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<strong>Banha</strong> <strong>University</strong> First Term 2012/2013<br />
Faculty of Engineering Regular Exam<br />
Department of Basic Sciences Students: 1 ST Written Examination<br />
Year El. Eng.<br />
Solutions to Questions for the First-Term Examination (January 2013)<br />
Subject: Modern Physics S1133 Time: 3 Hours<br />
Attempt all questions. No. of questions: 5 No. of pages:3<br />
Solution to Question1 (18 points)<br />
a) The wave-function that satisfies Schrodinger equation for an electron, in onedimensional<br />
infinite potential well of length a = 1nm is<br />
Ψ(x) =<br />
2 3x<br />
sin<br />
a a<br />
(i) What is the energy of the electron in this state? (ii) What is the de Broglie<br />
wavelength of the electron? (iii) What is the probability of finding the electron<br />
between x = a/2 and x = 2a/3?<br />
Solution<br />
(i) From the wave-function k =<br />
In one-dimensional infinite potential well V = 0 for 0 < x < a.<br />
The energy of the electron E =<br />
(ii) Since E =<br />
Then the momentum p =<br />
The de Broglie wavelength λ =<br />
(iii) The probability density P(x) = ψ 2 (x) =<br />
The probability p(a/2 < x
Solution<br />
Bohr model: the hydrogen atom consists of a positively charged nucleus<br />
containing a proton and an orbiting electron.<br />
Bohr postulates:<br />
1. The electron moves in stable circular orbits around the proton under the influence<br />
of the electric force of attraction<br />
2. The allowed orbits are those for which the electron’s orbital angular momentum<br />
about the nucleus is quantized and equal to an integral multiple of ħ: mvr = nħ<br />
where m is the electron mass, v is the electron’s speed in its orbit.<br />
3. The atom emits radiation when the electron makes a transition from a<br />
more energetic initial stationary state to a lower-energy stationary state. The<br />
frequency of the emitted radiation is hf = Ei – Ef<br />
where Ei is the energy of the initial state, Ef is the energy of the final state,<br />
and Ei > Ef.<br />
The radius of the orbits:<br />
The electric force exerted on the electron must equal the product of its mass and its<br />
centripetal acceleration:<br />
Using Bohr’s postulate: mvr = nħ<br />
The energy of the electron<br />
The kinetic energy of the electron<br />
Substituting for the radius of the orbits, then then the total energy
where<br />
The emitted wavelength of light:<br />
Where RH =<br />
The four quantum numbers (n, l, ml, ms) are:<br />
The first quantum number is the principal quantum number n. It is associated with<br />
the energies of the allowed states for the hydrogen atom<br />
The values of n are integers that can range from 1 to ∞.<br />
The second quantum number is the orbital quantum number l. It is associated with<br />
the orbital angular momentum of the electron.<br />
The values of l are integers that can range from 0 to (n – 1).<br />
The third quantum number is the orbital magnetic quantum number ml. It specifies<br />
the allowed values of the z component of the orbital angular momentum L.<br />
LZ = ml<br />
The values of ml are integers that can range from - l, …, -2, -1, 0, 1, 1,…, l.
L lies anywhere on the surface of a cone that makes an angle θ with the z axis such<br />
that<br />
The fourth quantum number is the spin magnetic quantum number ms. There are<br />
only two directions to exist for the electron spin. Either the spin is up or down<br />
relative to the z-axis. The values of the spin magnetic quantum number are<br />
ms = - ½, + ½ .<br />
___________________________________________________________________<br />
Solution to Question 2 (18 points)<br />
a) The Fermi energy for copper is 7.0 eV. (i) Find the probability of an energy level<br />
at 7.15 eV is being occupied by an electron at 300K if the electrons in copper follow<br />
the Femi-Dirac distribution function. (ii) Find the Fermi level at 0K if the density of<br />
electrons 8.75x10 22 cm -3 .<br />
Solution<br />
(i) The probability f(E) = ( E EF ) / kT<br />
1<br />
e<br />
For E = 7.15 eV, EF = 7 eV, kT = 0.026 eV<br />
