Company Presentation - SUSS MicroOptics

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High-Quality Diffractive Optical Elements (DOE)

� 8‘‘ wafer scale

� 190nm to 10µm wavelength range

� 0.5 μm min feature size

� < 50nm overlay accuracy

� Binary, 8-level, 16-level

� Upto 98% diffraction efficiency

Practical limitations of Talbot imaging with microlens arrays

Laser Beam Homogenizing: Limitations and Constraints

Mask Aligner Lithography - SUSS MicroOptics

Half-tone proximity lithography - SUSS MicroOptics

Micro-Optics: Manufacturing &Testing - SUSS MicroOptics

Optimization of illumination pupils and mask structures for proximity ...

$Refractive Micro-optics for Multi-spot and Multi-line Generation$

Micro-Optics Fabrication and Applications - SUSS MicroOptics

Homogeneous LED-illumination using microlens arrays

Novel Optics/Micro-Optics for Miniature Imaging Systems

Focal-point shaping of microlenses by amplitude or phase masks

Ultra-Thin Camera Based on Artificial Apposition Compound Eyes

High-Quality Diffractive Optical Elements (DOE) � 8‘‘ wafer scale � 190nm to 10µm wavelength range � 0.5 μm min feature size � < 50nm overlay accuracy � Binary, 8-level, 16-level � Upto 98% diffraction efficiency

Hybrid: ROE + DOE + Posts/Trenches + Alignment � Refractive Microlens Arrays � Diffractive Optical Elements (DOE) � Trenches, posts, grooves, holes � Full wafer-level integration on 8‘‘

Page 1 and 2: SUSS MicroOptics Our MicroOptics se
Page 3: Wafer-Based Manufacturing (ROE) �
Page 7 and 8: Micro-Optics in Front-End Lithograp
Page 9 and 10: Optical Communication � Leading s
Page 11 and 12: Wafer-Level Camera (WLC) � 100µm
Page 13 and 14: 13 SUSS MicroOptics - Quality Manag

Company Presentation - SUSS MicroOptics

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