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JANUARY 11, 2005 U.S. PATENT AND TRADEMARK OFFICE TM 9<br />

SN 76-272,226. TOKYO ELECTRON LIMITED, MINATO-KU,<br />

TOKYO 107, JAPAN, FILED 6-15-2001.<br />

PRIORITY CLAIMED UNDER SEC. 44(D) ON JAPAN<br />

APPLICATION NO. 2000-136001, FILED 12-18-2000, REG. NO.<br />

4569181, DATED 5-17-2002, EXPIRES 5-17-2012.<br />

NO CLAIM IS MADE TO THE EXCLUSIVE RIGHT TO<br />

USE "TECHNOLOGY", APART FROM THE MARK AS<br />

SHOWN.<br />

CLASS 7—MACHINERY<br />

<strong>FOR</strong> METAL WORKING MACHINES, NAMELY, LA-<br />

SER PROCESSING MACHINES, GRINDERS, ELECTRON<br />

BEAM PROCESSING MACHINES, LASER CUTTERS,<br />

ELECTRIC WELDING MACHINES; CHEMICAL PRO-<br />

CESSING MACHINES, NAMELY, GASIFIERS, SILICON<br />

WAFER CLEANING AND DRYING MACHINES, CHE-<br />

MICAL VAPOR DEPOSITION MACHINES <strong>FOR</strong> GENER-<br />

AL INDUSTRIAL USE; SEMICONDUCTOR<br />

MANUFACTURING, PROCESSING AND PRODUCTION<br />

MACHINES, NAMELY, SEMICONDUCTOR MANUFAC-<br />

TURING MACHINES, SEMICONDUCTOR WAFER PRO-<br />

CESSING MACHINES, SEMICONDUCTOR<br />

PRODUCTION MACHINES, ALL <strong>FOR</strong> THE PROCES-<br />

SING AND PRODUCTION OF SEMICONDUCTOR SUB-<br />

STRATES, THIN FILMS, SILICON DISCS AND WAFERS;<br />

LIQUID CRYSTAL DISPLAY MANUFACTURING, PRO-<br />

CESSING AND PRODUCTION MACHINES (U.S. CLS. 13,<br />

19, 21, 23, 31, 34 AND 35).<br />

CLASS 9—ELECTRICAL AND SCIENTIFIC<br />

APPARATUS<br />

<strong>FOR</strong> SEMICONDUCTOR TESTING MACHINES <strong>FOR</strong><br />

TESTING AND INSPECTING WAFERS AND INTE-<br />

GRATED CIRCUITS; SEMICONDUCTOR PROBE<br />

CARDS <strong>FOR</strong> TESTING INTEGRATED CIRCUITS; PHY-<br />

SICOCHEMICAL APPARATUS, NAMELY, GAS ANALY-<br />

SIS UNITS, AIR ANALYSIS UNITS; MEASURING<br />

APPARATUS, NAMELY, SURFACE ROUGHNESS TEST-<br />

ING MACHINES, GASOMETERS, WATER METERS,<br />

ACCELEROMETERS, PHOTOMETERS, ACTIN-<br />

OMETERS, REFRACTOMETERS, BAROMETERS, MAN-<br />

OMETERS, PRESSURE INDICATORS, PRESSURE<br />

MEASURING UNITS, CHEMICAL FLUID MEASURING<br />

CUPS, CALORIMETERS, FLOWMETERS, ANGLE<br />

GAUGES, CLINOMETERS, PRECISION INSTRUMENTS<br />

IN THE NATURE OF LENGTH GAUGES, VACUUM<br />

MEASURING SENSORS, FLATNESS TESTING MA-<br />

CHINES, AUTOMATIC HUMIDITY CONTROLLERS,<br />

AUTOMATIC PRESSURE CONTROLLERS, AUTOMATIC<br />

LIQUID LEVEL CONTROLLERS, AUTOMATIC FLUID<br />

FLOW CONTROLLERS, AUTOMATIC CALORIE CON-<br />

