you spend on Sponsorships and Advertising in 2012 (applicable for boothplacement in 2013 Exhibit in Providence, Rhode Island). Not only do you get double pointsfor booking multiple booths, but you can add points quickly by becoming a TechCon Sponsoror by advertising in the SVC Bulletin, TechCon Exhibit Guide and on the Web Site.Not sure how many points you have? Visit the TechCon website and click on How manypoints do I have? to see how many points you and your competitors have (and how youearned these points). Not happy with your total? Look at the chart to the right to discovernew ways to earn points and get an advantage on the Exhibit floor in 2013.Old Point System Point System for 2012• 10x10 Booth . ...... 1 point• Corporate Sponsor ...1 point• Hotel Reservations ...3 pointsat Host Hotel before deadline• Hotel Reservations ... 1 pointat Host Hotel after deadline• (1) 10x10 Booth . ..... 1 point(2) 10x10 Booths . .... 4 points(3) 10x10 Booths . .... 6 points(4) 10x10 Booths . .... 8 points• Corporate Sponsor ....1 point• Hotel Reservations ....3 pointsat Host Hotel before deadline• Hotel Reservations ....1 pointat Host Hotel after deadline• Every $1000 spent onAdvertising with SVC . . 1 point• Every $1000 spent onTechCon Sponsorship . . 1 point• Exhibitor Meeting . .... 5 points28Society of Vacuum Coaters » 2012 2011 TechCon Preliminary Program

Conference Registration InformationThe On-line Registration Process at www.svc.org will guide youthrough the Registration StepsIf you are unable to register on-line, please contact SVC to request aregistration form.1. Personnel from an Exhibiting Company and Manufacturer’s RepsIndividuals from Exhibiting companies who wish to register forthe TechCon or Tutorials have a special path to follow using theOn-line Registration System. It is strongly recommended that Exhibitbooth contacts ask their booth personnel to individually registerfor the TechCon using the On-line Registration System, since thereare opportunities to register for other events (such as the Tuesdayevening Networking Event) and/or purchase other products.2. Conference Registrant (including presenters and exhibitors) Completethe on-line registration form including the payment section.3. Invited Presenter ONLY (already approved by the Program Chairs)No fee is required but it is necessary to complete the on-line registrationform. A special registration link is provided.4. Students—Use the paths designated for Students or Tutorial CourseRegistrant OnlyGeneral Conference Information• Special reduced TechCon registration fees apply to students,Young Members and Member/Non-Member presenters.• Register early! Individual tutorial fees and conference registrationfees are $100 higher than the fees in this Preliminary Program afterApril 5, 2012 (this does not apply to students or the Young MembersGroup).Cancellation Policy• Only Conference registration cancellations received on or before April5, 2012, will be refunded. Refunds will be made upon receipt of awritten notice, less a $25 service fee for the TechCon No refunds willbe made for cancellations received after April 5, 2012.Membership Issues—Please Note!You must pay your 2012 Membership Dues before you can register at the“Member Rate” for the 2012 TechCon.Special NeedsIf you have disability or dietary needs, please contact SVC with thedetails.Tutorial Courses Offered at the 2012 TechConRegistration for Tutorial CoursesYou do not have to register for the TechCon or be a member of SVC to attendthe Tutorial Courses. Fees are the same for SVC Members and Non-Members. Full-time students receive substantially lower fees (Student IDcard required).Go to the Education Program button and click on “At the TechCon” toreview tutorial titles and descriptions, topical outlines, detailed syllabus,dates, fees and biographical sketch of each instructor.Register Early! Fees increase by $100 each after April 5, 2012 (this doesnot apply to students). Register for the Tutorials when you register forthe conference.Discounts Offered to Multiple Registrants from oneorganizationSVC is offering a 25% discount on each tutorial registration for the secondor more employee in a company who enrolls in the same tutorial asthe first employee (this discount does not apply to the Student rate).On-Site RegistrationSVC Registration is located in the main foyer of the Santa Clara ConventionCenter• Saturday, April 28 7:15 a.m.–10:00 a.m.• Sunday, April 29 7:15 a.m.–7:00 p.m.• Monday, April 30 7:15 a.m.–6:00 p.m.• Tuesday, May 1 7:15 a.m.–5:00 p.m.• Wednesday, May 2 7:15 a.m.–5:00 p.m.• Thursday, May 3 7:30 a.m.