Publikationsliste Prof. Dr. Ulrich Mescheder Buchbeiträge: [1] U ...

Publikationsliste Prof. Dr. Ulrich Mescheder
Buchbeiträge:
[1] U. Mescheder Porous Silicon: Technology and Application. In: Series NATO Science Series II:
Mathematics, Physics and Chemistry, Vol. 181: Yurish, Sergey Y.; Gomes, Maria Teresa S.R.
(Eds.): 2004, S. 273-288, ISBN: 1-4020-2929-2
[2] U. Mescheder Modern silicon based MEMS-technology. In: Series NATO Science Series II:
Mathematics, Physics and Chemistry, Vol. 181: Yurish, Sergey Y.; Gomes, Maria Teresa S. R.
(Eds.): 2004, S. 255-272, ISBN 1-4020-2929-2
Bücher:
[3] U. Mescheder, Mikrosystemtechnik: Konzepte und Anwendungen. Stuttgart: Teubner-Verlag, 2.
überarbeitete und ergänzte Auflage, 2004, 292 S., ISBN 3-519-16256-3
[4] U. Mescheder; Mikrosystemtechnik: Konzepte und Anwendungen. Stuttgart: B. G. Teubner, 1.
Auflage, 2000, S. 323, ISBN 3-519-06256-9
Veröffentlichungen in Zeitschriften und Konferenzberichten:
[5] A. Nimo, U. Mescheder, B. Müller, A. S. Abou Elkeir: 3D capacitive vibrational micro harvester
using isotropic charging of electrets deposited on vertical sidewalls, Proc. SPIE 8066, Prague April
2011
[6] P. Jonnalagadda, U. Mescheder, A. Kovacs, A. Nimo: Nanoneedles Based on Porous Silicon for
Chip Bonding with Self Assembly Capability, physica status solidi (a) Article first published online:
7 APR 2011, DOI: 10.1002/pssc.201000139
[7] A. Ivanov, U. Mescheder, A. Kovacs: High quality 3D shapes by silicon anodization, physica status
solidi (a), Article first published online: 18 MAR 2011,DOI: 10.1002/pssa.201000163
[8] A. Saad, U. Mescheder, B. Müller, A. Nimo: High Eficient, Low Cost Electret Charging Set-Up for
MEMS Based Energy Harvesting System, Proc. PowerMEMS 2010, Leuven, Belgium, November
30 – December 3, 2010
[9] A. Nimo, U. Mescheder: 3-D Capacitive Vibrational Harvester for Autonomous Low Power
Sensors, Proc. PowerMEMS 2010, Leuven, Belgium, November 30 – December 3, 2010
[10] S. Ressel, M. Gohlke, D. Rauen, T. Schuldt, W. Kronast, U. Mescheder, U. Johann, D. Weise, C.
Braxmaier: Ultra-stable assembly and integration technology for ground- and space-based optical
systems, J. Appl Optics, Applied Optics, Vol. 49, Issue 22, pp. 4296-4303 (2010)
[11] T. Bruns, L. Becsi, M. Talkenberg, M. Wagner, P. Weber, U. Mescheder, H. Schneckenburger:
Microfluidic system for single cell sorting with optical tweezers, Session: Single Cells and
Molecules "Microfluidic system for single cell sorting with optical tweezers", LALS'2010 - 12th
International Conference on Laser Applications in Life Sciences '2010; Oulu, Finnland 9.-
11.06.2010.
