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Failure Analysis (FA) Introduction (Failure Analysis Concept)

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Tung-Bao Lu<br />

<strong>Failure</strong> <strong>Analysis</strong> (<strong>FA</strong>) <strong>Introduction</strong><br />

(<strong>Failure</strong> <strong>Failure</strong> <strong>Analysis</strong> <strong>Concept</strong>)<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

1 of 18


<strong>Failure</strong> <strong>Analysis</strong> (<strong>FA</strong>)<br />

<strong>FA</strong> Definition:<br />

To identify the failure mechanism of failed product.<br />

<strong>FA</strong> <strong>Concept</strong>:<br />

Not only to confirm the failure, but trace the root causes.<br />

<strong>FA</strong> Attitude:<br />

1) Why/What/Who/When/How it failed.<br />

2) What should we do now.<br />

3) How do we improve better.<br />

<strong>FA</strong> Value:<br />

1) Identification of material-related defects.<br />

2) Solving manufacturing problems.<br />

3) Solving service-related problem.<br />

4) Providing corrective or prevention measures.<br />

5) Providing manufacturers’ insurance or legal defense/claim cases<br />

6) To improve product design, production yield and reliability<br />

Tung-Bao Lu<br />

水<br />

落<br />

石<br />

出<br />

也<br />

要<br />

明<br />

察<br />

秋<br />

毫<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

時時留意處處小心<br />

- <strong>Failure</strong> mode<br />

- <strong>Failure</strong> mechanism<br />

- Root cause<br />

2 of 18<br />

真<br />

相<br />

大<br />

白<br />

仍<br />

須<br />

鐵<br />

證<br />

如<br />


<strong>Failure</strong> <strong>Analysis</strong> Elements<br />

Tung-Bao Lu<br />

• Current Status (<strong>Failure</strong> rate)<br />

• <strong>Failure</strong> Mode (E<strong>FA</strong>)<br />

• <strong>Failure</strong> Mechanism (Possible)<br />

• <strong>Failure</strong> <strong>Analysis</strong> Technology (Tools)<br />

• <strong>FA</strong> Procedure (Flowchart)<br />

• Result Consistence (Date Speak)<br />

• Time Pressure (Resource Limit)<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

3 of 18


IC <strong>Failure</strong> Mechanism/Property<br />

Thermomechanical<br />

-Large Elastic<br />

Deformation<br />

-Yield<br />

-Buckling<br />

-Brittle Fracture<br />

-Ductile Fracture<br />

-Interfacial<br />

De-adhesion<br />

Tung-Bao Lu<br />

Overstress<br />

Electrical Chemical<br />

and Radiation<br />

-Electromagnetic<br />

Interference<br />

Damage<br />

-Electrical<br />

Overstress<br />

-Gate Oxide<br />

Breakdown<br />

Discharge<br />

-Second<br />

Breakdown<br />

-Ionic<br />

Contamination<br />

-Single Event<br />

Upset<br />

-Soft Error<br />

Thermomechanical<br />

-Fatigue Crack<br />

Initiation<br />

-Fatigue Crack<br />

Propagation<br />

-Creep<br />

-Wear<br />

Wear-out<br />

-Gate Oxide<br />

Breakdown<br />

Time Dependent<br />

Dielectric<br />

Breakdown<br />

-Slow Trapping<br />

-Surface charge<br />

Spreading<br />

-Hot electrons<br />

-Hillock<br />

Formation<br />

-Contact Spiking<br />

-Electromigration<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

Electrical Chemical<br />

and Radiation<br />

-Diffusion<br />

-Interdiffusion<br />

-Corrosion<br />

-Stress Corrosion<br />

-Dendritic Growth<br />

-Soft Error<br />

-Excessive Leakage<br />

Currents<br />

-Radiation Induced<br />

Thermal Breakdown<br />

4 of 18


Electrical <strong>Analysis</strong><br />

Tung-Bao Lu<br />

DC (Direct Current): Assembly related E<strong>FA</strong><br />

AC (Alternative Current): Device related E<strong>FA</strong><br />

��DC DC -- Open/Short: Pin Continuity/ESD Test<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