–12:30 p.m.Conference Registration Fees• TechCon Registration fees include the following social/networkingevents:- Welcome Reception on Sunday, April 28 at 7:00 p.m.- Reception in the Exhibit Hall on Tuesday, May 1 at 4:45 p.m.- Luncheon and Beerposium in the Exhibit Hall on Wednesday, May 2at 12:00 p.m.- Technology Forum Breakfasts on Monday and Tuesday, April 30 andMay 1 at 7:00 a.m.• All Conference registrants receive a copy of the CD-ROM for the1991–2012 Conference Proceedings to be released in the Fall of 2012.• SVC membership in 2012 is provided to those paying the Non-MemberConference fee.Conference and Hotel Registration is OpenThe 2012 TechCon willbe April 28–May 3, 2012at the Santa Clara ConventionCenter, SantaClara, CA. The HyattRegency Santa Clara willbe the HeadquartersHotel.Hyatt Regency Santa Clara- $175.00 single/double plus taxes; Government Rate rooms availableHilton Santa Clara- $175.00 single/double plus taxesBiltmore Hotel & Suites, Santa Clara- $135.00 Tower Suite rooms; single/double occupancy plus taxesNote: For the multiple registrant discount to apply, you need to pay thefull tutorial registration fees on the On-line Registration system. Thensend an E-mail to svcinfo@svc.org and request the discounted fee. Discountswill be refunded after the TechCon.Cancellation PolicyTutorial course cancellations received on or before April 5, 2012 will berefunded. Refunds will be made after receipt of written notice, less a $25service fee for each individual tutorial course. No refunds will be madeafter April 5, 2012.SVC reserves the right to cancel any Tutorial. If a Tutorial is cancelled,registrants will be notified and a full refund of the tuition will be made.30Society of Vacuum Coaters » 2012 TechCon Preliminary Program

Conference Registration InformationUse this worksheet to prepare for completing your on-line conference registration at www.svc.org.If you are unable to use the on-line registration, please contact SVC at svcinfo@svc.org to request a registration form.› Renew Your Membership for 2012 or Join SVC On-Line Member ‡ Non-MemberAttendee Registration (through 4/5/12/after 4/5/12) (through 4/5/12/after 4/5/12)❏ Full Conference ...................................................................$565.00/$665.00 . ......... $695.00/$795.00❏ Invited Presenter ............................................................................$0.00 . .................. $0.00❏ Presenter in Technical Sessions .......................................................$395.00/$495.00 . ......... $495.00/$595.00Note: Presenter Rate does not apply to co-authors❏ Media Personnel ............................................................................$0.00 . .................. $0.00❏ Student Conference ........................................................................$65.00 . ................ $115.00❏ Student Presenter in Technical Sessions .........................................................$40.00 . ................. $90.00❏ Young Members Group Conference ...........................................................$225.00 . ................ $275.00❏ Young Members Group Presenter in Technical Sessions ............................................$140.00 . ................ $195.00❏ Tutorial Course(s) Only ...............................................................See Fees Below . .......... See Fees Below❏ Exhibit Visitor Only (Exhibit Visitors can get fee waived using an Exhibitor Promotional Code) . .......................$20.00 . ................. $20.00‡ Member Fee applies only to those who have paid their 2012 Membership Dues.› Renew Your Membership for 2012 or Join SVC On-Line Member ‡ Non-MemberExhibitor Registration (through 4/5/12/after 4/5/12) (through 4/5/12/after 4/5/12)❏ Exhibitor Booth Personnel and Manufacturer’s Representative . ........................................$0.00 . ...................$0.00❏ Exhibitor with Full Conference Registration ...............................................$565.00/$665.00 . ......... $695.00/$795.00❏ Exhibitor Presenter in Technical Sessions ................................................$395.00/$495.00 . ......... $495.00/$595.00Complimentary transportationto Santana Row onTuesday eveningSpecial Events at the TechCon❏ Vacuum Wizard Program (Wednesday morning) . ........................ $40.00❏ SVC Foundation 5K Run (Tuesday morning) includes a T-shirt . ............$25.00❏ SVC Foundation Golf and Give Tournament (Sunday afternoon) . .......