[12] A. Kovacs, P. Jonnalagadda, X. Meng, U. Mescheder: Optisches Messsystem für biosensorische
Anwendungen, Proceedings 15.ITG-/GMM-Fachtagung Sensoren und Messsysteme, Nürnberg,
2010, 182-188
[13] A. Ivanov, A. Kovacs, U. Mescheder: Nasschemisches Ätzen von nahezu beliebigen 3D-Strukturen
in Silizium. Wet chemical etching of nearly arbitrary 3D-structures in silicon. Proceedings Workshop
Nano-Mikro-Integration, Erfurt, 3.-4.3.2010 , 65-68

[14] P. Jonnalagadda, U. Mescheder, A. Kovacs, A. Nimo: Bondverfahren für Selbstjustierung und
Mehrfachbonden basierend auf nasschemisch präparierten Si-Oberflächen, Proceedings
Workshop Nano-Mikro-Integration, Erfurt, 3.-4.3.2010, 41-44
[15] U.M. Mescheder, P. Jonnalagadda, A. Kovacs, X. Meng: Optischer Biosensor mittels
selbstorganisierter nanostrukturierte Multilayerschichten/ Optical biosensor using selforganized
nanostructured multilayers, Proceedings Workshop Nano-Mikro-Integration, Erfurt, 3.-4.3.2010,
105-110
[16] P. Jonnalagadda, U. Mescheder, A. Kovacs and A. Nimo: Nanoneedles based on porous silicon for
chip bonding with self-Assembly capability, paper abstract, 7th International Conference on porous
materials and technologies, Valencia (Spain), 14th-19th of March 2010
[17] A. Ivanov, A. Kovacs, U. Mescheder: High quality 3d shapes by silicon anodization, paper abstract,
7th International Conference on porous materials and technologies, Valencia (Spain), 14th-19th of
March 2010
[18] W. Kronast, U. Mescheder, B. Müller, A. Nimo, C. Braxmaier, T. Schuldt: Development of a tilt
actuated micromirror for applications in laser interferometry. Proceedings of SPIE, Photonics West
2010-MOEMS-MEMS: Micro- and Nanofabrication, San Francisco, Ca, USA, 23-28 January 2010,
Vol.7594-25, doi:10.1117/12.839577, 10 pages
[19] H. Schneckenburger, R. Börret, C. Braxmaier, R. Kessler, P. Kioschis, D. Kühlke, U. Mescheder,
W. Schröder, Ch. Nachtigall: Dem Energiestoffwechsel von Tumorzellen und Bioreagenzien auf
der Spur, BioPhotonik 2009, No.1-2009, pp.26-28
[20] U. Mescheder, A. Kovacs, J. Kritwattanakhorn, B. Müller, M.-L. Bauersfeld, S. Rademacher, J.
Wöllenstein, Ch. Ament, A. Peter: Mikrostrukturierter Sensorarray zur Luftqualitätsmessung
(Mosel) Dokumentation zum Forschungstag 2009, Hochtechnologieforschung, S. 169
(Posterabstract)
[21] U Mescheder, B.Müller, S Baborie, and P Urbanovic: Properties of SiO2 electret films charged by
ion implantation for MEMS-based energy harvesting systems, Journal of Micromechanics and
Microengineering, Vol. 19, No. 9 (2009), 094003 (6pp)
[22] A. Kovacs, P. Jonnalagadda, X. Y. Meng and U. Mescheder: Characterization of Porous Based
Optical Sensor System for Biosensor Applications, proceedings of the 8th IEEE Conference on
Sensors, Christchurch, New Zealand, 25-28 October, 2009, pp. 21- 26
[23] U.M.Mescheder, A. Kovacs, P. Jonnalagadda, A. Nimo: Nanostrukturierte Siliziumoberflächen für
Mikro-Nano-Integration, Tagungsband Mikrosystemtechnik Kongress 2009, Oktober 2009, Seite
210-213
[24] A. Ivanov, A. Kovacs, U. Mescheder, S. Kuhn, A. Burr: Optimisation of surface quality of 3D silicon
master forms for injection molding of optical micro elements, Tagungsband Mikrosystemtechnik
Kongress 2009, Oktober 2009, Seite 726-729
[25] W. Kronast, U. Mescheder, R. Huster: Huster Stressuntersuchung und Optimierung von SOI
basierten Membranen, Tagungsband Mikrosystemtechnik Kongress 2009, Oktober 2009, S. 590-
593
[26] A. Kovacs, P. Jonnalagadda, X. Meng, U. Mescheder: Entwicklung und Charakterisierung von
photonischen Multischichten aus porösem Silizium für biosensorische Anwendungen, Tagungsband
Mikrosystemtechnik Kongress 2009, Oktober 2009, Seite 333-336
[27] A. Kovacs, D. Meister, U. Mescheder: Investigation of humidity adsorption in porous silicon layers,
Phys. Status Solidi A 206, No. 6, 1343–1347 (2009)
[28] U. Mescheder, A. Kovacs, P. Jonnalagadda: Si-based Self-organized Nanostructuring Processes
for MEMS Applications, Technical Programme and Abstract Book of the 2nd Intern. Conference on
Frontiers in Nanoscience and Technology, Cochin, India, January 3-6, 2009, p. 37
[29] Adam Kovacs, Andras Kovacs, U. Mescheder: Estimation of elasticity modulus and fracture
strength of thin perforated SiN membranes with finite element simulations. Computational Material
Science (2008). ISSN 0927-0256 43 p. 59-64
[30] J. Wöllenstein, M.-L. Bauersfeld, S. Rademacher, A. Kovacs, J. Kritwattanakhorn, B. Müller, U.
