J. Alexander Liddle - National Institute of Standards and Technology
J. Alexander Liddle - National Institute of Standards and Technology
J. Alexander Liddle - National Institute of Standards and Technology
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Nanomanufacturing TodayResolution (nm)10 310 210 1AFM using oxidation <strong>of</strong>Si as resist(single tip)E-beam lithographyusing inorganicresistsGaussian e-beamsystems using highspeedresistsShaped <strong>and</strong> cellprojectione-beamlithographyGaussian e-beamwith PMMA resistOptical step <strong>and</strong>scan reductionprinting10 0STM low-temperatureatom manipulationBest fit: R= 23 T 0.2Nanoimprintlithography10 -1 10 -21 10 -19 10 -17 10 -15 10 -13 10 -11 10 -9 10 -7 10 -5 10 -3Areal Throughput (m 2 /s)After D.M. Tennant <strong>and</strong> C.R. Marrian, J. Vac. Sci. Technol. (2003)
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