AP&T High Voltage Power Supplies & Controllers for Electron Beam ...

Material Specific Evaporation ParametersIn order to achieve the best in film quality anduniform evaporant utilisation, the GENIUS canstore a wide variety of evaporation parameters.Different data sets may then be applied to differentphases of the process (e.g. material meltingand various coating phases). In addition to storingvarious beam sweep parameters, differenthigh voltage values may also be set.Pocket SelectionData sets containing evaporation parameterscan either be associated to an individual hearthor held and assigned externally to one or morehearths. With the I/O card it is therefore possibleto choose a particular data set dependent upona signal from a film thickness rate controller.Setting of evaporation parametersWave form EditorFlexible SystemConfigurationAs a controller for the evaporationsystem, the GENIUS handlescommunication betweenthe CARRERA high voltagepower supply and the filamentpower supply (FPS). In additionto this a process controller canbe set to access in real time allfunctions of the GENIUS andprocess data via the RS232 interface.For each data set the following parameters maybe defined and saved:• Magnet deflection (position, amplitude, frequency,wave form, beam spot, limits)• High voltage• Safety limits (arc-sensitivity, emission currentlimit)The wave form can be set independently in bothX- and the Y- axis. This enables an oscillation patterndefined by 32 coordinate positions to beestablished. This allows compensation for variationsin the energy distribution of the melt or thesweep pattern.The GENIUS PRO offers additional beam sweepand defocusing possibilities. For example, byapplying the “spiral” and “star” patterns, dielectricmaterials can be more homogenously evaporated.The GENIUS can be configuredfor integration into differentsystems by using a variety ofplug in cards.Rear View of GENIUS