Ion Beam Treatment of Functional Layers in Thin-Film Silicon Solar ...

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List of Figures 6.1 2 s HCl etching of untreated ZnO:Al film and Ar/O 2 treated ion beam treated ZnO film. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 138 6.2 2 s HCl etching of untreated ZnO:Al film and Ar treated ion beam treated ZnO film. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 139 6.3 2 s, 10 s and 40 s HCl etching of untreated, soft and strong Ar/O 2 ion beam treated ZnO:Al films. . . . . . . . . . . . . . . . . . . . . . . . . . 140 6.4 SEM micrographs of ZnO:Al on Ar/O 2 treated as-deposited and HCl textured ZnO:Al films. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 142 6.5 rms roughness and crater depth of the Ar etching series of the ZnO films 144 6.6 The topographies of Ar ion beam treated HCl textured ZnO:Al films. . . 145 6.7 External quantum efficiency (EQE) of the µc-Si solar cells prepared on untreated and Ar treated ZnO:Al films. . . . . . . . . . . . . . . . . . . . 147 6.8 Crystallinities of µc-Si p-layer deposited on Ar ion beam treated asdeposited and HCl etched ZnO films. . . . . . . . . . . . . . . . . . . . . 148 6.9 Crystallinities of µc-Si deposited on a variety ion beam treated ZnO:Al films. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 149 6.10 The schematic diagram of the solar cells based on traditional flat and textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 150 6.11 Motivation of using textured glass in Si thin-film solar cells. . . . . . . . 151 6.12 Preparation process of textured glass. . . . . . . . . . . . . . . . . . . . . 152 6.13 AFM images of textured glass prepared by ion beam etching of 60s HCl etched ZnO films. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 153 6.14 Crater depth, roughness, and lateral correlation length of a series of textured glass prepared by normal ion beam etching of different time HCl etched ZnO films with initial thickness of 800 nm. . . . . . . . . . . . . . 154 6.15 Haze of a series of textured glass prepared by normal ion beam etching of different time HCl etched ZnO films with initial thickness of 800 nm. . . 155 6.16 Crater depth, roughness and lateral correlation length of two series of textured glass by tilted ion beam etching of different time HCl etched ZnO films with initial thickness of 800 nm and 1500 nm. . . . . . . . . . 156 6.17 Textured glass prepared by ion beam etching of AsahiU SnO 2 :F film. . . 157 6.18 Textured glass prepared by ion beam etching of ZnO micro-particles. . . 158 6.19 AFM measurements of ZnO:Al films grown on Ar treated textured glass. 159 6.20 Height-height correlation function of Ar treated textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . 159 6.21 Haze and ARS of Ar treated textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 160 6.22 AFM measurements of ZnO:Al films grown on Ar/O 2 treated textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 161 6.23 Height-height correlation function of Ar/O 2 treated textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . 161 6.24 Haze and ARS of Ar/O 2 treated textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 162 6.25 AFM measurements of ZnO:Al films grown on cleaned textured glass. . . 163 viii
List of Figures 6.26 Height-height correlation function of cleaned textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . . . . . 163 6.27 Haze and ARS of Ar/O 2 treated textured glass and ZnO:Al film grown on the textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 164 6.28 SEM micrographs of three ZnO:Al films on cleaned, Ar treated and Ar/O 2 treated textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 165 6.29 Haze and ARS of the ZnO:Al substrates grown on different treated textured glass. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 166 6.30 Quantum efficiency of µc-Si single junction solar cells based on cleaned, Ar and Ar/O 2 treated textured glass. . . . . . . . . . . . . . . . . . . . . 167 6.31 Haze of a series of textured glass which were prepared from different HCl etched ZnO:Al films. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 169 6.32 Haze and ARS of ZnO:Al films grown on the series of textured glass. . . 169 6.33 The results of µc-Si single junction solar cells deposited on textured glass prepared from different HCl etching time of ZnO:Al films. . . . . . . . . . 170 6.34 Quantum efficiency of µc-Si single junction solar cells deposited on textured glass prepared from different HCl etching time of ZnO:Al films. . . 171 ix
Page 1 and 2: Ion Beam Treatment of Functional La
Page 3 and 4: Forschungszentrum Jülich GmbH Inst
Page 5 and 6: Contents Abstract 1 Zusammenfassung
Page 7: Contents 5.2 Reason of rough growth
Page 10 and 11: List of Figures 3.4 Schematic diagr
Page 15: List of Tables 4.1 Energy transfer
Page 19 and 20: Zusammenfassung In Dünnschichtsola
Page 21 and 22: 1 Introduction Presently, the incre
Page 23: study and understanding of as-grown
Page 26 and 27: 2 Fundamentals (a) (b) gas inlet an
Page 28 and 29: 2 Fundamentals When pure Ar is used
Page 30 and 31: 2 Fundamentals in this work was sup
Page 32 and 33: 2 Fundamentals the process is then
Page 34 and 35: 2 Fundamentals where f = 1 2 [(Z 1/
Page 36 and 37: 2 Fundamentals large area. One of t
Page 38 and 39: 2 Fundamentals where m ∗ is the e
Page 40 and 41: 2 Fundamentals where k and T are th
Page 42 and 43: 2 Fundamentals E g0 E g0 + E BM Fig
Page 44 and 45: 2 Fundamentals Vacuum chamber Anode
Page 46 and 47: 2 Fundamentals ation stage [72]. Ho
Page 48 and 49: 2 Fundamentals Feature (Before etch
Page 50 and 51: 2 Fundamentals 2.2.4.5 Surface evol
Page 52 and 53: 2 Fundamentals Figure 2.14: Represe
Page 54 and 55: 2 Fundamentals This paragraph expan
Page 56 and 57: 2 Fundamentals Figure 2.17: Absorpt
Page 58 and 59: 2 Fundamentals Figure 2.18: Schemat
Page 61 and 62: 3 Experimental This chapter describ
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3.2 Ion beam treatment 3.1.1.3 Smal
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3.3 Characterization methods y Carr
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3.3 Characterization methods The va
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3.3 Characterization methods measur
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3.3 Characterization methods the ca
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3.3 Characterization methods the Mi
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3.3 Characterization methods One ch
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3.3 Characterization methods compou
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4 Characterization of the ion beam
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4.2 Static etching For Ar ion beams
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4.2 Static etching 1 2 0 0 R e m o
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4.3 Dynamic etching 2 E x p e rim e
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4.4 Discussion Table 4.1: Energy tr
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4.5 Summary at normal incidence. Th
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5 Ion beam treatment of the glass s
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6 Ion beam treatment of the TCO sur
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7 Summary and Outlook Ion beam trea
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Bibliography [1] M. Pelliccione and
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Bibliography [23] A. Shabalin, M. A
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Bibliography [53] D. F. Mitchell, G
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Bibliography [79] J. Venables, G. S
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Bibliography [107] O. Kluth, Textur
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Bibliography [134] H. Sai, H. Fujiw
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Bibliography [158] H. Kato, K. Miya
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Bibliography [181] L. P. Schuler, M
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• Marek Warzecha, Hongbing Zhu, J
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Schriften des Forschungszentrums J
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