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Semiconductor Physics Sectional Programme Overview ...

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<strong>Semiconductor</strong> <strong>Physics</strong> Tuesday<br />

HL 14.7 Tue 12:30 POT 151<br />

Mid-infrared photocurrent spectroscopy of thin ZnO films —<br />

•H. Frenzel, A. Weber, H. v. Wenckstern, G. Biehne, H.<br />

Hochmuth, M. Lorenz, and M. Grundmann — Universität Leipzig,<br />

Institut für Experimentelle Physik II, Linnéstr. 5, 04103 Leipzig, Germany<br />

We investigate mid-infrared photocurrent properties of thin ZnO films<br />

in a temperature range from 4 K to 300 K. The films were grown by<br />

pulsed laser deposition on a-plane sapphire substrates with substrate<br />

temperatures varying from 550 ◦ C to 800 ◦ C and oxygen partial pressures<br />

between 10 −3 to 0.1 mbar [1]. High-quality Pd/ZnO Schottky diodes were<br />

realized by thermal evaporation of Pd on the Zn-face of the c-oriented<br />

thin films. The ideality factors of the diodes were characterized with<br />

Current–Voltage (I–U) measurements.<br />

The optical absorption by shallow impurity traps in the ZnO space<br />

charge region of the diodes is studied with Fourier transform infrared<br />

photocurrent spectroscopy. The results are compared to non-optical techniques<br />

like deep level transient spectroscopy [2].<br />

[1] E. M. Kaidashev, et al., Appl. Phys. Lett. 82, 3901 (2003).<br />

[2] M. Grundmann, et al.: in Zinc Oxide – A Material for Micro- and<br />

Optoelectronic Applications (eds.: N. H. Nickel and E. Terukov), 47–57,<br />

Springer (2005).<br />

HL 14.8 Tue 12:45 POT 151<br />

ZnO nanorods as laser emitters — •Robert Hauschild 1 , Holger<br />

Lange 1 , Alexander Urban 1 , Hongjin Fan 2 , Margit Zacharias 2 ,<br />

Claus Klingshirn 1 , and Heinz Kalt 1 — 1 Universität Karlsruhe,<br />

Karlsruhe, Germany — 2 Max-Planck-Institut für Mikrostrukturphysik,<br />

Halle, Germany<br />

By means of time resolved spectroscopy and numerical calculations we<br />

evaluate different ZnO nanorods samples with respect to their suitability<br />

as stimulated emitters. The influence of diameter and length on the<br />

HL 15 III-V semiconductors II<br />

field enhancement inside the nanorods is studied numerically by solving<br />

the scalar Helmholtz equation in 3D. According to our simulations the<br />

interface nanorod/substrate is mainly responsible for the low Q value of<br />

the nanorod resonators. In one sample a variation in VLS growth results<br />

in gold nanoparticles being present at the bottom of nanorods. This<br />

layer enhances the resonator properties of the nanorods due to the larger<br />

reflectivity. The better mode confinement in these nanorods is also confirmed<br />

by the finite element analysis. Consequently, laser emission from<br />

single rods of this sample is evidenced up to 150 K.<br />

HL 14.9 Tue 13:00 POT 151<br />

Thickness dependent magnetoresistance of ZnCoO:Al thin films<br />

— •Qingyu Xu, Lars Hartmann, Heidemarie Schmidt, Holger<br />

Hochmuth, Michael Lorenz, Rüdiger Schmidt-Grund, Daniel<br />

Spemann, and Marius Grundmann — Universität Leipzig, Fakultät<br />

für Physik und Geowissenschaften, Institut für Experimentelle Physik II,<br />

Linnéstrasse 5, D-04103 Leipzig, Germany<br />

Zn0.90Co0.10O films doped with 0.5 at% Al of different thickness (689<br />

nm, 408 nm, 355 nm) were prepared by pulsed laser deposition (PLD)<br />

on a-plane sapphire substrates. The room temperature electron concentration<br />

and mobility increase from 2 × 10 18 cm −3 and 12 cm 2 V −1 s −1 to<br />

2 × 10 19 cm −3 and 36 cm 2 V −1 s −1 with increasing film thickness, respectively.<br />

