Failure Analysis (FA) Introduction (Failure Analysis Concept)
Failure Analysis (FA) Introduction (Failure Analysis Concept)
Failure Analysis (FA) Introduction (Failure Analysis Concept)
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Tung-Bao Lu<br />
<strong>Failure</strong> <strong>Analysis</strong> (<strong>FA</strong>) <strong>Introduction</strong><br />
(<strong>Failure</strong> <strong>Failure</strong> <strong>Analysis</strong> <strong>Concept</strong>)<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
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<strong>Failure</strong> <strong>Analysis</strong> (<strong>FA</strong>)<br />
<strong>FA</strong> Definition:<br />
To identify the failure mechanism of failed product.<br />
<strong>FA</strong> <strong>Concept</strong>:<br />
Not only to confirm the failure, but trace the root causes.<br />
<strong>FA</strong> Attitude:<br />
1) Why/What/Who/When/How it failed.<br />
2) What should we do now.<br />
3) How do we improve better.<br />
<strong>FA</strong> Value:<br />
1) Identification of material-related defects.<br />
2) Solving manufacturing problems.<br />
3) Solving service-related problem.<br />
4) Providing corrective or prevention measures.<br />
5) Providing manufacturers’ insurance or legal defense/claim cases<br />
6) To improve product design, production yield and reliability<br />
Tung-Bao Lu<br />
水<br />
落<br />
石<br />
出<br />
也<br />
要<br />
明<br />
察<br />
秋<br />
毫<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
時時留意處處小心<br />
- <strong>Failure</strong> mode<br />
- <strong>Failure</strong> mechanism<br />
- Root cause<br />
2 of 18<br />
真<br />
相<br />
大<br />
白<br />
仍<br />
須<br />
鐵<br />
證<br />
如<br />
山
<strong>Failure</strong> <strong>Analysis</strong> Elements<br />
Tung-Bao Lu<br />
• Current Status (<strong>Failure</strong> rate)<br />
• <strong>Failure</strong> Mode (E<strong>FA</strong>)<br />
• <strong>Failure</strong> Mechanism (Possible)<br />
• <strong>Failure</strong> <strong>Analysis</strong> Technology (Tools)<br />
• <strong>FA</strong> Procedure (Flowchart)<br />
• Result Consistence (Date Speak)<br />
• Time Pressure (Resource Limit)<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
3 of 18
IC <strong>Failure</strong> Mechanism/Property<br />
Thermomechanical<br />
-Large Elastic<br />
Deformation<br />
-Yield<br />
-Buckling<br />
-Brittle Fracture<br />
-Ductile Fracture<br />
-Interfacial<br />
De-adhesion<br />
Tung-Bao Lu<br />
Overstress<br />
Electrical Chemical<br />
and Radiation<br />
-Electromagnetic<br />
Interference<br />
Damage<br />
-Electrical<br />
Overstress<br />
-Gate Oxide<br />
Breakdown<br />
Discharge<br />
-Second<br />
Breakdown<br />
-Ionic<br />
Contamination<br />
-Single Event<br />
Upset<br />
-Soft Error<br />
Thermomechanical<br />
-Fatigue Crack<br />
Initiation<br />
-Fatigue Crack<br />
Propagation<br />
-Creep<br />
-Wear<br />
Wear-out<br />
-Gate Oxide<br />
Breakdown<br />
Time Dependent<br />
Dielectric<br />
Breakdown<br />
-Slow Trapping<br />
-Surface charge<br />
Spreading<br />
-Hot electrons<br />
-Hillock<br />
Formation<br />
-Contact Spiking<br />
-Electromigration<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
Electrical Chemical<br />
and Radiation<br />
-Diffusion<br />
-Interdiffusion<br />
-Corrosion<br />
-Stress Corrosion<br />
