Semiconductor Physics Sectional Programme Overview ...
Semiconductor Physics Sectional Programme Overview ...
Semiconductor Physics Sectional Programme Overview ...
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<strong>Semiconductor</strong> <strong>Physics</strong> Tuesday<br />
HL 14.7 Tue 12:30 POT 151<br />
Mid-infrared photocurrent spectroscopy of thin ZnO films —<br />
•H. Frenzel, A. Weber, H. v. Wenckstern, G. Biehne, H.<br />
Hochmuth, M. Lorenz, and M. Grundmann — Universität Leipzig,<br />
Institut für Experimentelle Physik II, Linnéstr. 5, 04103 Leipzig, Germany<br />
We investigate mid-infrared photocurrent properties of thin ZnO films<br />
in a temperature range from 4 K to 300 K. The films were grown by<br />
pulsed laser deposition on a-plane sapphire substrates with substrate<br />
temperatures varying from 550 ◦ C to 800 ◦ C and oxygen partial pressures<br />
between 10 −3 to 0.1 mbar [1]. High-quality Pd/ZnO Schottky diodes were<br />
realized by thermal evaporation of Pd on the Zn-face of the c-oriented<br />
thin films. The ideality factors of the diodes were characterized with<br />
Current–Voltage (I–U) measurements.<br />
The optical absorption by shallow impurity traps in the ZnO space<br />
charge region of the diodes is studied with Fourier transform infrared<br />
photocurrent spectroscopy. The results are compared to non-optical techniques<br />
like deep level transient spectroscopy [2].<br />
[1] E. M. Kaidashev, et al., Appl. Phys. Lett. 82, 3901 (2003).<br />
[2] M. Grundmann, et al.: in Zinc Oxide – A Material for Micro- and<br />
Optoelectronic Applications (eds.: N. H. Nickel and E. Terukov), 47–57,<br />
Springer (2005).<br />
HL 14.8 Tue 12:45 POT 151<br />
ZnO nanorods as laser emitters — •Robert Hauschild 1 , Holger<br />
Lange 1 , Alexander Urban 1 , Hongjin Fan 2 , Margit Zacharias 2 ,<br />
Claus Klingshirn 1 , and Heinz Kalt 1 — 1 Universität Karlsruhe,<br />
Karlsruhe, Germany — 2 Max-Planck-Institut für Mikrostrukturphysik,<br />
Halle, Germany<br />
By means of time resolved spectroscopy and numerical calculations we<br />
evaluate different ZnO nanorods samples with respect to their suitability<br />
as stimulated emitters. The influence of diameter and length on the<br />
HL 15 III-V semiconductors II<br />
field enhancement inside the nanorods is studied numerically by solving<br />
the scalar Helmholtz equation in 3D. According to our simulations the<br />
interface nanorod/substrate is mainly responsible for the low Q value of<br />
the nanorod resonators. In one sample a variation in VLS growth results<br />
in gold nanoparticles being present at the bottom of nanorods. This<br />
layer enhances the resonator properties of the nanorods due to the larger<br />
reflectivity. The better mode confinement in these nanorods is also confirmed<br />
by the finite element analysis. Consequently, laser emission from<br />
single rods of this sample is evidenced up to 150 K.<br />
HL 14.9 Tue 13:00 POT 151<br />
Thickness dependent magnetoresistance of ZnCoO:Al thin films<br />
— •Qingyu Xu, Lars Hartmann, Heidemarie Schmidt, Holger<br />
Hochmuth, Michael Lorenz, Rüdiger Schmidt-Grund, Daniel<br />
Spemann, and Marius Grundmann — Universität Leipzig, Fakultät<br />
für Physik und Geowissenschaften, Institut für Experimentelle Physik II,<br />
Linnéstrasse 5, D-04103 Leipzig, Germany<br />
Zn0.90Co0.10O films doped with 0.5 at% Al of different thickness (689<br />
nm, 408 nm, 355 nm) were prepared by pulsed laser deposition (PLD)<br />
on a-plane sapphire substrates. The room temperature electron concentration<br />
and mobility increase from 2 × 10 18 cm −3 and 12 cm 2 V −1 s −1 to<br />
2 × 10 19 cm −3 and 36 cm 2 V −1 s −1 with increasing film thickness, respectively.<br />
Magnetoresistance (MR) effects were measured in the temperature<br />
range from 5 K to 290 K. At low temperature, the positive MR increases<br />
with decreasing film thickness. With increasing temperature, the MR<br />
of the thicker film will change to negative, while positive MR was still<br />
observed for the 355 nm thick film at room temperature. Anomalous<br />
Hall effect (AHE) provides information about the Co-generated internal<br />
field experienced by itinerant carriers. AHE was observed in the<br />
355 nm thick film at 20 K, indicating possible intrinsic ferromagnetism<br />
in Zn0.90Co0.10O. The observed thickness dependence of the MR suggests<br />
that structural defects may play an important role in the ferromagnetism<br />
of ZnCoO:Al thin films.<br />
Time: Tuesday 11:00–13:15 Room: POT 51<br />
