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Curriculum Vitae T.Prohaska I - Department für Chemie - Boku

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<strong>Curriculum</strong> <strong>Vitae</strong> T.<strong>Prohaska</strong><br />

Education<br />

03/2002 Habilitation (venia docendi) in Analytical Chemistry, BOKU Vienna<br />

12/1994 Doctoral Examination: „Doktor der technischen Wissenschaften<br />

(Dr. techn.)“, Degree Summa cum Laude.<br />

12/1992 – 05/1995 Doctoral Thesis at the Institute of Analytical Chemistry: „Investigation of Surface<br />

Reactions by Scanning Probe Microscopy“;<br />

supervision: Prof. Dr. Manfred Grasserbauer, Univ.Ass. Dr. Gernot Friedbacher.<br />

11/1992: University Diploma in Technical Chemistry at the Vienna<br />

University of Technology, Degree Summa cum Laude.<br />

03/1992 – 10/1992 Diploma-thesis at the Institute of Analytical Chemistry: ‘In-situ Investigations of<br />

Surface Reactions on Alkali Halides by Atomic Force Microscopy (AFM)’.<br />

supervision: Prof. Dr. Manfred Grasserbauer, Univ.Ass. Dr. Gernot Friedbacher.<br />

04/1987-11/1992 Study of Technical Chemistry at the Vienna University of<br />

Technology.<br />

07/1986 School Leaving Examination (Abitur), Summa cum Laude.<br />

Research abroad<br />

01/1999 – 12/2000 EC research fellow (Marie Curie Stipendium) am European Commission<br />

Research Centre (IRMM) Geel/Belgien, Isotope Measurement Unit (M.<br />

Grasserbauer, P. Taylor)<br />

Reference measurements by IDMS, setup of a multicollector ICP-MS.<br />

06/1996 – 08/1996 Research work at the Muroran Institute of Technology Muroran/Japan,<br />

<strong>Department</strong> of Mechanical Engineering, (Prof. Dr. H. Shirahata)<br />

Rare earth element analysis by ICP-MS under cleanroom conditions.<br />

07/1994 – 08/1994 Research work at the UNICAMP Campinas/Brasilien <strong>Department</strong> of<br />

Semiconductor and Photonics (Prof.Dr. V.Baranauskas)<br />

Diamand film deposition on silicon and porous silicon analysis by AFM and STM.<br />

09/1993 Research work at the University of Technology Espoo/Finland, <strong>Department</strong> of<br />

Chemical Engineering and Laboratory of Inorganic and Analytical Chemistry<br />

(Prof.Dr. L.Niinistö)<br />

Thin film deposition by ALE and SILAR.<br />

II

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