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Silicon thinfilm tandem technology and industrial production ... - Sintef

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25. juni 2008<br />

<strong>Silicon</strong> <strong>thinfilm</strong> <strong>t<strong>and</strong>em</strong> <strong>technology</strong> <strong>and</strong><br />

<strong>industrial</strong> <strong>production</strong> by Sunfilm<br />

Carsten Rohr<br />

9 Jan. 2008


Norsun<br />

Investments<br />

Partners<br />

Polysilicon Wafer Cells Modules Systems<br />

Polysilicon<br />

projects<br />

Sunfilm AG<br />

Strategic<br />

partners<br />

Okmetic<br />

Equipment<br />

suppliers<br />

Strategic partners<br />

• Incorporated in 2005 as a subsidiary of Scatec<br />

• Manufactures mono-crystalline ingots <strong>and</strong> wafers<br />

• Mission to become the global cost- <strong>and</strong> <strong>technology</strong> leader in mono-crystalline wafers<br />

<strong>production</strong> by 2010<br />

• Shareholders: Scatec, Good Energies, Norsk Hydro, <strong>and</strong> others<br />

25.06.2008


PV grid price parity outlook<br />

Utility prices <strong>and</strong> solar power generation cost (EUR/kWh) in Germany (sun energy 900KWh/year)<br />

0.8<br />

0.6<br />

0.4<br />

0.2<br />

Residential<br />

systems<br />

Commercial<br />

systems<br />

Solar <strong>production</strong> cost<br />

Grid parity in<br />

certain markets<br />

Commercial<br />

competitive<br />

Residential<br />

competitive<br />

Utility prices<br />

0.0<br />

2005 2010 2015 2020 2025 2030 2035 2040<br />

Assumptions<br />

5% solar cost decline p.a.<br />

2.5% price increase p.a. of electricity tariff<br />

Peak utility price<br />

(Germany)<br />

Average residential &<br />

commercial power<br />

price (Germany)<br />

Industrial Solar <strong>production</strong> cost<br />

Commercial Solar <strong>production</strong> cost<br />

Residential Solar <strong>production</strong> cost<br />

Average residential power price<br />

Average commercial power price<br />

Average <strong>industrial</strong> power price<br />

Utility bulk power price<br />

Source: Solarbuzz 2006,<br />

Citigroup 06/2005<br />

25.06.2008


Solar cell technologies<br />

Production in 2006 (in MWp)<br />

Crystalline Si Wafer<br />

Mono Crystalline<br />

Multi Crystalline<br />

880<br />

1089<br />

90%<br />

Ribbon<br />

57<br />

Amorphous + µc Si<br />

153<br />

Thin Film<br />

Thin Film Crystalline<br />

CdTe<br />

n.a.<br />

57<br />

Thin film advantages<br />

Solar Cell<br />

CIS<br />

Other Chalcopyrites<br />

GaAs<br />

9<br />

n.a.<br />

n.a.<br />

+ Cost<br />

+ No resource<br />

constraints<br />

Concentrator (III - V)<br />

InP<br />

Others<br />

Dye Solar Cell<br />

n.a.<br />

n.a.<br />

n.a.<br />

+ Scaling<br />

+ New applications<br />

New Technologies<br />

Organic Structures<br />

n.a.<br />

Others<br />

n.a.<br />

0<br />

1 GWp<br />

Source: ThinFilm Sun&Wind Energy 1/2007, PSE 2007


GW<br />

20<br />

18<br />

16<br />

14<br />

12<br />

10<br />

8<br />

6<br />

4<br />

2<br />

0<br />

Cell / module <strong>production</strong> outlook<br />

Thin film<br />

Conventional PV<br />

2.3<br />

0,6<br />

0,2<br />

2,1 2,5<br />

1,2<br />

3,7<br />

2,0<br />

5,7<br />

2,8<br />

8,9<br />

3,5<br />

14,5<br />

2006 2007 2008 2009 2010 2011<br />

Thin film at<br />

~10% market<br />

share<br />

3.1<br />

2006-2011 CAGR<br />

• Conventional PV: 47%<br />

• Thin film: 77%<br />

• Total: 51%<br />

4.9<br />

7.7<br />

13.1<br />

18.0<br />

Thin film at<br />

~19% market<br />

share<br />

Source: averages from UBS, 25.06.2008 GS, Photon,<br />

LBBW (update 08.11.2007).