HL 15.1 Tue 11:00 POT 51<br />
Incorporation of N at GaAs and InAs Surfaces — •Hazem Abu-<br />
Farsakh 1,2 , Alexey Dick 1 , and Jörg Neugebauer 1,2 — 1 Max-<br />
Planck-Institut für Eisenforschung GmbH, Max-Planck-Straße 1, 40237<br />
Düsseldorf, Germany — 2 Universität Paderborn, Warburger Straße 100,<br />
33098 Paderborn, Germany<br />
Recently, GaAsN and GaInNAs alloys with low N content have attracted<br />
a remarkable interest for making laser diodes operating in the<br />
1.3-1.6 µm region which is interesting for optical fiber communications.<br />
A specific problem for practical applications is the extremely low bulk<br />
equilibrium solubility of N in GaAs at typical growth temperatures. An<br />
interesting option to increase the concentration of N is the use of surface<br />
kinetics by (i) identifying GaAs and InAs surfaces with a large N<br />
solubility, and (ii) identifying conditions which prevent/reduce surface<br />
aggregation of N. We have therefore calculated the surface phase diagrams<br />
of N at GaAs and InAs surfaces using density functional theory<br />
in the GGA approximation. Based on these results, we have estimated<br />
the maximum N equilibrium concentration at various surface orientations<br />
((110), (001)) for given temperature and chemical potentials, and<br />
compared them with recent experimental results. In addition, STM simulation<br />
of selected structures have been made and compared with available<br />
experimental images.<br />
HL 15.2 Tue 11:15 POT 51<br />
Combining quasiparticle energy calculations with exactexchange<br />
density-functional theory: the bandgap of InN —<br />
•Patrick Rinke 1 , Abdallah Qteish 2 , Jörg Neugebauer 1,3 , and<br />
Matthias Scheffler 1 — 1 Fritz-Haber-Institut der MPG, Berlin —<br />
2 Department of <strong>Physics</strong>, Yarmouk University, Irbid - Jordan — 3 MPI<br />
für Eisenforschung, Düsseldorf<br />
Amongst the group-III-nitrides InN assumes a special place because the<br />
magnitude of its bandgap is still controversial. If one believes densityfunctional<br />
theory (DFT) calculations in the local-density approximation<br />
(LDA) or LDA based quasiparticle energy calculations in the G0W0 approximation<br />
InN should be metallic. Recent experiments [1,2], however,<br />
place the band gap between 0.7 and 1.0 eV, significantly lower than previ-<br />
ously thought. For GaN and II-VI compounds we have shown that DFT<br />
in the exact-exchange (EXX) approach gives an improved description of<br />
the d-electron hybridization compared to the LDA. In combination with<br />
G0W0 calculations we achieve very good agreement with experiment for<br />
the band gaps of these compounds [3]. For InN the EXX calculations<br />
yield a semiconductor with a band gap of 0.8 eV in the zincblend phase<br />
[4] and 1.0 eV for wurtzite. In contrast to GaN the G0W0 corrections are<br />
negative and lower the band gap to 0.5 eV and 0.7 eV, respectively - in<br />
very good agreement with the new experimental data.<br />
[1] J. Wu et al., Appl. Phys. Lett. 80, 3967 (2002)<br />
[2] T. Takachi et al., Appl. Phys. Lett. 81, 1246 (2002)<br />
[3] P. Rinke et al., New J. Phys. 7, 126 (2005)<br />
[4] A. Qteish et al., Phys. Rev. B 72, 155317 (2005)<br />
HL 15.3 Tue 11:30 POT 51<br />
RARE-EARTH DOPANT IMPLANTATION INTO GAN<br />
AND ZNO — •R. Nédélec 1 , R. Vianden 1 , and ISOLDE<br />
Collaboration 2 — 1 HISKP, Nußallee 14-16, D-53115 Bonn, Germany<br />
— 2 CERN, CH-1211 Genève, Switzerland<br />
In the past, wide band-gap semiconductors for optical, high-power and<br />
high-temperature application have been intensively investigated. The<br />
observation of room temperature luminescence for various Rare Earth<br />
dopants in GaN has stimulated further interest in the incorporation these<br />
impurities in appropriate host lattices. A convenient way of introducing<br />
impurities into semiconductors is ion implantation. In order to study<br />
the implantation induced damage and its recovery by annealing we used<br />
the perturbed angular correlation technique (PAC). Our samples were<br />
implanted at the ISOLDE facility at CERN and then treated in a rapid<br />
thermal annealing furnace.<br />
We have studied the annealing behaviour and the temperature dependence<br />
of the electric field gradient (EFG) using the Rare Earth PAC probe<br />
172-Lu. The temperature dependence was investigated for temperatures<br />
below and above room temperature. The results will be discussed and<br />
compared to results obtained with the PAC probe 181-Hf.