TROLLERS, THERMOSTATS, AUTOMATIC VACUUM<br />

CONTROLLERS, PROGRAM CONTROLLING MA-<br />

CHINES, NAMELY, EQUIPMENT CONTROLLER AND<br />

MACHINE CONTROLLER HAVING A PROGRAM <strong>FOR</strong><br />

CONTROLLING APPARATUSES <strong>FOR</strong> USE IN THE<br />

MANUFACTURE OF AND TESTING OF SEMICONDUC-<br />

TORS AND LIQUID CRYSTAL DISPLAYS, AERO-<br />

METERS, WATER LEVEL INDICATORS, SPIRIT<br />

LEVELS, SEISMOGRAPHS, FILM THICKNESS MEA-<br />

SURING UNITS, FILM INSPECTION UNITS; POWER<br />

DISTRIBUTION OR CONTROLLING APPARATUS,<br />

NAMELY, REACTORS, DISTRIBUTION BOXES, ELEC-<br />

TRIC RELAYS, DISTRIBUTOR BOXES, SWITCH-<br />

BOARDS, BRANCH BOXES, CELL SWITCHES,<br />

INVERTERS, TRANS<strong>FOR</strong>MERS, ELECTRIC SWITCHES,<br />

ELECTRIC RESISTANCES, ELECTRIC CONTACTS,<br />

CURRENT CONTROLLERS, WIRE CONNECTORS,<br />

FLASHERS, CIRCUIT BREAKERS, CONDENSERS,<br />

ELECTRICAL FUSES, ELECTRICAL CONTROLLERS<br />

<strong>FOR</strong> USE IN THE MANUFACTURE AND TESTING OF<br />

SEMICONDUCTORS AND LIQUID CRYSTAL DIS-<br />

PLAYS; OPTICAL INSTRUMENTS, NAMELY, OPTICAL<br />

LENSES, OPTICAL OBJECTIVE LENSES, CORRECTING<br />

LENSES, METALLURGICAL MICROSCOPES, SPECTRO-<br />

SCOPES, EYEPIECES, ZOOM MICROSCOPES, OPTICAL<br />

CONDENSERS, POLARIZING MICROSCOPES, PRISMS<br />

<strong>FOR</strong> SCIENTIFIC PURPOSES; TELECOMMUNICATION<br />

MACHINES, NAMELY, PRIORITY CONTROLLERS <strong>FOR</strong><br />

CONTROLLING SEMICONDUCTOR MANUFACTUR-<br />

ING SYSTEMS <strong>FOR</strong> USE IN THE MANUFACTURE OF<br />

AND TESTING OF SEMICONDUCTORS AND LIQUID<br />

CRYSTAL DISPLAYS AND TELEMETERING APPARA-<br />

TUS <strong>FOR</strong> USE IN THE MANUFACTURE AND TESTING<br />

OF SEMICONDUCTORS AND LIQUID CRYSTAL DIS-<br />

PLAYS, HIGH-FREQUENCY APPARATUS <strong>FOR</strong> USE IN<br />

THE MANUFACTURE AND TESTING OF SEMICON-<br />

DUCTORS AND LIQUID CRYSTAL DISPLAYS,<br />

SWITCHBOARD LAMPS, ELECTRICAL TRANS<strong>FOR</strong>-<br />

MERS, ELECTRIC COILS, FREQUENCY CONVERTERS,<br />

AMPLIFIERS, CHOCKING COILS; ELECTRONIC MA-<br />

CHINES, NAMELY, COMPUTERS, NOTEBOOK COMPU-<br />

TERS, OPTICAL CHARACTER READERS, LAPTOP<br />

COMPUTERS, MOUSE, MICROPROCESSORS, BAR<br />

CODE READERS, LASERS NOT <strong>FOR</strong> MEDICAL PUR-<br />

POSES, X-RAYS PRODUCING APPARATUS AND IN-<br />

STALLATIONS NOT <strong>FOR</strong> MEDICAL PURPOSES,<br />

PROTECTION DEVICES AGAINST X-RAYS NOT <strong>FOR</strong><br />

MEDICAL PURPOSES, NAMELY, SHIELDS; COMPUTER<br />

