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the effect of carbon content of the mechanical properties - McMaster ...

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M.A.Sc. Thesis – E. E. Yang <strong>McMaster</strong> – Materials Science & Engineering<br />

after each polishing step to avoid contamination from cloths, lubricants or o<strong>the</strong>r factors.<br />

Water was sed as a lubricant and for cleaning at early polishing stages and not used at<br />

finer polishing stages, with samples rinsed with ethanol instead. The polishing procedure<br />

followed is outlined in Table 9.4. The OM was used between steps to examine <strong>the</strong><br />

surface for significant scratches and if steps needed to be repeated.<br />

Table 9.4 Polishing Steps<br />

Cloth Time (min) Load (N) Lubricant<br />

SiC-800 5 5 Water<br />

SiC-1200 10 5<br />

SiC-2400 10 5<br />

SiC-2400 10 5<br />

MD-Dac 3μm diamond 15 10 BLUE<br />

MD-Nap 1μm diamond 15 10<br />

9.5 Detailed Etching Conditions<br />

The solution <strong>of</strong> 5% nitric acid in methanol was prepared each time prior to etching in<br />

order to ensure fresh etchant for maximum <strong>effect</strong>iveness in revealing <strong>the</strong> microstructure.<br />

The samples were immersed and swabbed with <strong>the</strong> etchant for approximately 45 seconds<br />

to reveal <strong>the</strong> microstructural features. All sample rinsing and cleaning was performed<br />

with ethanol to avoid adverse reactions <strong>of</strong> <strong>the</strong> sample surface<br />

xxi

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