-Dendritic Growth<br />
-Soft Error<br />
-Excessive Leakage<br />
Currents<br />
-Radiation Induced<br />
Thermal Breakdown<br />
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Electrical <strong>Analysis</strong><br />
Tung-Bao Lu<br />
DC (Direct Current): Assembly related E<strong>FA</strong><br />
AC (Alternative Current): Device related E<strong>FA</strong><br />
��DC DC -- Open/Short: Pin Continuity/ESD Test<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
-- Leakage: Input Buffer High/Low Current Test<br />
-- ICC: Standby/Dynamic/Refresh Current Test<br />
��AC AC -- High/Low Voltage Applied<br />
-- Data High/Low (1/0) Applied<br />
-- Pattern (Scan/Checkerboard/March) Applied<br />
-- Timing (Speed) Test<br />
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Parameter Defect<br />
Tung-Bao Lu<br />
Vcc Vss<br />
IO1<br />
IO2<br />
IO3<br />
IO4<br />
Lead<br />
- Open (開路)<br />
- Short (短路)<br />
- Leakage (漏電)<br />
- Idd (靜態電流)<br />
Lead-frame<br />
Compound<br />
Gold-wire<br />
bond-pad<br />
Chip<br />
Physical Package Diagram<br />
Vcc<br />
Vss<br />
IO16<br />
IO15<br />
IO14<br />
IO13<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
VLSI Circuit<br />
V53C16258<br />
1 Vcc Vss 44<br />
2 I/O 1 I/O 16 43<br />
3 I/O 2 I/O 15 42<br />
4 I/O 3 I/O 14 41<br />
5 I/O 4 I/O 13 40<br />
6 Vcc Vss 39<br />
7 I/O 5 I/O 12 38<br />
8 I/O 6 I/O 11 37<br />
9 I/O 7 I/O 10 36<br />
10 I/O 8 I/O 9 35<br />
13 NC NC 32<br />
14 NC LCAS 31<br />
15 WE UCAS 30<br />
16 RAS OE 29<br />
17 NC A8 28<br />
18 Ao A7 27<br />
19 A1 A6 26<br />
20 A2 A5 25<br />
21 A3 A4 24<br />
22 Vcc Vss 23<br />
Pin Names (V53C16258)<br />
A0-A8 Address Inputs<br />
RAS Row Address Strobe<br />
UCAS Column Address Strobe<br />
/Upper Byte Control<br />
LCAS Column Address Strobe<br />
/Lower Byte Control<br />
WE Write Enable<br />
OE Output Enable<br />
I/O1~I/O 16 Date Input, Output<br />
Vcc +5V Supply<br />
Vss 0V Supply<br />
NC No Connect<br />
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Open/Short<br />
E<br />
Tung-Bao Lu<br />
Pin connection<br />
- Sink 0.1 mA<br />
- Measure V<br />
- All pins<br />
+ -<br />
1 40<br />
2<br />
1<br />
39<br />
40<br />
3<br />
2<br />
38<br />
39<br />
4<br />
3<br />
37<br />
38<br />
5<br />
4<br />
36<br />
37<br />
6<br />
5<br />
35<br />
36<br />
7<br />
6<br />
34<br />
35<br />
8<br />
7<br />
33<br />
34<br />
9<br />
8<br />
32<br />
33<br />
10<br />
9<br />
31<br />
32<br />
11<br />
10<br />
30<br />
31<br />
12<br />
11<br />
29<br />
30<br />
13<br />
12<br />
28<br />
29<br />
14<br />
13<br />
27<br />
28<br />
15<br />
14<br />
26<br />
27<br />
16<br />
15<br />
25<br />
26<br />
17<br />
16<br />
24<br />
25<br />
18<br />
17<br />
23<br />
24<br />
19<br />
18<br />
22<br />
23<br />
20<br />
19<br />
21<br />
22<br />
20 21<br />
Vss=0V<br />
C<br />
I (mA)<br />
0.1<br />
E<br />
Input<br />
I<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
Force current I (0.1mA) to measure voltage V<br />
Short<br />
0.7<br />
Circuit Diagram (ESD Protection)<br />
V<br />
EDS<br />
0.2V 2V<br />
I (mA)<br />
0.1<br />
Vdd<br />
Vss<br />
Judgement<br />
Pass Open<br />
I (mA)<br />
0.7<br />
V<br />
C<br />
0.1<br />
Output<br />
0.7<br />
7 of 18<br />
V
Leakage<br />
Vdd=5V/3.3V Vss=0V<br />
AUX<br />
C<br />
Tung-Bao Lu<br />
