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<strong>Banha</strong> <strong>University</strong> First Term 2012/2013<br />

Faculty of Engineering Regular Exam<br />

Department of Basic Sciences Students: 1 ST Written Examination<br />

Year El. Eng.<br />

Solutions to Questions for the First-Term Examination (January 2013)<br />

Subject: Modern Physics S1133 Time: 3 Hours<br />

Attempt all questions. No. of questions: 5 No. of pages:3<br />

Solution to Question1 (18 points)<br />

a) The wave-function that satisfies Schrodinger equation for an electron, in onedimensional<br />

infinite potential well of length a = 1nm is<br />

Ψ(x) =<br />

2 3x<br />

sin<br />

a a<br />

(i) What is the energy of the electron in this state? (ii) What is the de Broglie<br />

wavelength of the electron? (iii) What is the probability of finding the electron<br />

between x = a/2 and x = 2a/3?<br />

Solution<br />

(i) From the wave-function k =<br />

In one-dimensional infinite potential well V = 0 for 0 < x < a.<br />

The energy of the electron E =<br />

(ii) Since E =<br />

Then the momentum p =<br />

The de Broglie wavelength λ =<br />

(iii) The probability density P(x) = ψ 2 (x) =<br />

The probability p(a/2 < x


Solution<br />

Bohr model: the hydrogen atom consists of a positively charged nucleus<br />

containing a proton and an orbiting electron.<br />

Bohr postulates:<br />

1. The electron moves in stable circular orbits around the proton under the influence<br />

of the electric force of attraction<br />

2. The allowed orbits are those for which the electron’s orbital angular momentum<br />

about the nucleus is quantized and equal to an integral multiple of ħ: mvr = nħ<br />

where m is the electron mass, v is the electron’s speed in its orbit.<br />

3. The atom emits radiation when the electron makes a transition from a<br />

more energetic initial stationary state to a lower-energy stationary state. The<br />

frequency of the emitted radiation is hf = Ei – Ef<br />

where Ei is the energy of the initial state, Ef is the energy of the final state,<br />

and Ei > Ef.<br />

The radius of the orbits:<br />

The electric force exerted on the electron must equal the product of its mass and its<br />

centripetal acceleration:<br />

Using Bohr’s postulate: mvr = nħ<br />

The energy of the electron<br />

The kinetic energy of the electron<br />

Substituting for the radius of the orbits, then then the total energy


where<br />

The emitted wavelength of light:<br />

Where RH =<br />

The four quantum numbers (n, l, ml, ms) are:<br />

The first quantum number is the principal quantum number n. It is associated with<br />

the energies of the allowed states for the hydrogen atom<br />

The values of n are integers that can range from 1 to ∞.<br />

The second quantum number is the orbital quantum number l. It is associated with<br />

the orbital angular momentum of the electron.<br />

The values of l are integers that can range from 0 to (n – 1).<br />

The third quantum number is the orbital magnetic quantum number ml. It specifies<br />

the allowed values of the z component of the orbital angular momentum L.<br />

LZ = ml<br />

The values of ml are integers that can range from - l, …, -2, -1, 0, 1, 1,…, l.


L lies anywhere on the surface of a cone that makes an angle θ with the z axis such<br />

that<br />

The fourth quantum number is the spin magnetic quantum number ms. There are<br />

only two directions to exist for the electron spin. Either the spin is up or down<br />

relative to the z-axis. The values of the spin magnetic quantum number are<br />

ms = - ½, + ½ .<br />

___________________________________________________________________<br />

Solution to Question 2 (18 points)<br />

a) The Fermi energy for copper is 7.0 eV. (i) Find the probability of an energy level<br />

at 7.15 eV is being occupied by an electron at 300K if the electrons in copper follow<br />

the Femi-Dirac distribution function. (ii) Find the Fermi level at 0K if the density of<br />

