Posters 1 - Fontismedia
Posters 1 - Fontismedia
Posters 1 - Fontismedia
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Program of the 58th Annual Meeting of the International Society of Electrochemistry 11<br />
Symposium 10: General Session<br />
Location: Trans Canada Pipelines Pavilion, TCPL 201 Aud<br />
Chair: J. Lessard, A. Kazuhisa<br />
10:20 to 10:40<br />
Johan Deconinck (Belgium), Gert Nelissen<br />
Multi Ion Simulation of copper deposition on wires in laminar and turbulent electrolyte flow<br />
10:40 to 11:00<br />
Peter Raffelstetter (Austria), Johan Deconinck, Günter Fafilek, Hermann Kronberger, Bernhard Mollay,<br />
Gerhard Nauer, Gert Nelissen, Marius Purcar, Bart Van Den Bossche<br />
Modelling of Electrochemical Pattern Etching Processes: Influence of the Design<br />
11:00 to 11:20<br />
Azumi Kazuhisa (Japan), Shinnosuke Egoshi, Hiroaki Fujieda, Hidetaka Konno<br />
Direct electroless Ni-P plating on ADC12 dicasting alloy<br />
11:20 to 11:40<br />
Bernhard Mollay (Austria), Gerhard Nauer, Gunther Schöllhammer<br />
On the Optimization of High Precision Electrochemical Machining Processes: Localization of the<br />
Dissolution Rate Distribution<br />
11:40 to 12:00<br />
Sangchul Kim (Korea, Republic of), Jaewon Han, Jiho Hong, Sungjoong Joo, Keeho Kim, Youngmin<br />
Kim, Hanchoon Lee, Minhyung Lee<br />
Effect of Direct Contact Via Process on Device Performance in Dual Damascene Cu Interconnects<br />
12:00 to 12:20<br />
Jomar Thonstad (Norway)<br />
Are Inert Anodes for Aluminium Electrolysis Close to a Technological Breakthrough?<br />
12:20 to 12:40<br />
Sudesh Lakshitha Wijesinghe (Singapore), Daniel John Blackwood, Mark Breese, Ee Jin Teo<br />
Influence of microstructure on the electronic and optical properties of porous silicon grown on<br />
highly conducting wafers.<br />
12:40 to 13:00<br />
Nobuhito Imanaka (Japan)<br />
Electrochemical Single Crystal Growth by Electrolyzing Ion Conducting Solids<br />
MONDAY