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The Extractor Ion Source IQE 11/35 - Specs

The Extractor Ion Source IQE 11/35 - Specs

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Surface AnalysisTechnologyVacuumComponentsSurface AnalysisSystem SoftwareComputerTechnology<strong>The</strong> <strong>Extractor</strong> <strong>Ion</strong> <strong>Source</strong> <strong>IQE</strong> <strong>11</strong>/<strong>35</strong>Product Information<strong>The</strong> extractor type ion source <strong>IQE</strong> <strong>11</strong>/<strong>35</strong> generates a typical ion current of 10-15 µA (Argon)with a Gaussian type beam profile depending on acceleration voltage. <strong>The</strong> special Y-oxidecoated Ir-cathode is suitable for operation with all noble gases, N 2 , and reactive gases like O 2 ,H 2 and CH 4 . This cathode is of the non-line-of-sight type which eliminates samplecontamination. <strong>The</strong> special arrangement of the accelerating electrode and anode ensures longterm stable operation of the ion source. <strong>The</strong> ion current can be varied over a wide range byadjusting the gas pressure. <strong>The</strong> energy range of the ions is continuously variable between 0.2and 5 keV. <strong>The</strong> source is bakeable up to 200°C and can be degassed internally. <strong>The</strong> standardinsertion depth of 62.5 mm can be adjusted to the customer’s specification.DimensionsFigure1: Schematic Drawing of the <strong>Ion</strong> <strong>Source</strong> <strong>IQE</strong> <strong>11</strong>/<strong>35</strong>Direct (<strong>IQE</strong> <strong>11</strong>/<strong>35</strong>) versus Indirect Gas Inlet<strong>The</strong> ion source <strong>IQE</strong> <strong>11</strong>/<strong>35</strong> has a direct gas inlet flange for direct gas transfer to the ionizationcylinder cap and is differentially pumped via the aperture opening. This leads to a low operationpressure of 10 -6 to 10 -5 mbar within the main chamber, clean sputter conditions and reducedpumping times after sputtering.<strong>The</strong> ion source can also be operated by backfilling of the UHV chamber with the sputter gas. <strong>The</strong>typical chamber pressure for operation of the ion source <strong>IQE</strong> <strong>11</strong>/<strong>35</strong> with indirect gas inlet viabackfilling is in the range of 10 -4 to 10 -3 mbar.C o m p e t e n c e i n S u r f a c e A n a l y s i s<strong>IQE</strong> <strong>11</strong>/<strong>35</strong> 1/3home\sales\aktuell\prospekte\iqe\iqe<strong>11</strong>-info.ppt


→→Performance (<strong>IQE</strong> <strong>11</strong>/<strong>35</strong>)Figure 2: Dependence ofMaximum Sample Currentand Beam Diameter on <strong>Ion</strong>EnergyParameters:§<strong>Source</strong>-Sample Distance:§50 mm§Emission Current: 10 mAPlease not that the pressure isoptimized at each point formaximum sample current.Max. Sample Current [uA]50403020100Sample Current [uA]FWHM [mm]→0,5 1 2 3 4 5<strong>Ion</strong> Energy [keV]1086420FWHM [mm]Figure 3: Dependence of SampleCurrent and Beam Diameter on<strong>Source</strong>-Sample DistanceParameters:§Acceleration Potential: 5 kV§Emission Current: 10 mASample Current [uA]2015105Current [uA]FWHM [mm]→2015105FWHM [mm]0030 50 80 125<strong>Source</strong>-Sample Distance [mm]Figure 4: Dependence of BeamDiameter on <strong>Ion</strong> EnergyParameters:§<strong>Source</strong>-Sample Distance:§125 mm§Emission Current: 10 mAFWHM [mm]30252015FWHM [mm]100 1 2 3 4 5<strong>Ion</strong> Energy [keV]C o m p e t e n c e i n S u r f a c e A n a l y s i s<strong>IQE</strong> <strong>11</strong>/<strong>35</strong> 2/3home\sales\aktuell\prospekte\iqe\iqe<strong>11</strong>-info.ppt


Typical <strong>Ion</strong> Current - Dependence on Pressure (<strong>IQE</strong> <strong>11</strong>/<strong>35</strong>)1 keV5 keV4 keV3 keV2 keV0,5 keVFigure 3:Dependence of Sample Current on Operation Pressure and<strong>Ion</strong> EnergyParameter<strong>Source</strong>-Sample Distance: 80 mmEmission Current: 10 mAPlease Note that the actual achieved Sample Current at a certain pressure depends on thechamber geometry and pumping speed.Furthermore the pressure to achieve a certain ion current will increase with the length of theion source.SPECS GmbH –Surface Analysisand Computer TechnologyVoltastraße 5, 13<strong>35</strong>5 BerlinGermanyPhone: +49 (0)30 46 78 24 - 0Fax: +49 (0)30 4 64 20 83E-mail: support@specs.dehttp://www.specs.deC o m p e t e n c e i n S u r f a c e A n a l y s i s<strong>IQE</strong> <strong>11</strong>/<strong>35</strong> 3/3home\sales\aktuell\prospekte\iqe\iqe<strong>11</strong>-info.ppt

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