2011 International Symposium on Extreme Ultraviolet Lithography ...

Accelerating the next technology revolution
<strong>2011</strong> <strong>International</strong> <strong>Symposium</strong> on
Extreme Ultraviolet Lithography
October 17-19 Miami, FL
Opening Address / Program Overview
Stefan Wurm, SEMATECH
Patrick Naulleau, LBNL
Copyright ©2009
SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. <strong>International</strong> SEMATECH Manufacturing Initiative, ISMI, Advanced Materials Research Center
and AMRC are servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.

Welcome to the
<strong>2011</strong> EUVL <strong>Symposium</strong>!
Hosted by: In cooperation with:
<strong>Symposium</strong> Chair: Stefan Wurm (SEMATECH / GLOBALFOUNDRIES)
<strong>Symposium</strong> Co-Chair: Ichiro Mori (Toshiba / EIDEC)
<strong>Symposium</strong> Co-Chair: Rob Hartman (ASML)
<strong>2011</strong> EUVL <strong>Symposium</strong>
30 October <strong>2011</strong> 2

<strong>2011</strong> EUVL <strong>Symposium</strong> Sponsors – Thank You!
30 October <strong>2011</strong>
<strong>2011</strong> EUVL <strong>Symposium</strong>

<strong>2011</strong> EUVL <strong>Symposium</strong> Sponsors – Thank You!
30 October <strong>2011</strong>
<strong>2011</strong> EUVL <strong>Symposium</strong>

The <strong>2011</strong> EUVL <strong>Symposium</strong> Program
Team
• Program Chair: Patrick Naulleau (LBNL)
– Dr. Naulleau has been on the leading edge of
EUV lithography research for over a decade
– 14 years at Lawrence Berkeley National
Laboratory and in addition 3 years Associate
Professor at University at Albany, SUNY
– Since April 2010 Acting Director of the Center
for X-ray Optic at Lawrence Berkeley National
Laboratory
• Program Co-Chairs:
– Frank Goodwin (SEMATECH)
– Iwao Nishiyama (Kyushu Institute of Technology)
– Winfried Kaiser – (Carl Zeiss)
<strong>2011</strong> EUVL <strong>Symposium</strong>
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The <strong>2011</strong> EUVL <strong>Symposium</strong> Support
Team at the <strong>Symposium</strong>
Jill & Marcy &
Beverly
<strong>2011</strong> EUVL <strong>Symposium</strong>
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Attendance by Geographic Region
United States
174 (48%)
• 362 registered as of October 16
Asia / Pacific
125 (35%)
Europe
63 (17%)
30 October <strong>2011</strong> <strong>2011</strong> EUVL <strong>Symposium</strong>
7

Attendance by Year
500
450
400
350
300
250
200
150
100
50
0
310
354
417 383 368
463
325 344
443
362
30 October <strong>2011</strong> <strong>2011</strong> EUVL <strong>Symposium</strong>
8

Are we making sufficient progress?
9
2005 2006 2007 2008 2009 2010 <strong>2011</strong>
Defect-free mask
Source power
Resist resolution
Reticle protection
Optics quality
First EUV tool
installed in Albany
EUV is
real
BACUS, EUV
<strong>Symposium</strong>
Integrated reticle handling 0 defect prototype
< 10% flare optics
EUV Mask
Infrastructure
Consortium
(EMI)
<strong>2011</strong> EUVL <strong>Symposium</strong>
~ 10 W exposure power
Achieved 20 nm hp resolution
5% flare optics
First of 6
Beta tools
delivered
EMI AIMS Tool
Contract
executed
~ 100-500X defect
reduction required for HVM
> 100 W reliable
source required
LWR needs 2-3X
improvement for MPU
(OK for Memory)
Commercial reticle-handling
solution available since 2010;
continued improvement
NXE3300 optics being
assembled (~5-6%flare); 3300
optics in manufacturing

Program Overview
Accelerating the next technology revolution
Copyright ©2009
SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. <strong>International</strong> SEMATECH Manufacturing Initiative, ISMI, Advanced Materials Research Center
and AMRC are servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.

Abstracts
Abstract count drops to 121
200
150
100
50
0
175 173 170 155 167 182
<strong>2011</strong> EUVL <strong>Symposium</strong>
121
2005 2006 2007 2008 2009 2010 <strong>2011</strong>
Year
30 October <strong>2011</strong> 11

Abstracts by region
USA, 45,
37%
Other, 1, 1% Asia/Pacific,
38, 31%
Europe, 37,
31%
<strong>2011</strong> EUVL <strong>Symposium</strong>
30 October <strong>2011</strong> 12

Abstracts by topic
Abstracts
40
35
30
25
20
15
10
5
0
Exposure Tool
Other Asia/Pacific Europe USA
Source
Resist
Mask
Device Integration
<strong>2011</strong> EUVL <strong>Symposium</strong>
Optics
30 October <strong>2011</strong> 13

Abstracts by affiliation
Academia,
23, 19%
Research
Labs, 21,
17%
Consortia,
24, 20%
<strong>2011</strong> EUVL <strong>Symposium</strong>
Industry, 53,
44%
30 October <strong>2011</strong> 14

Abstracts by affiliation
Research Labs Consortia Academia Industry
Abstracts
40
35
30
25
20
15
10
5
0
Exposure Tool
Source
Resist
Mask
Device Integration
<strong>2011</strong> EUVL <strong>Symposium</strong>
Optics
30 October <strong>2011</strong> 15

Oral talks by region
USA, 18,
36%
Europe, 16,
33%
<strong>2011</strong> EUVL <strong>Symposium</strong>
Asia/Pacific,
15, 31%
30 October <strong>2011</strong> 16

Oral talks by topic
Abstracts
20
18
16
14
12
10
8
6
4
2
0
Exposure Tool
Source
Asia/Pacific Europe USA
Resist
Mask
Device Integration
<strong>2011</strong> EUVL <strong>Symposium</strong>
Optics
30 October <strong>2011</strong> 17

A friendly reminder for
• The audience to:
– Set cell phones to vibrate
– Do not take photographs or recordings
– Please use microphone for questions
• The presenters to:
– Turn in and check talks
– Stick to your allotted time
<strong>2011</strong> EUVL <strong>Symposium</strong>
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