slides in pdf - Università degli Studi di Pavia
slides in pdf - Università degli Studi di Pavia
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The <strong>in</strong> L<strong>in</strong>e Process<br />
Rotat<strong>in</strong>g Targets,<br />
Cathode<br />
5 - 8 cm<br />
Heater<br />
Anode<br />
Glow<br />
Discharge<br />
ITO sputter<strong>in</strong>g will be done<br />
with a rotatable magnetron<br />
target. In this way, the<br />
nodule formation on the<br />
ITO surface will be avoided<br />
and more than 85% of the<br />
target material will be<br />
used.
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