Announced <strong>production</strong> capacity by <strong>thinfilm</strong> <strong>technology</strong><br />

Source: Status <strong>and</strong> Perspectives of Thin<br />

Film Solar Cell Production, A. Jäger-<br />

Waldau, European Commission, DG<br />

JRC, Ispra, 22nd EU PVSEC, Milan 2007.<br />

25. juni 2008


Markets recognize thin film potential<br />

500<br />

Indexed to 100<br />

450<br />

Thin film: 363%<br />

400<br />

350<br />

300<br />

250<br />

200<br />

150<br />

100<br />

50<br />

Nov 06 Jan 07 Apr 07 Jun 07 Aug 07 Nov 07<br />

Integrated: 129%<br />

Cell / module: 99%<br />

<strong>Silicon</strong> feedstock: 46%<br />

MSCI Utilities: 16%<br />

Conglomerates: -13%<br />

Thin film: First Solar<br />

Integrated: SolarWorld, REC <strong>and</strong> Trina<br />

Cell / module: SunPower, Suntech, Q-Cells, Motech, Solarfun,<br />

Canadian Solar, Aleo Solar & Solon<br />

<strong>Silicon</strong> feedstock: MEMC, Tokuyama <strong>and</strong> Wacker<br />

Conglomerates: Sharp, Kyocera, BP, Energy Conversion <strong>and</strong> Sanyo<br />

25.06.2008<br />

Source: Morgan Stanley, November 2007


Thin film offers clear advantages<br />

• High potential for cost reduction<br />

• Low material costs (1% of Si use vs. wafer based techs) <strong>and</strong> no major<br />

silicon constraints<br />

• Higher energy yield at less optimal environmental conditions<br />

(dawn, dusk, cloudy days)<br />

– Performance advantage in northern locations<br />

– Performance advantage in hot climates (better temperature coefficient)<br />

– Generates ~10% more energy (kWh) per Watt peak installed than<br />

crystalline PV<br />

• Strong synergies with flat panel display industry (=> <strong>industrial</strong> <strong>production</strong>)


<strong>Silicon</strong> thin film technologies<br />

• Amorphous silicon<br />

– ~ 6% efficiency<br />

– Long established,<br />

well understood<br />

<strong>technology</strong><br />

– Flexible substrates<br />

possible<br />

• Multi-junction<br />

amorphous silicon<br />

– 7-8% efficiency<br />

• Better utilisation of<br />

solar spectrum<br />

• a-Si/microcrystalline<br />

Si<br />

<strong>t<strong>and</strong>em</strong><br />

– ~ 8% efficiency<br />

• prospect of 10%,<br />

<strong>and</strong> 12% in the<br />

longer term<br />

25. juni 2008


Spectral response of an a-Si/µc-Si <strong>t<strong>and</strong>em</strong> cell<br />

• B<strong>and</strong>gap µc-Si: ~ 1.1 eV (1130 nm), B<strong>and</strong>gap a-Si: ~ 1.6 – 1.75 eV (775 – 710 nm)<br />

• Better utilisation of the solar spectrum<br />

UV VIS IR<br />

Spectral radiation density in kW / m² µm<br />

Quantum efficiency in %<br />

a-Si:H<br />

µc-Si:H<br />

Wavelength in µm<br />

Amorphous Top-Cell<br />

Wavelength in nm<br />

Microcrystalline Bottom-Cell<br />

25. juni 2008


Structure of an a-Si/µc-Si <strong>t<strong>and</strong>em</strong> solar cell<br />

