The Ever Expanding Need for Planarization - NCCAVS - User Groups
The Ever Expanding Need for Planarization - NCCAVS - User Groups
The Ever Expanding Need for Planarization - NCCAVS - User Groups
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1 st Generation HKMG: 45nm<br />
MC<br />
W<br />
Al<br />
NMOS<br />
PMOS<br />
SiGe<br />
Source: IEDM 2009<br />
• SiGe S/D integration <strong>for</strong> PMOS only<br />
• HfO 2 based high‐k material a <strong>for</strong> gate oxide<br />
• 3 ILD layers with nitride stress liner<br />
• Single W contact process<br />
• POP and Al CMP applications<br />
Source: Feeney et al, Taiwan CMPUG 2010