Mescheder, A. Peter: Sensorarray zur Luftqualitätsmessung, VDI-Kongress Sensoren und
Messsysteme 2008, VDI-Berichte Nr. 2011, S. 425-433

[31] Hellmuth, T.; Khrennikov, K.; Kronast, W.; Huster, R.; Mescheder, U.: Optimisation and
characterisation of parabolic membrane mirrors. MEMS, MOEMS, and Micromachining III. Edited
by Urey, Hakan. Proceedings of the SPIE, Volume 6993, pp. 699305-699305-11 (2008), DOI:
10.1117/12.780758
[32] U. Mescheder, P. Urbanovic, B. Müller, S. Baborie: Charging of SiO2 electret film by ion
implantation for MEMS based energy harvesting systems. Proceedings PowerMEMS 2008,
Sendai, Japan, November 9-12, 2008, p 501-504
[33] A. Kovacs, D. Meister, U. Mescheder: Investigation of humidity adsorption in porous silicon layers,
Porous Semiconductors – Science and Technology 2008, Sa Coma-Mallorca, Spain, 10-14 March,
2008, Materials of the 6th International conference, pp 403-404
[34] A. Ivanov, U. Mescheder, M. Kröner, P. Woias: Formation of arbitrarily shaped 3D-forms in silicon
by electrochemical wet-etching, 19th MicroMechanics Europe Workshop, 28-30. September, 2008,
Aachen, Deutschland, Proceedings, ISBN 978-3-00-025529-8, S.315-318
[35] Andras Kovacs, Adam Kovacs, M. Pogany, U. Mescheder: Mechanical investigation of perforated
and porous membranes for micro- and nanofilter application, Sensors & Actuators B, Chemical,
Volume 127, Issue 1, 20 October 2007, Pages 120-125
[36] J. Kritwattanakhorn, M., L. Bauersfeld, A. Kovacs, U. Mescheder, B. Müller, S. Rademacher, J.
Wöllenstein: Optimization of Platinum adhesion in electrochemical etching process for multi-sensor
systems, Sensors & Actuators B, Chemical, Volume 127, Issue 1, 20 October 2007, Pages 126-
131
[37] Adam Kovacs, Andras Kovacs, Ulrich Mescheder: Effektive material properties of multilayered
porous nanofilters, 17th International Workshop on Computational Mechanics of Materials, August
22-24, 2007, Paris, Book of Abstracts pp.29-30.
[38] U. Mescheder, R. Huster, W. Kronast:, T. Hellmuth, K. Khrennikov: Optimierung und
Charakterisierung eines Membranspiegels zur dynamischen Fokussierung, Mikrosystemtechnik-
Kongress 2007, 15-17. Oktober, Dresden, 2007, Tagungsband, S.1011-1014
[39] A. Ivanov, U. Mescheder, A. Kovacs, R. Huster: Einfluss unterschiedlicher Passivierungsschichten
auf die Bildungsrate von porösem Silizium an Strukturkanten bei der 3D-Formherstellung,
Mikrosystemtechnik-Kongress 2007, 15-17. Oktober, Dresden, 2007, Tagungsband, S.529-532
[40] Peter, Ch. Ament, M.-L. Bauersfeld, S. Rademacher, J. Wöllenstein, J. Kritwattanakhorn, A.