f(E = 7.15 eV) = ( 7.<br />
15 7)<br />
/ 0.<br />
026<br />
1<br />
e<br />
<br />
(ii) The electron density n = g ( E)<br />
f ( E)<br />
dE<br />
0<br />
The density of states g(E) =<br />
1 <br />
8<br />
2m<br />
3<br />
h<br />
3/<br />
2<br />
1 <br />
E<br />
1/<br />
2<br />
The probability at T = 0K: f(E) = 1 for E < EF<br />
= 0 for E > EF<br />
8<br />
Then n =<br />
3/<br />
2 EF<br />
2m<br />
1/<br />
2 2 8<br />
E dE <br />
3<br />
h<br />
3<br />
3/<br />
2<br />
2m<br />
3/<br />
2<br />
E 3 F<br />
h<br />
0<br />
2 / 3<br />
= 3.11x10 -3 = 0.311 %<br />
2<br />
h 3n<br />
<br />
The Fermi level EF(0) = <br />
2m<br />
8<br />
<br />
34<br />
2<br />
22 6<br />
2<br />
( 6.<br />
63x10<br />
) 3(<br />
8.<br />
75x10<br />
x10<br />
) <br />
<br />
31<br />
2(<br />
9.<br />
1 10 )<br />
<br />
<br />
8 <br />
<br />
<br />
x <br />
1.<br />
154 x10 -18 = 7.213 eV<br />
J<br />
2 / 3
) Derive expressions for the position of Fermi energy level in each of the following<br />
(i) intrinsic semiconductor,<br />
(ii) n-type semiconductor, and<br />
(iii) p-type semiconductors.<br />
Sketch this position in the energy band diagram for each of semiconductor type.<br />
Solution<br />
(i) The position of Fermi level in intrinsic semiconductor:<br />
Since the electron and hole concentrations are equal,<br />
then no = po<br />
(ii) The position of Fermi level in n-type semiconductor:<br />
For n-type no = Nd, then
Also<br />
EF – EFi = kT ln(Nd/ni)<br />
(iii) The position of Fermi level in p-type semiconductor:<br />
For p-type po = Na, then<br />
Also<br />
EFi – EF = kT ln(Na/ni)<br />
___________________________________________________________________<br />
Solution to Question 3 (18 points)<br />
a) Three samples of silicon at T = 300 K are the following:<br />
Sample 1 is n-type doped with arsenic atoms to Nd = 5x10 16 cm -3 .<br />
Sample 2 is p-type doped with boron to Na = 2x10 16 cm -3 .
Sample 3 is compensated silicon doped with both donors and acceptors<br />
described in the n-type and p-type samples.<br />
Find (i) the electron and hole concentrations in each sample, (ii) the conductivity of<br />
each sample (iii) The current density passing in each sample if an electric field of 25<br />
V/cm is applied.<br />
Solutions<br />
(i) sample 1: no = Nd = 5x10 16 cm -3<br />
Po = ni 2 /Nd = (1.5x10 10 ) 2 /5x10 16 = 4.5x10 3 cm -3<br />
sample 2: po = Na = 2x10 16 cm -3<br />
no = ni 2 /Na = (1.5x10 10 ) 2 /2x10 16 = 1.125x10 4 cm -3<br />
sample 3: no = (Nd - Na)/2 + {[(Nd - Na)/2] 2 + ni 2 } 1/2<br />
no = (Nd - Na)/2<br />
= (5x10 16 – 2x10 16 )/2 = 1.5 x10 16 cm -3<br />
Po = ni 2 /no = (1.5x10 10 ) 2 /1.5x10 16 = 1.5x10 4 cm -3<br />
(ii) sample 1: σn = e no μn = (1.6x10 -19 )(5x10 16 )(1350) = 10.8 S/cm<br />
sample 2: σp = e po μp = (1.6x10 -19 )(2x10 16 )(480) = 1.536 S/cm<br />
sample 3: σn = e no μn<br />
= (1.6x10 -19 )(1.5x1016)(1350) = 3.24 S/cm<br />
(iii) sample 1: Jn = σn ε = 10.8 x 25 = 270 A/cm 2<br />
sample 2: Jp = σp ε = 1.536 x 25 = 38.4 A/cm 2<br />
sample 3: Jn = σn ε = 3.24 x 25 = 81 A/cm 2<br />
__________________________________________________________________<br />
b) (i) Describe how the space charge region is formed in pn junction diode.<br />
(ii) Derive an expression for the electric field and the electric potential in the pn-<br />
junction diode.<br />
(iii) Sketch the energy band diagram of zero-biased, reverse-biased and forward-<br />
Biased pn-junction.<br />
Solutions<br />
(i) Formation of space charge region in pn-junction diode:<br />
A single-crystal semiconductor material in which one side is doped with acceptor<br />
impurity atoms to form the p region and the the other side is doped with donor<br />
atoms to form the n region. The interface separating the n and p regions is referred<br />
to as the junction.<br />
Initially, at the junction, there is a very large density gradient in both the electron<br />
and hole concentrations. Majority carrier electrons in the n region will begin<br />
diffusing into the p region leaving behind positively charged donor ions and majority<br />
