IVS TECHNICAL WORKSHOP ATOMIC LAYER DEPOSITION ...

THE ISRAEL VACUUM SOCIETYScience, Technology & Applicationsíå÷àåì úéìàøùéä äãåâàäíéîåùééå äéâåìåðëè ,òãîTHE ISRAEL VACUUM SOCIETYScience, Technology & Applicationsíå÷àåì úéìàøùéä äãåâàäíéîåùééå äéâåìåðëè ,òãîIVS TECHNICAL WORKSHOPATOMIC LAYER DEPOSITIONORGANIZING ANDPROGRAM COMMITTEECohen S., WISSukenik C., BIUThursday, July 8, 2010Bar-Ilan University, Ramat GanSPONSORS*AVS Science & Technology*Bar Ilan Institue ofNanotechnology & AdvancedMaterials*Getter Bio-Med Ltd*Picotech* Segen Technologies LTD*Weizmann Institute ofScience, The Helen andMartin Kimmel Center forNanoscale ScienceSHORT COURSESteven George, University of ColoradoTECHNICAL TALKSEric W. Deguns, Cambridge NanoTechALD Applications for Research and Development: from High AspectRatio Features to Plasma Enhanced DepositionVille Malinen, BeneqALD from R&D toIndustry: Selected Examples Beyond IC TechnologyJuhana Kostamo, PicosunBridging Between Research and Production with ALD Technology: SelectedDesign ConsiderationsIVS - CONFERENCESECRETARIATGalit WeizmanIvscon2009@gmail.comPhone: + 972- 54- 5580727Fax: + 153 - 4 - 8241602RESEARCH TALKSJoseph Salzman, TechnionHigh-k Dielectric Layers for Low Power Microelectronics andNonvolatile Memory DevicesFernando Patolsky, Tel Aviv UniversityHeteroepitaxial Si/ZnO Hierarchical Nanostructures for FutureOptoelectronic DevicesCommercial Exhibit on siteTour of Bar Ilan Nanocenter and ALD Facilities at day endRegistration and information:http://www.science.co.il/ivs/conferences/2010/ALD/