Kovacs, B. Müller, U. Mescheder: Modelbasierte Verfahren zur Bestimmung der Luftgüte,
Mikrosystemtechnik-Kongress 2007, 15-17. Oktober, Dresden, 2007, Tagungsband, S.1079-1082
[41] U. Mescheder, J. Kritwattanakhorn, A. Kovacs, B. Müller, Ch. Ament, A. Peter, M.-L. Bauersfeld, S.
Rademacher, J. Wöllenstein: Sensorarray zur Luftqualitätsmessung, Horizonte, Nr.30, Juni, 2007,
S.3-8.
[42] U. Mescheder, M.-L. Bauersfeld, A. Kovacs, J. Kritwattanakhorn, B. Müller, A. Peter, Ch. Ament, S.
Rademacher, J. Wöllenstein: MEMS-Based Air Quality Sensor, Technical Digest, Transducers XIV
& Eurosensors XXI, June 10-14, Lyon, Frankreich, 2007, S.1417-1420.
[43] Mescheder, U.: Aktive Optik sowie Luftqualitätssensoren. Carl Hanser Verlag, Mikroproduktion, 2
(2007), S.61
[44] Kovacs, Zs. Vizvary, A. Kovacs, U. Mescheder: Large deflection analysis of perforated silicon
nitride membranes; 6th EMSC, Budapest Hungary, Proc. CD S12, K140, 28.08.-01.09.2006
[45] U. Mescheder, Z. Torok, W. Kronast "Active focusing device based on MOEMS technology ",
Proceedings of SPIE Vol.8186-1, Strasbourg 3.-7.April 2006
[46] Andras Kovacs, M. Pogany, U. Mescheder, Adam Kovacs: Realization and mechanical
investigation of perforated and porous membranes for filter applications: XX Eurosen-sors,
Göteborg, Schweden, 17.-20. September 2006,Proc., ISBN 91-631-9280-2, Vol. II, p. 392-393
[47] J. Kritwattanakhorn, A. Kovacs, U. Mescheder, B. Müller, M.-L. Bauersfeld, S. Rademacher, J.
Wöllenstein: Optimization of Platinum Adhesion in Electroechemical Etching Processes for Multisensor
Systems: XX Eurosensors, Göteborg, Schweden, 17.-20. September 2006, Proc., ISBN 91-
631-9280-2, Vol. II, p. 376-377

[48] U. Mescheder, M. Freudenreich, S.Somogyi, C. Estan: Distortion Optimized Focusing Mirror
Device with Large Aperture. Journal: SENSORS AND ACTUATORS A: PHYSICAL Vol. 130-131,
2006, p. 20-27
[49] U. Mescheder, Zoltan Torok, W. Kronast: Active focusing device based on MOEMS technology.
Proceedings of SPIE Vol.8186, 2006, p 1-12
[50] R. Huster, A. Kovacs, U. Mescheder: 3-D Micro Free-Form Manufacturing in Silicon Micro-Free-
Form Production for Plastics Moulding Technology, Proceedings Micro System Technology
2005,ed. H.Reichl, Munich, 2005, pp 55
[51] Ch. Ament, M.-L. Bauersfeld, A. Kovacs, J. Kritwattanakhorn, U. Mescheder, B. Müller, A. Peter, J.
Radebacher, J. Wöllenstein: Sensorarray zur Luftqualitätsmessung, Tagungsband des
Mikrosystemtechnik-Kongresses 2005, Freiburg, 10.-12.10.2005, S.619-623
[52] U. Mescheder, A. Kovacs, R. Schneider: Optische Penmaus mit Bluetooth: Horizonte 27,
Mannheim, Dez. 2005: S. 8-11
[53] Peter, Ch. Ament, M.-L. Bauersfeld, S. Rademacher, R. Stich, J. Wöllenstein, A. Kovács, J.