carrier holes in the p region will begin diffusing into the n region leaving behind
negatively charged acceptor ions. If we assume there are no external connections<br />
to the semiconductor, then this diffusion process cannot continue indefinitely. The<br />
density gradient produces a "diffusion force" that acts on the majority carriers.<br />
These diffusion forces, acting on the electrons and holes at the edges of the space<br />
charge region. The net positive and negative ion charges in the n and p regions<br />
induce an electric field in the region near the junction, in the direction from the<br />
positive to the negative charge, or from the n to the p region. The electric field in<br />
the junction region produces another force on the electrons and holes which is in<br />
the opposite direction to the diffusion force for each type of particle. In thermal<br />
equilibrium, the diffusion force and the E-field force exactly balance each other.<br />
The net positively and negatively charged regions are referred to as the space<br />
charge region. Essentially all electrons and holes are swept out of the space charge<br />
region by the electric field. Since the space charge region is depleted of any mobile<br />
charge, this region is also referred to as the depletion region.<br />
The Fermi energy level is constant throughout the entire system. The conduction<br />
and valance band energies must bend as we go through the space charge region.<br />
(ii) The electric field:<br />
The charge density ρ(x) = - eNa - xp ≤ x ≤ 0<br />
= e Nd 0 ≤ x ≤ xn
The electric field is assumed to be zero in the neutral p region for x < - xp since the<br />
currents are zero in thermal equilibrium.<br />
The electric field in p-region - xp ≤ x ≤ 0;<br />
The electric field in the n-region 0 ≤ x ≤ xn,<br />
The potential in p-region - xp ≤ x ≤ 0;<br />
The potential in the n-region 0 ≤ x ≤ xn,
(iii) Energy band diagram<br />
Zero-biased<br />
Reverse-biased<br />
Forward-biased<br />
___________________________________________________________________
Solution to Question 4 (18 points)<br />
a) Consider a silicon pn-junction diode with a cross-sectional area of 10 -4 cm 2 has<br />
the following properties at 300 K:<br />
p-region n-region<br />
Na = 5x10 15 cm -3<br />
Nd = 10 17 cm -3<br />
τn = 10 -6 s<br />
Dn = 25 cm 2 /s<br />
τp = 10 -7 s<br />
Dp = 10 cm 2 /s<br />
Calculate (i) the built-in voltage barrier Vbi, (ii) the space charge width, the<br />
maximum electric field and the junction capacitance of the junction under reverse<br />
voltage of 5 V, (iii) The ideal reverse saturation current Is, and the diode current at<br />
a forward-bias voltage of 0.65 V.<br />
Solution<br />
(i) The built-in voltage Vbi = Vt ln (NaNd/ni 2 )<br />
= (0.026) ln[(5x10 15 x10 17 )/(1.5x10 10 ) 2 ]<br />
= 0.739 V<br />
(ii) The space charge width W =<br />
The maximum electric field<br />
εmax =<br />
2 <br />
s ( V bi V<br />
R ) N a N<br />
e <br />
<br />
N a N d<br />
= <br />
14<br />
15 17<br />
2(<br />
11.<br />
7)(<br />
8.<br />
85x10<br />
)( 0.<br />
739 5))<br />
5x10<br />
10<br />
<br />
<br />
<br />
19<br />
15 17<br />
1.<br />
6x10<br />
5x10<br />
x10<br />
<br />
= 1.25x10 -3 cm<br />
εmam = 2(Vbi +VR)/W=2(0.739 +5)/( 1.25x10 -3 )=9.182x10 3 V/cm<br />
The junction capacitance C = εsA/W = (11.7)(8.85x10 -14 )(10 -4 )/(1.25x10 -3 )<br />
= 8.2836x10 -14 F<br />
(iii) The ideal reverse saturation current<br />
eD p<br />
<br />
<br />
Lp<br />
eD<br />
p no n po<br />
Is = A<br />
L<br />
n<br />
n<br />
<br />
<br />
<br />
<br />
Pno = ni 2 / Nd = (1.5x10 10 ) 2 /10 17 = 2.25x10 3 cm -3<br />
Lp = √τpDp = √10 -7 x10 = 10 -3 cm<br />
npo = ni 2 / Na = (1.5x10 10 ) 2 /5x10 17 = 450 cm -3<br />
Ln = √τnDn = √10 -6 x25 = 5x10 -3 cm<br />
d
10x2.<br />
25x10<br />
<br />
10<br />
25x450<br />
<br />
5x10<br />
<br />
<br />
3<br />
19<br />
Is = 1. 6x10<br />
3<br />
3<br />
4<br />
16<br />
2<br />
x10<br />
3.<br />
96x10<br />
A/<br />
cm<br />
The diode current I = Is(e V/Vt – 1)<br />
= 3.96x10 -16 (e 0.65/0.026 – 1) = 2.85x10 -5 A<br />
___________________________________________________________________<br />
b) Describe the operation, the charge flow and the current components in npn<br />