electrons 8.75x10 22 cm -3 .<br />

Solution<br />

(i) The probability f(E) = ( E EF ) / kT<br />

1<br />

e<br />

For E = 7.15 eV, EF = 7 eV, kT = 0.026 eV<br />

f(E = 7.15 eV) = ( 7.<br />

15 7)<br />

/ 0.<br />

026<br />

1<br />

e<br />

<br />

(ii) The electron density n = g ( E)<br />

f ( E)<br />

dE<br />

0<br />

The density of states g(E) =<br />

1 <br />

8<br />

2m<br />

3<br />

h<br />

3/<br />

2<br />

1 <br />

E<br />

1/<br />

2<br />

The probability at T = 0K: f(E) = 1 for E < EF<br />

= 0 for E > EF<br />

8<br />

Then n =<br />

3/<br />

2 EF<br />

2m<br />

1/<br />

2 2 8<br />

E dE <br />

3<br />

h<br />

3<br />

3/<br />

2<br />

2m<br />

3/<br />

2<br />

E 3 F<br />

h<br />

0<br />

2 / 3<br />

= 3.11x10 -3 = 0.311 %<br />

2<br />

h 3n<br />

<br />

The Fermi level EF(0) = <br />

2m<br />

8<br />

<br />

34<br />

2<br />

22 6<br />

2<br />

( 6.<br />

63x10<br />

) 3(<br />

8.<br />

75x10<br />

x10<br />

) <br />

<br />

31<br />

2(<br />

9.<br />

1 10 )<br />

<br />

<br />

8 <br />

<br />

<br />

x <br />

1.<br />

154 x10 -18 = 7.213 eV<br />

J<br />

2 / 3


) Derive expressions for the position of Fermi energy level in each of the following<br />

(i) intrinsic semiconductor,<br />

(ii) n-type semiconductor, and<br />

(iii) p-type semiconductors.<br />

Sketch this position in the energy band diagram for each of semiconductor type.<br />

Solution<br />

(i) The position of Fermi level in intrinsic semiconductor:<br />

Since the electron and hole concentrations are equal,<br />

then no = po<br />

(ii) The position of Fermi level in n-type semiconductor:<br />

For n-type no = Nd, then


Also<br />

EF – EFi = kT ln(Nd/ni)<br />

(iii) The position of Fermi level in p-type semiconductor:<br />

For p-type po = Na, then<br />

Also<br />

EFi – EF = kT ln(Na/ni)<br />

___________________________________________________________________<br />

Solution to Question 3 (18 points)<br />

a) Three samples of silicon at T = 300 K are the following:<br />

Sample 1 is n-type doped with arsenic atoms to Nd = 5x10 16 cm -3 .<br />

Sample 2 is p-type doped with boron to Na = 2x10 16 cm -3 .


Sample 3 is compensated silicon doped with both donors and acceptors<br />

described in the n-type and p-type samples.<br />

Find (i) the electron and hole concentrations in each sample, (ii) the conductivity of<br />

each sample (iii) The current density passing in each sample if an electric field of 25<br />

V/cm is applied.<br />

Solutions<br />

(i) sample 1: no = Nd = 5x10 16 cm -3<br />

Po = ni 2 /Nd = (1.5x10 10 ) 2 /5x10 16 = 4.5x10 3 cm -3<br />

sample 2: po = Na = 2x10 16 cm -3<br />

no = ni 2 /Na = (1.5x10 10 ) 2 /2x10 16 = 1.125x10 4 cm -3<br />

sample 3: no = (Nd - Na)/2 + {[(Nd - Na)/2] 2 + ni 2 } 1/2<br />

no = (Nd - Na)/2<br />

= (5x10 16 – 2x10 16 )/2 = 1.5 x10 16 cm -3<br />

Po = ni 2 /no = (1.5x10 10 ) 2 /1.5x10 16 = 1.5x10 4 cm -3<br />

(ii) sample 1: σn = e no μn = (1.6x10 -19 )(5x10 16 )(1350) = 10.8 S/cm<br />

sample 2: σp = e po μp = (1.6x10 -19 )(2x10 16 )(480) = 1.536 S/cm<br />

sample 3: σn = e no μn<br />

= (1.6x10 -19 )(1.5x1016)(1350) = 3.24 S/cm<br />

(iii) sample 1: Jn = σn ε = 10.8 x 25 = 270 A/cm 2<br />

sample 2: Jp = σp ε = 1.536 x 25 = 38.4 A/cm 2<br />

sample 3: Jn = σn ε = 3.24 x 25 = 81 A/cm 2<br />

__________________________________________________________________<br />

b) (i) Describe how the space charge region is formed in pn junction diode.<br />

(ii) Derive an expression for the electric field and the electric potential in the pn-<br />

junction diode.<br />

(iii) Sketch the energy band diagram of zero-biased, reverse-biased and forward-<br />