• Substrate: TCO (tranparent<br />

conducting oxide) coated float glass<br />

• Absorber: amorphous und<br />

microcrystalline <strong>Silicon</strong> (a-Si/µc-Si)<br />

• Back contact: TCO <strong>and</strong> metal<br />

• Protective layer: NiV<br />

• Encapsulation/Laminination: PVB<br />

• Back Glass<br />

Encapsulation<br />

Back<br />

Contact<br />

Glass<br />

PVB<br />

Absorber<br />

μc-Si:H<br />

a-Si:H<br />

Transparent<br />

Front Contact<br />

TCO (SnO 2<br />

:F)<br />

Glass<br />

25. juni 2008


Players in <strong>Silicon</strong> <strong>thinfilm</strong> PV<br />

• Equipment / <strong>technology</strong><br />

providers:<br />

– Applied Materials (USA)<br />

– Oerlikon (Switzerl<strong>and</strong>)<br />

– Ulvac (Japan)<br />

• Module manufacturers:<br />

– Kaneka (Japan)<br />

– Mitsubishi Heavy Industries (Japan)<br />

– Sharp (Japan)<br />

– Topray (China)<br />

– Brilliant 234 (Germany)<br />

– Sanyo (Japan)<br />

– Ersol (Germany)<br />

– Moser Baer (India)<br />

– T Solar Global (Spain)<br />

– Signet Solar (USA/India/Germany)<br />

– Sunfilm (Germany)<br />

– etc.<br />

25. juni 2008


Applied Materials <strong>production</strong> line “Applied Sunfab”<br />

Quality<br />

Deposition (TCO, back<br />

surface reflectors)<br />

Back Glas<br />

Lasering<br />

Lamination<br />

Washing<br />

Lasering<br />

Junction<br />

Box Attach<br />

PECVD Deposition<br />

(<strong>Silicon</strong> layer)<br />

Source: Applied Materials


PECVD - Plasma-enhanced chemical vapor deposition<br />

• Plasma to generate reactive<br />

species via ionisation, dissociation<br />

<strong>and</strong> excitation<br />

• Chemical reaction on heated<br />

substrate (~ 200°C)<br />

• Process gases:<br />

• Silane (SiH4) <strong>and</strong> H2<br />

• TMB (Trimethylboran) for p-<br />

doping<br />

• Phosphin (PH3) for n-doping<br />

• Deposition rate<br />

• Influence on crystallinity<br />

• Afterwards:<br />

• Cleaning with NF3<br />

• Purging with Ar<br />

Silane<br />

(SiH 4<br />

)<br />

Electrode<br />

Plasma<br />

Exhaust<br />

RF-Generator<br />

(13.56 MHz)<br />

Diffuser<br />

Substrate<br />

Substrate heater<br />

H 2<br />

25. juni 2008


PVD - Physical Vapor Deposition<br />

• Plasma to generate Ar+ ions<br />

• Low energy Ar+ ions are<br />

accelerated to hit the target <strong>and</strong><br />

thereby release atoms (sputter)<br />

which deposit on the substrate<br />

• Sputter targets: metal, metal oxides<br />

25. juni 2008


Laser structuring for monolithic inter-connections<br />

• Integrated monolithic serial connection is a main advantage of <strong>thinfilm</strong> <strong>technology</strong><br />

• Low current <strong>and</strong> high voltage<br />

• Accurate positioning <strong>and</strong> temperature control required<br />

• because of thermal expansion of the glass substrate<br />

Back contact<br />

Absorber<br />

Front contact<br />

Front glass<br />

250 µm<br />

10 mm<br />

25. juni 2008


Sunfilm – Norsun investment in thin film<br />

• based in Großröhrsdorf near Dresden (Germany)<br />

• first 60MWp factory is being built<br />

• Construction started summer 2007<br />

• Production expected to commence summer 2008<br />

• About 180 employees when fully operational<br />

• Ambitious growth plans


Gen 8.5 <strong>Silicon</strong> <strong>thinfilm</strong> module<br />

1.1<br />

1.3<br />

Gen 5<br />

Gen 8.5<br />

2.2<br />

• Size <strong>and</strong> flexibility<br />

• Low cost promise<br />

• Higher energy yield<br />

• Good aesthetics<br />

• Suited for Building<br />

Integrated Photovoltaics<br />

(BIPV)<br />

• No cadmium<br />

8% nominal<br />

450Wp<br />

Monocrystalline<br />

Si module<br />

2.6<br />

Multicrystalline<br />

Si module


Fab 1 currently under construction<br />

23km from Dresden<br />

Temporary offices<br />

Gas farm <strong>and</strong> other<br />

expansion areas<br />

Site Fab 1<br />

purchased/<br />

additional<br />

l<strong>and</strong><br />

blocked


May 2007


June 1, 2007 „ Groundbreaking“


August 12, 2007


August 20, 2007


November 8, 2007 „Topping“


November 26, 2007


December 10, 2007<br />

25.06.2008


January 4, 2008<br />

25.06.2008


Sunfilm contacts<br />

Wolfgang Heinze, COO<br />

Dr. Sicco W.T. Westra, CBDO<br />

Dr. Wilhelm Stein, Head of Process<br />

Technology<br />

David Metzger, Member of the<br />

Executive Board<br />

Sunfilm AG<br />

Strasse E, Nr 8<br />

01900 Grossröhrsdorf<br />

Tel +49 35952 280 000<br />

Fax +49 35952 280 111<br />

www.sunfilmsolar.com<br />

Dr. Carsten Rohr, Business Development, NorSun AS, carsten.rohr@norsuncorp.no<br />

www.norsuncorp.no

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