Kritwattanakhorn, B. Müller und U. Mescheder: Neuartiger Mikrosensor zur Luftgütemessung mit
kombiniertem Feuchte- und Gassensor. Tagungsband des 50. Internationales Wissenschaftliches
Kolloquium, Technische Universität Ilmenau, 19.-23. September 2005, S. 273-274
[54] U. Mescheder, A. Kovacs: 3D-Mikrostrukturierungsverfahren: MikroSystemTechnik 3/2005, 7-9,
GIT Verlag, 2005: S.10-12
[55] U. Mescheder, M. Freudenreich, S.Somogyi, C. Estan: MOEMS Focusing Device with Ideal
Parabolic Deflection Shape, Solid-State Sensors, Actuators and Microsystems, 2005, Digest of
Technical Papers. TRANSDUCERS '05. The 13th International Conference on Volume 1, June 5-
9, 2005 Page(s):1000 – 1005
[56] U. Mescheder: Modern silicon based MEMS-technology, Series: NATO Science Series II:
Mathematics, Physics and Chemistry, Vol. 181 , Yurish, Sergey Y.; Gomes, Maria Teresa S.R.
(Eds.) 2004, ISBN: 1-4020-2929-2, S. 255-272
[57] U. Mescheder: Porous Silicon: Technology and Application, Series: NATO Science Series II:
Mathematics, Physics and Chemistry, Vol. 181 , Yurish, Sergey Y.; Gomes, Maria Teresa S.R.
(Eds.) 2004, ISBN: 1-4020-2929-2, S. 273-288
[58] W. Kronast, A.J. Laskurain, U. Mescheder: Das Rasterkraftmikroskop (AFM) zur Charakterisierung
und Strukturierung im Nanometerbereich, Horizonte Heft 25, Dezember 2004, S.3-8
[59] M.Herding, G.Somogyi, U. Mescheder, P.Woias: A new micromachined optical fiber switch for
instrumentation purposes, Proceedings of Photonics Europe 2004, Strasbourg, France, 2004, pp.
264-273
[60] M. Freudenreich, U. M. Mescheder, G. Somogyi: Simulation and realization of a novel
micromechanical bi-stable switch, Sensors and Actuators A: Physical, Vol 114/2-3 pp 451-459,
2004
[61] U. Mescheder, W. Kronast and N. Naychuk: Reliability investigations in micromechanical devices,
Sensors and Actuators A: Physical, Volume 110, Issues 1-3, Pages 150-156 (1 February 2004)
[62] U. Mescheder: Nanoporous Silicon, Multifunctional material for Microsystems, Proceedings of
AVT-099 Novel Vehicle Concepts and Emerging Vehicle Technology, Brüssel, April 2003
[63] U.M. Mescheder, W. Kronast, N. Naychuk: Reliability Investigations in micromechanical Devices,
CD-ROM Proceedings of EurosensorsXVI, September 2002, Prague, Czech Republic, MP58, pp
280-281
[64] P. Fürjes, A. Kovács, Cs. Dücső, M. Ádám, B. Müller and U. Mescheder: Porous Silicon Based
Humidity Sensor with Interdigital Electrodes and Internal Heaters, Proceedings Eurosensors XVI,
Prague Sept. 2002, 605-606
[65] U. Mescheder et al.: Local Laser Bonding for Low Temperature Budget, Sensors and Actuators
A97-98 (2002) 422-427
[66] U. Mescheder et al.: 3D Structuring of c-Si using porous Silicon, proceedings 2nd IEEE conference
on Nanotechnology, 33-36 (2002)

[67] U.M. Mescheder, A. Kovacs, W. Kronast, I. Bársony, M. Ádám and Cs. Dücsö: Porous silicon as
multifunctional material in MEMS, Proceedings of IEEE-Nanotechnology, Maui (USA), 2001, pp.