-- Leakage: Input Buffer High/Low Current Test<br />

-- ICC: Standby/Dynamic/Refresh Current Test<br />

��AC AC -- High/Low Voltage Applied<br />

-- Data High/Low (1/0) Applied<br />

-- Pattern (Scan/Checkerboard/March) Applied<br />

-- Timing (Speed) Test<br />

5 of 18


Parameter Defect<br />

Tung-Bao Lu<br />

Vcc Vss<br />

IO1<br />

IO2<br />

IO3<br />

IO4<br />

Lead<br />

- Open (開路)<br />

- Short (短路)<br />

- Leakage (漏電)<br />

- Idd (靜態電流)<br />

Lead-frame<br />

Compound<br />

Gold-wire<br />

bond-pad<br />

Chip<br />

Physical Package Diagram<br />

Vcc<br />

Vss<br />

IO16<br />

IO15<br />

IO14<br />

IO13<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

VLSI Circuit<br />

V53C16258<br />

1 Vcc Vss 44<br />

2 I/O 1 I/O 16 43<br />

3 I/O 2 I/O 15 42<br />

4 I/O 3 I/O 14 41<br />

5 I/O 4 I/O 13 40<br />

6 Vcc Vss 39<br />

7 I/O 5 I/O 12 38<br />

8 I/O 6 I/O 11 37<br />

9 I/O 7 I/O 10 36<br />

10 I/O 8 I/O 9 35<br />

13 NC NC 32<br />

14 NC LCAS 31<br />

15 WE UCAS 30<br />

16 RAS OE 29<br />

17 NC A8 28<br />

18 Ao A7 27<br />

19 A1 A6 26<br />

20 A2 A5 25<br />

21 A3 A4 24<br />

22 Vcc Vss 23<br />

Pin Names (V53C16258)<br />

A0-A8 Address Inputs<br />

RAS Row Address Strobe<br />

UCAS Column Address Strobe<br />

/Upper Byte Control<br />

LCAS Column Address Strobe<br />

/Lower Byte Control<br />

WE Write Enable<br />

OE Output Enable<br />

I/O1~I/O 16 Date Input, Output<br />

Vcc +5V Supply<br />

Vss 0V Supply<br />

NC No Connect<br />

6 of 18


Open/Short<br />

E<br />

Tung-Bao Lu<br />

Pin connection<br />

- Sink 0.1 mA<br />

- Measure V<br />

- All pins<br />

+ -<br />

1 40<br />

2<br />

1<br />

39<br />

40<br />

3<br />

2<br />

38<br />

39<br />

4<br />

3<br />

37<br />

38<br />

5<br />

4<br />

36<br />

37<br />

6<br />

5<br />

35<br />

36<br />

7<br />

6<br />

34<br />

35<br />

8<br />

7<br />

33<br />

34<br />

9<br />

8<br />

32<br />

33<br />

10<br />

9<br />

31<br />

32<br />

11<br />

10<br />

30<br />

31<br />

12<br />

11<br />

29<br />

30<br />

13<br />

12<br />

28<br />

29<br />

14<br />

13<br />

27<br />

28<br />

15<br />

14<br />

26<br />

27<br />

16<br />

15<br />

25<br />

26<br />

17<br />

16<br />

24<br />

25<br />

18<br />

17<br />

23<br />

24<br />

19<br />

18<br />

22<br />

23<br />

20<br />

19<br />

21<br />

22<br />

20 21<br />

Vss=0V<br />

C<br />

I (mA)<br />

0.1<br />

E<br />

Input<br />

I<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

Force current I (0.1mA) to measure voltage V<br />

Short<br />

0.7<br />

Circuit Diagram (ESD Protection)<br />

V<br />

EDS<br />

0.2V 2V<br />

I (mA)<br />

0.1<br />

Vdd<br />

Vss<br />

Judgement<br />

Pass Open<br />

I (mA)<br />

0.7<br />

V<br />

C<br />

0.1<br />

Output<br />

0.7<br />

7 of 18<br />

V


Leakage<br />

Vdd=5V/3.3V Vss=0V<br />

AUX<br />

C<br />

Tung-Bao Lu<br />

Pin connection<br />

- Force 0V and 5V (3.3V)<br />

- Measure I<br />

- All pins<br />

1 40<br />

2<br />

1<br />

39<br />

40<br />

3<br />

2<br />

38<br />

39<br />

4<br />

3<br />

37<br />

38<br />

5<br />

4<br />

36<br />

37<br />

6<br />

5<br />

35<br />

36<br />

7<br />

6<br />

34<br />

35<br />

8<br />

7<br />

33<br />

34<br />

9<br />