Magnetoresistance (MR) effects were measured in the temperature<br />

range from 5 K to 290 K. At low temperature, the positive MR increases<br />

with decreasing film thickness. With increasing temperature, the MR<br />

of the thicker film will change to negative, while positive MR was still<br />

observed for the 355 nm thick film at room temperature. Anomalous<br />

Hall effect (AHE) provides information about the Co-generated internal<br />

field experienced by itinerant carriers. AHE was observed in the<br />

355 nm thick film at 20 K, indicating possible intrinsic ferromagnetism<br />

in Zn0.90Co0.10O. The observed thickness dependence of the MR suggests<br />

that structural defects may play an important role in the ferromagnetism<br />

of ZnCoO:Al thin films.<br />

Time: Tuesday 11:00–13:15 Room: POT 51<br />

HL 15.1 Tue 11:00 POT 51<br />

Incorporation of N at GaAs and InAs Surfaces — •Hazem Abu-<br />

Farsakh 1,2 , Alexey Dick 1 , and Jörg Neugebauer 1,2 — 1 Max-<br />

Planck-Institut für Eisenforschung GmbH, Max-Planck-Straße 1, 40237<br />

Düsseldorf, Germany — 2 Universität Paderborn, Warburger Straße 100,<br />

33098 Paderborn, Germany<br />

Recently, GaAsN and GaInNAs alloys with low N content have attracted<br />

a remarkable interest for making laser diodes operating in the<br />

1.3-1.6 µm region which is interesting for optical fiber communications.<br />

A specific problem for practical applications is the extremely low bulk<br />

equilibrium solubility of N in GaAs at typical growth temperatures. An<br />

interesting option to increase the concentration of N is the use of surface<br />

kinetics by (i) identifying GaAs and InAs surfaces with a large N<br />

solubility, and (ii) identifying conditions which prevent/reduce surface<br />

aggregation of N. We have therefore calculated the surface phase diagrams<br />

of N at GaAs and InAs surfaces using density functional theory<br />

in the GGA approximation. Based on these results, we have estimated<br />

the maximum N equilibrium concentration at various surface orientations<br />

((110), (001)) for given temperature and chemical potentials, and<br />

compared them with recent experimental results. In addition, STM simulation<br />

of selected structures have been made and compared with available<br />

experimental images.<br />

HL 15.2 Tue 11:15 POT 51<br />

Combining quasiparticle energy calculations with exactexchange<br />

density-functional theory: the bandgap of InN —<br />

•Patrick Rinke 1 , Abdallah Qteish 2 , Jörg Neugebauer 1,3 , and<br />

Matthias Scheffler 1 — 1 Fritz-Haber-Institut der MPG, Berlin —<br />

2 Department of <strong>Physics</strong>, Yarmouk University, Irbid - Jordan — 3 MPI<br />

für Eisenforschung, Düsseldorf<br />

Amongst the group-III-nitrides InN assumes a special place because the<br />

magnitude of its bandgap is still controversial. If one believes densityfunctional<br />

theory (DFT) calculations in the local-density approximation<br />

(LDA) or LDA based quasiparticle energy calculations in the G0W0 approximation<br />

InN should be metallic. Recent experiments [1,2], however,<br />

place the band gap between 0.7 and 1.0 eV, significantly lower than previ-<br />

ously thought. For GaN and II-VI compounds we have shown that DFT<br />

in the exact-exchange (EXX) approach gives an improved description of<br />

the d-electron hybridization compared to the LDA. In combination with<br />

G0W0 calculations we achieve very good agreement with experiment for<br />

the band gaps of these compounds [3]. For InN the EXX calculations<br />

yield a semiconductor with a band gap of 0.8 eV in the zincblend phase<br />

[4] and 1.0 eV for wurtzite. In contrast to GaN the G0W0 corrections are<br />

negative and lower the band gap to 0.5 eV and 0.7 eV, respectively - in<br />

very good agreement with the new experimental data.<br />

[1] J. Wu et al., Appl. Phys. Lett. 80, 3967 (2002)<br />

[2] T. Takachi et al., Appl. Phys. Lett. 81, 1246 (2002)<br />

[3] P. Rinke et al., New J. Phys. 7, 126 (2005)<br />

[4] A. Qteish et al., Phys. Rev. B 72, 155317 (2005)<br />

HL 15.3 Tue 11:30 POT 51<br />

RARE-EARTH DOPANT IMPLANTATION INTO GAN<br />

AND ZNO — •R. Nédélec 1 , R. Vianden 1 , and ISOLDE<br />

Collaboration 2 — 1 HISKP, Nußallee 14-16, D-53115 Bonn, Germany<br />

— 2 CERN, CH-1211 Genève, Switzerland<br />

In the past, wide band-gap semiconductors for optical, high-power and<br />

high-temperature application have been intensively investigated. The<br />

observation of room temperature luminescence for various Rare Earth<br />

dopants in GaN has stimulated further interest in the incorporation these<br />

impurities in appropriate host lattices. A convenient way of introducing<br />

impurities into semiconductors is ion implantation. In order to study<br />

the implantation induced damage and its recovery by annealing we used<br />

the perturbed angular correlation technique (PAC). Our samples were<br />

implanted at the ISOLDE facility at CERN and then treated in a rapid<br />

thermal annealing furnace.<br />

We have studied the annealing behaviour and the temperature dependence<br />

of the electric field gradient (EFG) using the Rare Earth PAC probe<br />

172-Lu. The temperature dependence was investigated for temperatures<br />

below and above room temperature. The results will be discussed and<br />

compared to results obtained with the PAC probe 181-Hf.

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