Instrumentation for Synchrotron Based Micro Machining at CAMD

Instrumentation for Synchrotron Based Micro Machining at CAMD
J. Goettert, G. Aigeldinger, Y. Desta, Z. L. Ling, and L. Rupp
CAMD, Louisiana State Univ., 6980 Jefferson Hwy., Baton Rouge, LA 70806, USA
The J. Bennett Johnston Sr., Center for Advanced Microstructures and Devices (CAMD) [1] is a
synchrotron radiation facility owned by Louisiana State University and operated with financial
support from the State of Louisiana. The centerpiece of CAMD is a 1.3-1.5 GeV electron storage
ring.
CAMD supports a strong program in X-ray Lithography Mircomachining (XRLM) or LIGA. A
total of 4 beamlines equipped with different scanners is available for exposures. A 2.500 sq.ft
class 100 clean room provides basic processing capability for MEMS including optical
lithography, thin film deposition, electroplating and metrology. Three micromachining beamlines
are connected to bending magnets. All beamlines are ‘white light’ beamlines, terminated with a
Beryllium window. The typical source point to scanner distance is 10 m and the horizontal
acceptance ranges from 6.5 – 10 mrad. A number of low Z filters can be inserted into the beam
adapting the exposure spectrum to the resist thickness. Two beamlines are equipped with
commercial scanners from Jenoptik GmbH [2] and one beamline with a ‘vacuum’ scanner
designed in house. The latest model of Jenoptik’s DEX02 scanner has been installed at CAMD’s
XRLM1 beamline in December 2000 and allows advanced exposures using overlay as well as tilt
and rotate functions (see Fig. 1). In addition to these beamlines CAMD has installed a ‘white
light’ beamline at its 7T wiggler source. Preliminary exposure tests in ultra-thick samples (1mm
and thicker) have been conducted using an ‘air scanner’ (see Fig. 2). Currently this beamline is
dismantled and will be reinstalled together with a PX beamline.
In the paper further details of the beamlines and scanners as well as some examples of
applications of LIGA microstructures fabricated at CAMD will be discussed.
Fig. 1: First exposures using tilt and rotate functions
of the DEX02 scanner into SU-8 negative resist.
References
Fig. 2: 1.78 mm tall PMMA gear fabricated at the wiggler
beamline. The close-up views illustrate the accurate
patterning at the bottom and top of the gear.
[1] For information how to submit a project proposal go to: http://www.camd.lsu.edu
[2] For details see Jenoptik’s webpage at www.jo-mikrotechnik.com/
Submitting author: J. Goettert, e-mail: jost@lsu.edu