8<br />

32<br />

33<br />

10<br />

9<br />

31<br />

32<br />

11<br />

10<br />

30<br />

31<br />

12<br />

11<br />

29<br />

30<br />

13<br />

12<br />

28<br />

29<br />

14<br />

13<br />

27<br />

28<br />

15<br />

14<br />

26<br />

27<br />

16<br />

15<br />

25<br />

26<br />

17<br />

16<br />

24<br />

25<br />

18<br />

17<br />

23<br />

24<br />

19<br />

18<br />

22<br />

23<br />

20<br />

19<br />

21<br />

22<br />

20 21<br />

E<br />

0 - 5/3.3V<br />

C<br />

Leakage Lo<br />

EDS<br />

Leakage Hi<br />

Circuit Diagram<br />

Vdd=5/3.3V<br />

Vss=0V<br />

Judgement<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

AUX<br />

E<br />

Output<br />

Force voltage V (Lo=0V, Hi=5V) to measure current I<br />

10uA (depend on spec.)<br />

Pass Leakage<br />

8 of 18


Idd Current<br />

Vdd=5V/3.3V<br />

measure Idd Vss=0V<br />

C<br />

Tung-Bao Lu<br />

Pin connection<br />

- Force Vdd=5V(3.3V)<br />

- Measure I<br />

- Vdd and Vss<br />

1 40<br />

2<br />

1<br />

39<br />

40<br />

3<br />

2<br />

38<br />

39<br />

4<br />

3<br />

37<br />

38<br />

5<br />

4<br />

36<br />

37<br />

6<br />

5<br />

35<br />

36<br />

7<br />

6<br />

34<br />

35<br />

8<br />

7<br />

33<br />

34<br />

9<br />

8<br />

32<br />

33<br />

10<br />

9<br />

31<br />

32<br />

11<br />

10<br />

30<br />

31<br />

12<br />

11<br />

29<br />

30<br />

13<br />

12<br />

28<br />

29<br />

14<br />

13<br />

27<br />

28<br />

15<br />

14<br />

26<br />

27<br />

16<br />

15<br />

25<br />

26<br />

17<br />

16<br />

24<br />

25<br />

18<br />

17<br />

23<br />

24<br />

19<br />

18<br />

22<br />

23<br />

20<br />

19<br />

21<br />

22<br />

20 21<br />

E<br />

Input<br />

Circuit Diagram<br />

EDS<br />

Vdd=5/3.3V<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

Idd<br />

Vss=0V<br />

Judgement<br />

C<br />

Pass Idd fail<br />

E<br />

Output<br />

Force voltage V (5V) to measure current I<br />

9 of 18


Feature<br />

- Pin to to pin test<br />

- O/S test<br />

- Leakage test<br />

- Idd test<br />

Tung-Bao Lu<br />

Curve Tracer<br />

Tektronix 370A curve tracer spec.<br />

Range Resolution<br />

V -500V ~ +500V 5mV<br />

I -2A ~ +2A 100pA<br />

AUX -40V ~ +40V 20mA<br />

I-V Curve<br />

Feature<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

DC Tester<br />

- Socket test<br />

- O/S test<br />

- Leakage test<br />

- Idd test<br />

ChipMOS DC tester spec.<br />

Range Resolution<br />

V -110V ~ +110V 100μV<br />

I -1A ~ +1A 100fA<br />

Normal Open Short Leakage<br />

Test socket<br />

TSOP II 54L<br />

10 of 18


Tung-Bao Lu<br />

X-光顯微儀<br />

(XRM, X-Ray Microscopy)<br />

檢測產品內部金線連接, 金線傾斜及銀膠氣洞等<br />

(wire connection, wire sweep, epoxy void)<br />

Non-Destructive Test, NDT<br />

Brand: FEINFOCUS<br />

Model: FXS-100.23<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

超音波掃描儀<br />

(SAT, Scanning Acoustic Tomograph)<br />

檢測產品內部脫層, 氣洞, 晶片傾斜等<br />

(delamination, void, chip tilt)<br />

Brand: SONIX<br />

Model: HS-1000<br />

11 of 18


Tung-Bao Lu<br />

膠體開蓋機<br />

(Decapsulator)<br />

去除產品封膠材料以便觀察金線及晶片等<br />

(Move away EMC to observe wire and chip)<br />

Brand: NIPPON / Model: PS101<br />

Destructive Test<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

