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Posters 1 - Fontismedia

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Program of the 58th Annual Meeting of the International Society of Electrochemistry 11<br />

Symposium 10: General Session<br />

Location: Trans Canada Pipelines Pavilion, TCPL 201 Aud<br />

Chair: J. Lessard, A. Kazuhisa<br />

10:20 to 10:40<br />

Johan Deconinck (Belgium), Gert Nelissen<br />

Multi Ion Simulation of copper deposition on wires in laminar and turbulent electrolyte flow<br />

10:40 to 11:00<br />

Peter Raffelstetter (Austria), Johan Deconinck, Günter Fafilek, Hermann Kronberger, Bernhard Mollay,<br />

Gerhard Nauer, Gert Nelissen, Marius Purcar, Bart Van Den Bossche<br />

Modelling of Electrochemical Pattern Etching Processes: Influence of the Design<br />

11:00 to 11:20<br />

Azumi Kazuhisa (Japan), Shinnosuke Egoshi, Hiroaki Fujieda, Hidetaka Konno<br />

Direct electroless Ni-P plating on ADC12 dicasting alloy<br />

11:20 to 11:40<br />

Bernhard Mollay (Austria), Gerhard Nauer, Gunther Schöllhammer<br />

On the Optimization of High Precision Electrochemical Machining Processes: Localization of the<br />

Dissolution Rate Distribution<br />

11:40 to 12:00<br />

Sangchul Kim (Korea, Republic of), Jaewon Han, Jiho Hong, Sungjoong Joo, Keeho Kim, Youngmin<br />

Kim, Hanchoon Lee, Minhyung Lee<br />

Effect of Direct Contact Via Process on Device Performance in Dual Damascene Cu Interconnects<br />

12:00 to 12:20<br />

Jomar Thonstad (Norway)<br />

Are Inert Anodes for Aluminium Electrolysis Close to a Technological Breakthrough?<br />

12:20 to 12:40<br />

Sudesh Lakshitha Wijesinghe (Singapore), Daniel John Blackwood, Mark Breese, Ee Jin Teo<br />

Influence of microstructure on the electronic and optical properties of porous silicon grown on<br />

highly conducting wafers.<br />

12:40 to 13:00<br />

Nobuhito Imanaka (Japan)<br />

Electrochemical Single Crystal Growth by Electrolyzing Ion Conducting Solids<br />

MONDAY

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