483-488
[68] U. Mescheder, M. Alavi; K. Hiltmann; Ch. Lizeau, Ch. Nachtigall and H. Sandmaier: Local Laser
Bonding for Low Temperature Budget, Digest of Technical Papers of the Transducers ´01,
Eurosensors XV, pp. 620-623, Munich, Germany, June 2001
[69] U. Mescheder, A. Kovacs: Surface Micromachining Process for C-Si as Active Material, Digest of
Technical Papers of the Transducers ´01, Eurosensors XV, pp. 218-221, Munich, Germany, June
2001
[70] U. Mescheder, A. Kovacs: Porous silicon as sacrifical layer for sub-µm-crystalline freestanding
structures, invited paper presented on the conference "Sensor 2000, Nexus-Session", Juni 2000
St. Petersburg (Russia)
[71] M. Reichardt, U. Mescheder, N. Nosseir: Simulation of a Micro-Fabricated Inclinometer,
Proceedings of the International Conference on Mathematics and Engineering Techniques in
Medicine abd Biological Sciences (METMBS'00), Vol. I, pp. 309-314, Las Vegas, Nevada, USA,
June 26-29, 2000
[72] U. M. Mescheder, Ch. Kötter: Optical monitoring and control of Si wet etching", Sensors and
Actuators 76 (1-3), 425-430 (1999)
[73] U. Mescheder, Ch. Kötter: Optical monitoring and control of Si wet etching, Proceedings der
Eurosensors XII, Internat. Konferenz, Southampton, 1998, p. 51-54
[74] U. Mescheder, Ch. Kötter, B. Katzenstein, T. Lang: Piezoelectric inch worm motor with
monolithically integrated driving block, Proceedings Actuators 98, Internationale Konferenz ,
Bremen Juni 1998, p. 327-331
[75] U. Mescheder, Ch. Kötter, E Kolguin, A. Oukhov: Optische Insitu-Prozeßkontrolle beim
anisotropen Ätzen von Si-Membranen. in Sensoren und Meßsysteme, VDI-Verlag, 1998, p. 365–
372
[76] U. Mescheder, S. Majer: Mikromechanischer Zwei-Achsen-Neigungssensor, Tagungsband zum
3.Forschungstag, Forschungstag der baden-württembergischen Fachhochschulen , Karlsruhe
1997, S. 48-49
[77] U. Mescheder, Ch. Kötter: Laserschreibsystem mit Piezotisch, Tagungsband zum 3.
Forschungstag der baden-württembergischen Fachhochschulen , Karlsruhe 1997, S. 51
[78] U. Mescheder, B. Richards, S. Majer, N. Aribas, U. Lohmann: Expertensystem für den Entwurf von
Mikrosystemen, Tagungsband zum 3.Forschungstag, Forschungstag der badenwürttembergischen
Fachhochschulen , Karlsruhe 1997, S. 50
[79] E.A. Kolgin, I.A. Tumanov, A.A. Ukhov, U. Mescheder: Photometric device for control of
micromechanical elements manufacturing, Proceedings of third international scientific technical
Conference of Actual Problems of electronic instrument engineering, APEIE-96, Vol. 2, p.75-76
[80] U. Mescheder, S. Majer: Micromechanical Inclinometer, Sensors&Actuators, A60 (1997) 134-138
[81] U. Mescheder, S. Majer: Mikromechanischer Neigungssensor für industrielle Anwendungen, im
Tagungsband des 41.Internationalem Wissenschaftlichen Kolloquium der TU Ilmenau, Sept. 1996,
p. 507-514
[82] U. Mescheder, S. Majer, R. Keller: 2-Achsen Si-Neigungssensor: Simulation und Realisierung,
VDI-Berichte1255, VDI-Verlag Düsseldorf, 1996, p. 83-93
[83] S. Majer, U. Mescheder: Simulation supported design of micromechanical sensors, Beitrag in:
Simulation and Design of Microsystems and Microstructures, Computational Mechanics
Publication, Southampton/Boston, 1995 (ed. R.A. Adey, A. Lahrmann, C. Leßmöllmann) p. 329-
337
[84] M. Zander und U. Mescheder: Maskenmetrologie: Anforderungen und Trends, VDI-Berichte 935,
Tagungsbericht "Maskentechnik für Mikroelektronik-Bausteine" (1991), p. 7-40
[85] L. Buchmann, U. Mescheder, H. Torkler: Characterisation of Silicon open Stencil Masks in an Ion
Projection Lithography Machine, Micro. Eng. 10 (1991), pp. 353

[86] U. Mescheder, U. Mackens, H. Lifka, R. Dammel, G. Pawlowski, J. Theis: Application of Positive
and Negative Tone X-Ray Resist for 0.5 µm CMOS Device Fabrication, Microc. Eng. 9 (1990), pp.