Biased pn-junction.<br />

Solutions<br />

(i) Formation of space charge region in pn-junction diode:<br />

A single-crystal semiconductor material in which one side is doped with acceptor<br />

impurity atoms to form the p region and the the other side is doped with donor<br />

atoms to form the n region. The interface separating the n and p regions is referred<br />

to as the junction.<br />

Initially, at the junction, there is a very large density gradient in both the electron<br />

and hole concentrations. Majority carrier electrons in the n region will begin<br />

diffusing into the p region leaving behind positively charged donor ions and majority<br />

carrier holes in the p region will begin diffusing into the n region leaving behind


negatively charged acceptor ions. If we assume there are no external connections<br />

to the semiconductor, then this diffusion process cannot continue indefinitely. The<br />

density gradient produces a "diffusion force" that acts on the majority carriers.<br />

These diffusion forces, acting on the electrons and holes at the edges of the space<br />

charge region. The net positive and negative ion charges in the n and p regions<br />

induce an electric field in the region near the junction, in the direction from the<br />

positive to the negative charge, or from the n to the p region. The electric field in<br />

the junction region produces another force on the electrons and holes which is in<br />

the opposite direction to the diffusion force for each type of particle. In thermal<br />

equilibrium, the diffusion force and the E-field force exactly balance each other.<br />

The net positively and negatively charged regions are referred to as the space<br />

charge region. Essentially all electrons and holes are swept out of the space charge<br />

region by the electric field. Since the space charge region is depleted of any mobile<br />

charge, this region is also referred to as the depletion region.<br />

The Fermi energy level is constant throughout the entire system. The conduction<br />

and valance band energies must bend as we go through the space charge region.<br />

(ii) The electric field:<br />

The charge density ρ(x) = - eNa - xp ≤ x ≤ 0<br />

= e Nd 0 ≤ x ≤ xn


The electric field is assumed to be zero in the neutral p region for x < - xp since the<br />

currents are zero in thermal equilibrium.<br />

The electric field in p-region - xp ≤ x ≤ 0;<br />

The electric field in the n-region 0 ≤ x ≤ xn,<br />

The potential in p-region - xp ≤ x ≤ 0;<br />

The potential in the n-region 0 ≤ x ≤ xn,


(iii) Energy band diagram<br />

Zero-biased<br />

Reverse-biased<br />

Forward-biased<br />

___________________________________________________________________


Solution to Question 4 (18 points)<br />

a) Consider a silicon pn-junction diode with a cross-sectional area of 10 -4 cm 2 has<br />

the following properties at 300 K:<br />

p-region n-region<br />

Na = 5x10 15 cm -3<br />

Nd = 10 17 cm -3<br />

τn = 10 -6 s<br />

Dn = 25 cm 2 /s<br />

τp = 10 -7 s<br />

Dp = 10 cm 2 /s<br />

Calculate (i) the built-in voltage barrier Vbi, (ii) the space charge width, the<br />

maximum electric field and the junction capacitance of the junction under reverse<br />

voltage of 5 V, (iii) The ideal reverse saturation current Is, and the diode current at<br />

a forward-bias voltage of 0.65 V.<br />

Solution<br />

(i) The built-in voltage Vbi = Vt ln (NaNd/ni 2 )<br />

= (0.026) ln[(5x10 15 x10 17 )/(1.5x10 10 ) 2 ]<br />

= 0.739 V<br />

(ii) The space charge width W =<br />

The maximum electric field<br />

εmax =<br />

2 <br />

s ( V bi V<br />

R ) N a N<br />

e <br />

<br />

N a N d<br />

= <br />

14<br />

15 17<br />

2(<br />

11.<br />

7)(<br />

8.<br />

85x10<br />

)( 0.<br />

739 5))<br />

5x10<br />

10<br />

<br />

<br />

<br />

19<br />

15 17<br />

1.<br />

6x10<br />

5x10<br />

x10<br />

<br />

= 1.25x10 -3 cm<br />

εmam = 2(Vbi +VR)/W=2(0.739 +5)/( 1.25x10 -3 )=9.182x10 3 V/cm<br />

The junction capacitance C = εsA/W = (11.7)(8.85x10 -14 )(10 -4 )/(1.25x10 -3 )<br />