$140.00includes 18 holes of golf, cart fees, 2 drink tickets❏ Welcome Reception (Sunday evening) . .............................No fee❏ Complimentary Transportation to Santana Row in San Jose . .........No fee(Tuesday evening) Please indicate your interest when registeringSVC Foundation5K RunSaturday, April 28Reg/Student❏ V-204* Vacuum Systems, Materials and Operation ..................... $670/$190❏ C-103* An Introduction to Physical Vapor Deposition (PVD) Processes ....... $670/$190❏ C-311 Thin Film Growth and Microstructure Evolution .................. $570/$95❏ C-332 NEW! Zinc Oxide-Based and Other TCO Alternatives to ITO: Materials,Deposition, Properties and Applications ........................ $570/$95Sunday, April 29Reg/Student❏ C-203 Sputter Deposition (Day 1 of 2-Day Tutorial) .................... $895/$190❏ C-301* Optical Coating Design .................................... $620/$145❏ C-335 NEW! Understanding Solar Cells (Half-day a.m.) ................... $395/$70❏ C-330 Introduction to Thin Film Photovoltaic Technologies (Half-day p.m.) . . . . . . $395/$70❏ C-323 High Power Impulse Magnetron Sputtering .........................$570/$95Monday, April 30Reg/Student❏ C-203 Sputter Deposition (Day 2 of 2-Day Tutorial) .................... see above❏ C-211 Sputter Deposition onto Flexible Substrates ..................... $570/$95❏ C-322 Characterization of Thin Films ............................... $570/$95❏ C-302 Practical Aspects of Optical Coatings .......................... $570/$95Tuesday, May 1Reg/Student❏ C-210 Introduction to Plasma Processing Technology (Half-day p.m.) ........ $395/$70❏ C-318 Nanostructures: Strategies for Self-Organized Growth (Half-day a.m.) ... $395/$70Tuesday, May 1 (continued)Reg/Student❏ C-208 Sputter Deposition in Manufacturing .......................... $570/$95❏ C-333 NEW! Practice and Applications of High Power Impulse MagnetronSputtering (HIPIMS) (Half-day a.m.) ............................ $395/$70❏ M-102 NEW! Introduction to Ellipsometry (Half-day a.m.) ................. $395/$70❏ C-328 Properties and Applications of Tribological Coatings (Half-day p.m.) .... $395/$70❏ C-326 Manufacture of Precision Evaporative Coatings (Half-day p.m.) ....... $395/$70Wednesday, May 2Reg/Student❏ C-212 Troubleshooting for Thin Film Deposition Processes ............... $570/$95❏ V-207 Practical Aspects of Vacuum Technology: Operation and. . . . . . . . . . . . $570/$95Maintenance of Production Vacuum Systems❏ C-331 NEW! Ion Beam Processing Technology ........................ $570/$95❏ C-317 Practice of Reactive Sputtering .............................. $570/$95Thursday, May 3Reg/Student❏ C-320 Diamond Like Carbon Coatings – Basics to Industrial Realization ..... $395/$70(Half-day a.m.)❏ C-324 Atmospheric Plasma Technologies (Half-day a.m.) .................. $395/$70❏ C-316 NEW! Introduction to Atomic Layer Deposition (ALD) (Half-day a.m) ......$395/$70* Indicates that a textbook is included with these courses.505/856-7188 Fax 505/856-6716 » E-mail svcinfo@svc.org » Web Site www.svc.org31

TechCon SponsorsSanta Clara 2012Choose from one of our Level Sponsorships or a special program sponsorship to raise corporate awareness, promote new productsand services, and enhance exhibit participation. You do not need to be an exhibiting company to participate in the SponsorProgram. Official sponsors are recognized during their sponsored event, and also with prominent on-site signage, on the SVCWeb Site and in all SVC publications.› LEVEL SPONSORS ‹ › SPECIAL EVENT AND SPECIALTY ITEM SPONSORS ‹Gold - $2,800› Agilent Technologies› R.D. Mathis Company› Sidrabe, Inc.› Vacuum Research CorporationSilver - $1,500› Advanced Energy Industries, Inc.› Extrel CMS, LLC› General Plasma, Inc.› GfE Materials Technology, Inc.› Heraeus Materials Technology LLC› Indium CorporationBronze - $900› EBARA Technologies, Inc.› Hauzer Techno Coating› Kurt J. Lesker Company› Thermal Conductive Bonding, Inc.Beer Blast Sponsor SOLD!› VON ARDENNE, GermanyUSB Flash Drive Sponsor SOLD!› INFICONNotepad Sponsor SOLD!› Advanced Chemical CompanyRegistration Tote Bags SOLD!› Brooks Automation, Inc.› Denton Vacuum, LLC› DHF Technical Products› Korea Vac-Tec Co., Ltd.› Zpulser, LLCRegistration Splash Page SOLD!› Brooks Automation, Inc.Badge Lanyards SOLD!› TelemarkExhibit Opening Lunchtime Beerposium -“It’s five o’clock somewhere” SOLD!› Materion CorporationBottled Water SOLD!› DHF Technical ProductsJava Cart Coffee Station Sponsor - $2,300› Soleras Ltd.› Vacuum Research CorporationExhibitor Lounge Sponsor SOLD!› Physics TodayHotel Splash Page SOLD!› Zpulser, LLCExhibit Reception Drink Ticket - $2,000› Two Sponsorships AvailableWelcome Reception Drink Ticket - $1,500› Two Sponsorships Availablewww.physicst day.orgAdd SVC to your 2012 Marketing PlanTo learn more about advertising and sponsorship opportunities, visit www.svc.org or call 505/856-7188