Materials Science & Engineering - Trans Tech Publications Inc.

material groups, and theory. Overall, this is a valuable and unique
guide to the subject.
Available in print (978-3-03785-045-9), 190 pages, 2011,
US$138.00/€100.00, also available on CD (978-3-03785-046-6)
and eBook (sold separately)
Defects and Diffusion, Theory & Simulation II
Ed. David J. Fisher
Defect and Diffusion Forum Vol. 307
This second volume in a new series covering entirely general results
in the fields of defects and diffusion includes 356 abstracts of papers
which appeared between the end of 2009 and the end of 2010. As
well as the abstracts, the volume includes original papers on theory/
simulation, semiconductors and metals.
Available in print (978-3-03785-043-5), 220 pages, 2011,
US$138.00/€100.00, also available on CD (978-3-03785-044-2)
and eBook (sold separately)
Design Against Fracture and Failure Design
Zainul Huda, Robert Bulpett and Kang Yong Lee
Materials Science Foundations Vol. 69
The aim of this book is to develop, in the reader, the necessary skills
required for designing materials, components and structures so as
to resist fracture and failure in engineering applications. In order
to achieve this objective, the authors have adopted a combined
materials science-fracture mechanics-design approach. Although
the material covered is designed for an advanced undergraduate
course in metallurgy/materials engineering, students coming from
mechanical, civil or aerospace engineering backgrounds will also
be able to use this text as a course/reference book. In addition to
students, practising engineers and production mangers will also find
this book very useful; particular with regard to designing components
and machine elements so as to resist fracture and failure in critical
applications.
Available in print (978-0-87849-157-5), 221 pages, 2010,
US$138.00/€100.00, also available on CD (00) and eBook (sold
separately)
Diffusion in Semiconductors, Other than Silicon: Compilation
Ed. David J. Fisher
Defect and Diffusion Forum Vol. 308
This volume contains a selection of the available data, on ‘traditional’
(e.g. GaAs, Ge) and other (e.g. SiC, GaN) semiconductors, which
have been reported over a period stretching from the 1950s to 2010.
Only data on oxide semiconductors have been omitted. The full list of
materials covered is: CdHgTe, CdMnTe, CdS, CdSe, CdTe, CuInSe2,
GaAlAs, GaAlN, GaAsP, GaInAs, GaInP, GaN, GaP, GaSb, GaSe,
GaTe, Ge, HgTe, InAlAs, InAs, InAsSb, InP, InSb, InSe, PbSnTe,
PbTe, SiC, ZnS, ZnSe and ZnTe. This will be a handy reference
source for anyone requiring a guide to the order of magnitude of
diffusivities when designing diffusion-dependent experiments or
industrial processes.
Available in print (978-3-03785-093-0), 168 pages, 2011,
US$138.00/€100.00, also available on CD (978-3-03785-094-7)
and eBook (sold separately)
Diffusion in Solids and Liquids V
Eds. Andreas Öchsner, Graeme E. Murch, Ali Shokuhfar and João
M.P.Q. Delgado
Defect and Diffusion Forum Vols. 297-301
Current water-treatment technologies require considerable energy
consumption. Thus, closely linked to the problem of water shortage
is the impending energy crisis. Therefore, intensive research
is being aimed at developing water purification processes that
are based upon using renewable energy, such as solar energy,
rather than energy generated using fossil fuels. There has been
an accumulation of reports on the development of photocatalysts,
which enable water purification using solar energy as the only driving
force. Such photocatalysts, based upon oxide semiconductors,
permit the conversion of solar energy into the chemical energy
that is required for the oxidation of toxic organic compounds in
water. The most promising photocatalyst is titanium dioxide, TiO2,
and its solid solutions. The research on TiO2 photocatalysis is
multidisciplinary, and progress in this area requires the application
of concepts of catalysis and photocatalysis as well as concepts of
Current Publications (alphabetically)
solid-state chemistry.
Available in print (978-3-908451-80-8), 1600 pages, 2010,
US$729.00/€528.00, also available on CD (11) and eBook (sold
separately)
Diffusion in Solids and Liquids VI
Eds. Andreas Öchsner, Graeme E. Murch and João M.P.Q. Delgado
Defect and Diffusion Forum Vols. 312-315
The goal of this special collection of peer-reviewed papers was to
provide an unique opportunity to exchange information, to present
the latest results and to review relevant issues in contemporary
diffusion research. The result is a work which will provide valuable
insights into this subject.
Available in print (978-3-03785-117-3), 1300 pages, 2011,
US$435.00/€315.00, also available on CD (978-3-03785-118-0)
and eBook (sold separately)
Diffusivity in Silicon 1953 to 2009
Ed. David J. Fisher
Defect and Diffusion Forum Vol. 302
This work is essentially an update of previous compilations of
information on the diffusivity of elements in semiconductor-grade
silicon. It subsumes the data contained in B.L.Sharma’s monograph
on ‘Diffusion in Semiconductors‘ (Trans Tech Publications, 1970),
plus the data contained in Diffusion and Defect Data (Diffusion in
Silicon) Volume 45 (1986), Defect and Diffusion Forum (Diffusion in
Silicon - 10 years of Research) Volumes 153-155 (1998), Defect and
Diffusion Forum (Diffusion in Silicon - a Seven-Year Retrospective)
Volume 241 (2005) and the latest data from recent Semiconductor
Retrospectives: Defect and Diffusion Forum, Volumes 245-246,
Volumes 261-262, Volume 272 and Volume 282. In addition, the
resultant 400 items of data were analysed in the hope of finding
some unifying correlation. It was indeed found that all of the points
(each the average of many independent measurements) seemed
to fall on a number of distinct straight lines passing through the
origin of a plot of activation energy versus atomic radius. However,
it remained unclear how these correlations could be explained.
Available in print (978-3-908451-85-3), 230 pages, 2010,
US$138.00/€100.00, also available on CD (11) and eBook (sold
separately)
Digital Design and Manufacturing Technology
Eds. Guozhong Chai, Congda Lu and Donghui Wen
Advanced Materials Research Vols. 102-104
This special collection on digital design and manufacturing
technology explains the ins and outs of CAD/CAM technologies,
and how these tools can be used to model and manufacture
building components and industrial design products. It offers a
comprehensive overview of the field and expertly addresses a
broad range of recent initiatives and other issues related to the
design of parts and assemblies for manufacturing; including a broad
range of software, numerically controlled machines, manufacturing
processes and prototyping methods. This book will therefore
provide a valuable and fruitful reference work for researchers in
the field of digital design and manufacturing processes who wish
to understand further the underlying mechanisms and create new
and practical design technologies, systems and processes. It will
also be particularly useful for practising engineers in digital design
and manufacturing processing who are responsible for the design
of efficient and effective operations.
Available in print (978-0-87849-278-7), 1050 pages, 2010,
US$411.00/€298.00, also available on CD (978-3-908452-03-4)
and eBook (sold separately)
Digital Design and Manufacturing Technology II
Ed. Congda Lu
Advanced Materials Research Vol. 215
The rapid growth in digital design and manufacturing processes
brings with it some work-flow challenges. While the various existing
products provide an ideal solution to most of the steps in the
process, more dedicated and integrated systems are sometimes
required; raising the question of how best to handle the incoming
data and orders, automate the design and possibly the engineering,
make robust plans, manage the process and data and deliver quality
goods. This collection of peer-reviewed papers on digital design
and manufacturing technology explains the ins-and-outs of CAD/
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