481
[87] H. Schaffer, U. Mescheder, U. Weigmann, H. C. Petzold: Influence of X-Ray Mask Repair on
Pattern Placement Accuracy, Microc. Eng. 9 (1990), pp. 251
[88] H. Lüthje, A. Bruns, M. Harms, I. Köhler, U. Mescheder, U. Mackens, T. Stuck: X-Ray Mask
Technology: Precise Etching of Sub-half-micron Tungsten Absorber Features, Microc. Eng. 9
(1990), pp. 255
[89] U. Mescheder, K. Werner: Submikrometer Linienbreitenmetrologie hoher Genauigkeit, VDI-Bericht
795 "Maskentechnik für Mikroelektronik Bausteine" (1989), pp. 155
[90] U. Mackens, U. Mescheder, H. Lüthje: Herstellung einer 0.5 µm Schaltung und
Overlayuntersuchungen, GME-Fachbericht Mikroelektronik (1989)
[91] U. Mescheder, U. Mackens, F. Mund: Investigation of Linewidth Uniformity in X-Ray Lithography,
SPIE Vol. 1087 (1989), pp. 396
[92] U. Mackens, U. Mescheder, F. Mund, H. Lüthje, H. Lifka, C. A. H. Juffermans, P.H. Woerlee, A.J.
Walker: Fabrication of 0.5 µm NMOS-Devices by all level X-ray-Lithography, Microc. Eng. 8
(1989), pp. 89
[93] U. Mackens, H. Lüthje, U. Mescheder, F. Mund, S. Pongratz: Application of SiC-X-Ray Masks for
Fabricating Sub-micron Devices, SPIE Vol. 923 (1988), pp. 9
[94] S. Pongratz, U. Mescheder, C. Ehrlich, H.-L. Huber, K. Kohlmann: State of the Art of Pattern
Placement Accuracy of Silicon X-Ray Master Masks, Microc. Eng. 8 (1989), pp.117
[95] H. L. Huber, U. Mescheder, F. Mund, S. Pongratz, J. Trube, W. Windbracke: Sub-half-micron
Critical Dimension Control in X-Ray Mask Technology, Journ. Vac. Sc. B6(6) (1988), pp. 2184
[96] U. Mescheder, F. Mund, H. L. Huber: Linewidth Metrology for X-Ray Masks with Subhalfmicron
Feature Size, Microcircuit Eng. 7 (1988), pp. 653
[97] U. Mescheder, W. Windbracke, H. L. Huber: Kontrolle der Lagegenauigkeit von Absorberstrukturen
bei Röntgenmasken, Jahrestagung der Deutschen Gesellschaft für Angewandte Optik,
Berchtesgarden 1987
[98] H. Betz, H. L. Huber, S. Pongratz, W. Rohrmoser, W. Windbracke, U. Mescheder: Silicon X-Ray
Masks Pattern Placement and Overlay Accuracy, Microcircuit Eng. 6 (1987), pp.41
[99] H. Lüthje, U. Mackens, U. Mescheder, B. Matthießen: Stability of SiC-Masks for High Resolution
Synchrotron X-ray Lithography, Microelectronic Proc. 6 (1987), p.39
[100] U. Mescheder and G. Weiser: Optical study of charge injection in plasma deposited a-Si:H, Journ.
of Non-Crystalline Solids 77&78 (1985) pp. 571