SIMULATORS CONSISTING OF ELECTRONIC EVALU-<br />

ATING DEVICES <strong>FOR</strong> EVALUATING RELIABILITY,<br />

REPEATABILITY AND TRANSFER <strong>FOR</strong> THE CON-<br />

TROL OF SEMICONDUCTOR MANUFACTURING, PRO-<br />

CESSING AND PRODUCTION MACHINES,<br />

SIMULATION APPARATUS CONSISTING OF ELEC-<br />

TRONIC EVALUATING DEVICES <strong>FOR</strong> EVALUATING<br />

RELIABILITY, REPEATABILITY AND TRANSFER <strong>FOR</strong><br />

MANUFACTURE AND TESTING OF SEMICONDUC-<br />

TORS AND LIQUID CRYSTAL DISPLAYS, SCANNERS,<br />

MAGNETIC DISCS, MAGNETIC TAPES, DEMAGNETI-<br />

ZERS <strong>FOR</strong> MAGNETIC TAPES, ELECTRIC MONITOR-<br />

ING APPARATUS, ELECTRONIC PENS, CENTRAL<br />

PROCESSING UNITS, COMPUTER MEMORIES, COM-<br />

PUTER MONITORS, DISK DRIVES <strong>FOR</strong> COMPUTERS,<br />

MAGNETIC TAPES <strong>FOR</strong> COMPUTERS, PRINTERS <strong>FOR</strong><br />

USE WITH COMPUTERS, COMPUTER KEYBOARDS,<br />

FLOPPY DISKS, CATHODE-RAY TUBES, DIODES,<br />

NAMELY, SEMICONDUCTOR DIODES, CRYSTAL<br />

DIODES AND LIGHT EMITTING DIODES, TRANSIS-<br />

TORS, SEMICONDUCTORS, SILICON WAFERS, INTE-<br />

GRATED CIRCUITS, PRINTED CIRCUITS; COMPUTER<br />

SOFTWARE <strong>FOR</strong> USE WITH SEMICONDUCTOR MAN-<br />

UFACTURING, PROCESSING AND PRODUCTION MA-<br />

CHINES AND <strong>FOR</strong> USE WITH SEMICONDUCTOR<br />

TESTING MACHINES; COMPUTER OPERATING AND<br />

APPLICATION SOFTWARE <strong>FOR</strong> USE IN THE MANU-<br />

FACTURE AND TESTING OF SEMICONDUCTORS AND<br />

LIQUID CRYSTAL DISPLAYS; COMPUTER OPERAT-<br />

ING AND APPLICATION SOFTWARE <strong>FOR</strong> USE WITH<br />

SEMICONDUCTOR MANUFACTURING, PROCESSING<br />

AND PRODUCTION MACHINES, SEMICONDUCTOR<br />

TESTING MACHINES AND LIQUID CRYSTAL DISPLAY<br />

MANUFACTURING, PROCESSING AND PRODUCTION<br />

MACHINES; RECORDED VIDEO DISCS AND TAPES<br />

FEATURING SEMICONDUCTOR MANUFACTURING,<br />

PROCESSING AND PRODUCTION MACHINES, FEA-<br />

TURING LIQUID CRYSTAL DISPLAY MANUFACTUR-<br />

ING, PROCESSING AND PRODUCTION MACHINES<br />

AND FEATURING SEMICONDUCTOR TESTING MA-<br />

CHINES; PLASMA ETCHING AND COATING MA-<br />

CHINES; PHOTO-RESIST COATING MACHINES;<br />

SPUTTERING MACHINES (U.S. CLS. 21, 23, 26, 36 AND<br />

38).<br />

CLASS 11—ENVIRONMENTAL CONTROL AP-<br />

PARATUS<br />

<strong>FOR</strong> THERMAL OXIDATION FURNACES (U.S. CLS.<br />

13, 21, 23, 31 AND 34).

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