bipolar junction transistor in the forward active mode. What are the operating<br />
modes of the transistor?<br />
Solution<br />
The bipolar transistor consists of three separately doped regions and two pn<br />
junctions. There are two types of transistor structures an npn bipolar transistor and<br />
a pnp bipolar transistor. The three terminal connections are called the emitter,<br />
base, and collector. The width of the base region is small compared to the minority<br />
carrier diffusion length.<br />
The operation of an npn transistor in the forward active mode and the<br />
charge flow<br />
The base-emitter (B-E) pn junction is forward-biased, and the base-collector<br />
(B-C) pn junction is reverse-biased in the forward-active operating mode. Since the<br />
B-E junction is forward-biased so electrons from the emitter are injected across the<br />
B-E junction into the base. Also holes from the emitter are injected across the B-E<br />
junction into the emitter.<br />
The injected electrons create an excess concentration of minority carriers in the<br />
base. The B-C junction is reverse biased, so the minority carrier electron<br />
concentration at the edge of the B-C junction is ideally zero. The large gradient in<br />
the electron concentration means that electrons injected from the emitter will<br />
diffuse across the base region into the B-C space charge region where the electric<br />
field will sweep the electrons into the collector. Some of the injected electrons<br />
recombine with the majority holes in the base. We want as many electrons as
possible to reach the collector without recombining with any majority carrier holes<br />
in the base. For this reason, the width of the base needs to be small compared with<br />
the minority carrier diffusion length. If the base width is small, then the minority<br />
carrier electron concentration is a function of both the B-E and B-C junction<br />
voltages.<br />
The current components<br />
The emitter current IE consists of two components. One component of emitter<br />
current IEn is due to the flow of elections injected from the emitter into the base.<br />
The other component IEp is due to the holes injected across the B-E junction into<br />
the emitter. So IE = IEn + iEp = IEn.<br />
The base current IB consists of the current IEp, the recombination current due to the<br />
recombination of majority carrier holes in the base with electrons injected from the<br />
emitter.<br />
The collector current IB consist of the electrons reaching the B-C junction and swept<br />
to the collector. IC = α IE where α is the common base current gain.<br />
IE = IB + IC<br />
The modes of operation of the transistor<br />
Mode E-B junction B-C junction Application<br />
Forward active Forward-biased Reverse-biased Amplifier<br />
Saturation Forward-biased Forward-biased Switch<br />
Cutoff Reverse-biased Reverse-biased Switch<br />
Reverse active Reverse-biased Forward-biased Rarely used<br />
___________________________________________________________________<br />
Solution to Question 5 (18 points)<br />
Choose the correct answer justifying your choice.<br />
(1) The temperature of an electric heating element is 150°C. At what wavelength<br />
does the radiation emitted from the heating element reach its peak?<br />
(a) 8.9 μm (b)9.8 μm (c) 6.9 μm (d) not stated<br />
λm = C/T = 2.9x10 -3 /423 = 6.9x10 -6 m = 6.9 μ<br />
(2) Electrons are ejected from the metallic surface in a photoelectric tube with<br />
speeds of up to 4.60x10 5 m/s when light with a wavelength of 625 nm is used.<br />
What is the work function of the metallic surface?<br />
(a) 1.38 eV (b) 3.31 eV (c) 2.46 eV (d) not stated<br />
Ф = hc/λ - ½ mv 2 = (6.63x10 -34 )(3x10 8 )/(625x10 -9 ) - ½ (9.1x10 -31 )(4.6x10 5 ) 2<br />
= 3.1824x10 -19 – 9.278x10 -20 = 2.2546x10 -19 J= 1.41 eV<br />
(3) What is the energy of the characteristic x-ray emitted from a tungsten target<br />
when an electron drops from an M shell to a vacancy in the K shell? The atomic<br />
number for tungsten is Z = 74.