金相試片製作<br />

(DPA, Destructive Physical <strong>Analysis</strong>)<br />

產品內部結構及尺寸分析, 缺陷檢測<br />

(Internal structure and dimension)<br />

Chip<br />

(Lead frame)<br />

(Epoxy)<br />

(Die pad)<br />

12 of 18


Brand: BUEHLER<br />

Model: ISOMET<br />

Brand: EXTEC<br />

Model: 14560 (p)<br />

14565 (l)<br />

Brand: BUEHLER<br />

Model: ECOMET 3<br />

Brand: ALLIED<br />

Model: METPREP 8<br />

Tung-Bao Lu<br />

Powder<br />

DPA Preparation, Cross-Section<br />

Liquid<br />

切割<br />

切割<br />

切割<br />

切割<br />

(Cutting) (Cutting)<br />

鑲埋<br />

鑲埋<br />

鑲埋<br />

鑲埋<br />

(Monting) (Monting)<br />

研磨<br />

研磨<br />

研磨<br />

研磨<br />

(Grinding) (Grinding)<br />

拋光<br />

拋光<br />

拋光<br />

拋光<br />

(Polishing) (Polishing)<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

13 of 18


OM Appearance: Package crack<br />

XRM: Cannot find abnormality<br />

P52<br />

Tung-Bao Lu<br />

P51<br />

P48<br />

P50<br />

P49<br />

P48<br />

P47<br />

P46<br />

P45<br />

P49<br />

SEM: Find 2 nd stitch bond crack<br />

compound<br />

Au-wire<br />

Ag-plating<br />

Cu-leadframe<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

Crack-line<br />

<strong>Failure</strong> mode: 2 nd bond crack/broken<br />

14 of 18


Tung-Bao Lu<br />

光學顯微鏡<br />

(Optical Microscopy)<br />

Measurescopy<br />

Brand: NIKON<br />

Model: MM-60/L3U<br />

H.M. Optical Microscopy<br />

Brand: NIKON<br />

Model: OPTZPHOT-200<br />

Auxiliary Tools (Microscope)<br />

Stereoscopy<br />

Brand: NIKON<br />

Model: SMZ-10A<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

掃描式電子顯微鏡<br />

(SEM, Scanning Electron Microscopy)<br />

Brand: HITACHI<br />

Model: S-3500N<br />

15 of 18


(Chemical <strong>Analysis</strong>, FTIR, Auger, EDX, AA…)<br />

Tung-Bao Lu<br />

Device Related <strong>FA</strong> Instruments<br />

光子顯微鏡<br />

(EM, Emission Microscopy)<br />

液晶顯微鏡<br />

(LCM, Liquid Crystal Microscopy)<br />

聚焦離子束儀<br />

(FIB, Focus Ion Beam)<br />

記憶體分析儀<br />

(MOSAID Memory Analyzer)<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

16 of 18


XRM Image<br />

SAT Picture<br />

Tung-Bao Lu<br />

DC Tester<br />

(Socket, all pins)<br />

X-Ray Microscope<br />

(Feinfocus FXS 100.23)<br />

Liquid Crystal<br />

Microscope<br />

(Wentworth MP-2300)<br />

<strong>Failure</strong> <strong>Analysis</strong> Procedure<br />

PASS<br />

Open/Short<br />

only<br />

Open/Short<br />

only<br />

Leakage only<br />

(Hot-spot)<br />

Sample<br />

Open/Short Test<br />

Leakage (Hi/Lo)<br />

Idd Current Test<br />

XRM<br />

SAT (Cause)<br />

Decapsulation<br />

SEM<br />

Chip Probing<br />

LCM<br />

Report<br />

(Cause)<br />

(Cause)<br />

- Sample<br />

- Pin Assignment<br />

- Socket<br />

Curve Tracer<br />

(Tektronix 370A)<br />

(Pin to Pin)<br />

Scanning Acoustic<br />

Tomograph<br />

(SONIX HS-1000)<br />

Scanning Electron<br />

Microscope<br />

(HITACHI S-3500N)<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

SEM Photo<br />

LCM Photo<br />

Hot Spot<br />

(Defect)<br />

17 of 18


Tung-Bao Lu<br />

Reference<br />

<strong>Failure</strong> <strong>Analysis</strong><br />

www.semiconfareast.com Crime Scene Investigation<br />

18 of 18

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