Pin connection<br />
- Force 0V and 5V (3.3V)<br />
- Measure I<br />
- All pins<br />
1 40<br />
2<br />
1<br />
39<br />
40<br />
3<br />
2<br />
38<br />
39<br />
4<br />
3<br />
37<br />
38<br />
5<br />
4<br />
36<br />
37<br />
6<br />
5<br />
35<br />
36<br />
7<br />
6<br />
34<br />
35<br />
8<br />
7<br />
33<br />
34<br />
9<br />
8<br />
32<br />
33<br />
10<br />
9<br />
31<br />
32<br />
11<br />
10<br />
30<br />
31<br />
12<br />
11<br />
29<br />
30<br />
13<br />
12<br />
28<br />
29<br />
14<br />
13<br />
27<br />
28<br />
15<br />
14<br />
26<br />
27<br />
16<br />
15<br />
25<br />
26<br />
17<br />
16<br />
24<br />
25<br />
18<br />
17<br />
23<br />
24<br />
19<br />
18<br />
22<br />
23<br />
20<br />
19<br />
21<br />
22<br />
20 21<br />
E<br />
0 - 5/3.3V<br />
C<br />
Leakage Lo<br />
EDS<br />
Leakage Hi<br />
Circuit Diagram<br />
Vdd=5/3.3V<br />
Vss=0V<br />
Judgement<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
AUX<br />
E<br />
Output<br />
Force voltage V (Lo=0V, Hi=5V) to measure current I<br />
10uA (depend on spec.)<br />
Pass Leakage<br />
8 of 18
Idd Current<br />
Vdd=5V/3.3V<br />
measure Idd Vss=0V<br />
C<br />
Tung-Bao Lu<br />
Pin connection<br />
- Force Vdd=5V(3.3V)<br />
- Measure I<br />
- Vdd and Vss<br />
1 40<br />
2<br />
1<br />
39<br />
40<br />
3<br />
2<br />
38<br />
39<br />
4<br />
3<br />
37<br />
38<br />
5<br />
4<br />
36<br />
37<br />
6<br />
5<br />
35<br />
36<br />
7<br />
6<br />
34<br />
35<br />
8<br />
7<br />
33<br />
34<br />
9<br />
8<br />
32<br />
33<br />
10<br />
9<br />
31<br />
32<br />
11<br />
10<br />
30<br />
31<br />
12<br />
11<br />
29<br />
30<br />
13<br />
12<br />
28<br />
29<br />
14<br />
13<br />
27<br />
28<br />
15<br />
14<br />
26<br />
27<br />
16<br />
15<br />
25<br />
26<br />
17<br />
16<br />
24<br />
25<br />
18<br />
17<br />
23<br />
24<br />
19<br />
18<br />
22<br />
23<br />
20<br />
19<br />
21<br />
22<br />
20 21<br />
E<br />
Input<br />
Circuit Diagram<br />
EDS<br />
Vdd=5/3.3V<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
Idd<br />
Vss=0V<br />
Judgement<br />
C<br />
Pass Idd fail<br />
E<br />
Output<br />
Force voltage V (5V) to measure current I<br />
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Feature<br />
- Pin to to pin test<br />
- O/S test<br />
- Leakage test<br />
- Idd test<br />
Tung-Bao Lu<br />
Curve Tracer<br />
Tektronix 370A curve tracer spec.<br />
Range Resolution<br />
V -500V ~ +500V 5mV<br />
I -2A ~ +2A 100pA<br />
AUX -40V ~ +40V 20mA<br />
I-V Curve<br />
Feature<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
DC Tester<br />
- Socket test<br />
- O/S test<br />
- Leakage test<br />
- Idd test<br />
ChipMOS DC tester spec.<br />
Range Resolution<br />
V -110V ~ +110V 100μV<br />
I -1A ~ +1A 100fA<br />
Normal Open Short Leakage<br />
Test socket<br />
TSOP II 54L<br />
10 of 18
Tung-Bao Lu<br />
X-光顯微儀<br />
(XRM, X-Ray Microscopy)<br />
檢測產品內部金線連接, 金線傾斜及銀膠氣洞等<br />
(wire connection, wire sweep, epoxy void)<br />
Non-Destructive Test, NDT<br />
Brand: FEINFOCUS<br />
Model: FXS-100.23<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
超音波掃描儀<br />
(SAT, Scanning Acoustic Tomograph)<br />
檢測產品內部脫層, 氣洞, 晶片傾斜等<br />
(delamination, void, chip tilt)<br />
Brand: SONIX<br />
Model: HS-1000<br />
11 of 18
Tung-Bao Lu<br />
膠體開蓋機<br />