(a) 74 keV (b) 68 keV (c) 87 keV (d) not stated<br />
hf = EM – EK = [- (74 – 9) 2 x 13.6]/9 – [(74) 2 (-13.6/1)] = 68 keV<br />
(4) Which is the following important in the operation of the laser …….<br />
(a)spontaneous emission (b)stimulated emission (c)absorption (d) all what stated<br />
When light is incident on a collection of atoms, a net absorption of energy usually<br />
occurs because when the system is in thermal equilibrium, many more atoms are in<br />
the ground state than in excited states. If the situation can be inverted so that<br />
more atoms are in an excited state than in the ground state, however, a net<br />
emission of photons can result. Such a condition is called population inversion.<br />
Suppose an atom is in the excited E2 and a photon with energy hf = E2 – E1 is<br />
incident on it. The incoming photon can stimulate the excited atom to return to the<br />
ground state and thereby emit a second photon having the same energy hf and<br />
traveling in the same direction. The incident photon is not absorbed, so after the<br />
stimulated emission, there are two identical photons: the incident photon and the<br />
emitted photon. The emitted photon is in phase with the incident photon. These<br />
photons can stimulate other atoms to emit photons in a chain of similar processes.<br />
The many photons produced in this fashion are the source of the intense, coherent<br />
light in a laser.<br />
The first photon that triggers the operation of laser is from the spontaneous<br />
emission process. Once an atom is in an excited state, the atom can make a<br />
transition back to a lower energy level, emitting a photon in the process. This<br />
process is known as spontaneous emission because it happens naturally.<br />
(5) The lattice constant of silicon is 5.43 A. Calculate the volume density of silicon<br />
atoms.<br />
(a) 5x10 22 cm -3 (b) 8x10 22 cm -3 (c) 5x10 25 cm -3 (d) not stated<br />
N = 8/(5.43x10 -8 ) 3 = 5x10 22 cm -3
(6) The figure shows the E – k relation. Which material is A and which is B?<br />
(a) Both A and B are semiconductors (b) Both A and B are metals<br />
(c) A is metal and B is semiconductor(d) A is semiconductor and B is metal<br />
Curve A: is the free electron model as E ~ k 2 (E = ℏk 2 /2m = p 2 /2m). So curve A<br />
represents E-k relation for a metal.<br />
Curve B: there is a curvature at the zone boundary with slope zero as a result of<br />
motion of electron in periodic crystal. So curve B represent s E-k relation for a<br />
semiconductor.<br />
(7) Calculate the thermal equilibrium hole concentration in intrinsic silicon at T =<br />
400 K. Assume that the Fermi energy is 0.27 eV above the valence band energy.<br />
For silicon at 300 K, NV = 1.04x10 19 cm -3 .<br />
(a) 4.43x10 15 cm -3 (b) 6.43x10 17 cm -3 (c) 6.43x10 15 cm -3 (d) not<br />
stated<br />
kT(400) = kT(300)x(400/300) = (0.026)(400/300) =0.03467 eV = 0.0347 eV<br />
NV(400) = NV(300)x(400/300) 3/2 = 1.04x10 19 x(400/300) 3/2 = 1.6x10 19 cm -3<br />
po = NV e -(EF – EV)/kT = 1.6x10 19 e -0.27/0.0347 = 6.68x10 15 cm -3<br />
(8) Assume that, in an n-type gallium arsenide semiconductor at T = 300 K, the<br />
electron concentration varies linearly from 1x10 18 cm -3 to 7x10 17 cm -3 over a<br />
distance of 0.1 cm. What is the diffusion current density if the electron diffusion<br />
coefficient is Dn = 225 cm 2 /s.<br />
(a) 108 A/cm 2 (b) 808 A/cm 2 (c) 618 A/cm 2 (d) 708 A/cm 2<br />
Jn = eDn dn/dx = (1.6x10 -19 18 17<br />
1x10<br />
7x10<br />
2<br />
)(225)(<br />
) 108A<br />
/ cm<br />
0.<br />
1<br />
(9) The Zener breakdown that occurs in reverse-biased pn junction diode is due to<br />
(a) the forward-bias voltage. (b) the tunneling of electrons. (c) the built-in<br />
voltage. (d) the diode capacitance.<br />
Zener breakdown occurs in highly oped pn junctions through a tunneling<br />
mechanism. In a highly doped junction, the conduction and valence bands on<br />
opposite sides of the junction are sufficiently close during reverse bias that<br />
electrons may tunnel directly from the valence band on the p side into the<br />
conduction band on the n side.
___________________________________________________________________