Equipment S PECIA L S Y S TE M S - Leybold Optics GmbH
Equipment S PECIA L S Y S TE M S - Leybold Optics GmbH
Equipment S PECIA L S Y S TE M S - Leybold Optics GmbH
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MAGNETRON SPUT<strong>TE</strong>RING<br />
Penning cathode PK 100 - 250<br />
• wall mounted<br />
• magnetic array at athmosphere<br />
• water cooling integrated in backing plate<br />
Internally mounted cathode IMM 100 - 200<br />
• adjustable distance to substrate<br />
• high yield magnetic array<br />
• magnetic array not in contact<br />
with cooling water<br />
ION AND PLASMA SOURCES<br />
End Hall ion sources<br />
• pressure range > 3·10 -4 mbar<br />
• beam current up to 1000 mA<br />
• ion energy from 40 to 120 eV<br />
• filament or hollow cathode nutralizer<br />
ECWR plasma sources<br />
• pressure range > 1·10 -4 mbar<br />
• plasma densities up to 1013/cm 3<br />
• ion current density up to 3 mA/cm 2<br />
• independent control of the ion energy<br />
from 20 to 600 eV<br />
RF ion source<br />
• RF power: 75 to 300 W at 13.56 MHz<br />
• beam current: up to 50 mA<br />
• ion energy: from 100 to 2000 eV<br />
Penning cathode<br />
Mark I<br />
Copra<br />
S<strong>PECIA</strong>L SYS<strong>TE</strong>MS<br />
IMM 100<br />
Mark II<br />
Copra<br />
RF/I 40
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