= 8.2836x10 -14 F<br />

(iii) The ideal reverse saturation current<br />

eD p<br />

<br />

<br />

Lp<br />

eD<br />

p no n po<br />

Is = A<br />

L<br />

n<br />

n<br />

<br />

<br />

<br />

<br />

Pno = ni 2 / Nd = (1.5x10 10 ) 2 /10 17 = 2.25x10 3 cm -3<br />

Lp = √τpDp = √10 -7 x10 = 10 -3 cm<br />

npo = ni 2 / Na = (1.5x10 10 ) 2 /5x10 17 = 450 cm -3<br />

Ln = √τnDn = √10 -6 x25 = 5x10 -3 cm<br />

d


10x2.<br />

25x10<br />

<br />

10<br />

25x450<br />

<br />

5x10<br />

<br />

<br />

3<br />

19<br />

Is = 1. 6x10<br />

3<br />

3<br />

4<br />

16<br />

2<br />

x10<br />

3.<br />

96x10<br />

A/<br />

cm<br />

The diode current I = Is(e V/Vt – 1)<br />

= 3.96x10 -16 (e 0.65/0.026 – 1) = 2.85x10 -5 A<br />

___________________________________________________________________<br />

b) Describe the operation, the charge flow and the current components in npn<br />

bipolar junction transistor in the forward active mode. What are the operating<br />

modes of the transistor?<br />

Solution<br />

The bipolar transistor consists of three separately doped regions and two pn<br />

junctions. There are two types of transistor structures an npn bipolar transistor and<br />

a pnp bipolar transistor. The three terminal connections are called the emitter,<br />

base, and collector. The width of the base region is small compared to the minority<br />

carrier diffusion length.<br />

The operation of an npn transistor in the forward active mode and the<br />

charge flow<br />

The base-emitter (B-E) pn junction is forward-biased, and the base-collector<br />

(B-C) pn junction is reverse-biased in the forward-active operating mode. Since the<br />

B-E junction is forward-biased so electrons from the emitter are injected across the<br />

B-E junction into the base. Also holes from the emitter are injected across the B-E<br />

junction into the emitter.<br />

The injected electrons create an excess concentration of minority carriers in the<br />

base. The B-C junction is reverse biased, so the minority carrier electron<br />

concentration at the edge of the B-C junction is ideally zero. The large gradient in<br />

the electron concentration means that electrons injected from the emitter will<br />

diffuse across the base region into the B-C space charge region where the electric<br />

field will sweep the electrons into the collector. Some of the injected electrons<br />

recombine with the majority holes in the base. We want as many electrons as


possible to reach the collector without recombining with any majority carrier holes<br />

in the base. For this reason, the width of the base needs to be small compared with<br />

the minority carrier diffusion length. If the base width is small, then the minority<br />

carrier electron concentration is a function of both the B-E and B-C junction<br />

voltages.<br />

The current components<br />

The emitter current IE consists of two components. One component of emitter<br />

current IEn is due to the flow of elections injected from the emitter into the base.<br />

The other component IEp is due to the holes injected across the B-E junction into<br />

the emitter. So IE = IEn + iEp = IEn.<br />

The base current IB consists of the current IEp, the recombination current due to the<br />

recombination of majority carrier holes in the base with electrons injected from the<br />

emitter.<br />

The collector current IB consist of the electrons reaching the B-C junction and swept<br />

to the collector. IC = α IE where α is the common base current gain.<br />

IE = IB + IC<br />

The modes of operation of the transistor<br />

Mode E-B junction B-C junction Application<br />

Forward active Forward-biased Reverse-biased Amplifier<br />

Saturation Forward-biased Forward-biased Switch<br />

Cutoff Reverse-biased Reverse-biased Switch<br />

Reverse active Reverse-biased Forward-biased Rarely used<br />

___________________________________________________________________<br />

Solution to Question 5 (18 points)<br />

Choose the correct answer justifying your choice.<br />

(1) The temperature of an electric heating element is 150°C. At what wavelength<br />

does the radiation emitted from the heating element reach its peak?<br />

(a) 8.9 μm (b)9.8 μm (c) 6.9 μm (d) not stated<br />

λm = C/T = 2.9x10 -3 /423 = 6.9x10 -6 m = 6.9 μ<br />

(2) Electrons are ejected from the metallic surface in a photoelectric tube with<br />

speeds of up to 4.60x10 5 m/s when light with a wavelength of 625 nm is used.<br />

What is the work function of the metallic surface?<br />

(a) 1.38 eV (b) 3.31 eV (c) 2.46 eV (d) not stated<br />

Ф = hc/λ - ½ mv 2 = (6.63x10 -34 )(3x10 8 )/(625x10 -9 ) - ½ (9.1x10 -31 )(4.6x10 5 ) 2<br />

= 3.1824x10 -19 – 9.278x10 -20 = 2.2546x10 -19 J= 1.41 eV<br />

(3) What is the energy of the characteristic x-ray emitted from a tungsten target<br />

when an electron drops from an M shell to a vacancy in the K shell? The atomic<br />

number for tungsten is Z = 74.