(Decapsulator)<br />
去除產品封膠材料以便觀察金線及晶片等<br />
(Move away EMC to observe wire and chip)<br />
Brand: NIPPON / Model: PS101<br />
Destructive Test<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
金相試片製作<br />
(DPA, Destructive Physical <strong>Analysis</strong>)<br />
產品內部結構及尺寸分析, 缺陷檢測<br />
(Internal structure and dimension)<br />
Chip<br />
(Lead frame)<br />
(Epoxy)<br />
(Die pad)<br />
12 of 18
Brand: BUEHLER<br />
Model: ISOMET<br />
Brand: EXTEC<br />
Model: 14560 (p)<br />
14565 (l)<br />
Brand: BUEHLER<br />
Model: ECOMET 3<br />
Brand: ALLIED<br />
Model: METPREP 8<br />
Tung-Bao Lu<br />
Powder<br />
DPA Preparation, Cross-Section<br />
Liquid<br />
切割<br />
切割<br />
切割<br />
切割<br />
(Cutting) (Cutting)<br />
鑲埋<br />
鑲埋<br />
鑲埋<br />
鑲埋<br />
(Monting) (Monting)<br />
研磨<br />
研磨<br />
研磨<br />
研磨<br />
(Grinding) (Grinding)<br />
拋光<br />
拋光<br />
拋光<br />
拋光<br />
(Polishing) (Polishing)<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
13 of 18
OM Appearance: Package crack<br />
XRM: Cannot find abnormality<br />
P52<br />
Tung-Bao Lu<br />
P51<br />
P48<br />
P50<br />
P49<br />
P48<br />
P47<br />
P46<br />
P45<br />
P49<br />
SEM: Find 2 nd stitch bond crack<br />
compound<br />
Au-wire<br />
Ag-plating<br />
Cu-leadframe<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
Crack-line<br />
<strong>Failure</strong> mode: 2 nd bond crack/broken<br />
14 of 18
Tung-Bao Lu<br />
光學顯微鏡<br />
(Optical Microscopy)<br />
Measurescopy<br />
Brand: NIKON<br />
Model: MM-60/L3U<br />
H.M. Optical Microscopy<br />
Brand: NIKON<br />
Model: OPTZPHOT-200<br />
Auxiliary Tools (Microscope)<br />
Stereoscopy<br />
Brand: NIKON<br />
Model: SMZ-10A<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
掃描式電子顯微鏡<br />
(SEM, Scanning Electron Microscopy)<br />
Brand: HITACHI<br />
Model: S-3500N<br />
15 of 18
(Chemical <strong>Analysis</strong>, FTIR, Auger, EDX, AA…)<br />
Tung-Bao Lu<br />
Device Related <strong>FA</strong> Instruments<br />
光子顯微鏡<br />
(EM, Emission Microscopy)<br />
液晶顯微鏡<br />
(LCM, Liquid Crystal Microscopy)<br />
聚焦離子束儀<br />
(FIB, Focus Ion Beam)<br />
記憶體分析儀<br />
(MOSAID Memory Analyzer)<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
16 of 18
XRM Image<br />
SAT Picture<br />
Tung-Bao Lu<br />
DC Tester<br />
(Socket, all pins)<br />
X-Ray Microscope<br />
(Feinfocus FXS 100.23)<br />
Liquid Crystal<br />
Microscope<br />
(Wentworth MP-2300)<br />
<strong>Failure</strong> <strong>Analysis</strong> Procedure<br />
PASS<br />
Open/Short<br />
only<br />
Open/Short<br />
only<br />
Leakage only<br />
(Hot-spot)<br />
Sample<br />
Open/Short Test<br />
Leakage (Hi/Lo)<br />
Idd Current Test<br />
XRM<br />
SAT (Cause)<br />
Decapsulation<br />
SEM<br />
Chip Probing<br />
LCM<br />
Report<br />
(Cause)<br />
(Cause)<br />
- Sample<br />
- Pin Assignment<br />
- Socket<br />
Curve Tracer<br />
(Tektronix 370A)<br />
(Pin to Pin)<br />
Scanning Acoustic<br />
Tomograph<br />
(SONIX HS-1000)<br />
Scanning Electron<br />
Microscope<br />
(HITACHI S-3500N)<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
SEM Photo<br />
LCM Photo<br />
Hot Spot<br />
(Defect)<br />
17 of 18
Tung-Bao Lu<br />
Reference<br />
<strong>Failure</strong> <strong>Analysis</strong><br />
www.semiconfareast.com Crime Scene Investigation<br />
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