- Page 1: MEDIUM RANGE ORDER IN HIGH ALUMINUM
- Page 5 and 6: Abstract High Al-content metallic a
- Page 7 and 8: Table of Contents List of Figures
- Page 9 and 10: List of Figures Figure Page Figure
- Page 11 and 12: Figure 2.8: V(Φ) at varying values
- Page 13 and 14: electron beam exposure. The sharp f
- Page 15 and 16: Figure 5.7: FEM data for Al88Y7Fe5
- Page 17 and 18: Chapter 1. Introduction Amorphous m
- Page 19 and 20: Material Type Tg ( o C) Reference P
- Page 21 and 22: dH / dt (arb. units) time Figure 1.
- Page 23 and 24: enough to avoid any nucleation onse
- Page 25 and 26: nanocrystals are thermally stable u
- Page 27 and 28: The structural difference between t
- Page 29 and 30: Structures for various metallic gla
- Page 31 and 32: ( , ) V k Q = ( r, , ) − ( r, , )
- Page 33 and 34: of 1-3 nm is readily achievable in
- Page 35 and 36: than the STEM FEM V 66,67,84 . This
- Page 37 and 38: interesting behavior upon devitrifi
- Page 39 and 40: Λ is a characteristic ordering len
- Page 41 and 42: amorphous matrix crystal l R d R bi
- Page 43 and 44: For a crystal oriented to a Bragg c
- Page 45 and 46: number of crystals in a column will
- Page 47 and 48: 3 d π 2 Rt max Zmax Φ = . (2.21)
- Page 49 and 50: eciprocal lattice point 1 d hkl awa
- Page 51 and 52: A hkl 0.7 0.6 0.5 0.4 0.3 0.2 0.1 0
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V(C hklΦ,d) 0.4 0.3 0.2 0.1 0.4 0.
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V(C 111 Φ) 0.12 0.10 0.08 0.06 0.0
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Φ = 6π d ( 72 − 6π + π ρ) m
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V(t) 0.16 0.14 0.12 0.10 0.08 0.06
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⎛ 3 ⎛ 4 6tΩ⎞⎞ d = ⎜ Chkl
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Chapter 3. Experimental Set-up Prep
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A B 0.25 1/Å 0.25 1/Å Figure 3.1:
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〈IBF〉, to the bright field inte
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Once the relative thickness is know
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Given that FEM is a quantitative el
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eam at a uniform intensity across t
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Low Filtering Limit ω l (Å -1 ) 0
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sample 101 . Much of the influence
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3.07 Thickness Dependant Thinning A
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Residual XRD Intensity (arb. units)
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Intensity (arb. units) 0.30 Al 88 Y
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3.08 Beam Induced Crystallization o
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Fraction of Atoms 0 120 keV 100 200
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V(k) x10 -3 10 8 6 4 2 Al 92 Sm 8 P
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to produce an accurate FEM data set
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Deformation Al 92Sm 8 sample: Rapid
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intensity (arb. units) 3 4 {111} {2
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Al2O3 Al hkl d (1/nm) hkl d (1/nm)
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easons. First, the as-spun V(k) for
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atoms locally organized into an FCC
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in Figure 4.6. Still, this begs the
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Φ 0.20 0.15 0.10 0.05 0.00 10 21 A
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Chapter 5. Al88Y7Fe5 and Al88Y7Fe4C
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diffracting condition through the m
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increases the number of Al nanocrys
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Fraction of nanocrystals x10 -3 Fra
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Al 88 Y 7 Fe 5 Enthalpy (J/g) 0 -1
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Al 88Y 7Fe 5 100 nm Al 88Y 7Fe 4Cu
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5.04 Al88Y7Fe4Cu1 Discussion The de
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FEM is sensitive to both critical a
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devitrified structure has the possi
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fraction between the as quenched ma
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number, etc.) can give insight to t
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24. Liquid Metals Website, http://w
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66. Voyles, P. M., Gibson, J. M. &
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105. Zuo, J. M. Electron detection