(a) 74 keV (b) 68 keV (c) 87 keV (d) not stated<br />

hf = EM – EK = [- (74 – 9) 2 x 13.6]/9 – [(74) 2 (-13.6/1)] = 68 keV<br />

(4) Which is the following important in the operation of the laser …….<br />

(a)spontaneous emission (b)stimulated emission (c)absorption (d) all what stated<br />

When light is incident on a collection of atoms, a net absorption of energy usually<br />

occurs because when the system is in thermal equilibrium, many more atoms are in<br />

the ground state than in excited states. If the situation can be inverted so that<br />

more atoms are in an excited state than in the ground state, however, a net<br />

emission of photons can result. Such a condition is called population inversion.<br />

Suppose an atom is in the excited E2 and a photon with energy hf = E2 – E1 is<br />

incident on it. The incoming photon can stimulate the excited atom to return to the<br />

ground state and thereby emit a second photon having the same energy hf and<br />

traveling in the same direction. The incident photon is not absorbed, so after the<br />

stimulated emission, there are two identical photons: the incident photon and the<br />

emitted photon. The emitted photon is in phase with the incident photon. These<br />

photons can stimulate other atoms to emit photons in a chain of similar processes.<br />

The many photons produced in this fashion are the source of the intense, coherent<br />

light in a laser.<br />

The first photon that triggers the operation of laser is from the spontaneous<br />

emission process. Once an atom is in an excited state, the atom can make a<br />

transition back to a lower energy level, emitting a photon in the process. This<br />

process is known as spontaneous emission because it happens naturally.<br />

(5) The lattice constant of silicon is 5.43 A. Calculate the volume density of silicon<br />

atoms.<br />

(a) 5x10 22 cm -3 (b) 8x10 22 cm -3 (c) 5x10 25 cm -3 (d) not stated<br />

N = 8/(5.43x10 -8 ) 3 = 5x10 22 cm -3


(6) The figure shows the E – k relation. Which material is A and which is B?<br />

(a) Both A and B are semiconductors (b) Both A and B are metals<br />

(c) A is metal and B is semiconductor(d) A is semiconductor and B is metal<br />

Curve A: is the free electron model as E ~ k 2 (E = ℏk 2 /2m = p 2 /2m). So curve A<br />

represents E-k relation for a metal.<br />

Curve B: there is a curvature at the zone boundary with slope zero as a result of<br />

motion of electron in periodic crystal. So curve B represent s E-k relation for a<br />

semiconductor.<br />

(7) Calculate the thermal equilibrium hole concentration in intrinsic silicon at T =<br />

400 K. Assume that the Fermi energy is 0.27 eV above the valence band energy.<br />

For silicon at 300 K, NV = 1.04x10 19 cm -3 .<br />

(a) 4.43x10 15 cm -3 (b) 6.43x10 17 cm -3 (c) 6.43x10 15 cm -3 (d) not<br />

stated<br />

kT(400) = kT(300)x(400/300) = (0.026)(400/300) =0.03467 eV = 0.0347 eV<br />

NV(400) = NV(300)x(400/300) 3/2 = 1.04x10 19 x(400/300) 3/2 = 1.6x10 19 cm -3<br />

po = NV e -(EF – EV)/kT = 1.6x10 19 e -0.27/0.0347 = 6.68x10 15 cm -3<br />

(8) Assume that, in an n-type gallium arsenide semiconductor at T = 300 K, the<br />

electron concentration varies linearly from 1x10 18 cm -3 to 7x10 17 cm -3 over a<br />

distance of 0.1 cm. What is the diffusion current density if the electron diffusion<br />

coefficient is Dn = 225 cm 2 /s.<br />

(a) 108 A/cm 2 (b) 808 A/cm 2 (c) 618 A/cm 2 (d) 708 A/cm 2<br />

Jn = eDn dn/dx = (1.6x10 -19 18 17<br />

1x10<br />

7x10<br />

2<br />

)(225)(<br />

) 108A<br />

/ cm<br />

0.<br />

1<br />

(9) The Zener breakdown that occurs in reverse-biased pn junction diode is due to<br />

(a) the forward-bias voltage. (b) the tunneling of electrons. (c) the built-in<br />

voltage. (d) the diode capacitance.<br />

Zener breakdown occurs in highly oped pn junctions through a tunneling<br />

mechanism. In a highly doped junction, the conduction and valence bands on<br />

opposite sides of the junction are sufficiently close during reverse bias that<br />

electrons may tunnel directly from the valence band on the p side into the<br />

conduction band on the n side.


___________________________________________________________________

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